| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/04/2009 | US20090142674 Photo Mask and Method for Manufacturing Semiconductor Device Using the Same |
| 06/04/2009 | US20090142672 Optical recording composition and holographic recording medium |
| 06/04/2009 | US20090142671 Optical recording composition and holographic recording medium |
| 06/04/2009 | US20090142620 Magnetic recording medium, method of manufacturing the same, and magnetic recording/reproducing apparatus |
| 06/04/2009 | US20090142612 Holographic films employing cycloolefin copolymers |
| 06/04/2009 | US20090142472 Methods of fabrication employing nanoscale mandrels |
| 06/04/2009 | US20090141356 Optical element, and light source unit and exposure apparatus having the same |
| 06/04/2009 | US20090141258 Imaging Device in a Projection Exposure Machine |
| 06/04/2009 | US20090140175 Method and system for fabricating a data storage medium |
| 06/04/2009 | US20090140163 Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium |
| 06/04/2009 | DE19902527B4 Druckplattenträger und Verfahren zur Herstellung eines Druckplattenträgers oder einer Offsetdruckplatte Printing plate support and method for manufacturing a printing plate support or an offset printing plate |
| 06/04/2009 | DE102007055443A1 Reticle illumination system for microlithography, has light mixing rod provided for homogenization of light, and feedback lens leading back portion of light from light mixing rod at outlet end for guiding into light mixing rod at entry end |
| 06/03/2009 | EP2065920A1 Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| 06/03/2009 | EP2065743A1 Visible imaging device with colour filter |
| 06/03/2009 | EP2064597A1 Illumination system with a detector for recording a light intensity |
| 06/03/2009 | EP2064596A1 Dual stage positioning and switching system |
| 06/03/2009 | EP2064595A2 Optical element and method |
| 06/03/2009 | EP2064005A2 Method of cleaning a surface region covered with contaminant or undesirable material |
| 06/03/2009 | EP1747498B1 Chemical compositions |
| 06/03/2009 | EP1730591A4 Nanoscale electric lithography |
| 06/03/2009 | EP1652007B1 Further method to pattern a substrate |
| 06/03/2009 | EP1495365A4 Antireflective sio-containing compositions for hardmask layer |
| 06/03/2009 | EP1433857B1 Process for producing monomer |
| 06/03/2009 | EP1141776B1 Method for patterning thin films |
| 06/03/2009 | CN201251679Y Autofocus mechanism for controlling the exposure and imaging quality of a CTP system |
| 06/03/2009 | CN101449208A Photosensitive resin composition and laminate |
| 06/03/2009 | CN101449207A Antireflective hardmask composition |
| 06/03/2009 | CN101449206A Low thermal distortion silicone composite molds |
| 06/03/2009 | CN101446777A Super-resolution i-ray lithography device |
| 06/03/2009 | CN101446776A Lithographic apparatus and device manufacturing method |
| 06/03/2009 | CN101446775A Alignment light source apparatus |
| 06/03/2009 | CN101446774A A substrate, method of preparing a substrate for lithography, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus |
| 06/03/2009 | CN101446773A Maskless photon-electron spot-grid array printer |
| 06/03/2009 | CN101446772A Method of measuring focus of a lithographic projection apparatus |
| 06/03/2009 | CN101446771A Lithographic apparatus having an active damping subassembly |
| 06/03/2009 | CN101446770A Substrates and methods of using those substrates |
| 06/03/2009 | CN101446769A Method for selecting exposure conditions of lithography |
| 06/03/2009 | CN101446768A Zero layer alignment maker and preparation method |
| 06/03/2009 | CN101446767A Method for measuring focus offsets of exposure tool |
| 06/03/2009 | CN101446766A Exposure and alignment mark on silicon chip |
| 06/03/2009 | CN101446765A Photoetching development method |
| 06/03/2009 | CN101446764A Radiation sensitivity compound for red color filter, color filter and color liquid crystal display element |
| 06/03/2009 | CN101446763A Device for automatically adjusting dynamic balance of exposure roller |
| 06/03/2009 | CN101446762A Micro-complex type method for inducing electric field under the restrict of non-contact moulding board |
| 06/03/2009 | CN101446761A Pattern formation method |
| 06/03/2009 | CN101446760A Double patterning strategy for contact hole and trench |
| 06/03/2009 | CN101446759A Method for producing secondary coining moulding board for nanometer coining and secondary coining moulding board thereof |
| 06/03/2009 | CN101446758A Method for improving smoothness of reflector in micro-mechanical non-refrigeration infrared imaging chip |
| 06/03/2009 | CN100495217C Exposure device |
| 06/03/2009 | CN100495216C Electron beam alignment mark manufacture method and its uses |
| 06/03/2009 | CN100495215C Method and device for light etching micrometer structure of smooth surface |
| 06/03/2009 | CN100495214C Lithographic apparatus and device manufacturing method |
| 06/03/2009 | CN100495213C Lithographic apparatus and device manufacturing method |
| 06/03/2009 | CN100495212C Method of determining characteristic a process step and device manufacturing method |
| 06/03/2009 | CN100495211C Method of preparing components, prepared component, lithographic apparatus and device manufacturing method |
| 06/03/2009 | CN100495210C Photoetching equipment and device manufacturing method |
| 06/03/2009 | CN100495209C Low silicon-outgassing resist for bilayer lithography |
| 06/03/2009 | CN100495208C Fore-body of lithographic printing plate |
| 06/03/2009 | CN100495207C On-press developable infrared sensitive printing plates using binder resins having polyethylene oxide segments |
| 06/03/2009 | CN100495206C Precursor of thermosensitive lithographic printing plate |
| 06/03/2009 | CN100495205C Pattern formation method and exposure device |
| 06/03/2009 | CN100495204C Artistic light shield made through laser annealing and method for forming polycrystalline films by utilizing laser annealing |
| 06/03/2009 | CN100494481C Ion-implanted electroformed structural material and method of producing the structural material |
| 06/03/2009 | CN100494226C Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same |
| 06/03/2009 | CN100493693C Apparatus for treatment of light-sensitive biopolymers |
| 06/02/2009 | US7542263 Overlay correction by reducing wafer slipping after alignment |
| 06/02/2009 | US7542217 Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus |
| 06/02/2009 | US7542186 3-D holographic recording method and 3-D holographic recording system |
| 06/02/2009 | US7542141 Stage controller and exposure method in which position of the stage is controlled based on position measurements of first and second laser interferometers |
| 06/02/2009 | US7542129 Patterning apparatuses and methods for the same |
| 06/02/2009 | US7542128 Exposure apparatus, exposure method, and method for producing device |
| 06/02/2009 | US7541389 Arylsulfinate salts in photoinitiator systems for polymerization reactions |
| 06/02/2009 | US7541138 Evaluation of immersing the resist film in a solvent after the selective exposure step and before the post-exposure baking step followed by development; accuracy; no surface roughness; excellent resist pattern profile; antiswelling agents; minimal deterioration in sensitivity; miniaturization |
| 06/02/2009 | US7541137 Resist resolution using anisotropic acid diffusion |
| 06/02/2009 | US7541136 Transparent film configured to give a predetermined phase difference to exposure light passing through that part of the second opening area in which the transparent film is provided relative to exposure light passing through the second surrounding area; focus monitor masks; photolithography; efficiency |
| 06/02/2009 | US7541134 Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same |
| 06/02/2009 | US7541133 Positive resist composition and patterning process |
| 06/02/2009 | US7541132 Chemically amplified resist material, topcoat film material and pattern formation method using the same |
| 06/02/2009 | US7541131 A resin decomposing under the action of acid catalyst provided by the anion of a photosensitive sulfonium salt based on a thioxanthene ring to increase its solubility in an alkali developer; outgassing properties; semiconductors; integrated circuits; liquid-crystal thermal heads; argon fluoride laser |
| 06/02/2009 | US7541119 Photochromic dye dispersed in and attached to ionic polymer; reversible transition between colorless and colored state in response to light; UV light causes color change; erasing by heating; stability; ink jet printers; toner-free; cost efficiency; disposable paper reused; environmentally friendly |
| 06/02/2009 | CA2300967C Li2o-al2o3-sio2 type transparent crystallized glass |
| 05/28/2009 | WO2009067162A1 Process using colored mask combined with selective area deposition |
| 05/28/2009 | WO2009067160A1 Use of gradient colored mask |
| 05/28/2009 | WO2009067154A1 Multicolored mask process for making display circuitry |
| 05/28/2009 | WO2009067153A1 Multicolor mask |
| 05/28/2009 | WO2009067148A1 Photopatternable deposition inhibitor containing siloxane |
| 05/28/2009 | WO2009067147A1 Integrated color mask |
| 05/28/2009 | WO2009066895A2 Composition for mold sheet and method for preparing mold sheet using same |
| 05/28/2009 | WO2009066768A1 Composition for surface antireflection films and pattern-making method |
| 05/28/2009 | WO2009066638A1 Photosensitive resin composition, cured photosensitive resin product, photosensitive resin film, cured photosensitive resin film product, and optical waveguide produced by using those products |
| 05/28/2009 | WO2009066242A2 Method of increasing the operation lifetime of a collector optics arranged in an irradiation device and corresponding irradiation device |
| 05/28/2009 | WO2009066169A1 An antireflective coating composition and process thereof |
| 05/28/2009 | WO2009065849A1 Processing of lithographic printing plates with hydrophilic polymer in finisher solution |
| 05/28/2009 | WO2009065819A2 Polariser |
| 05/28/2009 | WO2009065590A1 Laser beam machining |
| 05/28/2009 | WO2009048262A3 Polymer for forming organic anti-reflective coating layer and composition including the same |
| 05/28/2009 | WO2009021249A3 Polar polydimethylsiloxane molds, methods of making the molds, and methods of using the molds for pattern transfer |
| 05/28/2009 | WO2008122335A3 Apparatus for measurement of substrates |
| 05/28/2009 | US20090137419 Sequencing of surface immobilized polymers utilizing microfluorescence detection |
| 05/28/2009 | US20090136878 Topcoat composition, alkali developer-soluble topcoat film using the composition and pattern forming method using the same |