Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
06/2009
06/10/2009CN101452218A Submerge self-adapting gas seal device for photoetching machine
06/10/2009CN101452217A Exposure method
06/10/2009CN101452216A Method for monitoring temperature controlling plate performance and system by employing the method
06/10/2009CN101452215A Control method for key dimension
06/10/2009CN101452214A Exposure method, photolithography method and method for making through-hole
06/10/2009CN101452213A Secondary image exposure method of contact hole
06/10/2009CN101452212A Projection aligner
06/10/2009CN101452211A Method for producing photolithography alignment mark
06/10/2009CN101452210A Photolithography method for forming different pattern density
06/10/2009CN101452209A Automatic cap-covering mechanism in photoresist coating unit of square substrate
06/10/2009CN101452208A Photosensitive resin composition for pad protective layer, and method for making image sensor using the same
06/10/2009CN101452207A Nanometer stamping and photoetching machine
06/10/2009CN100499029C Semiconductor device manufacture method and etching system
06/10/2009CN100499018C Method and composition for removing residue from microstructure of body
06/10/2009CN100498552C Environmental protection plate cleaning liquid for plate making
06/10/2009CN100498551C Fine dust adsorption device and machine station using same
06/10/2009CN100498550C Pattern formation method
06/10/2009CN100498549C Apparatus for fabricating flat panel display device and method of fabricating the same
06/10/2009CN100498548C Method for predicting function of integrated circuit fragment photo-etched on chip
06/10/2009CN100498547C Substrate processing apparatus
06/10/2009CN100498546C Method for seeking target area for integrated circuit layout design
06/10/2009CN100498545C Detecting method for position of photomask graphics
06/10/2009CN100498544C Method for reducing critical dimension of photoresist contact hole pattern
06/10/2009CN100498543C Method for applying back-exposure to embedded phase-shifting mask focused ion beam etching
06/10/2009CN100498542C Light source for photolithography
06/10/2009CN100498541C Method for manufacturing color element film-equipped substrate and color element film-equipped substrate
06/10/2009CN100498540C Wafer platform mask platform synchronous control system of step-scan photoetching machine
06/10/2009CN100498539C Photoreaction apparatus
06/10/2009CN100498538C Lithographic apparatus and device manufacturing method
06/10/2009CN100498537C Lithographic apparatus, device manufacturing method and variable attenuator
06/10/2009CN100498536C Lithographic apparatus, control system and device manufacturing method
06/10/2009CN100498535C Lithographic apparatus and device manufacturing method
06/10/2009CN100498534C Lithographic apparatus and device manufacturing method
06/10/2009CN100498533C Immersion lithography method and device for illuminating a substrate
06/10/2009CN100498532C Method for imaging member to wafer and mask group for imaging chip
06/10/2009CN100498531C Optical element, lithographic apparatus containing such optical element and device manufacturing method
06/10/2009CN100498530C Lithographic apparatus and device manufacturing method
06/10/2009CN100498529C Photosensitive resin composition and its uses
06/10/2009CN100498528C Low pressure treatment platform, its detaching method and substrate processing apparatus
06/10/2009CN100498527C Nanometer stamping inclination alignment mechanism with arc guide rail
06/10/2009CN100498526C Inclination correcting mechanism of multi hinge nano-stamping pressing die
06/10/2009CN100498525C Electrophotographic photosensitive member, process for producing electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus
06/10/2009CN100498209C Method and system to measure characteristics of a film disposed on a substrate
06/10/2009CN100497480C Composition for forming dielectric film and method for forming dielectric film or pattern using the composition
06/09/2009USRE40728 Acid functional polymers based on benzocyclobutene
06/09/2009US7546178 Aligner evaluation system, aligner evaluation method, a computer program product, and a method for manufacturing a semiconductor device
06/09/2009US7545482 Projection objective of a microlithographic projection exposure apparatus
06/09/2009US7545481 Lithographic apparatus and device manufacturing method
06/09/2009US7545479 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
06/09/2009US7545478 Lithographic apparatus, thermal conditioning system, and method for manufacturing a device
06/09/2009US7544986 System including integrated circuit structures formed in a silicone ladder polymer layer
06/09/2009US7544960 Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method
06/09/2009US7544750 Top antireflective coating composition with low refractive index at 193nm radiation wavelength
06/09/2009US7544638 Device for chemical and biochemical reactions using photo-generated reagents
06/09/2009US7544463 Photosensitive structure for flexographic printing
06/09/2009US7544462 Positive working imagable elements; lithography printing plates; phenol-formaldehyde resin binder
06/09/2009US7544461 Near infrared ray activation type positive resin composition
06/09/2009US7544460 Resist composition, multilayer body, and method for forming resist pattern
06/09/2009US7544448 Tetrabenzodiazadiketoperylene pigments for laser marking
06/09/2009US7544238 Modified pigments having steric and amphiphilic groups
06/09/2009CA2541239C Method and apparatus for micro-contact printing
06/09/2009CA2245548C Compositions which undergo light-induced cationic curing and their use
06/04/2009WO2009070500A1 Photocurable resin composition for producing three dimensional articles having high clarity
06/04/2009WO2009070434A1 Methods for forming sheeting with a composite image that floats and a master tooling
06/04/2009WO2009070013A1 A lithographic apparatus, a projection system and a device manufacturing method
06/04/2009WO2009069848A1 Novel copolymers and photoresist composition including the same
06/04/2009WO2009069847A1 Photoresist composition with high etching resistance
06/04/2009WO2009069817A2 Illumination optical apparatus, exposure apparatus, and method for producing device
06/04/2009WO2009069815A1 Illumination optical apparatus, exposure apparatus, and method for producing device
06/04/2009WO2009069722A1 Reflective projection exposure apparatus and exposure method
06/04/2009WO2009069712A1 Blocked isocyanato bearing silicon containing composition for the formation of resist undercoat
06/04/2009WO2009068755A1 Novel siloxane polymer compositions
06/04/2009WO2009068754A1 Siloxane polymer compositions and methods of using the same
06/04/2009WO2009040661A3 Thick film resists
06/04/2009WO2009030444A3 Chromatically corrected catadioptric objective and projection exposure apparatus including the same
06/04/2009WO2009014695A3 Engraving with amplifier having multiple exit ports
06/04/2009WO2008115530A3 Polymer composition for preparing electronic devices by microcontact printing processes and products prepared by the processes
06/04/2009US20090142715 Laminated resist used for immersion lithography
06/04/2009US20090142714 Method for using a topcoat composition
06/04/2009US20090142713 Substrate processing system and substrate processing method
06/04/2009US20090142712 Method of manufacturing image forming element, image forming element, and image forming apparatus having the same
06/04/2009US20090142711 An etching mask pattern having a pattern pitch half the resolution of an exposure equipment by exposure and development of chemically amplified negative and positive photoresists; bake to diffuse hydrogen ions generated from developed negative resist into positive resist; develop; removal
06/04/2009US20090142710 Method for patterning a photoresist layer
06/04/2009US20090142709 Imager with tuned color filter
06/04/2009US20090142708 Optical fiber illuminator, method of fabricating optical fiber illuminator, and optical recording head and optical recording and reading apparatus having the optical fiber illuminator
06/04/2009US20090142707 Method to build a wirebond probe card in a many at a time fashion
06/04/2009US20090142706 Method of manufacturing semiconductor device
06/04/2009US20090142705 Method for forming mask pattern
06/04/2009US20090142704 Method for reducing side lobe printing using a barrier layer
06/04/2009US20090142703 Display Member Exposing Method and Plasma Display Member Manufacturing Method
06/04/2009US20090142702 Methods of using violet-sensitive imageable elements
06/04/2009US20090142701 Double patterning strategy for contact hole and trench
06/04/2009US20090142700 Resin for photoresist composition, photoresist composition and method for forming resist pattern
06/04/2009US20090142699 Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern
06/04/2009US20090142698 Includes alkali-soluble resin comprising monomer containing an aliphatic cyclic group having fluorinated hydroxyalkyl group and monomer containing acrylate ester with hydroxyl group-containing aliphatic cyclic group, acid generator, and alkylene urea-based cross-linker
06/04/2009US20090142697 Photosensitive resin, and photosensitive composition
06/04/2009US20090142696 Positive resist composition, positive resist composition for thermal flow, and resist pattern forming method
06/04/2009US20090142695 use in negative- or positive-working imageable elements provides high photospeed and improved developability for providing imaged and developed elements, such as lithographic printing plates with improved chemical resistance and run length
06/04/2009US20090142694 Siloxane polymer compositions and methods of using the same
06/04/2009US20090142693 Negative resist composition and method of forming resist pattern
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