| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/17/2009 | EP0978016B1 Antireflective coating compositions for photoresist compositions and use thereof |
| 06/17/2009 | CN101460897A Exposure method and exposure apparatus |
| 06/17/2009 | CN101458463A Ashing method |
| 06/17/2009 | CN101458462A Photolithography developing method for reducing photoresist developing defect in semiconductor process |
| 06/17/2009 | CN101458461A Method of fine patterning semiconductor device |
| 06/17/2009 | CN101458460A Photoresist silicification method and method for forming photoresist mask pattern |
| 06/17/2009 | CN101458459A Cleaning apparatus and immersion lithographic apparatus |
| 06/17/2009 | CN101458458A Alignment method and apparatus, lithographic apparatus, metrology apparatus and device manufacturing method |
| 06/17/2009 | CN101458457A Method for obtaining focusing position of exposure apparatus and focusing detecting method |
| 06/17/2009 | CN101458456A Overlay precision control method and apparatus |
| 06/17/2009 | CN101458455A Exposure device and method |
| 06/17/2009 | CN101458454A Method for simultaneously monitoring photolithography exposure condition and registration photoetching precision |
| 06/17/2009 | CN101458453A Projection aligner |
| 06/17/2009 | CN101458452A X-ray sensitive resin composition, barrier body and protection film of liquid crystal display member and their forming methods |
| 06/17/2009 | CN101458451A Light path structure suitable for femtosecond laser two-photon mirco-nano processing system |
| 06/17/2009 | CN101458450A Method for making metallic surface pattern |
| 06/17/2009 | CN100501929C Method of adjusting deviation of critical dimension of patterns |
| 06/17/2009 | CN100501576C Apparatus and method for soft baking photoresist on substrate |
| 06/17/2009 | CN100501575C Around exposure device and method thereof |
| 06/17/2009 | CN100501574C On-line spherical aberration measuring method |
| 06/17/2009 | CN100501573C Method for online regulating silicon slice of photo-etching machine to optimum exposure position |
| 06/17/2009 | CN100501572C Lithographic apparatus, illumination system and debris trapping system |
| 06/17/2009 | CN100501571C Photoresist composition for multi-micro nozzle head coater |
| 06/17/2009 | CN100501570C Composition for dielectric of plasma display panel, laminate for dielectric, and method for forming the dielectric |
| 06/17/2009 | CN100501541C Copper conductor structure for liquid crystal display assembly and manufacturing method thereof |
| 06/17/2009 | CN100500450C Printing form having a plurality of planar functional zones |
| 06/16/2009 | USRE40743 Projection exposure system having a reflective reticle |
| 06/16/2009 | US7549140 Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
| 06/16/2009 | US7548404 Combination current sensor and relay |
| 06/16/2009 | US7548301 Maskless optical writer |
| 06/16/2009 | US7547998 Aligning apparatus including an attraction preventing plate provided between permanent magnet and magnetic member |
| 06/16/2009 | US7547735 an acrylate-functionalized hydrogenated polybutadiene and a mono-functional (meth)acrylate; a bisacyl phosphine oxide and benzophenone photoinitiators; wavelength of 365 nm at 120 to 130 mW/cm2 intensity; cures through the thickness of dispensed composition at 40 mm/sec to 100 mm/sec speed; noncorroding |
| 06/16/2009 | US7547669 Contains choline hydroxide; for removal of residues, photoresists, organic anti-reflective coatings and gap-fill and sacrificial polymers from surfaces; corrosion resistance |
| 06/16/2009 | US7547639 Selective surface exposure, cleans and conditioning of the germanium film in a Ge photodetector |
| 06/16/2009 | US7547597 Direct alignment scheme between multiple lithography layers |
| 06/16/2009 | US7547589 Method for fabricating semiconductor device, and electro-optical device, integrated circuit and electronic apparatus including the semiconductor device |
| 06/16/2009 | US7547505 Stress relieving the top portion of the multilayer mirror element followed by forming the protective capping layer of a noble metal or alloy, a ceramic material, a transition metal, or a metal oxide; extreme ultraviolet radiatio lithography; oxidation resistance; semiconductors; durability; quality |
| 06/16/2009 | US7547503 Low-defect microparticle pattern, dot array pattern, or hole array pattern with less processing steps (no rinsing of by-products) using a silane having a secondary amino group protected by an o-nitrobenzyloxycarbonyl group; quantum dot laser; photonic crystal optical devices; single-electron devices |
| 06/16/2009 | US7547502 Exposure method |
| 06/16/2009 | US7547501 Photoactive compounds |
| 06/16/2009 | CA2353162C Method and device for clearing a re-imageable printing form |
| 06/11/2009 | WO2009073589A1 Fluoride-free photoresist stripper or residue removing cleaning compositions containing conjugate oligomeric or polymeric material of alpha-hydroxycarbonyl compound/amine or ammonia reaction |
| 06/11/2009 | WO2009073588A1 Fluoride-containing photoresist stripper or residue removing cleaning compositions containing conjugate oligomeric or polymeric material of alpha-hydroxycarbonyl compound/amine or ammonia reaction |
| 06/11/2009 | WO2009073098A1 Imageable elements with components having 1h-tetrazole groups |
| 06/11/2009 | WO2009072590A1 Branched polyalkylene glycol derivative, photosensitive composition, crosslinked material, and substrate |
| 06/11/2009 | WO2009072493A1 Photosensitive adhesive, semiconductor device and method for manufacturing semiconductor device |
| 06/11/2009 | WO2009072465A1 Composition for forming base film for lithography and method for forming multilayer resist pattern |
| 06/11/2009 | WO2009071259A1 Inspection apparatus for lithography |
| 06/11/2009 | WO2009071207A1 Inspection apparatus, lithographic apparatus and method of measuring a property of a substrate |
| 06/11/2009 | WO2008060592A3 Micropatterning of conductive graphite particles using microcontact printing |
| 06/11/2009 | WO2002093254A3 Lithography system and method for device manufacture |
| 06/11/2009 | US20090149031 Method of making a semiconductor device with residual amine group free multilayer interconnection |
| 06/11/2009 | US20090149025 Remover Compositions |
| 06/11/2009 | US20090148796 Lithographic Method |
| 06/11/2009 | US20090148795 Patterning method using a combination of photolithography and copolymer self-assemblying lithography techniques |
| 06/11/2009 | US20090148794 Method for processing of photopolymer printing plates with overcoat |
| 06/11/2009 | US20090148793 Processing method of lithographic printing plate precursor |
| 06/11/2009 | US20090148792 Method of preparing lithographic printing plate and lithographic printing plate precursor |
| 06/11/2009 | US20090148791 Positive photosensitive composition |
| 06/11/2009 | US20090148790 For use as chemically-amplified resist useful for microfabrication utilizing various types of radiation; lithography, integrated circuits |
| 06/11/2009 | US20090148789 Coating compositions for use with an overcoated photoresist |
| 06/11/2009 | US20090148782 Exposure method, photo mask, and reticle stage |
| 06/11/2009 | US20090148781 Reflective-type mask |
| 06/11/2009 | US20090148611 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent |
| 06/11/2009 | US20090147345 Pattern generator |
| 06/11/2009 | US20090147235 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses |
| 06/11/2009 | US20090147234 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses |
| 06/11/2009 | US20090147233 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses |
| 06/11/2009 | US20090146236 Photosensitive resin composition for pad protective layer, and method for making image sensor using the same |
| 06/10/2009 | EP2068349A1 Stage device and exposure device |
| 06/10/2009 | EP2068326A1 Exposure mirror and exposure apparatus having same |
| 06/10/2009 | EP2067800A1 Polyorganosiloxane composition |
| 06/10/2009 | EP2067076A2 Projection objective for a microlithography apparatus with improved imaging properties and method for improving the imaging properties of the projection objective |
| 06/10/2009 | EP2067075A2 Method to form a pattern of functional material on a substrate |
| 06/10/2009 | EP1783148B1 High-molecular compound, acid generator, positive resist compositions, and method for formation of resist patterns |
| 06/10/2009 | EP1497341B1 Preparation of homo-, co- and terpolymers of substituted styrenes |
| 06/10/2009 | EP1478976B1 Critical dimension control using full phase and trim masks |
| 06/10/2009 | EP1350264A4 Method for forming a pattern and a semiconductor device |
| 06/10/2009 | EP1133440A4 Automated opening and closing of ultra clean storage containers |
| 06/10/2009 | EP0944851B1 Assembly of optical components optically aligned and method for making this assembly |
| 06/10/2009 | DE102008043395A1 Projection lens for use in projection exposure system, has arrangement of optical elements arranged between object and image planes, and two imaging groups with lenses made from material with small absorption and/or high heat conductivity |
| 06/10/2009 | DE102007059071A1 Optical element e.g. illumination lens, manufacturing method for microlithography system, involves manufacturing optical usable surfaces by material processing, where connecting surface cuts continuous optical usable surface |
| 06/10/2009 | DE102007058862A1 Optical system, particularly for microlithographic projection illumination system, has transparent optical element during working wavelength |
| 06/10/2009 | DE102007058105A1 Vorrichtung und Verfahren zur Bearbeitung von optischen Elementen mittels Laserablation Apparatus and method for machining optical elements by means of laser ablation |
| 06/10/2009 | DE102006038643B4 Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren Microlithographic projection exposure apparatus and microlithographic exposure method |
| 06/10/2009 | DE102005007280B4 Verfahren zum Bestimmen einer kritischen Dimension einer lateral strukturierten Schicht A method for determining a critical dimension of a laterally structured layer |
| 06/10/2009 | CN201255806Y Position limiter for image developing arm |
| 06/10/2009 | CN101454724A Illumination system with a detector for recording a light intensity |
| 06/10/2009 | CN101454723A Method of making a photopolymer printing plate |
| 06/10/2009 | CN101454722A Negative-working radiation-sensitive compositions and imageable materials |
| 06/10/2009 | CN101454721A Alkali developable black photosensitive resin composition for formation of light-tight partition |
| 06/10/2009 | CN101452227A Fluoride-free photoresist stripper or residue removing cleaning compositions and method for cleaning electronic substrate using same |
| 06/10/2009 | CN101452226A Fluoride-free photoresist stripper or residue removing cleaning compositions and method for cleaning electronic substrate using same |
| 06/10/2009 | CN101452225A Developing method for photoresist mask pattern |
| 06/10/2009 | CN101452224A Recovery system for tetramethylammonium hydroxide developing solution and method thereof |
| 06/10/2009 | CN101452223A Method for monitoring exposure threshold of polyimide |
| 06/10/2009 | CN101452222A Lithographic apparatus, projection assembly and active damping |
| 06/10/2009 | CN101452221A Methods and system for lithography process window simulation |
| 06/10/2009 | CN101452220A Lithographic apparatus and device manufacturing method |
| 06/10/2009 | CN101452219A Submerge liquid supplying recovery controlling device for photoetching machine |