| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/24/2009 | CN100503756C Coating compositions for use with an overcoated photoresist |
| 06/24/2009 | CN100503737C Pigment compositions consisting of a yellow disazo pigment and an organic pigment |
| 06/24/2009 | CN100503726C 可聚合组合物 Polymerizable composition |
| 06/23/2009 | USRE40788 Litho strip and method for its manufacture |
| 06/23/2009 | USRE40774 Positioning device with a vibration-free object table, and lithographic device provided with such a positioning device |
| 06/23/2009 | US7551362 Projection optical system and method for photolithography and exposure apparatus and method using same |
| 06/23/2009 | US7551361 Lithography lens system and projection exposure system provided with at least one lithography lens system of this type |
| 06/23/2009 | US7551281 Position sensor |
| 06/23/2009 | US7551264 Exposure apparatus |
| 06/23/2009 | US7551263 Device for adjusting the illumination dose on a photosensitive layer |
| 06/23/2009 | US7551261 Illumination system for a microlithography projection exposure installation |
| 06/23/2009 | US7550805 Stress-controlled dielectric integrated circuit |
| 06/23/2009 | US7550556 storage stability; does not increase in viscosity nor thicken; reacting a copolymer of an acrylic acid and a hydroxyalkyl acrylate with an isocyanate (isocyanatoalkyl acrylate) and also with an alcohol to prevent polymerization |
| 06/23/2009 | US7550545 Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it |
| 06/23/2009 | US7550254 Fluorinated silsesquioxane polymers and use thereof in lithographic photoresist compositions |
| 06/23/2009 | US7550253 Impervious barrier film includes an alkali-soluble addition polymer and a fluorine-based surface active agent; immersion photolithography using exposing light of a shorter wavelength, such as KrF or ArF excimer lasers, or F2 , ArKr, or Ar2 lasers; fine resist pattern; good shapes |
| 06/23/2009 | US7550251 Liquid transfer articles and method for producing the same using digital imaging photopolymerization |
| 06/23/2009 | US7550250 Positive resist composition and pattern forming method using the same |
| 06/23/2009 | US7550249 Base soluble polymers for photoresist compositions |
| 06/23/2009 | US7550248 A solubilizer of an organic salt, alcohol, carboxylic acid and/or amine which melts the resist pattern at the temperature near its melting point and a water-soluble element; controlled thickening because crosslinking-free; ARF laser-photoresists; fine pattern; cost efficiency; industrial scale; accuracy |
| 06/23/2009 | US7550247 Tri-/tetrapolymers of polysilsesquisiloxanes having fluoro, hydroxy and ester groups; resolution; antiswelling agents; good resistance to oxygen reactive etching resist; establishes a selective etching ratio between the resist and an underlying film used in the bilayer resist process using ArF exposure |
| 06/23/2009 | US7550246 Dissolving a pi complex of tetramethylcyclopentadienyl 2,2'-bipyridin-1,1'-diyl iridium hydride in a solvent; irrradiating with a laser beam to deprotonate and produce an acidicsolution; chemically-amplified photoresists; color filters for liquid rystal; photography/printing; solubility; efficiency |
| 06/23/2009 | US7550234 Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording |
| 06/23/2009 | US7550043 Substrate processing method and substrate processing apparatus |
| 06/18/2009 | WO2009075970A1 Method for making structures with improved edge definition |
| 06/18/2009 | WO2009075384A1 Exposure apparatus, manufacturing method thereof, and maintenance method of exposure apparatus |
| 06/18/2009 | WO2009075364A1 Process for producing regenerated porous sheet |
| 06/18/2009 | WO2009075308A1 Cyclic compound, photoresist base, photoresist composition, microfabrication process, and semiconductor device |
| 06/18/2009 | WO2009075307A1 Cyclic compound, photoresist base, photoresist composition, microfabrication process, and semiconductor device |
| 06/18/2009 | WO2009075265A1 Composition for resist underlayer film formation and method for resist pattern formation |
| 06/18/2009 | WO2009075233A1 Alkali-developable curable composition, insulating thin film using the same, and thin film transistor |
| 06/18/2009 | WO2009075217A1 Flame-resistant photo-sensitive resin composition, and circuit board comprising the same |
| 06/18/2009 | WO2009075103A1 Moving body device, exposure device, pattern formation device, and device manufacturing method |
| 06/18/2009 | WO2009074522A1 Photoresist compositions and method for multiple exposures with multiple layer resist systems |
| 06/18/2009 | WO2009074211A1 Illumination optics for microlithography |
| 06/18/2009 | WO2009053586A3 Method of producing a relief image arrangement usable in particular in the field of flexography and arrangement produced according to this method. |
| 06/18/2009 | WO2009040120A3 Optical unit having adjustable force action on an optical module |
| 06/18/2009 | WO2009034109A3 Illumination system of a microlithographic projection exposure apparatus |
| 06/18/2009 | WO2009015084A3 Methods for generating a standard reference die for use in a die to standard reference die inspection and methods for inspecting a wafer |
| 06/18/2009 | WO2008121137A3 Fabrication of microstructures and nanostructures using etching resist |
| 06/18/2009 | WO2004010167A3 Holographic surface mask etching and optical structures |
| 06/18/2009 | US20090158236 Semiconductor device fabrication method and fabrication apparatus using a stencil mask |
| 06/18/2009 | US20090157214 Maintenance system, substrate processing apparatus, remote operation unit and communication method |
| 06/18/2009 | US20090156453 Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors |
| 06/18/2009 | US20090156005 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith |
| 06/18/2009 | US20090155933 Manufacturing Method of Display Device |
| 06/18/2009 | US20090155733 Method of forming iso space pattern |
| 06/18/2009 | US20090155732 Method for Patterning Using Phase-Change Material |
| 06/18/2009 | US20090155731 Method and system for reducing line edge roughness during pattern etching |
| 06/18/2009 | US20090155730 Method for manufacturing storage medium and apparatus for manufacturing information storage master disc |
| 06/18/2009 | US20090155729 Photoimageable Nozzle Members and Methods Relating Thereto |
| 06/18/2009 | US20090155728 Fabrication Method of Topographically Modulated Microstructures Using Pattern Homogenization with UV Light |
| 06/18/2009 | US20090155727 Method of forming a flat media table for probe storage device |
| 06/18/2009 | US20090155726 Methods of forming electronic devices by ion implanting |
| 06/18/2009 | US20090155725 Method of fine patterning semiconductor device |
| 06/18/2009 | US20090155724 Method for fabricating probe needle tip of probe card |
| 06/18/2009 | US20090155723 Process for forming an organic electronic device including an organic device layer |
| 06/18/2009 | US20090155722 Method for making a lithographic printing plate |
| 06/18/2009 | US20090155721 Flexographic printing plate |
| 06/18/2009 | US20090155720 Photosensitive polymer, resist composition, and associated methods |
| 06/18/2009 | US20090155719 Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods |
| 06/18/2009 | US20090155718 Photoresist compositions and method for multiple exposures with multiple layer resist systems |
| 06/18/2009 | US20090155717 Photosensitive Resin Composition with Good Stripper-Resistance for Color Filter and Color Filter Formed Using the Same |
| 06/18/2009 | US20090155716 Polymeric material containing a latent acid, i.e. a compound which is not an acid but which can be converted to an acid by the influence of laser irradiation |
| 06/18/2009 | US20090155715 Photoresist compositions and method for multiple exposures with multiple layer resist systems |
| 06/18/2009 | US20090155714 Photosensitive compound and photoresist composition including the same |
| 06/18/2009 | US20090155713 Resist composition and process for producing same |
| 06/18/2009 | US20090155699 Phase-shift mask and method for forming a pattern |
| 06/18/2009 | US20090155698 Photomask blank and production method thereof, and photomask production method, and semiconductor device production method |
| 06/18/2009 | US20090155593 Through color high pressure decorative laminate and method of making same |
| 06/18/2009 | US20090155549 Polymerizable fluorine-containing compound and treated substrate having a hydrophilic region and a water repellent region |
| 06/18/2009 | US20090155546 Film-forming composition, method for pattern formation, and three-dimensional mold |
| 06/18/2009 | US20090155401 Method of Forming Nanopattern and Substrate Having Pattern Formed Using the Method |
| 06/18/2009 | US20090154009 Methods for fabricating perpendicular recording heads with controlled separation regions |
| 06/18/2009 | US20090153964 Methods for reducing polarization aberration in optical systems |
| 06/18/2009 | US20090153954 Off-Axis Catadioptric Projection Optical System for Lithography |
| 06/18/2009 | US20090153844 MEMS tunable silicon fabry-perot cavity and applications thereof |
| 06/18/2009 | US20090153820 Exposure apparatus and device manufacturing method |
| 06/18/2009 | US20090153815 Exposure apparatus, exposure method, method for manufacturing device |
| 06/18/2009 | US20090152661 Image sensor and method for manufacturing the same |
| 06/18/2009 | DE112007001740T5 Ausrichtung für Kontaktlithographie Orientation for contact lithography |
| 06/18/2009 | DE10258094B4 Verfahren zur Ausbildung von 3-D Strukturen auf Wafern A method for forming 3-D structures on wafers |
| 06/18/2009 | DE102008013229A1 Beleuchtungsoptik für die Mikrolithographie Illumination optics for microlithography |
| 06/18/2009 | DE102007059717A1 Vorrichtung und Verfahren zur Herstellung von Mikrobauteilen sowie Verwendung einer derartigen Vorrichtung Device and method for the production of micro-components and the use of such a device |
| 06/18/2009 | DE102005025693B4 Verfahren zur Herstellung einer metallorganischen Schicht A process for preparing an organometallic layer |
| 06/17/2009 | EP2071614A1 Mobile body driving method, mobile body driving system, pattern forming method and apparatus, exposure method and apparatus and device manufacturing method |
| 06/17/2009 | EP2071613A1 Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus, device manufacturing method and calibration method |
| 06/17/2009 | EP2071612A1 Mobile body drive method and mobile body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
| 06/17/2009 | EP2071611A1 Mobile body drive system and mobile body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision method |
| 06/17/2009 | EP2071401A2 Device and method for microstructuring a storage medium and storage medium with a microstructured area |
| 06/17/2009 | EP2071400A1 Coating compositions for use with an overcoated photoresist |
| 06/17/2009 | EP2070901A1 Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process |
| 06/17/2009 | EP2070696A1 Method of preparing lithographic printing plate and lithographic printing plate precursor |
| 06/17/2009 | EP2069867A1 Optical modulator with beam-pointing correction |
| 06/17/2009 | EP2069866A2 Photocurable compositions |
| 06/17/2009 | EP2069850A1 Optical system suitable for processing multiphoton curable photoreactive compositions |
| 06/17/2009 | EP1644426B1 Positive photoresist composition and method of forming resist pattern |
| 06/17/2009 | EP1501916B1 Non-corrosive cleaning compositions for removing etch residues |
| 06/17/2009 | EP1330860B1 Anode with porous insulating layer for discharge lasers |
| 06/17/2009 | EP1240553B1 Photoresist composition for deep uv radiation |