Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2014
09/02/2014US8822111 Colored photosensitive composition, color filter and process for producing same, and liquid-crystal display device
09/02/2014US8822109 Colored curable composition, color filter, and solid image pickup element
09/02/2014US8822107 Grid refinement method
09/02/2014US8822106 Grid refinement method
09/02/2014US8822103 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
09/02/2014US8822047 Patterned magnetic recording disk with high bit-aspect-ratio and master mold for nanoimprinting the disk
09/02/2014US8821978 Methods of directed self-assembly and layered structures formed therefrom
09/02/2014US8821761 Antistatic agent, antistatic film and articles coated with antistatic film
09/02/2014US8820234 Curing of photo-curable printing plates with flat tops or round tops by variable speed exposure
09/02/2014CA2558768C Method for producing a base material for screen printing, and base material of this type
08/2014
08/28/2014WO2014130926A1 Methods and apparatus for cleaning objects in a chamber of an optical instrument by generating reactive ions using photon radiation
08/28/2014WO2014128310A1 Optical module
08/28/2014WO2014128232A1 Gas flow optimization in reticle stage environment
08/28/2014WO2014128025A1 Illumination system for an euv lithography device and facet mirror therefor
08/28/2014WO2014128010A2 Euv light source for generating a used output beam for a projection exposure apparatus
08/28/2014WO2014127986A1 Discrete source mask optimization
08/28/2014WO2014127985A1 A lithography model for three-dimensional patterning device
08/28/2014WO2014127430A1 Lithographically produced features
08/28/2014WO2014086982A3 Stable metal compounds, their compositions and methods of their use
08/28/2014US20140242787 Photosensitive resin composition and method for producing semiconductor device
08/28/2014US20140242526 Positive tone organic solvent developed chemically amplified resist
08/28/2014US20140242525 Patterning of transparent conductive coatings
08/28/2014US20140242524 Two mask process for electroplating metal employing a negative electrophoretic photoresist
08/28/2014US20140242523 Techniques For Patterning A Substrate
08/28/2014US20140242522 Double-mask photolithography method minimizing the impact of substrate defects
08/28/2014US20140242521 Photosensitive copolymer, photoresist comprising the copolymer, and method of forming an electronic device
08/28/2014US20140242520 I-line photoresist composition and method for forming fine pattern using same
08/28/2014US20140242519 Monomer, polymer, resist composition, and patterning process
08/28/2014US20140242518 Patterning process and resist composition
08/28/2014US20140242517 Lithographic printing plate precursors and use
08/28/2014US20140242516 Silane Composition and Cured Film Thereof, and Method for Forming Negative Resist Pattern Using Same
08/28/2014US20140242515 Photoresist composition and method of manufacturing display device using same
08/28/2014US20140242505 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device
08/28/2014US20140242504 Positive photosensitive resin composition and method for forming patterns by using the same
08/28/2014US20140242502 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern
08/28/2014US20140242499 Light-reflective photomask and mask blank for euv exposure, and manufacturing method of semiconductor device
08/28/2014US20140242359 Method of forming pattern and composition for crosslinked layer formation to be used in the method
08/28/2014US20140240697 Apparatuses and methods for detecting wave front abberation of projection objective system in photolighography machine
08/28/2014US20140240687 Exposure apparatus, exposure method, and device fabrication method
08/28/2014US20140240686 Arrangement of a mirror
08/28/2014US20140240685 Exposure apparatus, exposure method, and method for producing device
08/28/2014US20140240684 Exposure apparatus, exposure method, and method for producing device
08/28/2014US20140240683 Focus position adjusting apparatus, reticle, focus position adjusting program, and method of manufacturing semiconductor device
08/28/2014US20140239462 Pecvd films for euv lithography
08/28/2014US20140239192 Illumination and displacement device for a projection exposure apparatus
08/28/2014US20140238956 Directed self-assembling composition for pattern formation, and pattern-forming method
08/28/2014DE112012005285T5 Nahinfrarot-absorbierende Dünnschichtzusammensetzung für eine lithographische Anwendung Near-infrared absorbing film composition for lithographic applications
08/28/2014DE102014212691A1 Optisches system für eine lithographieanlage sowie lithographieanlage Optical system for a lithography system and lithography system
08/28/2014DE102013215203A1 Spiegelanordnung und aufnahme für spiegelelemente einer projektionsbelichtungsanlage sowie montage- und demontageverfahren hierfür Mirror arrangement and recording for mirror elements of a projection exposure apparatus as well as assembly and disassembly procedures for this
08/28/2014DE102013203338A1 Modellbasierte Steuerung einer optischen Abbildungseinrichtung Model-based control of optical imaging device
08/28/2014DE102013203294A1 Optische Baugruppe zur Polarisationsdrehung An optical subassembly for polarization rotation
08/28/2014DE102013203035A1 Optisches modul Optical module
08/28/2014DE102013003329A1 Silane, Hybridpolymere und Photolack mit Positiv-Resist Verhalten sowie Verfahren zur Herstellung Silanes, hybrid polymers and photoresist with a positive type resist behavior and methods for preparing
08/28/2014DE102011006468B4 Vermessung eines abbildenden optischen Systems durch Überlagerung von Mustern Measuring an imaging optical system by superimposing patterns
08/28/2014DE102004008378B4 Optisches Nähenkorrekturverfahren Optical proximity correction method
08/27/2014EP2770373A1 Conformal anti-reflective coating
08/26/2014US8817839 Two-stage laser system for aligners
08/26/2014US8817237 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
08/26/2014US8817236 Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
08/26/2014US8817234 Optical device and exposure apparatus including the same
08/26/2014US8817233 Illumination optical system for projection lithography
08/26/2014US8817232 Optical apparatus, and method of orienting a reflective element
08/26/2014US8817230 Immersion photolithography system and method using microchannel nozzles
08/26/2014US8817229 Method of cooling an optical element, lithographic apparatus and method for manufacturing a device
08/26/2014US8816249 Apparatuses for fabricating patterns using laser diode
08/26/2014US8816211 Articles with photocurable and photocured compositions
08/26/2014US8815748 Method of forming semiconductor device with multiple level patterning
08/26/2014US8815498 Method of forming tight-pitched pattern
08/26/2014US8815497 Semiconductor constructions and methods of forming patterns
08/26/2014US8815496 Method for patterning a photosensitive layer
08/26/2014US8815495 Pattern forming method and manufacturing method of semiconductor device
08/26/2014US8815494 Resist underlayer film forming composition containing silicon having anion group
08/26/2014US8815493 Resist pattern-forming method, and radiation-sensitive resin composition
08/26/2014US8815492 Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process
08/26/2014US8815491 Chemically amplified negative resist composition and patterning process
08/26/2014US8815490 Radiation-sensitive resin composition, polymer, and method for forming resist pattern
08/26/2014US8815489 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film
08/26/2014US8815477 Color filter manufacturing method, patterned substrate manufacturing method, and small photomask
08/26/2014US8815473 Generalization of shot definitions for mask and wafer writing tools
08/26/2014US8815472 Volume hologram optical recording medium, composition for volume hologram recording layer formation, and volume hologram recording material
08/26/2014US8815333 Manufacturing method of metal structure in multi-layer substrate
08/26/2014US8815143 Method for producing a three-dimensional object by means of mask exposure
08/26/2014US8815130 Method for producing a lens
08/26/2014US8815105 Method using block copolymers for making a master mold for nanoimprinting patterned magnetic recording disks with chevron servo patterns
08/26/2014US8813678 Substrate processing apparatus
08/21/2014WO2014126837A2 Continuous liquid interphase printing
08/21/2014WO2014126834A2 Method and apparatus for three-dimensional fabrication with feed through carrier
08/21/2014WO2014126830A2 Method and apparatus for three-dimensional fabrication
08/21/2014WO2014125470A1 Two-step, direct- write laser metallization
08/21/2014WO2014125000A1 Method for ascertaining distortion properties of an optical system in a measurement system for microlithography
08/21/2014WO2014124795A1 Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
08/21/2014WO2014102187A3 Lithography method and lithography device for components and circuits having microscale and nanoscale structural dimensions
08/21/2014US20140235796 Composition for forming resist underlayer film and patterning process
08/21/2014US20140235747 Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof
08/21/2014US20140234785 Pattern forming process
08/21/2014US20140234784 Developing solution and development processing method of photosensitive resin composition
08/21/2014US20140234783 Rinse solution for lithography and pattern formation method employing the same
08/21/2014US20140234782 Method for manufacturing a semiconductor device
08/21/2014US20140234781 Pattern forming process
08/21/2014US20140234780 Lithography with reduced feature pitch using rotating mask techniques
1 ... 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 ... 1272