| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/25/2009 | WO2009078346A1 Heat-sensitive lithographic printing plates |
| 06/25/2009 | WO2009078336A1 Photosensitive resin composition |
| 06/25/2009 | WO2009078335A1 Novel sulfonate and radiation-sensitive resin composition |
| 06/25/2009 | WO2009078322A1 Composition for formation of top antireflective film, and pattern formation method using the composition |
| 06/25/2009 | WO2009078224A1 Illumination optical system, exposure apparatus, and device manufacturing method |
| 06/25/2009 | WO2009078223A1 Spatial light modulating unit, illumination optical system, aligner, and device manufacturing method |
| 06/25/2009 | WO2009078207A1 Method for pattern formation |
| 06/25/2009 | WO2009078154A1 Moving body system, pattern forming device, exposure apparatus, measuring instrument, and device manufacturing method |
| 06/25/2009 | WO2009050675A3 Displacement device with precision position measurement |
| 06/25/2009 | WO2009043790A3 Projection objective for microlithography |
| 06/25/2009 | WO2008072641A9 Exposure apparatus |
| 06/25/2009 | US20090163396 Nanoelectronic and microelectronic cleaning compositions |
| 06/25/2009 | US20090162800 Process for Imaging a Photoresist Coated over an Antireflective Coating |
| 06/25/2009 | US20090162799 Method and system for fabricating three-dimensional structures with sub-micron and micron features |
| 06/25/2009 | US20090162798 Method of manufacturing master plate, method of manufacturing microneedle patch and apparatus exposure apparatus |
| 06/25/2009 | US20090162797 Method of manufacturing liquid ejection head |
| 06/25/2009 | US20090162796 Methods of forming a pattern of a semiconductor device |
| 06/25/2009 | US20090162795 Method for manufacturing a semiconductor device |
| 06/25/2009 | US20090162793 Method of Manufacturing Metal Interconnection of Semiconductor Device |
| 06/25/2009 | US20090162791 Protective caps residing at an interface between metal lines and dielectric diffusion barrier (or etch stop) layers; formed by depositing a first layer of aluminum-containing material over an exposed copper line by treating an oxide-free copper surface with an organoaluminum compound; integrated circuit |
| 06/25/2009 | US20090162790 Photoresist double patterning |
| 06/25/2009 | US20090162788 Novel compound and method of producing the same, acid generator, resist composition and method of forming resist pattern |
| 06/25/2009 | US20090162787 Novel compound, acid generator, resist composition and method of forming resist pattern |
| 06/25/2009 | US20090162786 a copolymer of (meth)acrylic ester derivative, acrylic acid or methacrylic acid, styrene, hydroxystyrene/p-/; a sulfonium or iodonium acid generator; exposing the resist film and developing; displays increased alkali solubility under the action of an acid; resist patten having excellent negative margin |
| 06/25/2009 | US20090162785 Polymer compound, negative resist composition, and method of forming resist pattern |
| 06/25/2009 | US20090162784 A positive resist of an acrylic ester copolymer based on a monomer having a ketone-substituted fused saturated carbo ring ester and a monomer having an (alpha-lower alkyl)acrylate ester having an acid dissociable dissolution inhibiting group; high affinity for alkali developing solution; resolution |
| 06/25/2009 | US20090162783 Radiation-sensitive elements with developability-enhancing compounds |
| 06/25/2009 | US20090162782 Silicon-Containing Resist Underlayer Coating Forming Composition for Forming Photo-Crosslinking Cured Resist Underlayer Coating |
| 06/25/2009 | US20090162781 Resist composition, resist pattern forming method and compound |
| 06/25/2009 | US20090162758 Photomask having code pattern formed by coding data conversion process information, photomask formation method, and semiconductor device fabrication method |
| 06/25/2009 | US20090162756 Multi-Layer Body With Volume Hologram |
| 06/25/2009 | US20090161189 Method of manufacturing a structure based on anisotropic etching, and silicon substrate with etching mask |
| 06/25/2009 | US20090161123 Method and system for measuring patterned structures |
| 06/25/2009 | US20090161084 Cleanup method for optics in immersion lithography |
| 06/25/2009 | US20090159567 Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure |
| 06/25/2009 | US20090159321 Electronic devices with ultraviolet blocking layers and processes of forming the same |
| 06/25/2009 | US20090158947 Stamp Comprising a Nanostamping Structure, Device and Method for the Production Thereof |
| 06/25/2009 | DE102008044365A1 Projection exposure system for manufacturing semiconductor component i.e. computer chip, has changing unit for changing optical assembly that is exchangeably formed, and bearing unit reducing deformations of optical element caused by holder |
| 06/25/2009 | DE102007062564A1 Device for illuminating surface, particularly for illuminating mask for lithographic application, comprises light source for production of light, which is applied for illumination |
| 06/24/2009 | EP2073063A1 Lithographic method and apparatus |
| 06/24/2009 | EP2073062A1 Immersion lithographic apparatus and device manufacturing method |
| 06/24/2009 | EP2073061A2 Device for illuminating a surface and device for striking a work area with light |
| 06/24/2009 | EP2073060A1 Novel compound and method of producing the same, acid generator, resist composition and method of forming resist pattern |
| 06/24/2009 | EP2073059A1 Imprint method, imprint apparatus, and process for producing chip |
| 06/24/2009 | EP2072500A1 Oxime ester compound and photopolymerization initiator containing the compound |
| 06/24/2009 | EP2005252B1 Device for collecting flux of electromagnetic radiation in the extreme ultraviolet |
| 06/24/2009 | EP1787164B1 Method and device for structuring a substrate |
| 06/24/2009 | EP1754122A4 Method and system to control movement of a body for nano-scale manufacturing |
| 06/24/2009 | EP1660941B1 Method of forming multilayer reflective extreme ultraviolet lithography mask blanks |
| 06/24/2009 | EP1530492B1 Method for immobilizing hydrogel-bonding polymers on polymer substrate surfaces |
| 06/24/2009 | EP1360077A4 Compositions for cleaning organic and plasma etched residues for semiconductor devices |
| 06/24/2009 | EP1010040B1 Laser-illuminated stepper or scanner with energy sensor feedback |
| 06/24/2009 | CN201262685Y Device for demounting light shield protection film frame body |
| 06/24/2009 | CN201262684Y Convenient maintenance structure for gumming and developing unit |
| 06/24/2009 | CN201262683Y Printmaking machine for liquid edition |
| 06/24/2009 | CN101467104A Method for processing of photopolymer printing plates with overcoat |
| 06/24/2009 | CN101467103A Image recording device |
| 06/24/2009 | CN101467102A Use of supercritical fluid to dry wafer and clean lens in immersion lithography |
| 06/24/2009 | CN101467101A Lithographic plate material |
| 06/24/2009 | CN101467100A Positive photosensitive resin composition containing polymer having ring structure |
| 06/24/2009 | CN101464637A Measurement apparatus and method for wave aberration of photo-etching machine projection objective |
| 06/24/2009 | CN101464636A Immersion lithographic apparatus and device manufacturing method |
| 06/24/2009 | CN101464635A Lithographic method and apparatus |
| 06/24/2009 | CN101464634A Lithographic apparatus, workbench system and its control method |
| 06/24/2009 | CN101464633A Exposure system and exposure method for multi-light shield platform |
| 06/24/2009 | CN101464632A Light solidifying/heat solidifying resin composition and dry film and printed circuit board using the same |
| 06/24/2009 | CN101464631A Photosensitive resin composition with good stripper-resistance for color filter and color filter formed using the same |
| 06/24/2009 | CN101464630A Paste composition and roasted article pattern |
| 06/24/2009 | CN101464629A Paste composition and roasted article pattern |
| 06/24/2009 | CN101464628A Novel compound and method of producing the same, acid generator, resist composition and method of forming resist pattern |
| 06/24/2009 | CN100505974C Radiation source, photoetching equipment and device manufacturing method |
| 06/24/2009 | CN100505162C Method for manufacturing wire of semiconductor component |
| 06/24/2009 | CN100505156C Substrate processing apparatus and substrate processing method |
| 06/24/2009 | CN100505145C Tunable radiation source providing a vaccum ultroviolet wavelength planar illumination pattern for semiconductor wafers |
| 06/24/2009 | CN100504621C Thinner composition and method of removing photoresist using the same |
| 06/24/2009 | CN100504620C Etching solution for forming bimetallic mosaic structure and base plate treatment method |
| 06/24/2009 | CN100504619C Exposing device and method |
| 06/24/2009 | CN100504618C All-refraction immersion type projection and optical system, device and its uses |
| 06/24/2009 | CN100504617C Double platform system for rotary exchange |
| 06/24/2009 | CN100504616C Mask loading technology |
| 06/24/2009 | CN100504615C Method for measuring double-laser interferometer intersection angle non-orthogonality |
| 06/24/2009 | CN100504614C Stepping scan photo-etching machine double-platform exchanging and positioning system |
| 06/24/2009 | CN100504613C Method for manufacturing semiconductor devices using a photo acid generator |
| 06/24/2009 | CN100504612C Precision positioning and regulating tool |
| 06/24/2009 | CN100504611C Lithographic apparatus and device manufacturing method |
| 06/24/2009 | CN100504610C Lithographic apparatus and device manufacturing method |
| 06/24/2009 | CN100504609C Adaptive thermal control of lithographic chemical processes |
| 06/24/2009 | CN100504608C Optimized calibration method of thermal deformation of a wafer in a lithographic process |
| 06/24/2009 | CN100504607C Lithographic apparatus and device manufacturing method |
| 06/24/2009 | CN100504606C Lithographic apparatus and device manufacturing method |
| 06/24/2009 | CN100504605C Laser produced plasma radiation system with foil capturing |
| 06/24/2009 | CN100504604C Mask and device manufacturing methods |
| 06/24/2009 | CN100504603C Detecting assembly and photoetching projector, detection, calibration, determination and retaining method |
| 06/24/2009 | CN100504602C Method for monitoring regeneration of photoresist, technique and system for regenerating photoesist |
| 06/24/2009 | CN100504601C Manufacturing method of thick film member pattern and manufacture method of image forming device |
| 06/24/2009 | CN100504600C Lithographic printing plate precursor and lithographic printing method using the same |
| 06/24/2009 | CN100504599C Manufacture method of display element |
| 06/24/2009 | CN100504598C High-resolution overlay alignment methods and systems for imprint lithography |
| 06/24/2009 | CN100504594C Method for producing semiconductor device using illuminating system including diffraction optical element |
| 06/24/2009 | CN100504468C Method of producing polymer optical waveguide |