| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/02/2009 | US20090170039 can increase uniformity of a critical dimension (CD) on a shot-to-shot level; capable of improving the overlay alignment of successive material layers in each exposure region |
| 07/02/2009 | US20090170038 Method for producing fine structure |
| 07/02/2009 | US20090170037 Composition for removing photoresist and method of manufacturing an array substrate using the same |
| 07/02/2009 | US20090170036 Method for manufacturing transparent electrode pattern and method for manufacturing electro-optic device having the transparent electrode pattern |
| 07/02/2009 | US20090170034 Method for manufacturing semiconductor device |
| 07/02/2009 | US20090170033 Method of forming pattern of semiconductor device |
| 07/02/2009 | US20090170032 Method of manufacturing electronic device |
| 07/02/2009 | US20090170031 Method of forming a pattern of a semiconductor device |
| 07/02/2009 | US20090170030 Method of making a pillar pattern using triple or quadruple exposure |
| 07/02/2009 | US20090170029 (Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods |
| 07/02/2009 | US20090170028 Heat-sensitive positive-working lithographic printing plate precursor |
| 07/02/2009 | US20090170027 Optical recording medium |
| 07/02/2009 | US20090170026 Positive photosensitive resin composition, cured layer, protecting layer, insulating layer and semiconductor device and display therewith |
| 07/02/2009 | US20090170025 Lithographic method and carrier substrate |
| 07/02/2009 | US20090170024 Method of Patterning a Substrate, Photosensitive Layer Stack and System for Lithography |
| 07/02/2009 | US20090170017 Beam recording apparatus and beam adjustment method |
| 07/02/2009 | US20090170016 Compensating for periodical defects in a multi-beam pattern generator without increasing critical dimension-error;scaling a pattern pitch in a first direction to be an integer multiple of pitch; adjusting the pitch in first direction to maintain a scale; adjusting predetermined separation to pitch |
| 07/02/2009 | US20090170015 Dye-containing negative curable composition, color filter, method of producing the same, and solid-state image sensor |
| 07/02/2009 | US20090170014 Mask, exposure apparatus and device manufacturing method |
| 07/02/2009 | US20090170009 Holographic recording composition and holographic recording medium |
| 07/02/2009 | US20090170008 Holographic recording composition and holographic recording medium |
| 07/02/2009 | US20090169832 Simplified double mask patterning system |
| 07/02/2009 | US20090168207 Replacement Apparatus for an Optical Element |
| 07/02/2009 | US20090168044 Lithography apparatus and lithography method |
| 07/02/2009 | US20090168035 Exposure method and exposure apparatus for photosensitive film |
| 07/02/2009 | US20090168033 Manufacturing method of pattern formed body and pattern formed body manufacturing apparatus |
| 07/02/2009 | US20090166319 System and Method for Performing High Flow Rate Dispensation of a Chemical onto a Photolithographic Component |
| 07/02/2009 | DE102008060245A1 Halbleiteranordnung, Verfahren zum Herstellen der Halbleiteranordnung und computerlesbares Medium A semiconductor device, method for manufacturing the semiconductor device and computer readable medium |
| 07/02/2009 | DE102008021833A1 Illumination angle distribution and intensity distribution adjusting method for lithography projection illumination system, involves varying expansion coefficient and air-gap distance, so that difference of phase deviations is minimized |
| 07/02/2009 | DE102007063305A1 Optische Einrichtung mit einer Federeinrichtung mit einem Bereich konstanter Federkraft An optical device with a spring means with a region of constant spring force |
| 07/01/2009 | EP2075633A1 Method of releasing a plate made of brittle material, assembly of a support and peeling arrangement, and peeling arrangement |
| 07/01/2009 | EP2075632A1 Dye-containing negative curable composition, color filter, method of producing the same, and solid-state image sensor |
| 07/01/2009 | EP2075247A1 Fluorinated monomer having cyclic structure, manufaturing method, polymer, photoresist composition and patterning process |
| 07/01/2009 | EP2074634A1 Method for regenerating a surface of an optical element in an xuv radiation source and xuv radiation source |
| 07/01/2009 | EP2074617A1 Optical storage medium comprising tracks with positive and negative marks, and stampers and production methods for manufacturing of the optical storage medium |
| 07/01/2009 | EP2074469A1 Beam splitter apparatus and system |
| 07/01/2009 | EP1131675B1 A mixed solvent system for positive photoresists |
| 07/01/2009 | CN201266302Y Device for preventing photoresist leakage and photoresist output device |
| 07/01/2009 | CN101473272A Resist stripping agent |
| 07/01/2009 | CN101473271A Method of forming microfined resist pattern |
| 07/01/2009 | CN101473270A Composition containing hydroxylated condensation resin for forming film under resist |
| 07/01/2009 | CN101473269A Photopolymerisable layered composite for producing flexo printing elements |
| 07/01/2009 | CN101473268A Oxime sulfonates and the use therof as latent acids |
| 07/01/2009 | CN101470362A Exposure apparatus and device manufacturing method |
| 07/01/2009 | CN101470361A Exposure apparatus and device manufacturing method |
| 07/01/2009 | CN101470360A Immersion lithographic apparatus and device manufacturing method |
| 07/01/2009 | CN101470359A Projection exposure apparatus and division exposure method |
| 07/01/2009 | CN101470358A Method of placing a substrate, method of transferring a substrate, support system and lithographic projection apparatus |
| 07/01/2009 | CN101470357A Exposure apparatus |
| 07/01/2009 | CN101470356A Decribing apparatus and method |
| 07/01/2009 | CN101470355A Method for producing nano-dimension metal structure overlapped by metal membrane in large area |
| 07/01/2009 | CN101470354A Method for improving non-mask photo-etching definition |
| 07/01/2009 | CN101470353A Chemical liquid supply unit, and substrate treating apparatus and method using the same |
| 07/01/2009 | CN101470352A Polymer composition, hardmask composition having antireflective properties, and associated methods |
| 07/01/2009 | CN101470351A Antistatic flexible solid photopolymer plate and method for producing the same |
| 07/01/2009 | CN101470350A Photo sensitive resin compositon, optical spacer, protective film, coloring pattern, display device and substrate thereof |
| 07/01/2009 | CN101470349A Resist composition, method of forming resist pattern, novel compound, and acid generator |
| 07/01/2009 | CN101470348A Yellow photosensitive composition for color filter, color filter, and liquid crystal display device |
| 07/01/2009 | CN101470347A Production method of two-dimension photon crystal with annular hole array structure |
| 07/01/2009 | CN101470346A Non-mask photo-etching system based on nano lens |
| 07/01/2009 | CN101470345A Method for adopting screen to print CD grain |
| 07/01/2009 | CN101470343A Mask blank manufacturing method and coater |
| 07/01/2009 | CN100508308C Injection seeded F2 laser with wavelength control |
| 07/01/2009 | CN100508074C Lithographic systems and methods with extended depth of focus |
| 07/01/2009 | CN100507725C Method for photoetching glue soluting cleaning filter bubble |
| 07/01/2009 | CN100507724C 6 freedom degree micromotion operating platform |
| 07/01/2009 | CN100507723C Infiltration type lithography method |
| 07/01/2009 | CN100507722C Method of fabricating ips mode LCD and method of forming alignment layer in ips mode LCD |
| 07/01/2009 | CN100507721C Lithographic apparatus and device manufacturing method |
| 07/01/2009 | CN100507720C Patterning apparatus and method for fabricating continuous patterns using the same |
| 07/01/2009 | CN100507719C Exposure apparatus and device manufacturing method |
| 07/01/2009 | CN100507718C Projection system and method of use thereof |
| 07/01/2009 | CN100507717C Object-exposing equipment and method |
| 07/01/2009 | CN100507716C Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device |
| 07/01/2009 | CN100507713C Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask |
| 07/01/2009 | CN100507656C Method for producing liquid crystal display |
| 07/01/2009 | CN100507622C Photocurable resin composition for forming optical waveguide, photocurable dry film for forming optical waveguide, and optical waveguide |
| 07/01/2009 | CN100506877C Curable resin composition, overcoats, and process for formation thereof |
| 07/01/2009 | CN100506555C Printing plate, method of fabricating the same, and method of fabricating flat panel display using the same |
| 06/30/2009 | US7554788 Capacitor for a semiconductor device |
| 06/30/2009 | US7554164 Semiconductor device having a gap between a gate electrode and a dummy gate electrode |
| 06/30/2009 | US7554105 Lithographic apparatus and device manufacturing method |
| 06/30/2009 | US7553905 Anti-reflective coatings |
| 06/30/2009 | US7553610 Method of forming fine patterns |
| 06/30/2009 | US7553608 Photomask uniform control of optical near field intensity distribution |
| 06/30/2009 | US7553607 Interlayer for lithographic printing plates |
| 06/30/2009 | US7553605 Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate |
| 06/30/2009 | US7553603 Inkless printing paper and method |
| 06/30/2009 | US7553602 Transfer substrate, transfer method, and organic electroluminescent device manufacturing method |
| 06/30/2009 | US7553457 Chemical processing apparatus for manufacturing circuit substrates |
| 06/30/2009 | US7552601 Optical component of quartz glass, method for producing the optical component, and use thereof |
| 06/25/2009 | WO2009079241A2 Density multiplication and improved lithography by directed block copolymer assembly |
| 06/25/2009 | WO2009078708A1 Diffraction based overlay metrology tool and method |
| 06/25/2009 | WO2009078489A1 Exposure apparatus, exposure method and device manufacturing method |
| 06/25/2009 | WO2009078473A1 Exposure apparatus, exposure method, and device manufacturing method |
| 06/25/2009 | WO2009078443A1 Exposure apparatus, exposure method and device manufacturing method |
| 06/25/2009 | WO2009078434A1 Exposure apparatus, exposure method and device manufacturing method |
| 06/25/2009 | WO2009078407A1 Color composition, method for producing color filter, and color filter |
| 06/25/2009 | WO2009078380A1 Method for producing cured resist using negative photosensitive resin laminate, negative photosensitive resin laminate, and use of negative photosensitive resin laminate |
| 06/25/2009 | WO2009078365A1 Method for producing polyhydroxyimide and positive photosensitive resin composition containing polyhydroxyimide obtained by the production method |