| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/09/2009 | DE112007002124T5 Steuerverfahren für ein Beschichtungs- und Entwicklungssystem zum Steuern eines Beschichtungs- und Entwicklungssystems A control method for a coating and developing system for controlling a coating and developing system |
| 07/09/2009 | DE102008054582A1 Mikrolithographische Projektionsbelichtungsanlage Microlithographic projection exposure apparatus |
| 07/09/2009 | DE102008003289A1 Illumination device for microlithographic projection exposure system for manufacturing e.g. LCD, has manipulator in connection with light mixing bar producing locally varying contribution for polarization distribution in reticle plane |
| 07/09/2009 | DE102008003288A1 Light source's property monitoring device for use in projection illumination system, has evaluation unit receiving output signal of sensor element that is arranged in such manner that exclusive diffused light is detected |
| 07/09/2009 | DE102007063649A1 Verfahren zum Erzeugen von Strukturen in einem Resistmaterial und Elektronenstrahlbelichtungsanlagen A method for producing patterns in a resist material, and electron beam exposure systems |
| 07/08/2009 | EP2077565A1 Photocurable composition comprising a polyorganosiloxane |
| 07/08/2009 | EP2077471A1 Volume hologram optical recording medium, composition for volume hologram recording layer formation, and volume hologram recording material |
| 07/08/2009 | EP2077291A1 Bis(aminophenol) derivative, process for producing the same, polyamide resin, positive photosensitive resin compositions, protective film, interlayer dielectric, semiconductor device, and display element |
| 07/08/2009 | EP2076818A2 Apparatus comprising a rotating contaminant trap |
| 07/08/2009 | EP2076817A1 High resolution imaging process using an in-situ image modifying layer |
| 07/08/2009 | EP2076801A1 Coated mirrors and their fabication |
| 07/08/2009 | EP1629316A4 Micro-lens array with precisely aligned aperture mask and methods of producing same |
| 07/08/2009 | EP1395878B1 Photoresists processable under biocompatible conditions for multi-biomolecule patterning |
| 07/08/2009 | EP1390690A4 Cyclic error reduction in average interferometric position measurements |
| 07/08/2009 | EP1131678B1 Antireflective composition for a deep ultraviolet photoresist |
| 07/08/2009 | EP1105778B1 Silicate-containing alkaline compositions for cleaning microelectronic substrates |
| 07/08/2009 | CN201269969Y Platform module group for light exposure machine |
| 07/08/2009 | CN101479667A Method for revising/repairing a lithographic projection objective |
| 07/08/2009 | CN101479666A Method and unit for micro-structuring a moving substrate |
| 07/08/2009 | CN101479665A Optical imaging device with thermal attenuation |
| 07/08/2009 | CN101479664A Photosensitive materials and uses thereof |
| 07/08/2009 | CN101479663A Negative-working radiation-sensitive compositions and imageable element |
| 07/08/2009 | CN101479662A Printing form precursor and process for preparing a stamp from the precursor |
| 07/08/2009 | CN101479661A A method for manufacturing a device using imprint lithography and direct write technology |
| 07/08/2009 | CN101477317A Illumination optical system used for micro-photoetching |
| 07/08/2009 | CN101477316A Gravity compensator |
| 07/08/2009 | CN101477315A Measuring method and apparatus for mask bench scanning inclination |
| 07/08/2009 | CN101477314A Immersion liquid feed apparatus of immersion photo-etching machine |
| 07/08/2009 | CN101477313A Device and method for microstructuring a storage medium and storage medium comprising a microstructured region |
| 07/08/2009 | CN101477312A Exposure apparatus and device producing method |
| 07/08/2009 | CN101477311A Exposure method and exposure apparatus for photosensitive film |
| 07/08/2009 | CN101477310A Immersion flow field stabilizing device used for photo-etching machine |
| 07/08/2009 | CN101477309A Positive light-sensitive polyamic ester resin composition and its preparation and use |
| 07/08/2009 | CN101477308A Negative photoresist composition and method of manufacturing array substrate using the same |
| 07/08/2009 | CN101477307A Photomask blank, resist pattern forming process, and photomask preparation process |
| 07/08/2009 | CN101477306A High-speed multi-beam parallel laser direct-writing device |
| 07/08/2009 | CN101477305A Mold core production method used for imprinting process |
| 07/08/2009 | CN101477304A Stamping method for copying high-resolution nano-structure on complicated shape surface |
| 07/08/2009 | CN100511880C Ultraviolet light source, laser treatment apparatus comprising ultraviolet light source, and exposure apparatus comprising ultraviolet light source |
| 07/08/2009 | CN100511585C Method for forming fine pattern |
| 07/08/2009 | CN100510971C Coating forming agent for increasing fineness of pattern and fine pattern forming method using the same |
| 07/08/2009 | CN100510970C X ray exposure machine |
| 07/08/2009 | CN100510969C System and method for controlling composition for lithography process in real-time using near-infrared spectrometer |
| 07/08/2009 | CN100510968C Lithographic apparatus and device manufacturing method |
| 07/08/2009 | CN100510967C Phase shift mask alignment method and device |
| 07/08/2009 | CN100510966C Lithographic projector and substrate holder |
| 07/08/2009 | CN100510965C Panel printing device and device manufacturing method |
| 07/08/2009 | CN100510964C An imaging interference photo etching method adopting grating combination and photo etching system therefor |
| 07/08/2009 | CN100510963C Imaging interference photo etching method and system by rotating a mask and a resist silicon slice |
| 07/08/2009 | CN100510962C Photoetching device with aligning subsystem, manufacturng method for device with alignment and aligning structure |
| 07/08/2009 | CN100510961C Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide |
| 07/08/2009 | CN100510960C Positive resist composition and compound used therein |
| 07/08/2009 | CN100510959C Photosensitive composition and lithograph plate made of same |
| 07/08/2009 | CN100510958C Pattern forming method |
| 07/08/2009 | CN100509877C Unsaturated monomers, polymers, chemically amplified resist composition, and process of pattern formation |
| 07/08/2009 | CN100509413C Image setting apparatus having drum simulating supports |
| 07/08/2009 | CN100509165C Microfluidic chip |
| 07/07/2009 | US7557902 Projection objective |
| 07/07/2009 | US7557901 Lithographic apparatus and device manufacturing method |
| 07/07/2009 | US7557900 Exposure apparatus, device manufacturing method, maintenance method, and exposure method |
| 07/07/2009 | US7557073 Supercritical carbon dioxide, a cosolvent and a reducing agent; cleaning semiconductor substrates |
| 07/07/2009 | US7556988 Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof |
| 07/07/2009 | US7556917 Microelectromechanical system (MEMS); reduction in the number of masking steps in the overall manufacturing process to reduce manufacturing costs |
| 07/07/2009 | US7556915 By surrounding it with somewhat narrower, dummy hole features; The isolated hole may then be used for etching or electroplating the underlying substrate; manufacture of magnetic write heads |
| 07/07/2009 | US7556914 Form a resist pattern in a good shape without producing residues; resist film is formed on a substrate and a barrier film including a plasticizer, which aids in removal of barrier film after exposure; immersion lithography |
| 07/07/2009 | US7556913 Forming film from organometallic compound by combustion; forming resin on surface of substrate; absorption ; washing |
| 07/07/2009 | US7556911 Titanocene based compound, photosensitive composition, photosensitive transfer sheet and pattern forming method |
| 07/07/2009 | US7556910 Good sensitivity, retention rate, strength, heat resistance, chemical resistance and developing durability as the photopolymerization initiator with triazine groups absorbs UV radiation; curing of materials for color filters, resin black matrixes, LCDs, high temperature process characteristics |
| 07/07/2009 | US7556909 Onium salts, oxime sulfonates and sulfonyloxyimides derived from these sulfonium salts are effective photoacid generators in chemically amplified resist compositions; sensitive to high-energy radiation |
| 07/07/2009 | US7556908 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same |
| 07/07/2009 | US7556900 Measuring the effect of flare on line width |
| 07/07/2009 | US7556899 System for controlling an overlay, method for controlling overlay, and method for manufacturing a semiconductor device |
| 07/07/2009 | US7556896 Inspection method and photomask |
| 07/07/2009 | US7556894 silicon nitride antireflective coatings on EUV light absorber layer; defect inspection of mask with DUV light; eliminate the interference effect may cause reflectance oscillation near the absorber edges, increase the defect inspection sensitivity |
| 07/07/2009 | US7556891 positioning phase-shifting region substantially surrounds the contact hole region and is transparent to light; flexible using an identical unit cell to randomly scattered and neatly layouts; photolithography in integrated circuits, on silicon wafer |
| 07/07/2009 | US7556843 Photosensitive resin composition |
| 07/07/2009 | CA2449632C Method of fabrication of electronic devices using microfluidic channels |
| 07/07/2009 | CA2442997C Solid mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene oligomers and their use |
| 07/02/2009 | WO2009082694A1 Electrochromic display substrate |
| 07/02/2009 | WO2009082226A1 Lithographic apparatus, method for levelling an object, and lithographic projection method |
| 07/02/2009 | WO2009082224A1 Grating for euv-radiation, method for manufacturing the grating and wavefront measurement system |
| 07/02/2009 | WO2009081950A1 Precursor for heat-resistant resin and photosensitive resin composition containing the same |
| 07/02/2009 | WO2009081925A1 Layered photosensitive-resin product |
| 07/02/2009 | WO2009081907A1 Glass frit for photosensitive conductive paste |
| 07/02/2009 | WO2009081852A1 Protective agent |
| 07/02/2009 | WO2009081773A1 Composition for formation of anti-reflective film, and pattern formation method using the composition |
| 07/02/2009 | WO2009081702A1 Scanning exposure apparatus and method for manufacturing semiconductor device |
| 07/02/2009 | WO2009081676A1 Exposure method, exposure apparatus, and method for producing device |
| 07/02/2009 | WO2009080645A1 A method for preparing lithographic printing plate precursors |
| 07/02/2009 | WO2009080310A1 Illumination system for a microlithographic projection exposure apparatus |
| 07/02/2009 | WO2009080279A1 Microlithographic projection exposure apparatus |
| 07/02/2009 | WO2009080231A1 Illumination system for illuminating a mask in a microlithographic exposure apparatus |
| 07/02/2009 | WO2009054541A3 Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| 07/02/2009 | WO2009029189A3 Device for laser pulse conditioning by stretching, delaying and modulating |
| 07/02/2009 | US20090170802 Method for producing polymers |
| 07/02/2009 | US20090170326 Method of forming micro pattern of semiconductor device |
| 07/02/2009 | US20090170227 Mask and container and manufacturing |
| 07/02/2009 | US20090170042 Exposure apparatus and device manufacturing method |
| 07/02/2009 | US20090170041 Immersion lithography |
| 07/02/2009 | US20090170040 treatment of laser imaged plate with a deactivating solution and overall irradiation can be used to cause certain chemical or physical change to plate without developing the plate; improves color contrast, resolution, durability, or imaging consistence |