| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/16/2009 | US20090180185 Minute Structure and its Manufacturing Method |
| 07/16/2009 | US20090180096 Environmental system including vacuum scavenge for an immersion lithography apparatus |
| 07/16/2009 | US20090180090 Exposure apparatus and device fabrication method |
| 07/16/2009 | US20090180089 Exposure apparatus and method for producing device |
| 07/16/2009 | US20090179203 Display substrate |
| 07/16/2009 | DE102008054737A1 Object lens for microlithographic projection exposition system, is designed for operation with wide-band wavelength spectrum specified by illumination system, where lens extends around center wavelength |
| 07/16/2009 | DE102008054429A1 Component e.g. optical element, storage system for microlithography projection exposure system, has decoupling element atmospherically separated from another element by partition, and sealing element provided between rod and partition |
| 07/15/2009 | EP2079100A1 Exposure apparatus, exposure method, method for manufacturing decive |
| 07/15/2009 | EP2078985A1 Method for developing lithographic printing plate |
| 07/15/2009 | EP2078984A1 Lithographic printing plate precursor, method of preparing lithographic printing plate and lithographic printing method |
| 07/15/2009 | EP2078983A1 Composition for formation of upper layer film, and method for formation of photoresist pattern |
| 07/15/2009 | EP2078612A2 Method of manufacturing inkjet printhead and inkjet printhead manufactured using the same |
| 07/15/2009 | EP2078028A1 Photoactive compounds |
| 07/15/2009 | CN201273986Y Plate washing machine for flexographic plate |
| 07/15/2009 | CN201273985Y Clip for mask plate transferring and checking |
| 07/15/2009 | CN101482705A Scanning exposure system and method of photo-etching machine |
| 07/15/2009 | CN101482704A Alignment light intensity signal collection and demodulation apparatus |
| 07/15/2009 | CN101482703A Exposing method using variable shaped beam, and pattern forming method using the same |
| 07/15/2009 | CN101482702A Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| 07/15/2009 | CN101482701A Lithographic apparatus and device manufacturing method |
| 07/15/2009 | CN101482700A Colored photosensitive polymer combination |
| 07/15/2009 | CN101482699A Coloring light-sensitive resin composition |
| 07/15/2009 | CN101482698A Resist composition |
| 07/15/2009 | CN101482695A Optical mask for exposure |
| 07/15/2009 | CN100514553C Substrate processing apparatus |
| 07/15/2009 | CN100514193C Exposure apparatus, method for manufacturing exposure apparatus, and method for manufacturing microdevice |
| 07/15/2009 | CN100514192C System and method for photolithography in semiconductor manufacturing |
| 07/15/2009 | CN100514191C Substrate processing system for performing exposure process in gas atmosphere |
| 07/15/2009 | CN100514190C System and method for analyzing defect availability of task based automative etching mask |
| 07/15/2009 | CN100514189C Top anti-reflective coating composition and method for pattern formation of semiconductor device using the same |
| 07/15/2009 | CN100514188C Composition for antireflection film formation |
| 07/15/2009 | CN100514187C Photosensitive lithographic plate printing plate |
| 07/15/2009 | CN100514186C Photosensitive composite |
| 07/15/2009 | CN100514185C Method for making polymer self-supporting nano-micron-line |
| 07/15/2009 | CN100514184C Photomask |
| 07/15/2009 | CN100514162C Large-size substrate |
| 07/15/2009 | CN100514095C Polarizer, projection lens system, exposure device and exposure method |
| 07/15/2009 | CN100513545C Microelectronic cleaning compositions containing ammonia-free fluoride salts |
| 07/15/2009 | CN100513145C Method for manufacturing of polymer micro needle array with LIGA process |
| 07/14/2009 | US7562319 Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects |
| 07/14/2009 | US7562135 Enhanced fieldbus device alerts in a process control system |
| 07/14/2009 | US7561253 Method for a multiple exposure, microlithography projection exposure installation and a projection system |
| 07/14/2009 | US7561251 Lithographic apparatus and device manufacturing method |
| 07/14/2009 | US7561248 Immersion exposure technique |
| 07/14/2009 | US7561016 Iron core, iron core manufacturing method, alignment apparatus, and exposure apparatus |
| 07/14/2009 | US7560307 Resin composition, heat-resistant resin paste and semiconductor device using these and method of preparing the same |
| 07/14/2009 | US7560225 Depositing a photoresist material on a substrate surface;exposing the photoresist material through a mask that defines a first area on the substrate surface to be protected from ion milling;developing the photoresist material, baking, ion milling the second area on the substrate surface, removing |
| 07/14/2009 | US7560224 Forming photosensitive material layer for flow path member on substrate having liquid discharge energy generating element for discharging liquid from port, performing pattern exposure on photosensitive material to form latent image of flow path pattern, laminating second substrate with discharge port |
| 07/14/2009 | US7560222 Resist polymer used for etch mask addition-condensation copolymer film containing a silanetriol comonomoer and (meth)acrylate, substituted or unsubstituted styrenes, vinylanthracenes, vinylnaphthalenes, vinylnaphthols and/or vinylphenols; polysilsesquioxane graft polymers; modified with acid labile group |
| 07/14/2009 | US7560221 Lithographic printing plate precursors with mercapto-functionalized free-radical polymerizable monomers |
| 07/14/2009 | US7560220 Resist material and nanofabrication method |
| 07/14/2009 | US7560219 Arylsulfonium salts of 1-halothioxanthones and 2-decyl-1-tetradecyl bromide as an intermediate for their preparation; UV curable adhesives, sealants, coating compositions, such as printing inks and varnishes, and encapsulants |
| 07/14/2009 | US7560200 Overcoming conventional disadvantage, so that dimension correction for gate structures with different conductivity types can be incorporated into optical simulation in generating mask data for semiconductor integrated circuit device including dual gate structures different in conductivity types |
| 07/14/2009 | US7560196 Mask for exposing an alignment mark, and method and computer program for designing the mask |
| 07/14/2009 | US7559758 Mould for nano-printing, process for manufacturing such a mould and use of such a mould |
| 07/14/2009 | CA2328864C Method and apparatus for coating a solution onto a substrate |
| 07/09/2009 | WO2009086561A1 Nano-getter device |
| 07/09/2009 | WO2009085078A1 Three-dimensional hexagonal matrix memory array and method of manufacturing the same |
| 07/09/2009 | WO2009085077A1 Method of making a pillar pattern using triple or quadruple exposure |
| 07/09/2009 | WO2009085072A1 Composition comprising chelating agents containing amidoxime compounds |
| 07/09/2009 | WO2009084955A1 Method of releasing a plate made of brittle material, assembly of a support and peeling arrangement, and peeling arrangement |
| 07/09/2009 | WO2009084775A1 Resist for e-beam lithography |
| 07/09/2009 | WO2009084682A1 Heat-curable resin composition for laser engraved original printing plates |
| 07/09/2009 | WO2009084644A1 Exposure apparatus, exposure method, cleaning apparatus and device manufacturing method |
| 07/09/2009 | WO2009084516A1 Mask blank, production method of mask blank and production method of mask |
| 07/09/2009 | WO2009084515A1 Resist treatment method |
| 07/09/2009 | WO2009084466A1 Computer generated hologram and exposure apparatus |
| 07/09/2009 | WO2009084450A1 Manufacturing apparatus and manufacturing method for photosensitive resin plate sheet |
| 07/09/2009 | WO2009084430A1 Photosensitive resin composition |
| 07/09/2009 | WO2009084409A1 Computer generated hologram, generation method, and exposure apparatus |
| 07/09/2009 | WO2009084399A1 Process for making photosensitive lithographic form plates |
| 07/09/2009 | WO2009084333A1 Photosensitive insulating resin composition for forming resin electrode, method for forming resin convex body, and resin convex body |
| 07/09/2009 | WO2009084279A1 Method for processing substrate, program, computer storage medium, and substrate processing system |
| 07/09/2009 | WO2009084244A1 Exposure apparatus, moving body driving system, pattern forming apparatus, exposure method and device manufacturing method |
| 07/09/2009 | WO2009084203A1 Moving body driving method and apparatus, exposure method and apparatus, pattern forming method and apparatus, and device manufacturing method |
| 07/09/2009 | WO2009084199A1 Exposure device, exposure method, and device manufacturing method |
| 07/09/2009 | WO2009084196A1 Moving body driving system, pattern forming apparatus, exposure apparatus, exposure method and device manufacturing method |
| 07/09/2009 | WO2009083606A1 Method and apparatus for mapping of line-width size distributions on photomasks |
| 07/09/2009 | WO2009083476A1 Optical device comprising a spring device with a range of constant spring force |
| 07/09/2009 | WO2009083229A1 Scanning euv interference imaging for extremely high resolution |
| 07/09/2009 | WO2009083161A2 Folded optical encoder and applications for same |
| 07/09/2009 | WO2009065819A3 Polariser |
| 07/09/2009 | WO2009053023A3 Imaging optical system and projection exposure apparatus for microlithography comprising an imaging optical system of this type |
| 07/09/2009 | US20090176677 Treating liquid for photoresist removal, and method for treating substrate |
| 07/09/2009 | US20090176337 Negative photoresist composition and method of manufacturing array substrate using the same |
| 07/09/2009 | US20090176177 method of forming a pattern using a photoresist composition for immersion lithography |
| 07/09/2009 | US20090176176 Photosensitive Resin Composition for Flexographic Printing |
| 07/09/2009 | US20090176175 Photoacid generators for extreme ultraviolet lithography |
| 07/09/2009 | US20090176174 Multiple exposure photolithography methods and photoresist compostions |
| 07/09/2009 | US20090176173 Ionic, organic photoacid generators for duv, muv and optical lithography based on peraceptor-substituted aromatic anions |
| 07/09/2009 | US20090176172 Photosensitive polyimide composition and polyimide precursor composition |
| 07/09/2009 | US20090176168 Exposure data preparation method and exposure method |
| 07/09/2009 | US20090176165 Polymer composition, hardmask composition having antireflective properties, and associated methods |
| 07/09/2009 | US20090176062 Methods of Forming Features in Integrated Circuits |
| 07/09/2009 | US20090176060 Process for Producing 3-Dimensional Mold, Process for Producing Microfabrication Product, Process for Producing Micropattern Molding, 3-Dimensional Mold, Microfabrication Product, Micropattern Molding and Optical Device |
| 07/09/2009 | US20090175050 Process for making light guides with extraction structures and light guides produced thereby |
| 07/09/2009 | US20090174872 Cleanup method for optics in immersion lithography |
| 07/09/2009 | US20090174036 Plasma curing of patterning materials for aggressively scaled features |
| 07/09/2009 | US20090173948 Uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon |
| 07/09/2009 | US20090173895 Reflective optical element, optical system and euv lithography device |