| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/22/2009 | CN101487992A Silicon slice mark capturing system and method |
| 07/22/2009 | CN101487991A Silicon slice alignment system |
| 07/22/2009 | CN101487990A Work piece bench with edge exposure protection |
| 07/22/2009 | CN101487989A Six-freedom precise positioning platform |
| 07/22/2009 | CN101487988A Scanning exposure method for photo-etching machine |
| 07/22/2009 | CN101487987A Iris measuring apparatus and image processing process |
| 07/22/2009 | CN101487986A Sensor of photo-etching equipment, its production method and self-calibration method |
| 07/22/2009 | CN101487985A Alignment mark search system used for photo-etching equipment and its alignment mark search method |
| 07/22/2009 | CN101487984A Silicon chip placing apparatus used for photo-etching machine pre-alignment system |
| 07/22/2009 | CN101487983A Light beam transmission apparatus and method |
| 07/22/2009 | CN101487982A Continuous direct-write optical lithography |
| 07/22/2009 | CN101487981A Exposing device, exposing method, and assembly manufacturing method |
| 07/22/2009 | CN101487980A Lithographic apparatus and device manufacturing method |
| 07/22/2009 | CN101487979A Stage system, lithographic apparatus including such stage system, and correction method |
| 07/22/2009 | CN101487978A Exposure device and exposure method |
| 07/22/2009 | CN101487977A Light sensitization type polyimide |
| 07/22/2009 | CN101487976A Solution method preparation for metal photon crystal |
| 07/22/2009 | CN101487975A Production method for theta modulating holographic grating |
| 07/22/2009 | CN101487974A Nano-scale printing mould structure and its use on luminous element |
| 07/22/2009 | CN100517080C Conveying device |
| 07/22/2009 | CN100517079C Illumination optical apparatus and optical apparatus |
| 07/22/2009 | CN100517078C Method for forming pattern and method for fabricating LCD device using the same |
| 07/22/2009 | CN100517077C Exposal machine carrying platform cleaning method and system |
| 07/22/2009 | CN100517076C Exposal device and method |
| 07/22/2009 | CN100517075C Manufacturing method for array substrate of thin film transistor LCD |
| 07/22/2009 | CN100517074C Chuck system, lithographic apparatus using the same and device manufacturing method |
| 07/22/2009 | CN100517073C Independent controllable component array, lightscribing apparatus and device manufacturing method using the lightscribing apparatus |
| 07/22/2009 | CN100517072C Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/22/2009 | CN100517071C Lithographic apparatus and apparatus adjustment method |
| 07/22/2009 | CN100517070C Maskless lithography systems and methods utilizing spatial light modulator arrays |
| 07/22/2009 | CN100517069C Imaging interference photo etching method using two quadrature acousto-optic modulators and photo etching system |
| 07/22/2009 | CN100517068C Nanoimprint photoresist |
| 07/22/2009 | CN100517067C Organic anti-reflective coating composition and method for forming photoresist pattern using the same |
| 07/22/2009 | CN100517066C Light sensitive colouring composition and filter |
| 07/22/2009 | CN100517065C Wet-method etching liquid for making phase change storage and its wet-method etching process |
| 07/22/2009 | CN100517064C Method for manufacturing special purpose ultrahigh smoothness flexible mold for large-area micro-imprinting |
| 07/22/2009 | CN100517063C Method for preparing three-dimensional micro-configuration of unidimensional nanometer material |
| 07/22/2009 | CN100516939C Method for making light guiding board core |
| 07/21/2009 | US7565001 System and method of providing mask defect printability analysis |
| 07/21/2009 | US7564636 Device for preventing the displacement of an optical element |
| 07/21/2009 | US7564633 Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light |
| 07/21/2009 | US7564557 Apparatus and methods for detecting overlay errors using scatterometry |
| 07/21/2009 | US7564552 Systems and methods for measurement of a specimen with vacuum ultraviolet light |
| 07/21/2009 | US7564409 Antennas and electrical connections of electrical devices |
| 07/21/2009 | US7563754 Composition for removing photoresist residue and polymer residue |
| 07/21/2009 | US7563753 Cleaning solution for removing photoresist |
| 07/21/2009 | US7563709 Pattern formation method and method for forming semiconductor device |
| 07/21/2009 | US7563563 Wet developable bottom antireflective coating composition and method for use thereof |
| 07/21/2009 | US7563562 Lithographic apparatus and device manufacturing method |
| 07/21/2009 | US7563561 Pattern forming method and a semiconductor device manufacturing method |
| 07/21/2009 | US7563560 forming a photosensitive layer over substrates consisting of silicon, polysilicon, gallium arsenide, etc., treating with a polyelectrolyte polydiallyldimethylammonium chloride to change the surface energy of photosensitive material, causes adsorption of polyelectrolyte, exposing with lithography |
| 07/21/2009 | US7563559 SU-8; octafunctional epoxidized novolac, solvent, photopolymerization initiator; dialkyl phthalate, malonate, sebacate, and/or adipate plasticizer; and adhesion promoter of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and/or aminopropyltrimethoxysilanel; noncracking; larger wafer |
| 07/21/2009 | US7563558 Addition copolymer having first monomer having a polar functional group, a tertiary alcohol that provides an acid catalyzed polarity switch upon elimination of the polar functional group; and a second monomer having a fluoroalcohol moiety, to improve water solubility; lithography |
| 07/21/2009 | US7563557 Polyamide |
| 07/21/2009 | US7563556 Making an imaged lithographic element by imagewise exposing an imageable element using a source of infrared radiation to provide both exposed and non-exposed regions and developing imagewise exposed imageable element with a developer having a pH of 7-11 to remove exposed regions; minimal residue |
| 07/21/2009 | US7563482 Nucleotide/oligonucleotide hybridization; mineralization; electroless plating |
| 07/21/2009 | US7563389 utilizes the photo-tunable dopant in a cholesteric liquid crystal material comprising a triplet sensitizer and one or more photo-tunable chiral dopants (PTCD) that change chirality upon irradiation of the triplet sensitizer |
| 07/21/2009 | US7563382 Mask and method of fabricating the same, and method of machining material |
| 07/21/2009 | US7563323 Substrate treating apparatus |
| 07/21/2009 | US7563149 Sheet for manufacturing plasma display apparatus and method for manufacturing plasma display |
| 07/21/2009 | US7563146 Unbaked laminate for producing front plate of plasma display device, and method for producing front plate of plasma display device |
| 07/21/2009 | US7562663 High-pressure processing apparatus and high-pressure processing method |
| 07/16/2009 | WO2009089158A2 Functionalized fullerenes for nanolithography applications |
| 07/16/2009 | WO2009088357A1 Method for lift-off patterning films on a substrate |
| 07/16/2009 | WO2009088247A2 Optical sheets |
| 07/16/2009 | WO2009088177A2 Silicon-based hardmask composition (si-soh; si-based spin-on hardmask) and process of producing semiconductor integrated circuit device using the same |
| 07/16/2009 | WO2009088039A1 Composition having urea group for forming silicon-containing resist underlying film |
| 07/16/2009 | WO2009088004A1 Exposure method and exposure device |
| 07/16/2009 | WO2009088003A1 Exposure method, exposure device, and device manufacturing method |
| 07/16/2009 | WO2009087964A1 Positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device using the cured film |
| 07/16/2009 | WO2009087958A1 Production method for semiconductor device |
| 07/16/2009 | WO2009087889A1 Polymerizable fluorine-containing monomer, fluorine-containing polymer and method for forming resist pattern |
| 07/16/2009 | WO2009087862A1 Method for production of lithographic printing plate |
| 07/16/2009 | WO2009087805A1 Spatial light modulator, illumination optical system, aligner, and device manufacturing method |
| 07/16/2009 | WO2009087712A1 Method for pattern formation |
| 07/16/2009 | WO2009087029A1 Multiple exposure photolithography methods and photoresist compositions |
| 07/16/2009 | WO2009087027A2 Ionic, organic photoacid generators for duv, muv and optical lithography based on peraceptor-substituted aromatic anions |
| 07/16/2009 | WO2009066242A3 Method of increasing the operation lifetime of a collector optics arranged in an irradiation device and corresponding irradiation device |
| 07/16/2009 | WO2009061188A3 Method and system for determining a suppression factor of a suppression system and a lithographic apparatus |
| 07/16/2009 | WO2009049736A3 Diketopyrrolopyrrole pigment composition for use in color filters |
| 07/16/2009 | US20090182172 Fluoroarylsulfonium photoacid generators |
| 07/16/2009 | US20090181331 Method for forming film pattern |
| 07/16/2009 | US20090181330 Methods for forming a composite pattern including printed resolution assist features |
| 07/16/2009 | US20090181329 Method for manufacturing a liquid jet head, a liquid jet head, and a liquid jet apparatus |
| 07/16/2009 | US20090181328 Laser irradiation apparatus and method of fabricating organic light emitting display using the same |
| 07/16/2009 | US20090181327 Method of manufacturing semiconductor devices |
| 07/16/2009 | US20090181326 Positive-working imageable elements with chemical resistance |
| 07/16/2009 | US20090181325 Positive resist composition and method of forming resist pattern |
| 07/16/2009 | US20090181324 Photosensitive polyimides |
| 07/16/2009 | US20090181323 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
| 07/16/2009 | US20090181322 Photoresist Compositions and Methods of Use in High Index Immersion Lithography |
| 07/16/2009 | US20090181321 Photoresist Compositions and Methods of Use in High Index Immersion Lithography |
| 07/16/2009 | US20090181320 Fluorine-free heteroaromatic photoacid generators and photoresist compositions containing the same |
| 07/16/2009 | US20090181319 Aromatic fluorine-free photoacid generators and photoresist compositions containing the same |
| 07/16/2009 | US20090181316 Substrate processing method, program, computer-readable storage medium, and substrate processing system |
| 07/16/2009 | US20090181313 Pigment layer and method especially for a durable inscription of glass using a high energy radiation |
| 07/16/2009 | US20090181264 Method for manufacturing patterned magnetic recording medium |
| 07/16/2009 | US20090181224 Negative-type photosensitive resin composition, pattern forming method and electronic parts |
| 07/16/2009 | US20090181173 Lithographic printing plate precursor, method of preparing lithographic printing plate and lithographic printing method |
| 07/16/2009 | US20090180679 Method and apparatus for parts manipulation, inspection, and replacement |