| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/29/2009 | CN100520597C Method and system for optical proximity correction |
| 07/29/2009 | CN100520596C Method for improving SAC etching process tolerance in COB DRAM manufacture |
| 07/29/2009 | CN100520595C Device and method for determining an illumination intensity profile of an illuminator for a lithography system |
| 07/29/2009 | CN100520594C Substrate processing apparatus and substrate processing method |
| 07/29/2009 | CN100520593C Lithographic apparatus and device manufacturing method |
| 07/29/2009 | CN100520592C Lithographic apparatus and device manufacturing method |
| 07/29/2009 | CN100520591C Lithographic apparatus and device manufacturing method |
| 07/29/2009 | CN100520590C Exposure device, exposure method, and exposure treating programme |
| 07/29/2009 | CN100520589C Lithographic apparatus and device manufacturing method |
| 07/29/2009 | CN100520588C Lithographic apparatus and device manufacturing method |
| 07/29/2009 | CN100520587C Lithographic apparatus, lorentz actuator and device manufacturing method |
| 07/29/2009 | CN100520586C Method for manufacturing a carbon nanotube multilayer pattern using photolithography and dry etching |
| 07/29/2009 | CN100520585C Method and apparatus for generating assist features utilizing an image field map |
| 07/29/2009 | CN100520584C Method for reducing nonuniformity of image printed on substrate using light micro-image cover and light micro- image cover |
| 07/29/2009 | CN100520583C Photoetching apparatus and method for optimizing lighting light source by photoetching analog technology |
| 07/29/2009 | CN100520582C Photoetching equipment and devices producing method |
| 07/29/2009 | CN100520581C Photoetching apparatus and devices producing method |
| 07/29/2009 | CN100520580C Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 07/29/2009 | CN100520579C Positive type corrosion-resisting composition and corrosion-resisting pattern formation method using same |
| 07/29/2009 | CN100520578C Positive type corrosion-resisting composition and corrosion-resisting pattern formation method using same |
| 07/29/2009 | CN100520577C Photosensitive composition for forming light shading film, black bottom formed from said light shading film for photosensitive composition |
| 07/29/2009 | CN100520576C Method for etching complex pattern on 3-D abnormal curved surface |
| 07/29/2009 | CN100520575C Method of enhancing clear field phase shift masks by adding parallel line to phase 0 region |
| 07/29/2009 | CN100519829C Aperture masks for circuit fabrication |
| 07/29/2009 | CN100519630C Active energy line cured resin, optical solidified and thermosetting resin composition containing the resin and condensate thereof |
| 07/29/2009 | CA2645994A1 Light guide exposure device |
| 07/28/2009 | US7567607 Very narrow band, two chamber, high rep-rate gas discharge laser system |
| 07/28/2009 | US7567379 Technique to prevent tin contamination of mirrors and electrodes in an EUV lithography system |
| 07/28/2009 | US7566752 Such as high viscosity epoxy resin modifiers; crosslinking agents; antioxidants; produced from 4-hydroxyphenylmethylcarbinol starting material; avoids use of 4-hydroxystyrene |
| 07/28/2009 | US7566527 Fused aromatic structures and methods for photolithographic applications |
| 07/28/2009 | US7566526 Method of exposure for lithography process and mask therefor |
| 07/28/2009 | US7566522 Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography |
| 07/28/2009 | US7566422 Exposure apparatus with tanks storing helium gas and method of manufacturing device using exposure apparatus |
| 07/28/2009 | US7566365 Liquid processing apparatus and liquid processing method |
| 07/28/2009 | US7566181 Controlling critical dimensions of structures formed on a wafer in semiconductor processing |
| 07/23/2009 | WO2009091704A2 Aromatic fluorine-free photoacid generators and photoresist compositions containing the same |
| 07/23/2009 | WO2009091630A2 Contamination prevention in extreme ultraviolet lithography |
| 07/23/2009 | WO2009091508A1 Imaging and processing negative-working imageable elements |
| 07/23/2009 | WO2009090928A1 Exposure method and apparatus, and device manufacturing method |
| 07/23/2009 | WO2009090867A1 Resist material and laminate |
| 07/23/2009 | WO2009090474A1 A process for imaging a photoresist coated over an antireflective coating |
| 07/23/2009 | WO2009090007A2 Illumination system of a microlithographic projection exposure apparatus |
| 07/23/2009 | WO2009089999A1 Projection exposure system for microlithography with a measurement device |
| 07/23/2009 | WO2009021249A4 Polar polydimethylsiloxane molds, methods of making the molds, and methods of using the molds for pattern transfer |
| 07/23/2009 | US20090186484 Pattern formation method |
| 07/23/2009 | US20090186308 Method for printing a pattern on a substrate |
| 07/23/2009 | US20090186307 Hydrogenated ring-opening metathesis polymer, resist composition and patterning process |
| 07/23/2009 | US20090186306 Polymeric microfluidic devices from liquid thermoset precursors |
| 07/23/2009 | US20090186305 Manufacturing method of optical waveguide device |
| 07/23/2009 | US20090186303 Method of Creating a Digital Mask for Flexographic Printing Elements In Situ |
| 07/23/2009 | US20090186302 Metal or metal compound pattern and forming method of pattern, and electron emitting device, electron source, and image-forming apparatus using the pattern |
| 07/23/2009 | US20090186301 Method of making lithographic printing plates |
| 07/23/2009 | US20090186300 Resist composition for liquid immersion lithography, method of forming resist pattern, and fluorine-containing copolymer |
| 07/23/2009 | US20090186299 Methods for imaging and processing negative-working imageable elements |
| 07/23/2009 | US20090186298 Positive resist compositions and patterning process |
| 07/23/2009 | US20090186297 Positive resist compositions and patterning process |
| 07/23/2009 | US20090186296 Positive resist compositions and patterning process |
| 07/23/2009 | US20090186295 Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof |
| 07/23/2009 | US20090186294 Organic graded spin on barc compositions for high na lithography |
| 07/23/2009 | US20090186293 Dry film protoresist for a micro-fluid ejection head and method therefor |
| 07/23/2009 | US20090186284 Reticle, and method of laying out wirings and vias |
| 07/23/2009 | US20090186281 Method for producing silicon-containing complex oxide sol, method for producing silicon-containing hologram recording material, and hologram recording medium |
| 07/23/2009 | US20090186187 Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs |
| 07/23/2009 | US20090186156 Method of forming fine patterns |
| 07/23/2009 | US20090185774 Optical integrated device and method of manufacturing the same |
| 07/23/2009 | US20090185470 Advantageous recording media for holographic applications |
| 07/23/2009 | US20090185322 Combination current sensor and relay |
| 07/23/2009 | US20090185156 Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas |
| 07/23/2009 | US20090185153 Catadioptric projection objective with pupil mirror, projection exposure apparatus and projection exposure method |
| 07/23/2009 | US20090185150 Immersion exposure apparatus and device manufacturing method |
| 07/23/2009 | US20090185059 Colored negative photoresist composition, colored pattern comprising the same, and method for producing the colored pattern |
| 07/23/2009 | US20090185003 Hydrophobic nozzle plate structures for micro-fluid ejection heads |
| 07/23/2009 | US20090184270 Lithographic apparatus and device manufacturing method |
| 07/23/2009 | US20090183901 Wiring Boards and Processes for Manufacturing the Same |
| 07/23/2009 | US20090183647 Imageable elements with coalescing core-shell particles |
| 07/23/2009 | DE112007002165T5 Maskenrohling und Verfahren zum Herstellen einer Übertragungsmaske Mask blank and method for producing a transmission mask |
| 07/23/2009 | DE102008043321A1 Optical system for use in micro-lithographic projection exposure system, has polarization manipulator increasing maximum value of delay in light cluster for field point in comparison to appropriate optical system without manipulator |
| 07/22/2009 | EP2081086A2 Lithographic apparatus and device manufacturing method |
| 07/22/2009 | EP2081085A1 Positive resist compositions and patterning process |
| 07/22/2009 | EP2081084A1 Positive resist compositions and patterning process |
| 07/22/2009 | EP2081083A1 Positive resist compositions and patterning process |
| 07/22/2009 | EP2080774A1 Polymerizable sulfonic acid onium salt and resin |
| 07/22/2009 | EP2080750A1 Radiation-sensitive composition |
| 07/22/2009 | EP2006899A9 Stage apparatus, exposure apparatus, stage control method, exposure method and device manufacturing method |
| 07/22/2009 | EP2006310A9 Polymer compound and production method thereof, pigment dispersing agent, pigment dispersion composition, photocurable composition, and color filter and production method thereof |
| 07/22/2009 | EP1695122A4 Spatial light modulator and method for performing dynamic photolithography |
| 07/22/2009 | EP1597631B1 Multiple exposure method for circuit performance improvement and maskset |
| 07/22/2009 | EP1506456B1 Radiation filter element and manufacturing processes therefor |
| 07/22/2009 | EP1424537B1 Recording device of information recording medium original disk |
| 07/22/2009 | CN201278080Y Plate printing and punching machine |
| 07/22/2009 | CN201278079Y Spraying light sensing heat sensitive CTP plate material |
| 07/22/2009 | CN101490626A Positive resist processing liquid composition and liquid developer |
| 07/22/2009 | CN101490625A A process for enhancing the resolution of a thermally transferred pattern |
| 07/22/2009 | CN101490624A Correction of spatial instability of an EUV source by laser beam steering |
| 07/22/2009 | CN101490623A Backside immersion lithography |
| 07/22/2009 | CN101490622A Antireflective coating compositions |
| 07/22/2009 | CN101490621A Hardmask composition for processing resist underlayer film, process for producing semiconductor integrated circuit device using the hardmask composition, and semiconductor integrated circuit device pr |
| 07/22/2009 | CN101490620A Color filter composition |
| 07/22/2009 | CN101490619A Photosensitive conductive paste for electrode formation and electrode |
| 07/22/2009 | CN101487993A Thick-film photo resist cleaning agent |