| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/04/2009 | US7569331 irradiating portions of a non-conductive coating having silver conductive elements, a polyetherurethane binder to join the conductive elements, and a material to propagate absorption of radiation from a light source to induce the portions to an electrical conducting state |
| 08/04/2009 | US7569330 property of an exposed part changes by the action of a photocatalyst in a photocatalyst containing layer, to form a wettability pattern having a lyophilic region and a liquid repellent region on the property changing layer; color filiters |
| 08/04/2009 | US7569329 Method for making a lithographic plate |
| 08/04/2009 | US7569328 Resin composition and thermo/photosensitive composition |
| 08/04/2009 | US7569327 Curable polymer compound |
| 08/04/2009 | US7569326 Sulfonium salt having polymerizable anion, polymer, resist composition, and patterning process |
| 08/04/2009 | US7569325 Monomer having sulfonyl group, polymer thereof and photoresist composition including the same |
| 08/04/2009 | US7569324 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process |
| 08/04/2009 | US7569323 alpha -trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant; water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography |
| 08/04/2009 | US7569316 Inkless reimageable printing paper and method |
| 08/04/2009 | US7569312 Mask data creation method |
| 08/04/2009 | US7569311 single reticle photolithography system suitable for exposing regions of the reticle having distinct patterns under different illumination conditions optimal for each respective region |
| 08/04/2009 | US7569308 Placing rectangular contacts on a grid in a first direction; placing rectangular contacts unrestrictedly in a second direction perpendicular to the first direction;a first exposure forms periodic dark lines and a second exposure on the period dark lines form the rectangular contacts |
| 08/04/2009 | US7569252 Lithography; capillary transportation; pen for writing patterns |
| 08/04/2009 | US7569165 Black conductive compositions, black electrodes, and methods of forming thereof |
| 08/04/2009 | US7569153 Fabrication method of liquid crystal display device |
| 07/30/2009 | WO2009094170A1 Method of making images using fresh processing solution |
| 07/30/2009 | WO2009094120A1 Method of making lithographic printing plates |
| 07/30/2009 | WO2009093907A1 Magnectic actuator |
| 07/30/2009 | WO2009093757A1 Exposure apparatus, and manufacturing method and supporting method thereof |
| 07/30/2009 | WO2009093706A1 Photosensitive resin laminate |
| 07/30/2009 | WO2009093686A1 Method for forming resist pattern and resist pattern miniaturizing resin composition |
| 07/30/2009 | WO2009093553A1 Illuminating apparatus, exposure apparatus, exposure method and device manufacturing method |
| 07/30/2009 | WO2009093513A1 Photosensitive lithographic printing plate and printing method |
| 07/30/2009 | WO2009093419A1 Resin for chemically amplified photoresist and method for producing the same |
| 07/30/2009 | WO2009093102A1 Method of forming openings in a semiconductor device and a semiconductor device fabricated by the method |
| 07/30/2009 | WO2009092292A1 Cleaning composition for thick film resist |
| 07/30/2009 | WO2009066895A3 Composition for mold sheet and method for preparing mold sheet using same |
| 07/30/2009 | WO2009054705A3 Film type transfer material |
| 07/30/2009 | WO2009042465A3 Stepping optical reduction system for a dna array synthesizer |
| 07/30/2009 | US20090192065 Dense fluid compositions for removal of hardened photoresist, post-etch residue and/or bottom anti-reflective coating |
| 07/30/2009 | US20090191491 Method of Creating an Image in a Photoresist Laminate |
| 07/30/2009 | US20090191490 Method and apparatus for structuring a radiation-sensitive material |
| 07/30/2009 | US20090191489 Pattern generator |
| 07/30/2009 | US20090191488 Ink jet recording head and manufacturing method |
| 07/30/2009 | US20090191487 Liquid jet head, method for manufacturing liquid jet head, and method for forming structure for liquid jet head |
| 07/30/2009 | US20090191486 Production method for electroluminescent element |
| 07/30/2009 | US20090191485 Monomer, resin, resist composition using the resin, and method producing semiconductor device using the resist composition |
| 07/30/2009 | US20090191484 Provides a photosensitive resin composition capable of offering gradual solubility to a developing solution after unsaturated exposure due to hardness graduations from the lower layer to the upper layer without regard to the film thickness |
| 07/30/2009 | US20090191483 Device and method for preparing relief printing form |
| 07/30/2009 | US20090191482 Device and method for preparing relief printing form |
| 07/30/2009 | US20090191481 Method of manufacturing relief printing plate and printing plate precursor for laser engraving |
| 07/30/2009 | US20090191480 Thermoplastic material comprising polychromic substances |
| 07/30/2009 | US20090191479 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same |
| 07/30/2009 | US20090191478 Method of forming resist pattern and negative resist composition |
| 07/30/2009 | US20090191474 On-track process for patterning hardmask by multiple dark field exposures |
| 07/30/2009 | US20090191467 Image-formed object and method for producing the same |
| 07/30/2009 | US20090191386 Positive photosensitive polymer composition |
| 07/30/2009 | US20090191385 Photosensitive Resin Composition and Photosensitive Film |
| 07/30/2009 | US20090190115 Method for exposing a substrate and lithographic projection apparatus |
| 07/30/2009 | US20090190114 Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof |
| 07/30/2009 | US20090190113 Projection exposure apparatus, projection exposure method, and method for producing device |
| 07/30/2009 | US20090190112 Exposure apparatus, and device manufacturing method |
| 07/30/2009 | US20090190107 Maskless photopolymer exposure process and apparatus |
| 07/30/2009 | US20090189620 Compliant membrane probe |
| 07/30/2009 | US20090189524 Plasma display panel and its manufacturing method |
| 07/30/2009 | US20090189277 Photosensitive compositions based on polycyclic polymers for low stress, high temperature films |
| 07/30/2009 | US20090189164 Uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon |
| 07/30/2009 | DE102009004392A1 Datenerzeugungsverfahren für Halbleitervorrichtung und Elektronenstrahlbelichtungssystem Data forming method for the semiconductor device and electron beam exposure system |
| 07/30/2009 | DE102008004762A1 Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung Projection exposure system for microlithography with a measuring device |
| 07/30/2009 | DE102005002410B4 Antireflektives Beschichtungspolymer, dessen Präparationsverfahren und obere antireflektierende Beschichtungszusammensetzung mit demselben Anti-reflective coating polymer whose preparation methods, and top anti-reflective coating composition having the same |
| 07/30/2009 | DE10121188B4 Verfahren zum Entfernen eines restliches Metall enthaltenden Polymermaterials und von ionenimplantiertem Photoresistmaterial in einem stromabwärtigen atmosphärischen Plasmabearbeitungssystem A method of removing a residual metal-containing polymeric material and of ion implanted photoresist material in a downstream atmospheric plasma processing system |
| 07/30/2009 | CA2712382A1 Polychromic substances and their use |
| 07/29/2009 | EP2083329A2 Method and apparatus for structuring a radiation-sensitive material |
| 07/29/2009 | EP2083328A1 Grazing incidence collector for laser produced plasma sources |
| 07/29/2009 | EP2083327A1 Improved grazing incidence collector optical systems for EUV and X-ray applications |
| 07/29/2009 | EP2083326A1 Photosensitive resin composition, insulating film, protective film, and electronic equipment |
| 07/29/2009 | EP2083325A2 Method for printing a pattern on a substrate |
| 07/29/2009 | EP2083019A1 Photocurable/thermosetting resin composition, cured product and printed wiring board |
| 07/29/2009 | EP2082994A1 Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs |
| 07/29/2009 | EP2082289A2 Radiation system and lithographic apparatus comprising the same |
| 07/29/2009 | EP2082288A1 Antireflective coating compositions |
| 07/29/2009 | EP2082287A2 Antireflective coating compositions |
| 07/29/2009 | EP2082286A2 Solvent-assisted embossing of flexographic printing plates |
| 07/29/2009 | EP2082024A1 Compositions and methods for the removal of photoresist for a wafer rework application |
| 07/29/2009 | EP2018598B1 Backside immersion lithography |
| 07/29/2009 | EP2006737A9 Photosensitive resin composition for flexographic printing |
| 07/29/2009 | EP1756670B1 Method of making a photopolymer sleeve blank having an integral cushion layer for flexographic printing |
| 07/29/2009 | EP1697974A4 Exposure apparatus and device manufacturing method |
| 07/29/2009 | EP1567913B1 A chucking system and method for modulating shapes of substrates |
| 07/29/2009 | CN201281804Y 曝光设备 Exposure equipment |
| 07/29/2009 | CN201281803Y Division control and crossover operation structure for working arm of gumming and developing unit |
| 07/29/2009 | CN101495922A Lithography system, method of heat dissipation and frame |
| 07/29/2009 | CN101495921A Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination |
| 07/29/2009 | CN101495920A Negative-working radiation-sensitive compositions and imageable materials |
| 07/29/2009 | CN101495919A Positive photosensitive resin composition |
| 07/29/2009 | CN101495918A Photosensitive surface printing plate material |
| 07/29/2009 | CN101493657A Mask plate positioning device |
| 07/29/2009 | CN101493656A Exposure condition setting method, substrate processing unit and computer program |
| 07/29/2009 | CN101493655A Exposure method |
| 07/29/2009 | CN101493654A Method for producing green environmental-protecting type homogeneous phase PS plate gas-liquid guide rough surface |
| 07/29/2009 | CN101493653A Colored photosensitive composition, and color filter array and solid image pickup device using the same |
| 07/29/2009 | CN101493652A Colored photosensitive composition, and color filter array and solid image pickup device using the same |
| 07/29/2009 | CN101493651A Photosensitive paste composition, barrier ribs prepared using the composition and plasma display panel comprising the barrier ribs |
| 07/29/2009 | CN101493650A Method for manufacturing microlens and method for manufacturing solid-state image sensor |
| 07/29/2009 | CN101493649A Color filter, manufacturing method and liquid crystal display device |
| 07/29/2009 | CN101493648A Color filter, manufacturing method and liquid crystal display device |
| 07/29/2009 | CN100520600C Assembly comprising a sensor, a method therefor and a lithographic projection apparatus |
| 07/29/2009 | CN100520599C Asymmetric transmission mark combination and its aligning method |
| 07/29/2009 | CN100520598C Measuring system and method for photoelectric difference |