| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/12/2009 | CN101506885A Drawing method, drawing apparatus, and information recording medium |
| 08/12/2009 | CN101506739A Method and system for correcting image changes |
| 08/12/2009 | CN101506738A Exposure device for the production of screen print stencils |
| 08/12/2009 | CN101506737A Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface |
| 08/12/2009 | CN101506736A Resist underlayer film forming composition containing liquid additive |
| 08/12/2009 | CN101506734A UV-dosis indicators |
| 08/12/2009 | CN101506252A Thiourethane compound and photosensitive resin composition |
| 08/12/2009 | CN101504948A Hollow pen tip like structure, apparatus comprising the same, and manufacturing method therefor |
| 08/12/2009 | CN101504931A Manufacturing method of semiconductor device |
| 08/12/2009 | CN101504917A Method for preventing secondary breakdown of VDMOS tube |
| 08/12/2009 | CN101504513A Air-supporting slide rail system |
| 08/12/2009 | CN101504512A Exposure method, expose apparatus, carrier apparatus and equipment manufacturing method |
| 08/12/2009 | CN101504511A Photo-etching apparatus and calibration method |
| 08/12/2009 | CN101504510A Photoetching technology |
| 08/12/2009 | CN101503389A Novel method for synthesizing SBQ sensitizer |
| 08/12/2009 | CN100526999C Optical etching device aligning method and system |
| 08/12/2009 | CN100526998C Rinse liquid for lithography and method for forming resist pattern using same |
| 08/12/2009 | CN100526997C Exposure apparatus inspection method |
| 08/12/2009 | CN100526996C Exposure apparatus and exposure method |
| 08/12/2009 | CN100526995C Marker for photo-etching machine aligning and aligning using the same |
| 08/12/2009 | CN100526994C Transmission aligning mark combination and alignment method of light scribing device |
| 08/12/2009 | CN100526993C Photo-etching machine work-piece platform balancing and positioning system |
| 08/12/2009 | CN100526992C Exposure apparatus, exposure method, device manufacturing method |
| 08/12/2009 | CN100526991C Method for changing dimension of photo mask pattern |
| 08/12/2009 | CN100526990C Photoetching projection objective lens telecentric measuring method |
| 08/12/2009 | CN100526989C Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus |
| 08/12/2009 | CN100526988C Method and apparatus for vibration detection and vibration analysis, and lithographic apparatus equipped such an apparatus |
| 08/12/2009 | CN100526987C Lithographic apparatus and device manufacturing method |
| 08/12/2009 | CN100526986C Optical projection exposure device |
| 08/12/2009 | CN100526985C Off-axis signal treatment method based on linear model |
| 08/12/2009 | CN100526984C Particle-optical device for object irradiation |
| 08/12/2009 | CN100526983C Composition for forming anti-reflective coating |
| 08/12/2009 | CN100526982C Positive-working photoimageable bottom antireflective coating |
| 08/12/2009 | CN100526981C Pad for display panel, radiosensitive resin composition, and liquid crystal display device |
| 08/12/2009 | CN100526980C Lithographic printing plate precursor and lithographic printing method |
| 08/12/2009 | CN100526448C Agent of cleaning edge rubber |
| 08/12/2009 | CN100526404C Resin composition for coating |
| 08/11/2009 | US7573580 Optical position measuring system and method using a low coherence light source |
| 08/11/2009 | US7573568 Method and apparatus for detecting a photolithography processing error, and method and apparatus for monitoring a photolithography process |
| 08/11/2009 | US7573560 Supporting plate, stage device, exposure apparatus, and exposure method |
| 08/11/2009 | US7573225 Electromagnetic alignment and scanning apparatus |
| 08/11/2009 | US7573019 Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method |
| 08/11/2009 | US7572656 Mask and method of manufacturing liquid crystal display device using the same |
| 08/11/2009 | US7572573 Maskless photolithography for etching and deposition |
| 08/11/2009 | US7572572 for use in integrated circuits; conventional photolithography steps can be used in combination with pitch-reduction techniques to form superimposed patterns of crossing elongate features with pillars at the intersections; reduction in size of integrated circuits |
| 08/11/2009 | US7572571 improved efficiency by heat treating a silicon oxynitride antireflective layer; for contemporary imaging devices, such as charge-coupled devices (CCDs) and CMOS image sensors (CISs). |
| 08/11/2009 | US7572570 Chemically amplified resist composition |
| 08/11/2009 | US7572569 Inkless printing paper and method |
| 08/11/2009 | US7572568 Donor substrate for laser induced thermal imaging and method of fabricating organic light emitting display using the same substrate |
| 08/11/2009 | US7572560 methoxy substitued dithienylethene as phorochromic dyes; dispersed in a solvent or polymer; reversible transition between colorless and colored state in response to light;erasable by heat or light, stability; ink jet printers; toner-free; cost efficiency; disposable paper reused; environmentally friendly |
| 08/11/2009 | US7572559 Colorant-containing curable composition, color filter and manufacturing method thereof |
| 08/11/2009 | US7572558 Photomask and exposure method |
| 08/11/2009 | US7572556 Photomasks; decreased apodization |
| 08/11/2009 | US7572489 Method for immobilizing hydrogel-forming polymers on polymer substrate surfaces |
| 08/11/2009 | US7572351 Process for producing wiring circuit board |
| 08/11/2009 | US7571793 Actuator arrangement for active vibration isolation using a payload as an inertial reference mass |
| 08/11/2009 | US7571542 Aluminum sheet embossing roll |
| 08/06/2009 | WO2009097436A2 On-track process for patterning hardmask by multiple dark field exposures |
| 08/06/2009 | WO2009096691A2 Method for selective adsorption of noble metal catalyst onto surface of polymer |
| 08/06/2009 | WO2009096452A1 Resin, pigment dispersion liquid, coloring curable composition, color filter produced by using the composition, and method for producing the color filter |
| 08/06/2009 | WO2009096438A1 Method for electroconductive pattern formation |
| 08/06/2009 | WO2009096432A1 Optical recording material, optical recording method, photosensitive material, photolithography method, photopolymerization initiator and photosensitizing agent |
| 08/06/2009 | WO2009096371A1 Fine pattern mask, method for producing the same, and method for forming fine pattern using the mask |
| 08/06/2009 | WO2009096340A1 Sulfur atom-containing composition for resist underlayer film formation and method for resist pattern formation |
| 08/06/2009 | WO2009096292A1 Layered product of photosensitive resin |
| 08/06/2009 | WO2009095520A1 Method for defining and producing reactive chemical nanomemtric surface patterns by means of gaseous-phase soft lithography, resulting patterns and devices and uses thereof |
| 08/06/2009 | WO2009095282A2 Photolatent amidine bases for redox curing of radically curable formulations |
| 08/06/2009 | WO2009095220A2 Grazing incidence collector for laser produced plasma sources |
| 08/06/2009 | WO2009095219A1 Improved grazing incidence collector optical systems for euv and x-ray applications |
| 08/06/2009 | WO2009095052A1 Illumination optics and projection exposure apparatus |
| 08/06/2009 | WO2009094773A1 Method of depositing a polymer micropattern on a substrate |
| 08/06/2009 | WO2009069817A3 Illumination optical apparatus, exposure apparatus, and method for producing device |
| 08/06/2009 | WO2009059031A3 Photoimageable branched polymer |
| 08/06/2009 | WO2009032448A3 Zwitterionic block copolymers and methods |
| 08/06/2009 | US20090199153 Exposure condition setting method and program for setting exposure conditions |
| 08/06/2009 | US20090199148 Pattern-producing method for semiconductor device |
| 08/06/2009 | US20090199137 System and method for multi-exposure pattern decomposition |
| 08/06/2009 | US20090198065 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer |
| 08/06/2009 | US20090197211 Lithographic apparatus and device manufacturing method |
| 08/06/2009 | US20090197210 Method for preparing photonic crystal slab waveguides |
| 08/06/2009 | US20090197209 Lithographically patterned nanowire electrodeposition |
| 08/06/2009 | US20090197208 Method for manufacturing a perpendicular magnetic write pole using an electrical lapping guide for tight write pole flare point control |
| 08/06/2009 | US20090197207 Negative laser sensitive lithographic printing plate having specific photosensitive composition |
| 08/06/2009 | US20090197206 Method of making images using fresh processing solution |
| 08/06/2009 | US20090197205 Lithographic printing plate precursor and printing method |
| 08/06/2009 | US20090197204 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound |
| 08/06/2009 | US20090197203 Photosensitive conductive paste for transferring and photosensitive transfer sheet |
| 08/06/2009 | US20090197202 Photosensitive planographic printing plate material |
| 08/06/2009 | US20090197201 Fluorosurfactants |
| 08/06/2009 | US20090197200 Resist top coat composition and patterning process |
| 08/06/2009 | US20090197199 Material for forming resist protective film and method for forming resist pattern using same |
| 08/06/2009 | US20090197198 Photosensitive molecular compound and photoresist composition including the same |
| 08/06/2009 | US20090197197 Resist composition and method of forming resist pattern |
| 08/06/2009 | US20090197187 Hologram fabrication process and fabricated hologram |
| 08/06/2009 | US20090197186 Optical devices responsive to blue laser and method of modulating light |
| 08/06/2009 | US20090197090 Composition, anti-oxide film including the same, electronic component including the anti-oxide film, and methods for forming the anti-oxide film and electronic component |
| 08/06/2009 | US20090197086 Elimination of photoresist material collapse and poisoning in 45-nm feature size using dry or immersion lithography |
| 08/06/2009 | US20090197067 Novel Positive Photosensitive Resin Compositions |
| 08/06/2009 | US20090197066 Dye-containing negative curable composition, color filter and method of producing color filter |
| 08/06/2009 | US20090197052 Method of imaging and developing positive-working imageable elements |