Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2009
08/19/2009CN100529931C Method of fabricating liquid crystal display device
08/19/2009CN100529926C Thin film transistor substrate for horizontal electric field LCD device and its manufacture
08/19/2009CN100529925C Array substrate for ips-mode LCD device and method of fabricating the same
08/19/2009CN100529880C Method for preparing photo-patterned light polarizing films
08/19/2009CN100529866C Liquid crystal display manufacture method
08/19/2009CN100529805C Colourful optical filter and producing method thereof
08/19/2009CN100529039C Post-dry etching cleaning liquid composition and process for fabricating semiconductor device
08/19/2009CN100528883C Novel compounds capable of forming photoconvertible organic thin films and articles having organic thin films
08/19/2009CN100528838C Oxime ester photoinitiatros having combined structure
08/19/2009CN100528561C Imageable element, method for forming image and prepared image
08/19/2009CN100528516C Ultraviolet radiation apparatus
08/18/2009US7576834 Lithographic apparatus and device manufacturing method
08/18/2009US7576831 Method and apparatus for maintaining a machine part
08/18/2009US7576374 Semiconductor device with robust polysilicon fuse
08/18/2009US7576223 Polymer of a (meth)acryloyloxy)ethoxycarbonyl)sulfonium sulfonate, e.g., 1-[2-(2-methylacryloyloxy)ethoxycarbonyl]tetrahydrothiophenium perfluorobutanesulfonate; used a an acid generator in excimer laser lithography; stable fine patterns without collapse and improved line edge roughness.
08/18/2009US7575855 Etching photomasks, photoresists; photolithography; depth of focus
08/18/2009US7575854 Method for manufacturing microlens
08/18/2009US7575853 Method of forming thin film pattern and method of forming magnetoresistive element
08/18/2009US7575852 Method of optically transferring a pattern from a mask having advanced oriented assist features for integrated circuit hole patterns
08/18/2009US7575851 Polymerization catalysts; ink jet heads
08/18/2009US7575850 Chemically amplified resist composition
08/18/2009US7575849 Optical disks, digital video disks
08/18/2009US7575848 Allowing easy, inexpensive user labeling of individual discs; professional look; activator and colorant precursor; radiation absorption marking
08/18/2009US7575847 Low refractive index composition comprising fluoropolyether urethane compound
08/18/2009US7575846 excimer laser lithography; high sensitivity and resolution
08/18/2009US7575845 Structure for pattern formation, method for pattern formation, and application thereof
08/18/2009US7575844 Color forming composites capable of multi-colored imaging and associated systems and methods
08/18/2009US7575837 Colored curable composition, color filter and method for producing the same
08/18/2009US7575835 Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method
08/18/2009US7575634 Coating device and coating film forming method
08/18/2009US7574959 Radiation-sensitive compositions and imageable elements based thereon
08/13/2009WO2009099987A1 Gate patterning scheme with self aligned independent gate etch
08/13/2009WO2009099954A1 Novel positive photosensitive resin compositions
08/13/2009WO2009099924A2 Method to produce nanometer-sized features with directed assembly of block copolymers
08/13/2009WO2009099713A2 Elimination of photoresist material collapse and poisoning in 45-nm feature size using dry or immersion lithography
08/13/2009WO2009099619A2 Array and cantilever array leveling
08/13/2009WO2009099518A1 Method of imaging and developing positive-working imageable elements
08/13/2009WO2009099083A1 Acrylamide polymers, acrylamide compounds, chemically amplified photosensitive resin compositions and pattern formation method
08/13/2009WO2009099021A1 Stage apparatus, exposure apparatus, exposure method, and device fabrication method
08/13/2009WO2009098891A1 Position measuring system and position measuring method, mobile body device, mobile body driving method, exposure device and exposure method, pattern forming device, and device manufacturing method
08/13/2009WO2009098242A1 Metallization process to obtain a microelectrode on a photopatternable substrate and its biomedical application on an organ transplant monitoring device
08/13/2009WO2009098213A1 Methods and apparatuses for reducing mura effects in generated patterns
08/13/2009WO2008122884A3 A composition for coating over a photoresist pattern comprising a lactem
08/13/2009US20090203904 Arylsulfinate salts in photoinitiator systems for polymerization reactions
08/13/2009US20090203206 Fabrication of semiconductor devices using anti-reflective coatings
08/13/2009US20090202952 Sublithographic patterning method incorporating a self-aligned single mask process
08/13/2009US20090202951 Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium
08/13/2009US20090202950 Laser irradiation apparatus and method of fabricating organic light emitting display using the same
08/13/2009US20090202948 Method for developing and sealing of lithographic printing plates
08/13/2009US20090202947 Positive resist composition and patterning process using the same
08/13/2009US20090202946 Positive resist composition for use with electron beam, x-ray or euv and pattern forming method using the same
08/13/2009US20090202945 Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
08/13/2009US20090202944 Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition
08/13/2009US20090202943 Positive resist composition and patterning process
08/13/2009US20090202942 Process for producing patterned film and photosensitive resin composition
08/13/2009US20090202941 Silsesquioxane resin systems with base additives bearing electron-attracting functionalities
08/13/2009US20090202940 Positive resist composition and patterning process using the same
08/13/2009US20090202939 Compound, positive resist composition and method for forming resist pattern
08/13/2009US20090202938 Method of improving surface abrasion resistance of imageable elements
08/13/2009US20090202926 Exposure mask and pattern forming method therefor
08/13/2009US20090202921 Optical recording composition and holographic recording medium
08/13/2009US20090202920 Optical recording composition and holographic recording medium
08/13/2009US20090202919 Apparatus and methods for threshold control of photopolymerization for holographic data storage using at least two wavelengths
08/13/2009US20090202794 polyamides, acid generators; heat treatment; heat resistance; semiconductors; relief imaging; lithography
08/13/2009US20090202793 Photosensitive, Aqueous Alkaline Solution-Soluble Polyimide Resin and Photosensitive Resin Composition Containing the same
08/13/2009US20090202786 Photosensitive Resin Composition and Circuit Substrate Employing the Same
08/13/2009US20090202750 Colored alkali-developable photosensitive resin composition and color filter using the same
08/13/2009US20090202749 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel
08/13/2009US20090202136 Polarization analyzing system, exposure method, and method for manufacturing semiconductor device
08/13/2009US20090201485 Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus
08/13/2009US20090201476 Lithographic projection apparatus and device manufacturing method
08/13/2009US20090201474 Semiconductor Devices and Methods of Manufacture Thereof
08/13/2009US20090201471 Vacuum system for immersion photolithography
08/13/2009US20090201338 Photoimageable dry film formulation
08/13/2009US20090200709 Full-Wafer or Large Area Imprinting with Multiple Separated Sub-Fields for High Throughput Lithography
08/13/2009US20090200546 Test Structures and Methods
08/13/2009US20090200073 Printed wiring board with capacitor
08/13/2009US20090199733 Apparatus for forming a printing form having a cylindrical support
08/13/2009DE102008007449A1 Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie Illumination optics for illuminating an object field of a projection exposure system for microlithography
08/13/2009DE102004037009B4 Verfahren zum Herstellen einer Flüssigkristalldisplay-Vorrichtung A method of manufacturing a liquid crystal display device
08/13/2009CA2714627A1 Method and apparatus for provisioning dual mode wireless client devices in a telecommunications system
08/13/2009CA2714005A1 Array and cantilever array leveling
08/12/2009EP2088470A1 Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method
08/12/2009EP2088469A1 Solution for treatment of resist substrate after development processing, and method for treatment of resist substrate using the same
08/12/2009EP2088468A1 Method of preparing lithographic printing plate and lithographic printing plate precursor
08/12/2009EP2088467A1 Radiation-sensitive resin composition
08/12/2009EP2088466A1 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
08/12/2009EP2088163A1 Curable composition containing hydroxyl group-containing thiol compound and cured product thereof
08/12/2009EP2087838A1 Metallization process to obtain a microelectrode on a photopatternable substrate and its biomedical application on an organ transplant monitoring device
08/12/2009EP2087536A1 Methods and apparatus for the manufacture of microstructures
08/12/2009EP2087403A2 Relief layer and imprint method for making the same
08/12/2009EP2086737A1 Hollow structure forming substrate, method of producing the same, and method of producing hollow structure using the same
08/12/2009EP1989061A4 Method for producing lithographic printing plate
08/12/2009EP1768847B1 Liquid discharge head manufacturing method, and liquid discharge head obtained using this method
08/12/2009EP1723455B1 Process for producing photonic crystals
08/12/2009EP1636274B1 Photocurable resin composition
08/12/2009EP1252028B1 Method of fabricating a micro machined structure
08/12/2009EP0822881B1 Laser imaging ablation method
08/12/2009CN201289581Y Equipment for producing circuit board
08/12/2009CN101506939A Low-k damage avoidance during bevel etch processing
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