Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2014
09/09/2014US8830441 Fluid handling structure, a lithographic apparatus and a device manufacturing method
09/09/2014US8830440 Vacuum system for immersion photolithography
09/09/2014US8830020 Actuator, lithographic apparatus, and actuator constructing method
09/09/2014US8829478 Drive laser delivery systems for EUV light source
09/09/2014US8829477 Droplet generator with actuator induced nozzle cleaning
09/09/2014US8829436 Phase plate and method of fabricating same
09/09/2014US8829420 Two dimensional encoder system and method
09/09/2014US8829087 Transparent layer forming polymer
09/09/2014US8829070 Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same
09/09/2014US8829067 Polymerizable compositions with initiators containing several Ge atoms
09/09/2014US8828918 Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent composition
09/09/2014US8828651 Positive-type photosensitive resin composition and cured film manufactured therefrom
09/09/2014US8828650 Method for making a retarder
09/09/2014US8828649 Method of patterning a thin film
09/09/2014US8828648 Method for producing a planographic printing plate
09/09/2014US8828647 Patterning process and resist composition
09/09/2014US8828646 Lithographic printing plate precursor and method of producing thereof
09/09/2014US8828645 Negative resist composition and patterning process
09/09/2014US8828644 Compound, photosensitive composition comprising the same and photosensitive material
09/09/2014US8828642 Positive photosensitive resin composition, cured film obtained using same, and optical device
09/09/2014US8828641 Chemically amplified resist composition and patterning process
09/09/2014US8828632 Multiple-grid exposure method
09/09/2014US8828631 Pigment dispersion composition, photosensitive resin composition including the same and color filter using the same
09/09/2014US8828629 Black curable composition, light-shielding color filter for a solid-state imaging device and method of producing the same, solid-state imaging device, wafer level lens, and camera module
09/09/2014US8828628 Method and system for design of a reticle to be manufactured using variable shaped beam lithography
09/09/2014US8828625 Extreme ultraviolet lithography mask and multilayer deposition method for fabricating same
09/09/2014US8828624 Method and device for fabricating volume Bragg gratings
09/09/2014US8828524 Layered structure and piezoelectric device using the same
09/09/2014US8828500 Photocurable resin composition for sealing organic EL device
09/09/2014US8828493 Methods of directed self-assembly and layered structures formed therefrom
09/09/2014US8828307 Imprint method, chip production process, and imprint apparatus
09/09/2014US8828304 Method of forming resist pattern by nanoimprint lithography
09/09/2014US8828297 Patterning of non-convex shaped nanostructures
09/09/2014US8828282 Photosensitive resin composition for color filter and color filter using the same
09/09/2014US8828251 Method for finishing exterior surface of injection-molded product
09/09/2014US8828149 Apparatus for fabricating thin film transistor array substrate
09/09/2014US8827686 Imprinting apparatus and imprint transfer method
09/09/2014US8827400 Liquid application apparatus, liquid application method and imprinting system
09/09/2014US8826926 Methods of profiling edges and removing edge beads
09/09/2014US8826847 Imprinting apparatus, imprinting method, and manufacturing method of uneven plate
09/04/2014WO2014134098A1 Machining of fusion-drawn glass laminate structures containing a photomachinable layer
09/04/2014WO2014133807A1 Lithographic printing plate precursors and use
09/04/2014WO2014133726A1 Correction of plane-of-incidence azimuth in optical metrology
09/04/2014WO2014133187A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound
09/04/2014WO2014131889A1 Model-based control of an optical imaging device
09/04/2014WO2014131796A1 Reflecting coating with optimized thickness
09/04/2014WO2014131604A1 Optical assembly for rotating polarization
09/04/2014US20140249065 Microelectronic substrate cleaning compositions having copper/azole polymer inhibition
09/04/2014US20140248565 Method of patterning a device
09/04/2014US20140248564 Aromatic polycarbonate composition
09/04/2014US20140248563 Composition, resist pattern-forming method, compound, method for production of compound, and polymer
09/04/2014US20140248562 Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern
09/04/2014US20140248561 Resist composition, method for forming resist pattern, polyphenolic compound for in the composition, and alcoholic compound that can be derived therefrom
09/04/2014US20140248556 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device
09/04/2014US20140248554 Sub-resolution assist devices and methods
09/04/2014US20140248429 Fabrication of Free Standing Membranes and Use Thereof for Synthesis of Nanoparticle Patterns
09/04/2014US20140247975 Source and mask optimization by changing intensity and shape of the illumination source and magnitude and phase of mask diffraction orders
09/04/2014US20140247438 Reticle defect correction by second exposure
09/04/2014US20140247437 Illumination system of a microlithographic projection exposure apparatus
09/04/2014US20140247436 Exposure apparatus, exposure method, and device manufacturing method
09/04/2014US20140247435 Radiation source device, lithographic apparatus, and device manufacturing method
09/04/2014US20140247434 Lithographic Focus and Dose Measurement Using A 2-D Target
09/04/2014US20140246400 Resin having fluorene structure and material for forming underlayer film for lithography
09/04/2014US20140246045 Lithography Mask Repair Methods
09/04/2014DE102013202590A1 EUV-Lichtquelle zur Erzeugung eines Nutz-Ausgabestrahls für eine Projektionsbelichtungsanlage EUV light source for producing a useful output beam for a projection exposure apparatus
09/03/2014EP2772805A1 Method of making a lithographic printing plate
09/03/2014EP2772804A1 Positioning and loading a substrate in an exposure apparatus
09/03/2014EP2772803A1 Positioning and loading a substrate in an exposure apparatus
09/03/2014EP2772802A1 Dual-mask photolithography method minimising the impact of substrate defects
09/03/2014EP2772661A1 Method for dimensioning an oscillation insulator
09/03/2014EP2771740A1 Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head
09/02/2014US8825191 System and method for improved automated semiconductor wafer manufacturing
09/02/2014US8825182 Position control system, lithographic apparatus, and method to control a position of a movable object
09/02/2014US8823948 System for measuring the image quality of an optical imaging system
09/02/2014US8823936 Structure for critical dimension and overlay measurement
09/02/2014US8823926 Method and apparatus for visualizing a signature mark on a spectacle lens
09/02/2014US8823921 Programmable illuminator for a photolithography system
09/02/2014US8823920 Lithographic apparatus and device manufacturing method
09/02/2014US8823919 Lithographic apparatus, removable member and device manufacturing method
09/02/2014US8822942 Projection exposure tool for microlithography with a radiation detector detecting radiation with high resolution over a two-dimensional area
09/02/2014US8822858 Keyboard design
09/02/2014US8822617 Copolymer for organic antireflective film, monomer, and composition comprising the copolymer
09/02/2014US8822141 Front side wafer ID processing
09/02/2014US8822140 Resist pattern-forming method
09/02/2014US8822139 Method for providing an ordered layer of self-assemblable polymer for use in lithography
09/02/2014US8822138 Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring
09/02/2014US8822136 Patterning process and resist composition
09/02/2014US8822135 Method for preparing a composite printing form
09/02/2014US8822134 Resist developer, method for forming a resist pattern and method for manufacturing a mold
09/02/2014US8822133 Underlayer composition and method of imaging underlayer
09/02/2014US8822132 Colored dispersion, photoresist composition and black matrix
09/02/2014US8822131 Flexographic printing plate precursor
09/02/2014US8822130 Self-assembled structures, method of manufacture thereof and articles comprising the same
09/02/2014US8822129 Pattern forming method, electron beam-sensitive or extreme ultraviolet-sensitive composition, resist film, manufacturing method of electronic device, and electronic device
09/02/2014US8822128 Production method of resist composition for lithography
09/02/2014US8822127 Photosensitive resin composition for black matrix
09/02/2014US8822126 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate
09/02/2014US8822125 Composition for forming pattern and in-plane printing method using the same
09/02/2014US8822123 Polymeric materials and methods for making the polymeric materials
09/02/2014US8822112 Siloxane-based compound, photosensitive composition comprising the same and photosensitive material
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