| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/20/2009 | US20090208875 Surface position detecting apparatus, exposure apparatus, and device manufacturing method |
| 08/20/2009 | US20090208874 Method of processing on-press developable lithographic printing plate having overcoat |
| 08/20/2009 | US20090208873 Polymer, resist composition, and patterning process |
| 08/20/2009 | US20090208872 Sulphonium Salt Initiators |
| 08/20/2009 | US20090208871 Novel compound and method of producing same, acid generator, resist composition, and method of forming resist pattern |
| 08/20/2009 | US20090208870 Photosensitive composition and lithographic printing original plate using the composition |
| 08/20/2009 | US20090208869 Lithographic-printing plate precursor and image forming method using the same |
| 08/20/2009 | US20090208868 Positive photosensitive resin composition and method for forming pattern |
| 08/20/2009 | US20090208867 Resist Composition, Resist Protective Coating Composition, and Patterning Process |
| 08/20/2009 | US20090208866 irradiating a predetermined region of photosensitive layer, subjecting the photosensitive layer after baking to development treatment with an alkali aqueous solution to selectively remove the light-exposed part; has a photo-acid generator which generates an acid by the action of actinic radiation |
| 08/20/2009 | US20090208865 Photolithography focus improvement by reduction of autofocus radiation transmission into substrate |
| 08/20/2009 | US20090208855 Exposure apparatus and device manufacturing method |
| 08/20/2009 | US20090208854 Photosensitive Resin Composition for Forming Column Spacer of Liquid Crystal Display, Method for Forming Column Spacer Using the Composition, Column Spacer Formed by the Method, and Display Device Comprising the Column Spacer |
| 08/20/2009 | US20090208852 Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 08/20/2009 | US20090208851 Photomask, Fabrication Method for the Same and Pattern Formation Method Using the Same |
| 08/20/2009 | US20090208850 Near-Field Exposure Mask, Method of Producing that Mask, Near-Field Exposure Apparatus Having that Mask, and Resist Pattern Forming Method |
| 08/20/2009 | US20090208167 Manufacturing method of opto-electric hybrid board and opto-electric hybrid board obtained thereby |
| 08/20/2009 | US20090207703 Optical near-field generator and recording apparatus using the optical near-field generator |
| 08/20/2009 | US20090207464 Holograms and Hologram Fabrication Methods and Apparatus |
| 08/20/2009 | US20090207406 Particle inspection apparatus, exposure apparatus, and device manufacturing method |
| 08/20/2009 | US20090207398 Near Field Exposure That Reduces Scatter of a Surface Plasmon Polariton Wave Going Around a Light Blocking Member |
| 08/20/2009 | US20090207397 Lithographic apparatus and device manufacturing method |
| 08/20/2009 | US20090207287 Colored photosensitive composition, and color filter array and solid image pickup device using the same |
| 08/20/2009 | US20090207286 Colored photosensitive composition, and color filter array and solid image pickup device using the same |
| 08/20/2009 | US20090206520 Photosensitive composition, microfabrication method using the same, and microfabricated structure thereof |
| 08/20/2009 | US20090206328 Silicon-Containing Photosensitive Composition, Method for Forming Thin Film Pattern Using Same, Protective Film for Electronic Device, Gate Insulating Film And Thin Film Transistor |
| 08/20/2009 | US20090206282 Method for manufacturing semiconductor device or photomask |
| 08/20/2009 | US20090206279 Method and Device for Removing Particles Generated by Means of a Radiation Source During Generation of Short-Wave Radiation |
| 08/20/2009 | US20090205851 Electronic circuit device and method for fabricating the same |
| 08/20/2009 | DE112007002452T5 Hydraulisch ermöglichte Kontaktlithographievorrichtung, System und Verfahren Hydraulic enabled contact lithography apparatus, system and method |
| 08/20/2009 | DE112007002360T5 Niveausensor mit redundanten Beschleunigungsmessern Level sensor with redundant accelerometers |
| 08/20/2009 | DE102008054682A1 Lens i.e. plane-convex lens, for use in microlithographic projection exposure system to manufacture e.g. LCD, has two lens elements with non-birefringent, non-amorphous material and birefringent material, respectively |
| 08/20/2009 | DE102008009601A1 Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren Optical system for a microlithography projection exposure apparatus and microlithographic exposure method |
| 08/20/2009 | DE102008009600A1 Facet mirror e.g. field facet mirror, for use as bundle-guiding optical component in illumination optics of projection exposure apparatus, has single mirror tiltable by actuators, where object field sections are smaller than object field |
| 08/20/2009 | DE102008008232A1 Vorrichtung und Verfahren zum Belichten eines Fotomaterials Apparatus and method for exposing a photographic material |
| 08/20/2009 | DE102004027622B4 Laserstrahlmarkierverfahren Laserstrahlmarkierverfahren |
| 08/19/2009 | EP2090933A1 Lithographic printing plate precursor and printing method |
| 08/19/2009 | EP2090932A1 Positive resist composition for use with electron beam, X-ray or EUV and pattern forming method using the same |
| 08/19/2009 | EP2090931A1 Positive resist composition and patterning process |
| 08/19/2009 | EP2090930A1 Precursor for waterless lithographic printing plate |
| 08/19/2009 | EP2090929A2 Mold, pattern forming method, and pattern forming apparatus |
| 08/19/2009 | EP2090928A2 Imprint apparatus, imprint method, and mold for imprint |
| 08/19/2009 | EP2090920A1 Optical imaging device, in particular lens, with at least one system aperture |
| 08/19/2009 | EP2090598A1 Polymer, resist composition, and patterning process |
| 08/19/2009 | EP2090564A1 Adamantane derivative, process for production thereof, resin composition, and cured product of the resin composition |
| 08/19/2009 | EP2089774A2 Device manufacturing process utilizing a double pattering process |
| 08/19/2009 | EP2089773A1 Movable phase step micro mirror having a multilayer substrate and a method for its manufacture |
| 08/19/2009 | EP2089772A2 Method and system for detecting existence of an undesirable particle during semiconductor fabrication |
| 08/19/2009 | EP2089771A2 Negative-working radiation-sensitive compositions and imageable materials |
| 08/19/2009 | EP2089770A1 Method of creating photolithographic structures with developer-trimmed hard mask |
| 08/19/2009 | EP1644427B1 Positive photoresist composition and method of forming resist pattern |
| 08/19/2009 | EP1497102B1 Device and method for transferring a pattern to a substrate |
| 08/19/2009 | EP1463778B1 Modified pigment products and black matrixes comprising same |
| 08/19/2009 | EP1446460A4 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 08/19/2009 | EP1400858B1 Photoresist stripper composition |
| 08/19/2009 | EP1303791B1 Multicolor imaging using multiphoton photochemical processes |
| 08/19/2009 | EP1292862B1 Multipass multiphoton absorption method and apparatus |
| 08/19/2009 | CN201293916Y Probe evoked surface plasma resonance lithographic equipment |
| 08/19/2009 | CN201293915Y Light filter for screen-coating exposure platform of color kinescope |
| 08/19/2009 | CN101512439A Photolithography |
| 08/19/2009 | CN101512438A Apparatus and method for conditioning an immersion fluid |
| 08/19/2009 | CN101512437A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board |
| 08/19/2009 | CN101512436A Photosensitive composition containing polyvinyl alcohol and purpose thereof for dye printing method |
| 08/19/2009 | CN101512435A Black-colored photosensitive resin composition, method for formation of black matrix, method for production of color filter, and color filter |
| 08/19/2009 | CN101511969A Method and system for dry etching a hafnium containing material |
| 08/19/2009 | CN101511888A Fluorine-containing compound, resin composition, photosensitive transfer material, separation wall, method for separation wall formation, color filter, method for manufacturing the color filter, and d |
| 08/19/2009 | CN101511599A Photosensitive resin composition |
| 08/19/2009 | CN101511149A Producing method of wired circuit board |
| 08/19/2009 | CN101510511A Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 08/19/2009 | CN101510510A Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 08/19/2009 | CN101510503A Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 08/19/2009 | CN101510059A Exposure apparatus, exposure method, and method for producing device |
| 08/19/2009 | CN101510058A Method for measuring and correcting level error of work head position |
| 08/19/2009 | CN101510057A Multiple imaging mask-alignment and method |
| 08/19/2009 | CN101510056A Adjustment device and method for movement of work head of mask aligner |
| 08/19/2009 | CN101510055A Alignment system and alignment method for photolithography equipment |
| 08/19/2009 | CN101510054A Exposure control system and control method for photolithography equipment |
| 08/19/2009 | CN101510053A Optical lens for ultraviolet laser interference photolithography straight-writing system |
| 08/19/2009 | CN101510052A Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object |
| 08/19/2009 | CN101510051A Inspection method and equipment, photolithography equipment and method for manufacturing photolithography processing unit and device |
| 08/19/2009 | CN101510050A Method for extracting electron-beam exposure scattering parameter |
| 08/19/2009 | CN101509637A Top module installing and adjusting mechanism for illumination |
| 08/19/2009 | CN101508860A Copper product circuit board etching printing ink, preparation and uses thereof |
| 08/19/2009 | CN100530666C Image sensor and method for manufacturing the same |
| 08/19/2009 | CN100530547C Method for forming pattern, thin film transistor, display device, method for manufacturing thereof, and television apparatus |
| 08/19/2009 | CN100530541C Stabilized photoresist structure for etching process |
| 08/19/2009 | CN100530540C Exposure apparatus, exposure method, and device production method |
| 08/19/2009 | CN100530539C Exposure apparatus control method, exposure method and apparatus using the control method, and device manufacturing method |
| 08/19/2009 | CN100530495C Film photoetching manufacturing method of plasma display plate electrode and its product |
| 08/19/2009 | CN100530384C Original disc producing method for optical disc and optical disc producing method |
| 08/19/2009 | CN100529971C Process for producing water development printing plate for relief printing |
| 08/19/2009 | CN100529970C Projection exposing device |
| 08/19/2009 | CN100529969C Method of determining photo mask, method of manufacturing semiconductor device |
| 08/19/2009 | CN100529968C Dimension monitoring method and system |
| 08/19/2009 | CN100529967C Direct platemaking offset plate of ink-jetting computer |
| 08/19/2009 | CN100529966C Active energy ray sensitive resin composition, active energy ray sensitive resin film and method for forming pattern using said film |
| 08/19/2009 | CN100529965C Infrared light-sensitive composition |
| 08/19/2009 | CN100529964C Positive photosensitive resin composition |
| 08/19/2009 | CN100529963C Photosensitive composition and new compound therefor |
| 08/19/2009 | CN100529962C Light guide board module core manufacturing method |