| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/26/2009 | EP1994134B1 Stabilized, non-aqueous cleaning compositions for microelectronics substrates |
| 08/26/2009 | EP1242851B1 Use of a composition in stereolithography |
| 08/26/2009 | CN201298145Y Dry film cleaner |
| 08/26/2009 | CN201298144Y 显影液自动添加系统 Developer is automatically added system |
| 08/26/2009 | CN201298143Y Automatic sprinkling and developing device after exposure of large format photosensitive resist glass board |
| 08/26/2009 | CN101517703A Coating/developing apparatus, coating/developing apparatus control method and storage medium |
| 08/26/2009 | CN101517493A Method for developing and sealing of lithographic printing plates |
| 08/26/2009 | CN101517492A Method for manufacturing transparent cured film using positive-working photosensitive resin layer for half exposure |
| 08/26/2009 | CN101517491A Projection exposure method and projection exposure system therefor |
| 08/26/2009 | CN101517490A Apparatus comprising a rotating contaminant trap |
| 08/26/2009 | CN101517489A Optical element and method |
| 08/26/2009 | CN101517488A Optical system for semiconductor lithography |
| 08/26/2009 | CN101517487A Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating |
| 08/26/2009 | CN101517486A Photosensitive resin composition |
| 08/26/2009 | CN101517485A Method of creating photolithographic structures with developer-trimmed hard mask |
| 08/26/2009 | CN101517484A Method to form a pattern of functional material on a substrate |
| 08/26/2009 | CN101517483A Mask blank and method for manufacturing transfer mask |
| 08/26/2009 | CN101517419A Level sensor with redundant accelerometers |
| 08/26/2009 | CN101515121A Developing machine |
| 08/26/2009 | CN101515120A Method for processing substrate |
| 08/26/2009 | CN101515119A Silicon chip bench double-bench switching system employing air floatation plane motor |
| 08/26/2009 | CN101515118A Immersion self-adaptation rotary sealing device for photo-etching machine |
| 08/26/2009 | CN101515117A Lithographic apparatus having a chuck with a visco-elastic damping layer |
| 08/26/2009 | CN101515116A Mark structure for coarse wafer alignment and method for manufacturing such a mark structure |
| 08/26/2009 | CN101515115A Substrate supporting mechanism of exposure device |
| 08/26/2009 | CN101515114A Coloring curable composition, coloring pattern, color filter and method of manufacturing the same and liquid crystal display element |
| 08/26/2009 | CN101515113A Radioactive ray sensibility resin composition, interlayer insulating film, microlens and method of forming the same |
| 08/26/2009 | CN101515112A Positive resist composition, method of forming resist pattern, and polymeric compound |
| 08/26/2009 | CN101515111A Method for sensitizing images on surface of printing plate by using semiconductor laser |
| 08/26/2009 | CN101515110A Photoetching mask structure for aeration of X-ray and method for preparing same |
| 08/26/2009 | CN101515103A Electrophoretic display device and method of manufacturing electrophoretic display device |
| 08/26/2009 | CN101515081A Colorized film substrate and method for manufacturing same |
| 08/26/2009 | CN101515080A Colored filter and method for manufacturing same |
| 08/26/2009 | CN101515048A Backlight unit |
| 08/26/2009 | CN101514173A Polyhydric compound and chemically amplified resist composition containing the same |
| 08/26/2009 | CN100533710C Method of manufacturing a thin film transistor substrate and stripping composition |
| 08/26/2009 | CN100533686C Plating method |
| 08/26/2009 | CN100533662C Exposure apparatus and device producing method |
| 08/26/2009 | CN100533661C Determination method of exposure conditions, exposure method, exposure device and components manufacturing method |
| 08/26/2009 | CN100533279C Method for reducing residual polymer during low-temperature nitrogen/hydrogen ashing procedure |
| 08/26/2009 | CN100533278C Developing device for column spray developing and fog spray developing optionally |
| 08/26/2009 | CN100533277C Lithogaphic apparatus and positioning apparatus |
| 08/26/2009 | CN100533276C Mask protection film removing device and its method |
| 08/26/2009 | CN100533275C Method and apparatus for variable polarization control in a lithography system |
| 08/26/2009 | CN100533274C Exposure device |
| 08/26/2009 | CN100533273C Lithographic apparatus and device manufacturing method |
| 08/26/2009 | CN100533272C Smoothening method of rotary coating material layer and production of photoresist layer |
| 08/26/2009 | CN100533271C Photoresist compositions |
| 08/26/2009 | CN100533270C Apparatus for forming fine pattern |
| 08/26/2009 | CN100533269C Photoetching projection assembly, loading locking device and method for transferring a object |
| 08/26/2009 | CN100533213C Liquid crystal display panel and fabricating method thereof |
| 08/26/2009 | CN100533143C Evaluation method of resist composition using immersion solvent |
| 08/26/2009 | CN100532120C 平版印刷版前体和平版印刷方法 Lithographic printing plate precursor and lithographic methods |
| 08/26/2009 | CN100532119C Method for producing printing plate |
| 08/26/2009 | CN100532055C Capillary imprinting technique |
| 08/25/2009 | US7581203 Method and apparatus for manufacturing multiple circuit patterns using a multiple project mask |
| 08/25/2009 | US7580559 System and method for calibrating a spatial light modulator |
| 08/25/2009 | US7580197 Projection optical system and method for photolithography and exposure apparatus and method using same |
| 08/25/2009 | US7580114 Exposure apparatus and method for manufacturing device |
| 08/25/2009 | US7580111 Liquid for immersion exposure and immersion exposure method |
| 08/25/2009 | US7580088 Contact for semiconductor and display devices |
| 08/25/2009 | US7579622 Fabrication of MEMS devices with spin-on glass |
| 08/25/2009 | US7579386 Ink for printing on a game ball |
| 08/25/2009 | US7579308 Etching with organic ammonium compound and/or oxoammonium compound, water, and solvent |
| 08/25/2009 | US7579138 applying a coating film e.g acrylic acid-vinylpyrrolidone copolymer on a substrate having a resist pattern; heat-treating the coating film to narrow the resist pattern; completely removing th coating film, heat-treating the pattern narrowed by the first heating treatment in a second heat treatment |
| 08/25/2009 | US7579137 Method for fabricating dual damascene structures |
| 08/25/2009 | US7579135 Photoresists; semiconductors; immersion fluid between final optic and substrate |
| 08/25/2009 | US7579134 cover layer comprises polyamic acid precursor curable to an adhesive polyimide base polymer and an ethylenically unsaturated photo-monomer; avoiding unwanted curling of a flexible printed circuit |
| 08/25/2009 | US7579133 Processless lithographic printing plate precursor |
| 08/25/2009 | US7579132 giving patterns having high resolution and excellent exposure margin; fine processing of semiconductors; esterification; reacting sodium salt of difluorosulfoacetic acid with triphenylsulfonium chloride |
| 08/25/2009 | US7579131 Positive resist composition and method of forming resist pattern using the same |
| 08/25/2009 | US7579124 Pyrazolotriazole ring containing dye for improving heat resistance and photostability, curable monomers, alkali soluble ibinders, photosensitive azide compound, a crosslinking agent |
| 08/25/2009 | CA2353858C An exposure device |
| 08/20/2009 | WO2009102359A2 Nonlinear optical chromophores with stabilizing substituent and electro-optic devices |
| 08/20/2009 | WO2009101958A1 Illumination optical system, exposure device, device manufacturing method, correction filter, and exposure optical system |
| 08/20/2009 | WO2009101932A1 Photosensitive color composition, color filter and method for producing the same |
| 08/20/2009 | WO2009101885A1 Polyimide |
| 08/20/2009 | WO2009101878A1 Pattern forming method, semiconductor manufacturing apparatus and storage medium |
| 08/20/2009 | WO2009101869A1 Applying/developing apparatus, and applying/developing method |
| 08/20/2009 | WO2009101758A1 Curable resin composition for nanoimprint |
| 08/20/2009 | WO2009100895A1 Optical elements with gradient structure |
| 08/20/2009 | WO2009100867A1 Method and appartus for angular-resolved spectroscopic lithography characterization |
| 08/20/2009 | WO2009100862A1 Optcal system for a microlithographic projection exposure apparatus and microlithographic exposure method |
| 08/20/2009 | WO2009100856A1 Facet mirror for use in a projection exposure apparatus for microlithography |
| 08/20/2009 | WO2009083891A3 Pulse-width modulated amplifier for inverted planar motor |
| 08/20/2009 | WO2009061551A3 Distributed mask data preparation |
| 08/20/2009 | US20090209109 Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 08/20/2009 | US20090209105 Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus |
| 08/20/2009 | US20090208887 Removing solution for photosensitive composition |
| 08/20/2009 | US20090208886 Double patterning process |
| 08/20/2009 | US20090208885 Exposure apparatus, exposure method, and device manufacturing method |
| 08/20/2009 | US20090208884 Exposure apparatus |
| 08/20/2009 | US20090208883 Stage device, exposure apparatus, exposure method and device manufacturing method |
| 08/20/2009 | US20090208882 Stamp for patterning, method for manufacturing such stamp and method for manufacturing an object using the stamp |
| 08/20/2009 | US20090208881 Immersion ultraviolet photolithography process |
| 08/20/2009 | US20090208880 Process sequence for formation of patterned hard mask film (rfp) without need for photoresist or dry etch |
| 08/20/2009 | US20090208879 Substrate processing method, program, computer-readable recording medium, and substrate processing system |
| 08/20/2009 | US20090208878 Lithographic System, Lithographic Apparatus and Device Manufacturing Method |
| 08/20/2009 | US20090208877 Methods of making optical fiber gratings |
| 08/20/2009 | US20090208876 Long-length fiber Bragg creating sequential UV writing by probing phase mask |