| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/02/2009 | CN100535765C 6-freedom micro-motion platform capable of isolating exterior vibration |
| 09/02/2009 | CN100535764C Method for detecting target position corresponding to designated lighting intensity value |
| 09/02/2009 | CN100535763C Device for automatically focusing and leveling |
| 09/02/2009 | CN100535762C Silicon slice fixing part |
| 09/02/2009 | CN100535761C Lithography device sensor and detection method |
| 09/02/2009 | CN100535760C On-line testing apparatus of projection objective |
| 09/02/2009 | CN100535759C Method of determining semiconductor technological condition |
| 09/02/2009 | CN100535758C Control method and operation system for wet photoetching process |
| 09/02/2009 | CN100535757C Substrate processing apparatus |
| 09/02/2009 | CN100535756C Control method for coaxial alignment signal acquisition and processing, and key subsystem thereof |
| 09/02/2009 | CN100535755C Adaptive optimization method for coaxial-aligning vertical-scanning length |
| 09/02/2009 | CN100535754C Mask frame conveying device and exposure device |
| 09/02/2009 | CN100535753C Immersion lithography system, and method of performing irradiation to semiconductor structure having a photoresistive layer |
| 09/02/2009 | CN100535752C Coating apparatus and operating method thereof |
| 09/02/2009 | CN100535751C Coating and developing system and coating and developing method |
| 09/02/2009 | CN100535750C Polyamide acid-containing composition for forming antireflective film |
| 09/02/2009 | CN100535749C Chemically amplified positive photosensitive resin composition |
| 09/02/2009 | CN100535748C Red photoresist combination of color light filter used for LCD device and its application |
| 09/02/2009 | CN100535747C Photosensitive resin composition |
| 09/02/2009 | CN100535746C 光致抗蚀剂树脂组合物 The photoresist resin composition |
| 09/02/2009 | CN100535745C Phase conflict resolution for photolithographic masks |
| 09/01/2009 | US7583433 Multi mirror system for an illumination system |
| 09/01/2009 | US7582921 Semiconductor device and method for patterning |
| 09/01/2009 | US7582718 Multi-functional linear siloxane compound, a siloxane polymer prepared from the compound, and a process for forming a dielectric film by using the polymer |
| 09/01/2009 | US7582585 Coating compositions |
| 09/01/2009 | US7582414 exposing thin film to a radiation source in a liquid immersion lithography, rotating the substrate and remove fluids; baking; development; transferring pattern |
| 09/01/2009 | US7582413 photolithography for exposing semiconductor substrates; double exposure for enhancing the image resolution; controlling the lithographic exposure apparatus and spin-coat device |
| 09/01/2009 | US7582412 Multilayer photoresist systems |
| 09/01/2009 | US7582411 Antireflective film and exposure method |
| 09/01/2009 | US7582410 Laser-decomposable resin composition and pattern-forming material using the same |
| 09/01/2009 | US7582409 Negative resist composition and method of forming resist pattern |
| 09/01/2009 | US7582408 Color forming compositions with a fluoran leuco dye having a latent developer |
| 09/01/2009 | US7582407 Imageable elements with low pH developer solubility |
| 09/01/2009 | US7582406 Resin exhibits changed alkali solubility under action of acid, oxime sulfonate-based acid generator, amine, and organic acid, all dissolved in solvent comprising methyl n-amyl ketone; heat treatment; semiconductors |
| 09/01/2009 | US7582404 Photosensitive paste composition, PDP electrode manufactured using the composition, and PDP comprising the PDP electrode |
| 09/01/2009 | US7582398 Photochromic dye dispersed in and attached to ionic polymer; reversible transition between colorless and colored state in response to light; UV light causes color change; erasing by heating; stability; ink jet printers; toner-free; cost efficiency; disposable paper reused; environmentally friendly |
| 09/01/2009 | US7582397 Photomask, and method and apparatus for producing the same |
| 09/01/2009 | US7582394 Photomask and method for forming pattern |
| 09/01/2009 | US7582393 Charged-particle beam, X-ray, and extreme ultraviolet beam lithography masks |
| 09/01/2009 | US7582360 Microelectronic wafers having photosensitive antireflective polyester and photoresist multilayers used to form integrated circuits; relief images |
| 09/01/2009 | US7581305 Method of manufacturing an optical component |
| 09/01/2009 | CA2628782C Method of forming antenna for radio frequency identification medium employing conductive paste, and method for mounting ic chip onto circuit on substrate |
| 08/27/2009 | WO2009105347A2 Process sequence for formation of patterned hard mask film (rfp) without need for photoresist or dry etch |
| 08/27/2009 | WO2009105045A1 Patterning of nanostructures |
| 08/27/2009 | WO2009104962A1 Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method |
| 08/27/2009 | WO2009104748A1 Water-repellant composition for substrate to be exposed, method of forming resist pattern, electronic device produced by the formation method, method of imparting water repellency to substrate to be exposed, water-repellant set for substrate to be exposed, and method of imparting water repellency with the same to substrate to be exposed |
| 08/27/2009 | WO2009104727A1 Method for producing acrylate derivative, acrylate derivative, and intermediate thereof |
| 08/27/2009 | WO2009104726A1 (meth)acrylate derivative, intermediate thereof, and polymer compound |
| 08/27/2009 | WO2009104722A1 Acrylate ester derivatives and polymer compounds |
| 08/27/2009 | WO2009104717A1 Polymer compound |
| 08/27/2009 | WO2009104685A1 Composition for forming resist underlayer film and method for forming resist pattern using the same |
| 08/27/2009 | WO2009104680A1 Radiation-sensitive resin composition, cured product thereof, interlayer insulating film using the composition, and optical device |
| 08/27/2009 | WO2009104643A1 Photocurable film-forming composition and method of forming a photocurable film |
| 08/27/2009 | WO2009104552A1 Silicon-containing resist underlayer film-forming composition containing cyclic amino group |
| 08/27/2009 | WO2009104059A1 Multiplexing of pulsed sources |
| 08/27/2009 | WO2009103964A1 Laser processing a multi-device panel |
| 08/27/2009 | WO2009103631A1 Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material |
| 08/27/2009 | WO2009103485A2 Gas gauge compatible with vacuum environments |
| 08/27/2009 | WO2009083161A3 Folded optical encoder and applications for same |
| 08/27/2009 | WO2009061159A3 Colored dispersion, photoresist composition and black matrix |
| 08/27/2009 | WO2009019574A8 Photoresist composition for deep uv and process thereof |
| 08/27/2009 | WO2008139320A3 Antireflective coating compositions |
| 08/27/2009 | WO2006104100A8 Water purge agent, and method for resist pattern formation using the same |
| 08/27/2009 | US20090217218 Opc simulation model using socs decomposition of edge fragments |
| 08/27/2009 | US20090215659 Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings |
| 08/27/2009 | US20090215233 Photoresist composition and method of manufacturing array substrate using the same |
| 08/27/2009 | US20090215228 Wafer lever fixture and method for packaging micro-electro-mechanical-system devices |
| 08/27/2009 | US20090215156 Method for Fabricating Nanogap and Nanogap Sensor |
| 08/27/2009 | US20090214986 Lithographic apparatus and device manufacturing method |
| 08/27/2009 | US20090214985 Method for reducing surface defects on patterned resist features |
| 08/27/2009 | US20090214984 Methods for enhancing photolithography patterning |
| 08/27/2009 | US20090214983 Laser-engraveable flexographic printing plate precursors |
| 08/27/2009 | US20090214982 Positive resist composition, method of forming resist pattern, and polymeric compound |
| 08/27/2009 | US20090214981 Photoresists and methods for optical proximity correction |
| 08/27/2009 | US20090214980 Melts |
| 08/27/2009 | US20090214964 Semiconductor device manufacturing method, semiconductor device manufacturing equipment, and computer readable medium |
| 08/27/2009 | US20090214963 Substrate processing method, computer-readable storage medium, and substrate processing system |
| 08/27/2009 | US20090214962 Exposure apparatus |
| 08/27/2009 | US20090214960 Resist composition and patterning process |
| 08/27/2009 | US20090214959 Photoresist compositions and methods related to near field masks |
| 08/27/2009 | US20090214689 Imprint Lithography Templates Having Alignment Marks |
| 08/27/2009 | US20090214686 Formation of Conductive Templates Employing Indium Tin Oxide |
| 08/27/2009 | US20090213389 Wavefront aberration measuring method, mask, wavefront aberration measuring device, exposure apparatus, and device manufacturing method |
| 08/27/2009 | US20090213367 Transmissive element |
| 08/27/2009 | US20090213353 Lithographic Apparatus and Device Manufacturing Method |
| 08/27/2009 | US20090212963 Resistor structures to electrically measure unidirectional misalignment of stitched masks |
| 08/27/2009 | DE102008054779A1 Projection exposure system for use in microlithography for production of semiconductor components, has optical element statically deformable by force effect, where electrostatic force field acts between subelements of optical element |
| 08/27/2009 | DE102008011501A1 Verfahren zum Betreiben eines Beleuchtungssystems einer mikrolithographischen Projektionsbelichtungsanlage A method of operating an illumination system of a microlithographic projection exposure apparatus |
| 08/27/2009 | CA2711616A1 Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material |
| 08/26/2009 | EP2093616A1 Split and design guidelines for double patterning |
| 08/26/2009 | EP2093615A1 Method of ultraviolet photolithography by immersion |
| 08/26/2009 | EP2093614A1 Split and design guidelines for double patterning |
| 08/26/2009 | EP2093613A1 Composition for upper surface antireflection film, and method for pattern formation using the same |
| 08/26/2009 | EP2093612A1 A method of applying a pattern of metal, metal oxide and/or semiconductor material on a substrate |
| 08/26/2009 | EP2093611A2 Particle inspection apparatus, exposure apparatus, and device manufacturing method |
| 08/26/2009 | EP2093269A1 Photobase generator and photocurable resin composition |
| 08/26/2009 | EP2093213A1 Positive resist composition, method of forming resist pattern, and polymeric compound |
| 08/26/2009 | EP2093059A2 Extended print sleeve and method for preparing a printing form from the sleeve |
| 08/26/2009 | EP2092394A2 Radiation system and lithographic apparatus |
| 08/26/2009 | EP2092393A2 Double patterning for lithography to increase feature spatial density |