| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/08/2009 | US7585611 Photocurable and thermosetting resin composition, dry film using the same, and cured product thereof |
| 09/08/2009 | US7585610 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same |
| 09/08/2009 | US7585609 Bilayer film including an underlayer having vertical acid transport properties |
| 09/08/2009 | US7585599 Photomask, and method and apparatus for producing the same |
| 09/08/2009 | US7585421 Method of producing a sheet comprising through pores and the application thereof in the production of micronic and submicronic filters |
| 09/08/2009 | US7585418 Lithographic mask and manufacturing method thereof |
| 09/08/2009 | US7585334 Manufacturing method for molecular rulers |
| 09/08/2009 | CA2403730C Method and composition for removing sodium-containing material from microcircuit substrates |
| 09/08/2009 | CA2285317C Ternary photoinitiator system for curing of epoxy/polyol resin compositions |
| 09/03/2009 | WO2009108771A2 Methods of patterning a conductor on a substrate |
| 09/03/2009 | WO2009108543A2 Multi-photon exposure system |
| 09/03/2009 | WO2009107852A1 Substrate holding apparatus |
| 09/03/2009 | WO2009107734A1 Coloring resin composition for color filter, color filter, organic el display and liquid crystal display |
| 09/03/2009 | WO2009107510A1 Projection optical system, exposure apparatus and device manufacturing method |
| 09/03/2009 | WO2009107327A1 Monomer having electron-withdrawing substituent and lactone skeleton, polymeric compound, and photoresist composition |
| 09/03/2009 | WO2009107063A1 Debris mitigation device with rotating foil trap and drive assembly |
| 09/03/2009 | WO2009106306A1 A method for making a lithographic printing plate |
| 09/03/2009 | WO2009106291A1 Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby |
| 09/03/2009 | WO2009106279A1 Metrology method and apparatus, lithographic apparatus, and device manufacturing method |
| 09/03/2009 | WO2009106253A1 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| 09/03/2009 | WO2009106217A1 Method for operating an illumination system of a microlithographic projection exposure apparatus |
| 09/03/2009 | WO2009105888A1 Mfthod of calibrating light delivery systems, light delivery systems and radiometer for use therewith |
| 09/03/2009 | WO2009088177A3 Silicon-based hardmask composition (si-soh; si-based spin-on hardmask) and process of producing semiconductor integrated circuit device using the same |
| 09/03/2009 | US20090221845 Fluorinated compound, and fluoropolymer, process for its production and resist composition containing it |
| 09/03/2009 | US20090220898 Pattern forming method and method of manufacturing semiconductor device by using the same |
| 09/03/2009 | US20090220897 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide |
| 09/03/2009 | US20090220896 Pattern forming method |
| 09/03/2009 | US20090220895 Metrology of bilayer photoresist processes |
| 09/03/2009 | US20090220894 Semiconductor device manufacturing method |
| 09/03/2009 | US20090220893 Method for Patterning a Semiconductor Wafer |
| 09/03/2009 | US20090220892 Method of manufacturing semiconductor device, and resist coating and developing system |
| 09/03/2009 | US20090220891 Method of on-press developing overcoated lithographic printing plate |
| 09/03/2009 | US20090220890 Chemically amplified resist composition and chemically amplified resist composition for immersion lithography |
| 09/03/2009 | US20090220889 Photosensitive resin composition and method of forming pattern |
| 09/03/2009 | US20090220888 Dyed photoresists and methods and articles of manufacture comprising same |
| 09/03/2009 | US20090220887 Molecular Resists Based On Functionalized Polycarbocycles |
| 09/03/2009 | US20090220886 Polyhydric compound and chemically amplified resist composition containing the same |
| 09/03/2009 | US20090220874 Exposure apparatus and device manufacturing method |
| 09/03/2009 | US20090220872 Detecting apparatus, exposure apparatus, and device manufacturing method |
| 09/03/2009 | US20090220871 Device Manufacturing Method, Lithographic System, Lithographic Apparatus and Design for Manufacturing System |
| 09/03/2009 | US20090220870 Printing on the substrate a composite mask pattern based on features of dark-field mask and clear-field mask;developing printed patterns, obtaining measurements and determining the flare effect including line shortening; photolithography; semiconductors; transistors |
| 09/03/2009 | US20090220756 Reversible photo bleachable materials based on nano sized semiconductor particles and their optical applications |
| 09/03/2009 | US20090220753 Resin composition for laser engraving, resin printing plate precursor for laser engraving, relief printing plate and method for production of relief printing plate |
| 09/03/2009 | US20090220752 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate |
| 09/03/2009 | US20090220381 Imagewise patterning of films and devices comprising the same |
| 09/03/2009 | US20090219617 Short-wavelength polarizing elements and the manufacture and use thereof |
| 09/03/2009 | US20090219590 Method and apparatus for the production of polarization holograms |
| 09/03/2009 | US20090219504 Substrate conveyor apparatus, substrate conveyance method and exposure apparatus |
| 09/03/2009 | US20090219498 Illumination optical system, exposure apparatus, and device fabrication method |
| 09/03/2009 | US20090219496 Methods of Double Patterning, Photo Sensitive Layer Stack for Double Patterning and System for Double Patterning |
| 09/03/2009 | US20090218653 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device |
| 09/03/2009 | US20090218505 Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method |
| 09/03/2009 | DE112007002550T5 Fotolacke für EUV basierend auf photonischen Kristallen Resists for EUV based on photonic crystals |
| 09/03/2009 | DE102009007319A1 Verfahren zum Herstellen einer Halbleitervorrichtung oder Photomaske A method of manufacturing a semiconductor device or a photomask |
| 09/03/2009 | DE102008054581A1 Projection system for projection exposure system for manufacturing micro-and/or nanostructure semiconductor components, has carrier structure provided for supporting projection lens in floor and implemented for holding projection lens |
| 09/03/2009 | DE102004036747B4 Verfahren zur Herstellung einer Halbleitervorrichtung mit einer photoempfindlichen Polyimidschicht und entsprechend des Verfahrens hergestellte Vorrichtung A process for producing a semiconductor device having a photosensitive polyimide and produced in accordance with the process device |
| 09/02/2009 | EP2096495A1 Method of treating rinsing wastewater from developing apparatus for photosensitive lithographic printing plate, method of development, and developing apparatus |
| 09/02/2009 | EP2096494A1 Iterative learning for position control in an exposure apparatus |
| 09/02/2009 | EP2096493A1 Photosensitive element |
| 09/02/2009 | EP2095969A1 Laser engravable printing original plate |
| 09/02/2009 | EP2095948A1 A method for making a lithographic printing plate |
| 09/02/2009 | EP2095190A1 Lithographic apparatus, substrate table, and method for releasing a wafer |
| 09/02/2009 | EP2095188A1 Hardmask composition for processing resist underlayer film, process for producing semiconductor integrated circuit device using the hardmask composition, and semiconductor integrated circuit device produced by the process |
| 09/02/2009 | EP2095187A2 Method for patterning a surface |
| 09/02/2009 | EP2095065A2 Distance measuring interferometer and encoder metrology systems for use in lithography tools |
| 09/02/2009 | EP1910896B1 Photopolymer composition suitable for lithographic printing plates |
| 09/02/2009 | EP1780772B1 Exposure equipment and device manufacturing method |
| 09/02/2009 | EP1646912B1 High resolution, dynamic positioning mechanism |
| 09/02/2009 | EP1405120A4 Compact imaging head and high speed multi-head laser imaging assembly and method |
| 09/02/2009 | CN201302651Y Automatic forming device for micro-light curing thick film layer by layer |
| 09/02/2009 | CN201302650Y Aqua film for printing circuit boards |
| 09/02/2009 | CN101523297A Liquid composition for removing photoresist residue and polymer residue |
| 09/02/2009 | CN101523296A Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method |
| 09/02/2009 | CN101523295A Solution for treatment of resist substrate after development processing, and method for treatment of resist substrate using the same |
| 09/02/2009 | CN101523294A Catadioptric projection objective with pupil mirror. projection exposure apparatus and method |
| 09/02/2009 | CN101523293A Lithographic apparatus, and device manufacturing method |
| 09/02/2009 | CN101523292A Method for manufacturing semiconductor device using quadruple-layer laminate |
| 09/02/2009 | CN101523291A Process for semiconductor device production using under-resist film cured by photocrosslinking |
| 09/02/2009 | CN101523290A High resolution imaging process using an in-situ image modifying layer |
| 09/02/2009 | CN101523289A Photocurable compositions containing benzoyl formic ether type photoinitiator |
| 09/02/2009 | CN101521153A Method of manufacturing semiconductor device, and resist coating and developing system |
| 09/02/2009 | CN101521152A Pattern forming method and method of manufacturing semiconductor device by using the same |
| 09/02/2009 | CN101520612A Washing agent for color photoresist |
| 09/02/2009 | CN101520611A Lithographic apparatus and device manufacturing method |
| 09/02/2009 | CN101520610A Pattern describing apparatus and pattern describing method |
| 09/02/2009 | CN101520609A Method, inspection system, computer program and reference substrate for detecting mask defects |
| 09/02/2009 | CN101520608A Optical focus sensor, inspection apparatus and a lithographic apparatus |
| 09/02/2009 | CN101520607A Double-faced exposure architecture and double-faced exposure method of printed circuit board |
| 09/02/2009 | CN101520606A Non-contact long-stroke multi-degree-of-freedom nanometer precision working table |
| 09/02/2009 | CN101520605A Photosensitive linear resin composition and separator for liquid crystal display element |
| 09/02/2009 | CN101520604A Coloring curing composition, color filter and liquid display device |
| 09/02/2009 | CN101520603A Photosensitive resin compound, transfer printing material, optical spacer and preparation thereof, display device and substrate thereof |
| 09/02/2009 | CN101520602A Polyurethane which can develop by radiation curing and photoresistance constituent which can develop by radiation curing and contains the polyurethane |
| 09/02/2009 | CN101520601A Light shield for manufacturing colored filter and liquid crystal display device |
| 09/02/2009 | CN101520600A Method for preparing transparent nano imprinting template based on X-ray exposure technology |
| 09/02/2009 | CN101520599A Mask, design method thereof, as well as method for manufacturing array substrates thereby |
| 09/02/2009 | CN101520543A Deep ultraviolet projection photoetching object lens |
| 09/02/2009 | CN101520322A Telecentric measurement device and method |
| 09/02/2009 | CN101518672A Radiation device for photodynamic therapy |
| 09/02/2009 | CN100535766C Apparatus for processing photosensitive material and area measurement method |