| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 09/10/2009 | US20090226677 Lithographic apparatus and method |
| 09/10/2009 | US20090225422 Transfer of optical element patterns on a same side of a substrate already having a feature thereon |
| 09/10/2009 | US20090225410 Fluorescence Microscope |
| 09/10/2009 | US20090225331 Method of Providing Alignment Marks, Device Manufacturing Method and Lithographic Apparatus |
| 09/10/2009 | US20090225298 Optical element, projection optical system, exposure apparatus, and device fabrication method |
| 09/10/2009 | US20090225296 Projection objective of a microlithographic projection exposure apparatus |
| 09/10/2009 | US20090225286 Exposure apparatus, method for cleaning member thereof , maintenance method for exposure apparatus, maintenance device, and method for producing device |
| 09/10/2009 | US20090225285 Substrate processing method, computer storage medium and substrate processing system |
| 09/10/2009 | US20090224436 Imprint method and template for imprinting |
| 09/10/2009 | DE19905568B4 Polymergemisch für ein Photoresist und dieses Gemisch enthaltende Photoresistzusammensetzung Polymer mixture containing a photoresist and this mixture photoresist composition |
| 09/10/2009 | DE19724245B4 Flüssigkristallanzeige und Herstellungsverfahren dafür Liquid crystal display and manufacturing method thereof |
| 09/10/2009 | DE102009007111A1 Optische Baugruppe Optical assembly |
| 09/10/2009 | DE102009005230A1 Vorrichtung und Verfahren zum dynamischen Messen einer Abbildungsstabilität eines optischen Abbildungssystems Apparatus and method for dynamically measuring a mapping stability of an optical imaging system |
| 09/10/2009 | DE102006020991B4 Verfahren zum Herstellen eines Formkörpers aus Glas oder Glaskeramik A method for producing a molded article of glass or glass ceramic |
| 09/10/2009 | DE102004057759B4 Verfahren zur Reduzierung von Streulicht bedingten CD-Schwankungen A method for reducing stray light caused by CD variations |
| 09/09/2009 | EP2099066A1 Method for modulating shapes of substrates |
| 09/09/2009 | EP2098911A2 Stripper for dry film removal |
| 09/09/2009 | EP2098910A1 Wavefront aberration measuring apparatus, wavefront aberration measuring method, exposure apparatus, and device manufacturing method |
| 09/09/2009 | EP2098909A1 Connection device |
| 09/09/2009 | EP2098490A1 Method for finishing surface of preliminary polished glass substrate |
| 09/09/2009 | EP2098367A1 Sensitizer/Initiator Combination for Negative-Working Thermal-Sensitive Compositions Usable for Lithographic Plates |
| 09/09/2009 | EP2097790A2 Substrate processing apparatus and method |
| 09/09/2009 | EP2097789A2 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations |
| 09/09/2009 | EP1913443B1 Radiation-sensitive compositions and imageable materials |
| 09/09/2009 | EP1761822A4 A dynamic fluid control system for immersion lithography |
| 09/09/2009 | EP1449833B1 Bisimide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition |
| 09/09/2009 | CN201307215Y Positioning device of photoresistance dipping sprinkler head |
| 09/09/2009 | CN201307214Y Exposure mother panel of plasma display barrier wall and plasma display barrier wall |
| 09/09/2009 | CN101529338A Method of neutralizing developer waste liquid containing tetraalkylammonium hydroxide |
| 09/09/2009 | CN101529337A Cleaning method, apparatus and cleaning system |
| 09/09/2009 | CN101529336A Antireflective coating compositions |
| 09/09/2009 | CN101529335A Antireflective coating compositions |
| 09/09/2009 | CN101529334A Photosensitive resin composition, photosensitive film, and method for formation of pattern |
| 09/09/2009 | CN101529333A Photosensitive resin composition and photosensitive element using the same |
| 09/09/2009 | CN101529332A Photosensitive resin composition, insulating film, protective film, and electronic equipment |
| 09/09/2009 | CN101527255A Ultraviolet irradiation set and ultraviolet irradiation processing unit |
| 09/09/2009 | CN101526761A Image forming method, color filter and display apparatus |
| 09/09/2009 | CN101526760A Base plate processing system and developing method |
| 09/09/2009 | CN101526759A Exposure unit |
| 09/09/2009 | CN101526758A Projection exposure apparatus, exposure method, and element manufacture method |
| 09/09/2009 | CN101526757A A method of providing alignment marks on a substrate, device production and photoetching devices |
| 09/09/2009 | CN101526756A Photolithography device and method |
| 09/09/2009 | CN101526755A 193-nanometre immersed lithography illuminating system |
| 09/09/2009 | CN101526754A Mask-plate bearing bed and photo-etching device and double-exposure method thereof |
| 09/09/2009 | CN101526753A Parameter measuring method of worktable coordinate system |
| 09/09/2009 | CN101526752A Self-regulating exposure path programming method |
| 09/09/2009 | CN101526751A Flexible positioning structure with safety protection function |
| 09/09/2009 | CN101526750A Alignment system for photolithographic device and photolithographic device applying same |
| 09/09/2009 | CN101526749A Photolithographic system and method for measuring deviation between variable gap of photolithographic system and center of mask stage |
| 09/09/2009 | CN101526748A Memory device, method and aligning control system for photoetching aligning data detection |
| 09/09/2009 | CN101526747A Double workpiece platform device |
| 09/09/2009 | CN101526746A Vertical measuring system capable of adjusting zero-plane position |
| 09/09/2009 | CN101526745A Flexible connecting device and exposure platform using same |
| 09/09/2009 | CN101526744A Positioning access mechanism of mask |
| 09/09/2009 | CN101526743A Maskless exposure device |
| 09/09/2009 | CN101526742A Manufacturing method of liquid resin printing plate |
| 09/09/2009 | CN101526741A Radioactive ray sensitive composition, color filter and colourful liquid crystal display device for forming dyed layer |
| 09/09/2009 | CN101526740A Low-temperature curable photosensitive resin composition |
| 09/09/2009 | CN101526739A Radioactive ray sensitive composition, color filter and colourful liquid crystal display device for forming green pixel |
| 09/09/2009 | CN101526738A Photoresist composition and method for making array base plate using the same |
| 09/09/2009 | CN101526737A Immersion lithography compositions and immersion lithography method |
| 09/09/2009 | CN101526736A Laser direct rendering apparatus |
| 09/09/2009 | CN101526734A Photo mask material, photo mask and photo mask preparing method |
| 09/09/2009 | CN101526733A Multicolor photo mask and pattern transfer printing method using same |
| 09/09/2009 | CN101526707A TFT-LCD array base plate structure and manufacturing method thereof |
| 09/09/2009 | CN101526685A Color film substrate and manufacture method thereof |
| 09/09/2009 | CN101526683A Manufacturing method of LCD substrate |
| 09/09/2009 | CN101526657A Adjusting device of movable lens |
| 09/09/2009 | CN100539049C Graphic drawing device and method, detector for the device |
| 09/09/2009 | CN100539017C Developing device and developing method |
| 09/09/2009 | CN100538532C Pattern recognition and metrology structure for an X-initiative layout design |
| 09/09/2009 | CN100538531C Water-soluble resin composition and method of forming pattern therewith |
| 09/09/2009 | CN100538530C Reclaiming system for tetramethylammonium hydroxide developing liquid and method therefor |
| 09/09/2009 | CN100538529C Secondary exposure method using two photomasks in semiconductor production process |
| 09/09/2009 | CN100538528C Optical short distance amending method |
| 09/09/2009 | CN100538527C Multiple mask exposure system and method |
| 09/09/2009 | CN100538526C Light exposure apparatus |
| 09/09/2009 | CN100538525C Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/09/2009 | CN100538524C Projection optical system |
| 09/09/2009 | CN100538523C Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
| 09/09/2009 | CN100538522C Lithographic apparatus and integrated circuit manufacturing method |
| 09/09/2009 | CN100538521C Photoresist coating system |
| 09/09/2009 | CN100538520C Coating and developing apparatus and coating and developing method |
| 09/09/2009 | CN100538519C Coating and developing apparatus |
| 09/09/2009 | CN100538518C Sensitive and radiation resin composite, spacer for display panel and the display panel |
| 09/09/2009 | CN100538517C Negative resist composition for organic insulator of high aperture LCD |
| 09/09/2009 | CN100538516C Process control method and semiconductor manufacture method |
| 09/09/2009 | CN100538515C Thermosensitive laser sculpturing machine and its sculpturing method |
| 09/09/2009 | CN100538514C Device manufacturing method, lithographic apparatus, and robotics system and program |
| 09/09/2009 | CN100537676C Formation of self-assembled monolayers |
| 09/09/2009 | CN100537263C Method of producing photopolymerizable lithographic plate |
| 09/09/2009 | CN100537260C Printing plate precursor of negative thermal lithographic printing containing smooth aluminium carrier |
| 09/09/2009 | CN100537235C Imageable element with solvent-resistant polymeric binder |
| 09/09/2009 | CN100537053C Mask blanks and method of producing the same |
| 09/08/2009 | US7586620 Methods and systems for interferometric analysis of surfaces and related applications |
| 09/08/2009 | US7586564 Light-sensitive composition, light-sensitive transfer material, light shielding layer for display device, color filter, liquid crystal display element, and substrate having light shielding layer for display device and producing method thereof |
| 09/08/2009 | US7586218 Moving apparatus, exposure apparatus, and device manufacturing method |
| 09/08/2009 | US7585615 Composite photoresist for modifying die-side bumps |
| 09/08/2009 | US7585614 depositing a memory material on a semiconductor substrate; protecting an edge during undercutting etching for image transfer |
| 09/08/2009 | US7585613 Antireflection film composition, substrate, and patterning process |