| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/16/2009 | CN101535895A Photosensitive resin composition, and flexible print circuit board using the same |
| 09/16/2009 | CN101535894A Photosensitive resin composition for forming column spacer of liquid crystal display, method for forming column spacer using the composition, column spacer formed by the method, and display device com |
| 09/16/2009 | CN101535893A Solvent-assisted embossing of flexographic printing plates |
| 09/16/2009 | CN101535892A Relief layer and imprint method for making the same |
| 09/16/2009 | CN101534608A Manufacturing method of flexible circuit board |
| 09/16/2009 | CN101533795A Apparatus for conveying substrate |
| 09/16/2009 | CN101533773A Method for overcoming defect of wafer polymer |
| 09/16/2009 | CN101533257A Hologram substrate, method for producing same, and electronic device |
| 09/16/2009 | CN101533231A Off-axis alignment system and alignment method |
| 09/16/2009 | CN101533230A Anomaly detection method of UV photoresist hardening platform |
| 09/16/2009 | CN101533229A Reticle for projection exposure apparatus and exposure method using the same |
| 09/16/2009 | CN101533228A Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface |
| 09/16/2009 | CN101533227A Edge exposure adjusting device |
| 09/16/2009 | CN101533226A Leveling and focusing mechanism and microstage and workpiece stage using same |
| 09/16/2009 | CN101533225A Glass mask and position alignment apparatus of mask retainer |
| 09/16/2009 | CN101533224A Radiation-sensitive resin composition |
| 09/16/2009 | CN101533223A Colored curable resin composition, colored pattern forming method, colored pattern, method for manufacturing color filter, liquid crystal display element |
| 09/16/2009 | CN101533222A Photocurable coating composition, and overprint and process for producing same |
| 09/16/2009 | CN101533221A Light-sensitive composition, light-sensitive film, light-sensitive laminated body, permanent pattern forming method and printing circuit board |
| 09/16/2009 | CN101533220A Light-sensitive resin composition, light-sensitive resin transfer material, photospacer |
| 09/16/2009 | CN101533219A Imprint method and mold |
| 09/16/2009 | CN101533218A Method of lithography patterning |
| 09/16/2009 | CN101533216A Manufacturing method of a semiconductor device |
| 09/16/2009 | CN101533191A TFT-LCD array substrate structure and preparation method thereof |
| 09/16/2009 | CN101533176A A manufacturing method of liquid crystal display panel |
| 09/16/2009 | CN101533121A Optical film, die for forming optical film and method for manufacturing die |
| 09/16/2009 | CN101533005A Microflow distribution device, manufacturing method and application thereof |
| 09/16/2009 | CN101531950A Semi-aqueous stripping and cleaning composition containing aminobenzenesulfonic acid |
| 09/16/2009 | CN101531600A Quaternary ammonium hydroxide as well as preparation method and application thereof |
| 09/16/2009 | CN100541717C Exposure method, exposure apparatus, and device manufacture method |
| 09/16/2009 | CN100541338C Resist composition and organic solvent for removing resist |
| 09/16/2009 | CN100541337C Displacement device |
| 09/16/2009 | CN100541336C A device for generating light in the extreme ultraviolet and its application to a source for lithography using radiation in the extreme ultraviolet |
| 09/16/2009 | CN100541335C Device and method for manufacturing plate display device |
| 09/16/2009 | CN100541334C Lithographic apparatus having a gas flushing device |
| 09/16/2009 | CN100541333C Electronic beam exposure process sample wafer step-by-step positioning error dynamic compensating system |
| 09/16/2009 | CN100541332C Lithographic apparatus and methods for use thereof |
| 09/16/2009 | CN100541331C Imaging interference photo etching method adopting gated shutter and trapezoidal prism and photo etching system therefor |
| 09/16/2009 | CN100541330C Apparatus for heating coating film |
| 09/16/2009 | CN100541329C Positive resist containing naphthol functionality |
| 09/16/2009 | CN100541328C Production method for photosensitive resin composition and element and related members |
| 09/16/2009 | CN100541327C Liquid crystal display element random layer optical resistance composition |
| 09/16/2009 | CN100541326C Method and device for fabricating graphical stamp in nano grade |
| 09/16/2009 | CN100540320C Method and apparatus for micro-contact printing |
| 09/16/2009 | CN100540318C Image-recording apparatus and method |
| 09/16/2009 | CN100540277C Process for producing a tridimensional object with improved separation of hardened material layers from a structural surface |
| 09/15/2009 | US7590966 Data path for high performance pattern generator |
| 09/15/2009 | US7589911 Technique for positioning optical system element |
| 09/15/2009 | US7589823 Stage device, exposure apparatus, and method of manufacturing device |
| 09/15/2009 | US7589822 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| 09/15/2009 | US7589821 Exposure apparatus and device manufacturing method |
| 09/15/2009 | US7589820 Exposure apparatus and method for producing device |
| 09/15/2009 | US7589819 Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems |
| 09/15/2009 | US7589818 Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
| 09/15/2009 | US7589242 Use of highly purified hydrocarbons in vacuum ultraviolet applications |
| 09/15/2009 | US7589015 Fabrication of semiconductor devices using anti-reflective coatings |
| 09/15/2009 | US7588884 Enhancing the shallow alignment marks in a relatively thin layer such as the sensor layer so that subsequent layers such as write head layers can align directly to alignment marks created during the fabrication of the relatively thin layer; forming an oversized trench in the target area; photolithography |
| 09/15/2009 | US7588882 Method for fabricating complex three-dimensional structures on the submicrometric scale by combined lithography of two resists |
| 09/15/2009 | US7588880 Phenylglyoxylic acid type of low volatility, excellent initiator properties, dark-storage stability of formulations; used in thermally and photochemically curable component mixtures; binds in coating to prevent migration; addition-condensation polymers; photoresists; electronics; inks; adhesives; cables |
| 09/15/2009 | US7588879 Graded spin-on organic antireflective coating for photolithography |
| 09/15/2009 | US7588878 Photoacid generator, and an acid-base indicator, irradiation forms an image; reduces cost of ink cartridges in ink jet printing |
| 09/15/2009 | US7588877 A cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, an organic solvent, and a mother-glass powder; improved adhesion to an inorganic material and an organic material; fineness |
| 09/15/2009 | US7588876 Resist material and pattern formation method |
| 09/15/2009 | US7588870 Dual layer workpiece masking and manufacturing process |
| 09/15/2009 | US7588869 Divided exposure method for making a liquid crystal display |
| 09/15/2009 | US7588863 Producing a latent image by holographic exposure; andcausing a polymerization reaction due to the latent image, so as to form a first interference fringe providing a refractive index modulation |
| 09/15/2009 | CA2515989C Curable resin composition |
| 09/15/2009 | CA2454963C Parallel, individually addressable probes for nanolithography |
| 09/11/2009 | WO2009110982A1 Methods of making extrusion dies |
| 09/11/2009 | WO2009110793A1 Lithographic apparatus, plasma source, and reflecting method |
| 09/11/2009 | WO2009110787A1 Lithographic apparatus and method |
| 09/11/2009 | WO2009110764A2 Positive photosensitive polyimide composition |
| 09/11/2009 | WO2009110582A1 Semiconductor surface treating agent composition and method for treating semiconductor surface using the semiconductor surface treating agent composition |
| 09/11/2009 | WO2009110388A1 Radiation-sensitive composition, polymer and monomer |
| 09/11/2009 | WO2009110202A1 Moving device and exposure device |
| 09/11/2009 | WO2009110166A1 Resist material and pattern forming method using the same |
| 09/11/2009 | WO2009110046A1 Method for processing work having photoresist layer |
| 09/11/2009 | WO2009109685A1 Plasmonic nanocomposites based on polymer and metal nanoparticles for lithographic use |
| 09/11/2009 | WO2009109579A1 Sensitizer/initiator combination for negative-working thermal-sensitive compositions usable for lithographic plates |
| 09/11/2009 | WO2007110777A3 Lithographic apparatus and patterning device |
| 09/10/2009 | US20090227483 Stripper For Dry Film Removal |
| 09/10/2009 | US20090227112 Exposure mask manufacturing method, drawing apparatus, semiconductor device manufacturing method, and mask blanks product |
| 09/10/2009 | US20090227111 Barrier film material and pattern formation method using the same |
| 09/10/2009 | US20090227075 Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same |
| 09/10/2009 | US20090227058 Photoresist composition and method of manufacturing array substrate using the same |
| 09/10/2009 | US20090227057 Electronic component and display device and a method of manufacturing the same |
| 09/10/2009 | US20090226851 (meth)acrylate, polymer and resist composition |
| 09/10/2009 | US20090226850 laminating support having upper surface on which copper exists, inorganic substance layer, and photoresist layer consisting of chemically amplified type positive photoresist composition to obtain photoresist laminate, selectively irradiating active light or radioactive rays to photoresist to form pattern |
| 09/10/2009 | US20090226849 Exposure apparatus and device manufacturing method |
| 09/10/2009 | US20090226848 Method of manufacturing light receiving device |
| 09/10/2009 | US20090226847 Method of reducing photoresist defects during fabrication of a semiconductor device |
| 09/10/2009 | US20090226846 Exposure Apparatus, Exposure Method, and Device Manufacturing Method |
| 09/10/2009 | US20090226845 Printing Element with an Integrated Printing Surface |
| 09/10/2009 | US20090226844 thickeners contains polyvinyl alcohol, polyvinyl acetal, or polyvinyl acetate with 2-hydroxybenzyl alcohol; water solubility and alkali-solubility; utilize ArF excimer laser light, thickening the resist pattern and forming a fine space pattern; cost efficiency, industrial scale |
| 09/10/2009 | US20090226843 Monomer, resist composition, and patterning process |
| 09/10/2009 | US20090226842 Resist composition and method of forming resist pattern |
| 09/10/2009 | US20090226841 Photosensitive planographic printing plate and fabrication process thereof |
| 09/10/2009 | US20090226824 Hardmask composition and associated methods |
| 09/10/2009 | US20090226823 Reticles including assistant structures, methods of forming such reticles, and methods of utilizing such reticles |
| 09/10/2009 | US20090226822 Recording medium |