| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/22/2009 | US7592123 Excellent resolution and line edge roughness characteristics; resin has a hydroxyl group bonded to a carbon atom at a polymer terminal, and the carbon atom in the alpha -position to the hydroxy group has at least one electron attractive group |
| 09/22/2009 | US7592122 Used in patterning of semiconductor integrated circuit by lithography; a low-molecular compound and a high-molecular compound for constituting photoresist composition, excellent in transparency in fine patterning with light source having a wavelength of 300 nm or less, especially a F2 excimer laser |
| 09/22/2009 | US7592121 Antireflection film, polarizing plate and display device |
| 09/22/2009 | US7592120 Structured thermal transfer donors |
| 09/22/2009 | US7592119 Photosensitive polyimide resin composition |
| 09/22/2009 | US7592118 Positive resist composition and pattern forming method using the same |
| 09/22/2009 | US7592108 preparing a photomask for near-field exposure, having a light blocking film; position detection; producing a fine metal pattern having a small positional deviation with respect to the Si pattern on the insulating film; high yield |
| 09/22/2009 | US7592107 Polarized reticle, photolithography system, and method of fabricating a polarized reticle |
| 09/22/2009 | US7592103 Electron beam writing method and lithography mask manufacturing method |
| 09/22/2009 | US7591601 Coater/developer, coating/developing method, and storage medium |
| 09/22/2009 | US7591270 Reducing defects in the manufacture of semiconductor devices by contacting with acetylenic diol derivatives, amines, hydroxyamine modified polyethers, esters, quaternaryammonium compounds as surfactant, aqueous (water)and nonaqueous (ethanol, methanol, tetrahydrofuran etc) solvents |
| 09/17/2009 | WO2009114572A2 Phototools having a protective layer |
| 09/17/2009 | WO2009114253A2 Immersion lithography using hafnium-based nanoparticles |
| 09/17/2009 | WO2009114164A1 Low chlorine epoxy resin formulations |
| 09/17/2009 | WO2009114058A1 Plate pallet alignment system |
| 09/17/2009 | WO2009114056A1 Negative-working imageable elements with improved abrasion resistance |
| 09/17/2009 | WO2009113735A1 Resist composition and pattern forming method using the same |
| 09/17/2009 | WO2009113508A1 Novel salt having fluorine-containing carbanion structure, derivative thereof, photoacid generator, resist material using the photoacid generator, and pattern forming method |
| 09/17/2009 | WO2009113490A1 Radiation-sensitive resin composition |
| 09/17/2009 | WO2009113459A1 Photosensitive polyorganosiloxane composition |
| 09/17/2009 | WO2009113447A1 Colored curable composition, color filter and solid-state imaging device |
| 09/17/2009 | WO2009113378A1 Method for making lithographic printing original plate |
| 09/17/2009 | WO2009113275A1 Radiation-sensitive composition for the formation of colored layers, color filters, and color liquid crystal displays |
| 09/17/2009 | WO2009113272A1 Mold processing method and mold manufacturing method |
| 09/17/2009 | WO2009113228A1 Monomer having lactone skeleton, polymer compound and photoresist composition |
| 09/17/2009 | WO2009113169A1 Multi-column electron beam photolithography system |
| 09/17/2009 | WO2009112704A1 Device for the inspection of semiconductor wafers |
| 09/17/2009 | WO2009112456A1 Test structures for checking the positional precision in microelectronic circuits |
| 09/17/2009 | WO2009112239A1 Method and arrangement for displacement |
| 09/17/2009 | WO2008125074A3 Biocompatible radiation-curable formulation for the generative production of medical products, particularly adaptive ear pieces and dental mouldings, by means of image projection systems |
| 09/17/2009 | US20090233244 Method and system for overlay correction during photolithography |
| 09/17/2009 | US20090233243 Structure for pattern formation, method for pattern formation, and application thereof |
| 09/17/2009 | US20090233242 improved line edge roughness (LER) without sacrificing resolution; photoresists; immersion lithography; (meth)acrylic esters linked trough an alkyl chain conntect via another ester to a tricyclic lactone ring, such as 2,6-norbornane carbolactone |
| 09/17/2009 | US20090233241 Method of Optical Fabrication of Three-Dimensional Polymeric Structures With Out of Plane Profile Control |
| 09/17/2009 | US20090233240 Method of fabricating Triode-Structure field-emission device |
| 09/17/2009 | US20090233238 Double Patterning Strategy For Contact Hole and Trench in Photolithography |
| 09/17/2009 | US20090233237 Process For Preparing Conductive Material |
| 09/17/2009 | US20090233236 Method for fabricating self-aligned nanostructure using self-assembly block copolymers, and structures fabricated therefrom |
| 09/17/2009 | US20090233235 Method of making a lithographic printing plate |
| 09/17/2009 | US20090233234 Holding apparatus, position detection apparatus and exposure apparatus, moving method, position detection method, exposure method, adjustment method of detection system and device manufacturing method |
| 09/17/2009 | US20090233233 Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same |
| 09/17/2009 | US20090233232 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process |
| 09/17/2009 | US20090233231 Photosensitive resin composition |
| 09/17/2009 | US20090233230 Photosensitive Resin Composition and Laminates |
| 09/17/2009 | US20090233229 Lithographic printing plate precursor and method of lithographic printing |
| 09/17/2009 | US20090233228 A photo-acid generator, a terpene compound in combination with of a hydroxypolyamide which undergoes cyclization upoon curing to become a polybenzoxazole; semiconductors; excellant positive lithography performance such as sensitivity and resolution |
| 09/17/2009 | US20090233227 Negative-working imageable elements with improved abrasion resistance |
| 09/17/2009 | US20090233226 Photopatternable dielectric materials for beol applications and methods for use |
| 09/17/2009 | US20090233225 Low chlorine epoxy resin formulations |
| 09/17/2009 | US20090233224 Compositions and processes for photolithography |
| 09/17/2009 | US20090233223 Sulfonium salt-containing polymer, resist composition, and patterning process |
| 09/17/2009 | US20090233222 Lithographic printing plate precursor |
| 09/17/2009 | US20090233221 Negative-working photosensitive material and negative-working planographic printing plate precursor |
| 09/17/2009 | US20090233220 resist pattern with reduced defects and excellent lithographic characteristics; acrylate ester copolymer obtained by polymerizing an ( alpha -lower alkyl)acrylate ester having tertiary alkyl ester-type acid dissociable dissolution inhibiting group, under a presence of acid |
| 09/17/2009 | US20090233195 Linewidth measuring method, image-forming-state detecting method, adjustment method, exposure method, and device manufacturing method |
| 09/17/2009 | US20090233194 determining an optical parameter by using an optical simulator which calculates a resist image to be formed on a resist on a substrate, based on the optical parameter of an exposure apparatus which transfers a pattern of a mask onto the substrate, a simulator which calculates a process image formed |
| 09/17/2009 | US20090233190 Mask blank and method for manufacturing transfer mask |
| 09/17/2009 | US20090233189 Device and method for obtaining exposure correction information, and manufacturing method of semiconductor device |
| 09/17/2009 | US20090233187 Designing method of photo-mask and method of manufacturing semiconductor device using the photo-mask |
| 09/17/2009 | US20090233186 Scattering bar opc application method for sub-half wavelength lithography patterning field of the invention |
| 09/17/2009 | US20090233184 Manufacturing method of a semiconductor device |
| 09/17/2009 | US20090233183 improve the depth of focus margin to allow for the high integration of a semiconductor device; light blocking pattern having first and second patterns, and an assist feature disposed between the first and second patterns and including a dot pattern |
| 09/17/2009 | US20090233182 Photomask blank and method of producing the same, method of producing photomask, and method of producing semiconductor device |
| 09/17/2009 | US20090233181 Porous holographic film |
| 09/17/2009 | US20090233050 Fabrication of a printhead integrated circuit attachment film by photopatterning |
| 09/17/2009 | US20090233014 Photoactive Film, Its Preparation And Use, And Preparation Of Surface Relief And Optically Anisotropic Structures By Irradiating Said Film |
| 09/17/2009 | US20090232928 Method of Manufacturing Stamper, and Stamper |
| 09/17/2009 | US20090231979 Optical recording medium |
| 09/17/2009 | US20090231714 Transparent anti-reflective article and method of fabricating same |
| 09/17/2009 | US20090231648 Hologram substrate, method for producing same, and electronic device |
| 09/17/2009 | US20090231584 Periodic patterns and technique to control misaligment between two layers |
| 09/17/2009 | US20090231564 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| 09/17/2009 | US20090231559 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| 09/17/2009 | US20090231558 Monitoring apparatus and method particularly useful in photolithographically processing substrates |
| 09/17/2009 | US20090231521 Method for producing partition wall for color filter, substrate with partition wall for color filter, color filter for display element, and display device |
| 09/17/2009 | US20090230571 Masking of repeated overlay and alignment marks to allow reuse of photomasks in a vertical structure |
| 09/17/2009 | US20090229629 Stripper For Copper/Low k BEOL Clean |
| 09/17/2009 | DE102008054683A1 Optical system for microlithographic projection exposure system, has partial sections to which distinct-polarization states are assigned, which remain obtained by sections so that light enters in sections with two input-polarization states |
| 09/16/2009 | EP2101219A1 Stripper for copper/low K BEOL clean |
| 09/16/2009 | EP2101218A1 Method for preparing lithographic printing plate and lithographic printing plate precursor |
| 09/16/2009 | EP2101217A1 Sulfonium salt-containing polymer, resist compositon, and patterning process |
| 09/16/2009 | EP2101216A2 Imprint method and mold |
| 09/16/2009 | EP2101209A1 Symmetrical objective having four lens groups for microlithography |
| 09/16/2009 | EP2100907A1 Resin composition for printing plate |
| 09/16/2009 | EP2100887A1 Lactone-containing compound, polymer, resist composition, and patterning process |
| 09/16/2009 | EP2100870A1 Compound and radiation-sensitive composition |
| 09/16/2009 | EP2100731A2 Lithographic printing plate precursor and method of lithographic printing |
| 09/16/2009 | EP2100192A2 Devices and methods for pattern generation by ink lithography |
| 09/16/2009 | EP2100191A1 Optical element and illumination optics for microlithography |
| 09/16/2009 | EP2100190A1 Illuminating optical unit and projection exposure apparatus for microlithography |
| 09/16/2009 | EP2100189A2 Method for determination of residual errors |
| 09/16/2009 | EP1771773B1 Defect repair device and defect repair method |
| 09/16/2009 | EP1449284B1 Timing control for two-chamber gas discharge laser system |
| 09/16/2009 | CN201311548Y Development processing equipment |
| 09/16/2009 | CN201311547Y Dustless equipment structure |
| 09/16/2009 | CN101535900A Process for preparing a polymeric relief structure |
| 09/16/2009 | CN101535899A Optical arrangement for immersion lithography with a hydrophobic coating and projection exposure apparatus comprising the same |
| 09/16/2009 | CN101535898A A method and a system for reducing overlay errors within exposure fields by APC control strategies |
| 09/16/2009 | CN101535897A Composition for upper surface antireflection film, and method for pattern formation using the same |
| 09/16/2009 | CN101535896A Photosensitive resin composition, cured product thereof, and method for producing photosensitive resin |