| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/29/2009 | US7595142 Photoresists films with patterns formed by exposure to radiation or light and development |
| 09/29/2009 | US7595141 Composition for coating over a photoresist pattern |
| 09/29/2009 | US7594801 Chemical liquid apparatus and deaerating method |
| 09/29/2009 | US7594680 Identification documents with enhanced security |
| 09/24/2009 | WO2009117252A1 Method and apparatus for detecting non-uniform fracturing of a photomask shape |
| 09/24/2009 | WO2009117103A2 Split field inspection system using small catadioptric objectives |
| 09/24/2009 | WO2009116724A1 Positive photosensitive resin composition |
| 09/24/2009 | WO2009116632A1 Photosensitive resin composition, photosensitive resin laminate, method for resist pattern formation, and process for producing printed wiring board, lead frame, semiconductor package, and substrate with concaves and convexes |
| 09/24/2009 | WO2009116625A1 Cleaning tool, cleaning method and device manufacturing method |
| 09/24/2009 | WO2009116434A1 Coloring curable composition, color filter and method for producing color filter |
| 09/24/2009 | WO2009116401A1 Photosensitive resin composition, and photosensitive element, solder resist and printed wiring board each using the composition |
| 09/24/2009 | WO2009116258A1 Photosensitive resin composition, film for photosensitive resin spacer, and semiconductor device |
| 09/24/2009 | WO2009116244A1 Green pixel, radiation-sensitive composition for green pixel formation, color filter, and color liquid crystal display element |
| 09/24/2009 | WO2009116182A1 Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board |
| 09/24/2009 | WO2009115370A1 Cleaning module, euv lithography device and method for the cleaning thereof |
| 09/24/2009 | WO2009115362A1 Lighting system for a microlithography projection exposure installation |
| 09/24/2009 | WO2009115342A1 Inspection apparatus for lithography |
| 09/24/2009 | WO2009115329A1 Method and apparatus for measuring of masks for the photo-lithography |
| 09/24/2009 | WO2009115205A1 Actuator system, lithographic apparatus, and device manufacturing method |
| 09/24/2009 | WO2009115180A1 Projection objective for microlithography |
| 09/24/2009 | WO2009114964A1 Solution preparation apparatus and method for treating individual semiconductor workpiece |
| 09/24/2009 | WO2009090007A3 Illumination system of a microlithographic projection exposure apparatus |
| 09/24/2009 | WO2009089158A3 Functionalized fullerenes for nanolithography applications |
| 09/24/2009 | US20090239732 Optical component quartz glass |
| 09/24/2009 | US20090239342 Thin Film Transistor Substrate of Horizontal Electric Field Type Liquid Crystal Display Device and Fabricating Method Thereof |
| 09/24/2009 | US20090239179 Hydroxyl-containing monomer, polymer, resist composition, and patterning process |
| 09/24/2009 | US20090239178 Optical attenuator plate, exposure apparatus, exposure method, and device manufacturing method |
| 09/24/2009 | US20090239177 Mask pattern data generation method, mask manufacturing method, semiconductor device manufacturing method, and pattern data generation program |
| 09/24/2009 | US20090239176 Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin |
| 09/24/2009 | US20090239175 Stereolithographic Resins Containing Selected Oxetane Compounds |
| 09/24/2009 | US20090239160 Method for preparing data for exposure and method for manufacturing photo mask |
| 09/24/2009 | US20090239159 Photomask, apparatus for manufacturing semiconductor device having the photomask, and method of manufacturing semiconductor device using the photomask |
| 09/24/2009 | US20090239155 Fluorine-passivated reticles for use in lithography and methods for fabricating the same |
| 09/24/2009 | US20090239080 Photosensitive insulation resin composition and cured product thereof |
| 09/24/2009 | US20090239042 Material Assisted Laser Ablation |
| 09/24/2009 | US20090238514 Optical waveguide having grating and method of forming the same |
| 09/24/2009 | US20090237451 Inkjet print head and manufacturing method thereof |
| 09/24/2009 | US20090236627 Method of forming metal wiring |
| 09/24/2009 | US20090236137 Method for Forming Resist Pattern, Method for Producing Circuit Board, and Circuit Board |
| 09/24/2009 | US20090236129 Methods for reducing corrosion on printed circuit boards |
| 09/24/2009 | US20090235835 Method and apparatus for processing flexographic printing plates |
| 09/24/2009 | DE112007002430T5 Kontaktlithographievorrichtung, -System und -Verfahren Contact lithography apparatus, system and method |
| 09/24/2009 | DE102008011354B3 Verfahren zum Verbinden zweier Komponenten zu einer Verbundstruktur durch "fusion bonding" sowie damit hergestellte Verbundstruktur, optisches Element, Haltevorrichtung, Projektionsobjektiv und Projektionsbelichtungsanlage A method for connecting two components into a composite structure by "fusion bonding", as well as thus prepared composite structure optical element holding device, projection lens and the projection exposure apparatus |
| 09/24/2009 | DE102008000800A1 Projection lens for use in projection illumination system for microlithography, has six mirrors including free-form reflection surfaces, where ratio of overall length of lens and object-image offset is smaller than specific value |
| 09/24/2009 | DE102008000788A1 Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage Illumination system for a microlithography projection exposure apparatus |
| 09/23/2009 | EP2103994A1 Automatic processing apparatus for making lithographic printing plate |
| 09/23/2009 | EP2103993A1 Automatic processing for making lithographic printing plate |
| 09/23/2009 | EP2103992A2 Information recording medium and method of manufacturing the same |
| 09/23/2009 | EP2103966A2 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor |
| 09/23/2009 | EP2103592A2 Hydroxyl-containing monomer, polymer, resist composition, and patterning process |
| 09/23/2009 | EP2102907A2 High-z structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels |
| 09/23/2009 | EP2102895A1 Device and method for wet treating plate-like-articles |
| 09/23/2009 | EP2102711A1 Exposure appararus |
| 09/23/2009 | EP2102710A2 Strategy for control of recirculated exhaust gas to null turbocharger boost error |
| 09/23/2009 | EP2102709A2 Pigment-dispersed composition, curable composition, color filter and production method thereof |
| 09/23/2009 | EP2102708A1 Curable composition, color filter, and manufacturing method of the same |
| 09/23/2009 | EP2102257A1 Directly photodefinable polymer compositions and methods thereof |
| 09/23/2009 | EP1554621B1 Optical imaging device designs for solar-powered flight and powergeneration |
| 09/23/2009 | EP1478978B1 Self-aligned pattern formation using dual wavelengths |
| 09/23/2009 | CN101542394A Photosensitive siloxane composition, hardened film formed therefrom and device having the hardened film |
| 09/23/2009 | CN101542393A Colored resin composition, color filter, liquid crystal display device, and organic el display |
| 09/23/2009 | CN101542392A Photocurable resin composition, dry film, cured product, and printed wiring board |
| 09/23/2009 | CN101542391A 平版印刷版材料 Lithographic printing plate material |
| 09/23/2009 | CN101542390A Double patterning for lithography to increase feature spatial density |
| 09/23/2009 | CN101540288A Method for printing a metal paste, metal mask, and bump forming method |
| 09/23/2009 | CN101539725A Method for coarse wafer alignment in a lithographic apparatus |
| 09/23/2009 | CN101539724A Method for forming photoresist layer |
| 09/23/2009 | CN101539723A Radioactive ray sensitive composition for forming coloured layer, colour filter and colourful liquid crystal display element |
| 09/23/2009 | CN101539722A Coating compositions for use with an overcoated photoresist |
| 09/23/2009 | CN101539721A Frequency doubling using a photo-resist template mask |
| 09/23/2009 | CN101539720A Photomask, system for manufacturing semiconductor device, and method of manufacturing semiconductor device |
| 09/23/2009 | CN101539719A Manufacturing method of vibration amplitude mask template used for manufacturing sampling fiber grating |
| 09/23/2009 | CN101539697A Thin-film transistor liquid crystal display pixel structure and manufacturing method thereof |
| 09/23/2009 | CN101539568A Ice grip/photolithographic device for cooling/heating probes by convective heat transfer with gas |
| 09/23/2009 | CN101538348A Active energy ray solidification type resin composition using reactivity compound with fire retardance and condensate thereof |
| 09/23/2009 | CN101537762A Method for manufacturing home decoration stickers |
| 09/23/2009 | CN100543590C Polymer-stripping composition |
| 09/23/2009 | CN100543589C Decompression dry device |
| 09/23/2009 | CN100543588C A method of generating a mask having optical proximity correction features and parts manufacturing method |
| 09/23/2009 | CN100543587C Detector and its detection method |
| 09/23/2009 | CN100543586C Apparatus and method for reducing contamination in immersion lithography |
| 09/23/2009 | CN100543585C Coloring composite for color filter and color filter |
| 09/23/2009 | CN100543584C Composition for forming antireflection coating |
| 09/23/2009 | CN100543583C Method of covering and patterning nanometer structure on sensitive material surface |
| 09/22/2009 | USRE40920 Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers |
| 09/22/2009 | US7594199 Method of optical proximity correction design for contact hole mask |
| 09/22/2009 | US7593095 System for reducing the coherence of laser radiation |
| 09/22/2009 | US7593093 Lithographic apparatus and device manufacturing method |
| 09/22/2009 | US7593092 Lithographic apparatus and device manufacturing method |
| 09/22/2009 | US7592610 Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 09/22/2009 | US7592598 Illumination system particularly for microlithography |
| 09/22/2009 | US7592132 Restricting thickness of crosslinked film and preventing developing defects by using super fine pattern-forming material which contains solvent composed of water-soluble resin, water-soluble crosslinking agent, and water or water and water-soluble organic solvent, and amine compound-containing developer |
| 09/22/2009 | US7592131 Irradiation polymerization of polymethacrylic anhydride; improved positive accuracy; for ink jet recording |
| 09/22/2009 | US7592130 Illumination improves imaging for hybrid pattern with a sufficient depth of focus by having a mask with a contact hole pattern including a hybrid pattern and using an illumination light that has plural poles and projecting an image of the mask onto a plate through projection optics |
| 09/22/2009 | US7592129 Method for forming photoresist pattern and method for manufacturing semiconductor device |
| 09/22/2009 | US7592128 Printing plate precursors; polymerizable component, free radical initiator, an infrared radiation absorbing compound, and a polymer binder; where the imageable layer is removable prior to irradiation only when contacted with either water or a fountain solution and a lithographic printing ink |
| 09/22/2009 | US7592127 Resist pattern thickening material, resist pattern and process for forming the same, and semiconductor device and process for manufacturing the same |
| 09/22/2009 | US7592126 Comprising resin insoluble or sparingly soluble in an alkali but capable of decomposing under action of an acid to increase solubility in an alkali developer, the resin having a beta (meth)acroyloxy-gamma -butyrolactone repeating unit, and compound capable of generating an organic acid |
| 09/22/2009 | US7592125 Chemically-amplified positive photoresist compositions that contain a photoactive component and blend of at least two distinct resins; a first resin that comprises hydroxy naphthyl groups and a second cross-linked resin; reduced line edge roughness |
| 09/22/2009 | US7592124 Photosensitive element, photosensitive element roll, process for the preparation of resist pattern using the same, resist pattern, resist pattern laminated substrate, process for the preparation of wiring pattern and wiring pattern |