| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/01/2009 | US20090246697 Method of processing overcoated lithographic printing plate |
| 10/01/2009 | US20090246696 Planographic printing plate precursor and plate making method using the same |
| 10/01/2009 | US20090246695 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound |
| 10/01/2009 | US20090246694 Novel photoacid generator, resist composition, and patterning process |
| 10/01/2009 | US20090246693 Negative-working lithographic printing plate precursor and method of lithographic printing using same |
| 10/01/2009 | US20090246692 Lithographic printing plate precursor |
| 10/01/2009 | US20090246691 Antireflective Coating Composition |
| 10/01/2009 | US20090246690 Lithographic printing plate precursor |
| 10/01/2009 | US20090246689 Processless lithographic printing plate precursor |
| 10/01/2009 | US20090246688 Negative-working lithographic printing plate precursor and method of lithographic printing using same |
| 10/01/2009 | US20090246686 Polymer, polymer preparation method, resist composition and patterning process |
| 10/01/2009 | US20090246685 Positive resist composition for electron beam, x-ray or euv and pattern forming method using the same |
| 10/01/2009 | US20090246684 Propylene oxide ether adduct, oligomer or polymer capped on one end with 4'-carboxybiphenyl 4''''-hydroxybiphenylcarboxylate esterified with a tertiary alkanol or cycloalkanol such as 2-methyl-2-hydroxyadamantane; smaller size than conventional photoresist polymers; can form a nano-assembly |
| 10/01/2009 | US20090246683 Reduced line width roughness; sulfonium-containing acid generators; semiconductors; liquid crystal displays |
| 10/01/2009 | US20090246671 Developer and processing method for light sensitive planographic printing plate material |
| 10/01/2009 | US20090246655 Electron beam writing apparatus and method |
| 10/01/2009 | US20090246654 Method for evaluating lithography apparatus and method for controlling lithography apparatus |
| 10/01/2009 | US20090246653 Relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate |
| 10/01/2009 | US20090246651 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor |
| 10/01/2009 | US20090246650 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor |
| 10/01/2009 | US20090246649 Green curable composition, color filter and method of producing same |
| 10/01/2009 | US20090246643 Photosensitive composition containing organic-zirconia composite fine particles |
| 10/01/2009 | US20090246642 Holographic detection of analyte by active dye |
| 10/01/2009 | US20090245621 System And Method Of Providing Mask Defect Printability Analysis |
| 10/01/2009 | US20090244507 Optical member, light routing unit, and exposure apparatus |
| 10/01/2009 | US20090244503 Exposure apparatus, device manufacturing method, maintenance method, and exposure method |
| 10/01/2009 | US20090244502 Methods of Compensating Lens Heating, Lithographic Projection System and Photo Mask |
| 10/01/2009 | US20090242787 Charged-particle beam writing method and charged-particle beam writing apparatus |
| 10/01/2009 | US20090242236 Method of forming conductive tracks |
| 10/01/2009 | US20090241988 Photoresist and antireflective layer removal solution and method thereof |
| 10/01/2009 | DE102009011207A1 Verfahren und Beleuchtungssystem zum Beleuchten einer Maske in einer mikrolithographischen Projektionsbelichtungsanlage Procedures and lighting system for illuminating a mask in a microlithography projection exposure apparatus |
| 10/01/2009 | CA2689186A1 Coating membrane forming method and coating membrane forming apparatus |
| 09/30/2009 | EP2105949A1 Composition for formation of antireflection film and pattern formation method using the same |
| 09/30/2009 | EP2105800A2 Processing solution for preparing lithographic printing plate and processing method of lithographic printing plate precursor |
| 09/30/2009 | EP2105799A1 A method for preparing lithographic printing plates |
| 09/30/2009 | EP2105798A1 Developing solution and method for production of finely patterned material |
| 09/30/2009 | EP2105797A1 Lithographic printing plate precursor |
| 09/30/2009 | EP2105796A1 Plate-making method of lithographic printing plate |
| 09/30/2009 | EP2105795A1 Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate |
| 09/30/2009 | EP2105794A1 Novel photoacid generator, resist composition, and patterning process |
| 09/30/2009 | EP2105793A2 Green curable composition, color filter and method of producing same |
| 09/30/2009 | EP2105792A1 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor |
| 09/30/2009 | EP2105443A1 Oxime derivatives and their use in photopolymerizable compositions for colour filters |
| 09/30/2009 | EP2105440A2 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method using the same, polymerizable compound and polymer compound obtained by polymerizing the polymerizable compound |
| 09/30/2009 | EP2105297A1 Planographic printing plate precursor and plate making method using the same |
| 09/30/2009 | EP2104880A1 Projection optical apparatus, exposure method and device manufacturing method |
| 09/30/2009 | EP1470446B1 Organic anti-reflective coating compositions for advanced microlithography |
| 09/30/2009 | CN101548240A Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations |
| 09/30/2009 | CN101548239A Negative-working radiation-sensitive compositions and imageable materials |
| 09/30/2009 | CN101546733A Method for manufacturing TFT-LCD array substrate and color film substrate |
| 09/30/2009 | CN101546136A Method for removing optical resist |
| 09/30/2009 | CN101546135A Charged-particle beam writing method and charged-particle beam writing apparatus |
| 09/30/2009 | CN101546134A Electron beam writing apparatus and method |
| 09/30/2009 | CN101546133A Exposure device and an exposure method |
| 09/30/2009 | CN101546132A Projection exposure device |
| 09/30/2009 | CN101546131A Output-image geometric-error correction method based on laser photoplotters |
| 09/30/2009 | CN101546130A Etching system using optical microscope |
| 09/30/2009 | CN101546129A Method for monitoring exposure device by adopting side wall angles |
| 09/30/2009 | CN101546128A Method for forming patterns with gradually changed colors on surface of shell |
| 09/30/2009 | CN101546127A Radiation sensitive resin composition, interlayer insulation film and method for manufacturing micro-lens |
| 09/30/2009 | CN101546126A Chemically amplified resist composition and chemically amplified resist composition for immersion lithography |
| 09/30/2009 | CN101546125A Color cured composition for color filter and color filter |
| 09/30/2009 | CN101546124A Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate |
| 09/30/2009 | CN101546123A Light sensitive resin composition, cured matter and printed circuit substrate having solder mask layer formed with the cured matter |
| 09/30/2009 | CN101546122A Color resist composition and a color filter using the same |
| 09/30/2009 | CN101546121A Color cured composition, a color filter, a method for manufacturing the color filter and a liquid crystal display device |
| 09/30/2009 | CN101546120A White cured resin composition and printed circuit board having insulation layer formed with the same |
| 09/30/2009 | CN101546119A Radiation sensitive resin composition, division article, preparation method and liquid crystal display element |
| 09/30/2009 | CN101546117A Masstone photomask and pattern transfer method using the same |
| 09/30/2009 | CN101546115A Photomask storage apparatus |
| 09/30/2009 | CN101546114A Exposure system, light shield and method for designing same |
| 09/30/2009 | CN101546112A Method for replacing mask |
| 09/30/2009 | CN101546070A Transverse electric-field liquid crystal display panel and preparation method thereof |
| 09/30/2009 | CN101546036A Shape memory alloy spring drive-based adjustable focal length silicon grating and preparation method thereof |
| 09/30/2009 | CN101546008A Color filter and manufacturing method thereof |
| 09/30/2009 | CN101546006A Color filter slice, method for manufacturing the same and liquid crystal display device |
| 09/30/2009 | CN101546004A Colored filter |
| 09/30/2009 | CN101544929A Edge gluing cleaning agent used in processing procedure of colored filter |
| 09/30/2009 | CN101544784A Photocurable resin composition, dry film and cured object thereof, and printed circuit board with the same |
| 09/30/2009 | CN101544733A Polymeric composition, color filter and manufacturing method thereof, and liquid crystal display device |
| 09/30/2009 | CN101543660A Method for preparing neuro chip by taking polylactic acid as substrate |
| 09/30/2009 | CN100545986C Plasma display panel producing method |
| 09/30/2009 | CN100545756C Thinner composition for removing photoresist |
| 09/30/2009 | CN100545755C Photolithographic system exposal lens structure constituted by lens set and the assembling and regulation method |
| 09/30/2009 | CN100545754C Replacement apparatus for an optical element |
| 09/30/2009 | CN100545753C Chemically amplified positive photo resist composition and method for forming resist pattern |
| 09/30/2009 | CN100545752C Resin composition for mold used in forming micropattern, and method for fabricating organic mold therefrom |
| 09/30/2009 | CN100545751C Photosensitive planography printing plate |
| 09/30/2009 | CN100545750C Etch-resisting pattern formation method, fine pattern formed thereby and method for making liquid crystal displaying component |
| 09/30/2009 | CN100545749C Apparatus and method for making a forming structure |
| 09/30/2009 | CN100545747C Method for detecting failure of database patterns of photo mask |
| 09/30/2009 | CN100545744C Exposure station for film webs |
| 09/29/2009 | US7595931 Grating for EUV lithographic system aberration measurement |
| 09/29/2009 | US7595861 Exposure apparatus and method of manufacturing device |
| 09/29/2009 | US7595496 Optimized correction of wafer thermal deformations in a lithographic process |
| 09/29/2009 | US7595351 Actinic radiation curable compositions and their use |
| 09/29/2009 | US7595207 Method of exposing layer with light and method of manufacturing thin film transistor substrate for liquid crystal display device using the same |
| 09/29/2009 | US7595145 Method of forming pattern of semiconductor device |
| 09/29/2009 | US7595144 Sulfonate-containing anti-reflective coating forming composition for lithography |
| 09/29/2009 | US7595143 Containing two binder resins produced by reacting m-cresol and p-cresol with salicylic aldehyde for first and with formaldehyde for second; heat resistance, pattern adhesion; photomasks, photoresists |