Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2009
10/07/2009CN101552181A 薄膜蚀刻方法 Film etching method
10/07/2009CN101551958A Engraving plate structure and manufacture method thereof
10/07/2009CN101551603A Method for patterning a photosensitive layer
10/07/2009CN101551602A Substrate cleaning method and substrate cleaning apparatus
10/07/2009CN101551601A Laser direct drafting method and laser direct drafting device
10/07/2009CN101551600A Exposure system and exposure method
10/07/2009CN101551599A Double-stage switching system of photoetching machine wafer stage
10/07/2009CN101551598A Double-stage switching system of photoetching machine wafer stage
10/07/2009CN101551597A A self-imaging double-sided overlay aligning method
10/07/2009CN101551596A Waveguide device of super resolution interference lithography
10/07/2009CN101551595A Temperature control method for projection objective of photoetching machine
10/07/2009CN101551594A Detection system and method of lithography machine projection lens odd chromatic aberration based on two-stage illumination
10/07/2009CN101551593A Alignment system for lithography equipment, lithography equipment and aligning method thereof
10/07/2009CN101551592A Device and method for drawing pattern
10/07/2009CN101551591A Planographic printing plate precursor
10/07/2009CN101551590A Preparation method of a super-fine super-line holographic film
10/07/2009CN101551589A Silica based positive type photosensitive organic compound
10/07/2009CN101551588A Light-sensitive resin composition, light spacer, protective film, coloring pattern, display device and substrate thereof
10/07/2009CN101551553A Liquid crystal display panel and method for manufacturing the same
10/07/2009CN101551545A Method for manufacturing color film substrate
10/07/2009CN101551482A Color filtering disc with subwavelength grating structure and manufacturing method thereof
10/07/2009CN101551476A Laser three-dimensional preparing method of non-spherical micro-lens
10/07/2009CN101551235A Laser interfering meter measuring device
10/07/2009CN101550334A Fluorescent powder coating method of white light-emitting diode
10/07/2009CN101550265A Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound
10/07/2009CN100547730C Exposure equipment and element manufacturing method
10/07/2009CN100547729C Method for fabricating semiconductor device using tungsten as sacrificial hard mask
10/07/2009CN100547724C Substrate processing apparatus
10/07/2009CN100547490C Method for calibrating focus part of exposure member of lithography tool
10/07/2009CN100547489C Illuminating optic system for microlithography
10/07/2009CN100547488C Immersion optical projection system and manufacturing method of IC wafer
10/07/2009CN100547487C Composition for forming antireflection film for lithography
10/07/2009CN100547486C Sensitive resin composition
10/07/2009CN100547485C Photosensitive resin composition
10/07/2009CN100547448C Projection optical system and projection exposure device
10/07/2009CN100547447C Deep UV projection photoetching objective lens
10/07/2009CN100546825C Original plate for offset
10/06/2009US7599811 Sensor for lithographic apparatus and method of obtaining measurements of lithographic apparatus
10/06/2009US7598507 Adjustable lithography blocking device and method
10/06/2009US7598320 a formal or acetal protected vinyl acetate-vinyl alcohol copolymer, a derivataive of melamine, urea, guanamine, glycoluril or amino resin crosslinking agent; water as solvent or mixed with organic solvents, such as methanol, ethylene glycol, monomethyl ether, acetone etc; for resist pattern; electronics
10/06/2009US7598182 Anti-reflective coating forming composition containing polyamic acid
10/06/2009US7598023 surface treatment of wafer by lamination, etching; reduce the dimension of gaps in the etching mask; increasing the aperture ratio and the reflectivity of light, improving device performance; liquid crystal televisions, computers
10/06/2009US7598022 comprises a manganese(Mn)-containing precursor and hydrophilic polymer; preparing nano-scale patterns by varying exposure doses; water-soluble solvent developable property; uses water-soluble solvent as developing solvent with environmental protection; low cost, high speed process; integrated circuit
10/06/2009US7598021 fabricating an integrated circuit; forming a pattern by control the directing light energy from the associated light source to the target positioning of the nanodots
10/06/2009US7598020 Forming image with high resolving power; producing extremely fine circuit pattern; utilizing excimer laser light emitted from annular shaped source passed through mask having phase shifter
10/06/2009US7598019 exposure to UV/VIS radiation, by the action of electromagnetic radiation to modify the nucleotide; for preparing DNA chips
10/06/2009US7598017 Includes alkali-soluble resin comprising acid generator, and norbornan based cross-linker; forming a resist pattern that are capable of forming a resist film having a high hydrophobicity at the film surface as well as favorable lithography properties
10/06/2009US7598016 Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer
10/06/2009US7598015 (meth)acrylic copolymer with polycyclic structure units; for use in the formulation of a resist composition which has good etching resistance and adhesion and satisfies both a high resolution and a minimized pattern density-dependent size difference when processed by photolithography
10/06/2009US7598014 Thick film photoresist composition and method of forming resist pattern
10/06/2009US7598009 Photosensitive resin composition, production method for cured relief pattern using it, and semiconductor device
10/06/2009US7598005 An approximated curve to the curve of the actual pattern, mask pattern can be formed based on an individual and specific polygonal approximation in accordance with the shapes
10/06/2009US7597968 Substrate for pattern formation
10/06/2009US7597814 Structure formed with template having nanoscale features
10/06/2009US7597531 Method of controlling mover device
10/01/2009WO2009120410A2 High refractive index sol-gel composition and method of making photo-patterned structures on a substrate
10/01/2009WO2009120353A2 Semiconductor buried grating fabrication method
10/01/2009WO2009119898A1 Immersion system, exposure apparatus, exposing method and device fabricating method
10/01/2009WO2009119894A1 Positive resist composition and pattern forming method using the same
10/01/2009WO2009119878A1 Positive photosensitive resin composition and method of forming cured film from the same
10/01/2009WO2009119827A1 Original plate for lithographic printing plate, and method for production of lithographic printing plate using the same
10/01/2009WO2009119784A1 Cyclic compound, process for producing cyclic compound, photoresist base material comprising cyclic compound, photoresist composition, microprocessing method, semiconductor device, and apparatus
10/01/2009WO2009119687A1 Immersion automatic development apparatus and automatic development method for manufacturing planographic printing plate
10/01/2009WO2009119623A1 Photosensitive resin and photosensitive resin composition comprising the same
10/01/2009WO2009119622A1 Photosensitive resin and photosensitive resin composition comprising the same
10/01/2009WO2009119610A1 Process for producing lithographic printing plate
10/01/2009WO2009119576A1 Photosensitive composition for forgery preventive hologram and forgery preventive hologram medium
10/01/2009WO2009119473A1 Pigment dispersing composition for color filters
10/01/2009WO2009119430A1 Process for producing lithographic printing plate
10/01/2009WO2009119364A1 Metal phthalocyanine dye mixture, curable composition, color filter, and method for producing color filter
10/01/2009WO2009119201A1 Resist underlayer film, composition for resist underlayer film formation, and method for resist underlayer film formation
10/01/2009WO2009119155A1 Coat film forming method and coat film forming apparatus
10/01/2009WO2009118883A1 Exposure head, exposure device, and exposure head manufacturing method
10/01/2009WO2009118281A1 A method for preparing lithographic printing plates
10/01/2009WO2009118148A1 Inspection apparatus for lithography
10/01/2009WO2009118113A1 Inspection apparatus, lithographic apparatus and method of measuring a property of a substrate
10/01/2009WO2009090474A8 A process for imaging a photoresist coated over an antireflective coating
10/01/2009US20090249266 Displacing Edge Segments On A Fabrication Layout Based On Proximity Effects Model Amplitudes For Correcting Proximity Effects
10/01/2009US20090247447 Removing agent composition and removing/cleaning method using same
10/01/2009US20090246975 Multiple technology node mask
10/01/2009US20090246717 Method for forming a patterned photoresist layer
10/01/2009US20090246716 High refractive index sol-gel composition and method of making photo-patterned structures on a substrate
10/01/2009US20090246715 Plating method and method of forming magnetic pole
10/01/2009US20090246714 Thin film etching method
10/01/2009US20090246713 Oxygen-containing plasma flash process for reduced micro-loading effect and cd bias
10/01/2009US20090246712 Method of producing multilayer optical recording medium, stamper for producing multilayer optical recording medium, and method therefor
10/01/2009US20090246711 Method for manufacturing magnetic recording medium
10/01/2009US20090246710 Pattern forming method and a semiconductor device manufacturing method
10/01/2009US20090246709 Manufacturing method of semiconductor device
10/01/2009US20090246708 Method of forming mask pattern
10/01/2009US20090246707 Semiconductor buried grating fabrication method
10/01/2009US20090246706 Patterning resolution enhancement combining interference lithography and self-aligned double patterning techniques
10/01/2009US20090246705 DI Water Rinse of Photoresists with Insoluble Dye Content
10/01/2009US20090246704 Manufacturing Method for Conducting Films on Two Surfaces of Transparent Substrate of Touch Control Circuit
10/01/2009US20090246703 Lithographic Apparatus and Device Manufacturing Method
10/01/2009US20090246702 Method for preparing lithographic printing plate
10/01/2009US20090246701 Method for preparing lithographic printing plate
10/01/2009US20090246700 Plate-making method of lithographic printing plate precursor
10/01/2009US20090246699 Plate-making method of lithographic printing plate precursor
10/01/2009US20090246698 Methods for imaging and processing negative-working imageable elements
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