Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2009
10/14/2009CN100549155C Semiconductor process residue removal composition
10/14/2009CN100549051C Photoresist polymer compositions
10/14/2009CN100548675C Printing plate material and printing process
10/13/2009US7603010 Device consisting of at least one optical element
10/13/2009US7603001 Method and apparatus for providing back-lighting in an interferometric modulator display device
10/13/2009US7602827 Semiconductor laser and manufacturing process therefor
10/13/2009US7602503 Methods for measuring a wavefront of an optical system
10/13/2009US7602476 Substrate-holding technique
10/13/2009US7602091 Positioning apparatus and exposure apparatus
10/13/2009US7601933 Heat processing apparatus and heat processing method
10/13/2009US7601819 Azo dye, colored curable composition, color filter and producing method therefor
10/13/2009US7601764 Comprising alkaline soluble resin, in particular, cumyl phenoxyl ethyl acrylate, which can be copolymerized with carboxy-group-containing ethylenically unsaturated monomer, multi-functional monomer, photoinitiator, pigment, and solvent; heat resistance, development and adhesion properties; displays
10/13/2009US7601485 Negates effect of fine dust causing defects; locating an exposure mask at a predetermined position with respect to a wafer, exposing a resist film, then displacing the exposure mask relative to the wafer by a predetermined dimension, and further exposing the resist film; semiconductors
10/13/2009US7601484 Imagewise multiphoton polymerization and blanket irradiation techniques are combined to fabricate optical elements in situ in an encapsulating, protective monolithic polymeric matrix; e.g. waveguides; encapsulated structure with good hardness, durability, dimensional stability, resilience, and toughness
10/13/2009US7601483 Form crosslinks of repeating -(CO-O-CH(-CH3)-O)-; reaction of multifunctional vinyl ether and a polymer with free acid groups, e.g. poly(methacryloyloxy ethyl phthalate); eliminate the bottom anti-reflective coating etch step by using a wet-developable bottom anti-reflective coating; high resolution
10/13/2009US7601482 Negative photoresist compositions
10/13/2009US7601480 Photoactive compounds
10/13/2009US7601479 For use in the formulation of a resist composition which has good etching resistance and adhesion and satisfies both a high resolution and a minimized pattern density-dependent size difference when processed by photolithography
10/13/2009US7601471 the transferred patterns of respective evaluation patterns transferred using the test photo mask are calculated on the basis of the relationship with the opening ratio of the flare generation patterns; enables performing accurate pattern-dimension corrections against local flares
10/13/2009US7601469 Plasma etching chamber and method for manufacturing photomask using the same
10/13/2009US7601270 Microfabricated elastomeric valve and pump systems
10/08/2009WO2009123691A1 A system for plate imaging and processing
10/08/2009WO2009123446A1 Lithographic apparatus and contamination detection method
10/08/2009WO2009123341A1 Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith
10/08/2009WO2009123122A1 Base-generating agent, photosensitive resin composition, pattern-forming material comprising the photosensitive resin composition, pattern formation method using the photosensitive resin composition, and article
10/08/2009WO2009123109A1 Photosensitive transparent resin composition, process for production of color filters, and color filters
10/08/2009WO2009123096A1 Photosensitive film lamination method, resist pattern formation method, and printed circuit board manufacturing method
10/08/2009WO2009123050A1 Curable composition, color filter and process for production thereof, and solid-state imaging device
10/08/2009WO2009122853A1 Positive radiation-sensitive resin composition, microlens, and method for forming microlens
10/08/2009WO2009122789A1 Polymerizable composition, light-blocking color filter for solid-state imaging device, and solid-state imaging device
10/08/2009WO2009122753A1 Photoresist composition
10/08/2009WO2009122752A1 Polymer compound for photoresist
10/08/2009WO2009122751A1 Polyol compound for photoresist
10/08/2009WO2009122276A1 A process for shrinking dimensions between photoresist pattern comprising a pattern hardening step
10/08/2009WO2009122275A1 A photoresist image-forming process using double patterning
10/08/2009WO2009121950A1 Method of making micron or submicron cavities
10/08/2009WO2009121755A1 A method for treating a lithographic printing plate
10/08/2009WO2009121641A1 Protection module and euv lithography apparatus with protection module
10/08/2009WO2009121546A1 Device for microlithographic projection illumination and method for testing such a device
10/08/2009WO2009121541A1 Device for microlithographic projection illumination and device for the inspection of a surface of a substrate
10/08/2009WO2009121438A1 Projection illumination system for euv microlithography
10/08/2009WO2009121385A1 Cleaning module and euv lithography device with cleaning module
10/08/2009WO2009099713A3 Elimination of photoresist material collapse and poisoning in 45-nm feature size using dry or immersion lithography
10/08/2009WO2009099619A3 Array and cantilever array leveling
10/08/2009WO2009088247A3 Optical sheets
10/08/2009US20090253084 Double patterning process
10/08/2009US20090253083 Exposure Apparatus, Exposure Method, and Method for Producing Device
10/08/2009US20090253082 Method for forming resist pattern
10/08/2009US20090253081 Process for Shrinking Dimensions Between Photoresist Pattern Comprising a Pattern Hardening Step
10/08/2009US20090253080 Photoresist Image-Forming Process Using Double Patterning
10/08/2009US20090253079 Forming reverse illumination patterns
10/08/2009US20090253078 Double exposure lithography using low temperature oxide and uv cure process
10/08/2009US20090253077 Anti-reflection film forming material, and method for forming resist pattern using the same
10/08/2009US20090253076 Coating-type underlayer coating forming composition for lithography containing vinylnaphthalene resin derivative
10/08/2009US20090253075 Positive resist composition, and method of forming resist pattern
10/08/2009US20090253074 Fluorinated polymers for use in immersion lithography
10/08/2009US20090253073 Light-Sensitive Component for Use in Photoresists
10/08/2009US20090253072 Nanoparticle reversible contrast enhancement material and method
10/08/2009US20090253071 Planographic printing plate precursor
10/08/2009US20090253070 Resist composition and pattern forming method using the same
10/08/2009US20090253069 Imageable elements useful for waterless printing
10/08/2009US20090252950 Alumina substrate and method of making an alumina substrate
10/08/2009US20090252898 Transfer material, process for producing a laminated structure having a patterned optically anisotropic layer and photosensitive polymer layer, and liquid crystal display device
10/08/2009US20090252422 Exposure method and exposure device
10/08/2009US20090251772 Reflective optical element and euv lithography appliance
10/08/2009US20090251679 Exposure method and exposure apparatus, stage unit, and device manufacturing method having two substrate stages with one stage temporarily positioned below the other stage
10/08/2009US20090251674 Lithographic apparatus and device manufacturing method
10/08/2009US20090251652 Silica based positive type photosensitive organic compound
10/08/2009US20090251646 Array substrate, manufacturing method thereof and liquid crystal display
10/08/2009US20090250817 Method of fabricating semiconductor device and semiconductor device
10/08/2009US20090250253 Printed circuit board and manufacturing method thereof
10/08/2009US20090249972 Method for making a lithographic printing plate
10/08/2009DE112007002992T5 Direkt photostrukturierbare Polymerzusammensetzungen und Verfahren davon Direct photostructurable polymer compositions and method thereof
10/08/2009DE10338018B4 Fotolitographisches Verfahren Fotolitographisches method
10/08/2009DE102008017645A1 Vorrichtung zur mikrolithographischen Projektionsbelichtung sowie Vorrichtung zur Inspektion einer Oberfläche eines Substrats An apparatus for microlithographic projection exposure apparatus, as well as for inspecting a surface of a substrate
10/08/2009DE102008000967A1 Projektionsbelichtungsanlage für die EUV-Mikrolithographie Projection exposure apparatus for EUV microlithography
10/08/2009DE102008000959A1 Cleaning module, particularly for extreme-ultraviolet lithography apparatus, has supply for molecular hydrogen, where atomic hydrogen generating device is provided
10/08/2009DE102008000957A1 Schutzmodul sowie EUV-Lithographievorrichtung mit Schutzmodul Protection module and EUV lithography apparatus with protection module
10/08/2009DE102006032053B4 Oberflächenmodifikationsverfahren und- vorrichtung Surface modification process device and-
10/08/2009DE102006001435B4 Vorrichtung zur Beleuchtung und zur Inspektion einer Oberfläche Apparatus for lighting and for inspecting a surface
10/08/2009DE102005003001B4 Verfahren zur Korrektur des optischen Proximity-Effektes A method for correcting the optical proximity effect
10/08/2009DE102004025203B4 Fotolackverarbeitungsverfahren Photoresist processing method
10/08/2009DE102004005981B4 Ausrichtungselemente einer Vorrichtung zur Handhabung von Druckplatten Alignment elements of a device for handling printing plates
10/07/2009EP2107422A1 Method for preparing lithographic printing plate
10/07/2009EP2107420A1 Compositions for removing etching residue and use thereof
10/07/2009EP2107041A2 Mold having nanometric features, method for realising such a mold and corresponding use of it in a method for realising an array of carbon nanotubes
10/07/2009EP2106924A1 A method for treating a lithographic printing plate
10/07/2009EP2106906A1 Relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate
10/07/2009EP2106574A2 Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
10/07/2009EP2106573A1 Positive resist composition and pattern forming method using the positive resist composition
10/07/2009EP2004725B1 Base soluble polymers for photoresist compositions
10/07/2009EP1899768B1 Toner, and toner production process
10/07/2009EP1453675B1 Photosensitive composition and photosensitive planographic printing plate
10/07/2009EP1190277B1 Semiconductor having spin-on-glass anti-reflective coatings for photolithography
10/07/2009EP1012779B1 Method and system for lithographic mask inspection
10/07/2009CN101553759A Photosensitive heat curing-type resin composition and flexible printed wiring board
10/07/2009CN101553758A Pattern forming method and photosensitive resin composition used therefor
10/07/2009CN101553549A Photobase generator and photocurable resin composition
10/07/2009CN101552266A Wafer
10/07/2009CN101552189A 等离子体处理方法 The plasma processing method
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