Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2009
10/15/2009WO2009095847A3 Lithography robustness monitor
10/15/2009WO2009093028A3 Polychromic substances and their use
10/15/2009WO2009091630A3 Contamination prevention in extreme ultraviolet lithography
10/15/2009WO2009079241A3 Density multiplication and improved lithography by directed block copolymer assembly
10/15/2009US20090258497 Photoresist resin, and method for forming pattern and method for manufacturing display panel using the same
10/15/2009US20090258322 Methods for planarizing unevenness on surface of wafer photoresist layer and wafers produced by the methods
10/15/2009US20090258321 Light absorbent and organic antireflection coating composition containing the same
10/15/2009US20090258320 Method of forming measuring targets for measuring dimensions of substrate in substrate manufacturing process
10/15/2009US20090258319 Exposure method and semiconductor device manufacturing method
10/15/2009US20090258318 Double patterning method
10/15/2009US20090258317 Writing apparatus and writing method
10/15/2009US20090258315 Photoacid generator compounds and compositions
10/15/2009US20090258314 Negative working, heat sensitive lithographic printing plate precursor
10/15/2009US20090258313 Resist composition and resist pattern forming method
10/15/2009US20090258305 Memory medium storing original data generation program, memory medium storing illumination condition determination program, original data generation method, illumination condition determination method, and device manufacturing method
10/15/2009US20090258304 Substrate processing method, program, computer-readable storage medium and substrate processing system
10/15/2009US20090258197 Composite Composition for Micropatterned Layers
10/15/2009US20090258186 Wafer-level method for fabricating an optical channel and aperture structure in magnetic recording head sliders for use in thermally-assisted recording (tar)
10/15/2009US20090258139 Coating process apparatus and coating film forming method
10/15/2009US20090257049 Device and method for the optical measurement of an optical system by using an immersion fluid
10/15/2009US20090257008 Color filter substrate, liquid crystal display apparatus including color filter substrate, and method of manufacturing color filter substrate
10/15/2009US20090256287 UV Curable Silsesquioxane Resins For Nanoprint Lithography
10/15/2009US20090255110 Photo-etched edm electrode
10/15/2009DE112005002186T5 Nanoimprint-Form, Verfahren zum Bilden einer Nanoschablone sowie ein aus Harz gegossenes Produkt Nanoimprint-shape, method of forming a nano-template and a molded resin product
10/15/2009DE102009013126A1 Anordnung und Verfahren zum Aktuieren einer Komponente einer optischen Abbildungseinrichtung Apparatus and method for actuate a component of an optical imaging device
10/14/2009EP2109134A1 Optical element, exposure apparatus employing the optical element, and device manufacturing method
10/14/2009EP2109133A1 Stage apparatus, exposure apparatus and device manufacturing method
10/14/2009EP2109005A1 Process for preparing a polymeric relief structure
10/14/2009EP2109004A1 Lithographic apparatus and device manufacturing method
10/14/2009EP2109003A2 Table for vacuum use guided with aerostatic bearing elements
10/14/2009EP2109002A2 Measurement method, measurement apparatus, exposure apparatus, and device fabrication method
10/14/2009EP2109001A1 Positive photosensitive resin composition
10/14/2009EP2109000A1 Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same
10/14/2009EP2108999A1 Method for preparation of lithographic printing plate and lithographic printing plate precursor
10/14/2009EP1676869B1 Photoresist resin and photoresist resin composition
10/14/2009EP1658615B1 Oblique reflector normal incidence collector system for light sources, in particular for euv plasma discharge sources
10/14/2009EP1498394B1 Synthetic quartz glass for optical member, projection exposure device, and projection exposure method
10/14/2009EP0932081B1 Pattern forming body, pattern forming method, and their applications
10/14/2009CN201327564Y Reticle library mechanism
10/14/2009CN101558360A Exposure apparatus
10/14/2009CN101558359A Surface treatment method and apparatus, exposure method and apparatus, and device manufacturing method
10/14/2009CN101558358A Composition for forming resist foundation film containing low molecular weight dissolution accelerator
10/14/2009CN101558357A Immersion lithography technique and product using a protection layer covering the resist
10/14/2009CN101558356A Photosensitive resin composition, photosensitive element, method for resist pattern formation, and method for manufacturing printed wiring board
10/14/2009CN101558345A Wide-angle optical system
10/14/2009CN101558013A Method of neutralizing waste developing solution containing tetraalkylammonium hydroxide
10/14/2009CN101556905A Thermal processing device, thermal processing method and storage medium
10/14/2009CN101556754A Nameplate structure and manufacturing method thereof
10/14/2009CN101556440A Alignment device
10/14/2009CN101556439A Method for removing polyimide (PI) film from simulation substrate
10/14/2009CN101556438A Lithographic apparatus and device manufacturing method
10/14/2009CN101556437A Method of lithography patterning
10/14/2009CN101556436A A system and a method for light shield tracking monitoring
10/14/2009CN101556435A Method for manufacturing mask blank and photomask
10/14/2009CN101556434A Negative resist composition
10/14/2009CN101556433A Light absorbent and organic antireflection coating composition containing the same
10/14/2009CN101556431A Translational symmetrical mark and in-situ detection method of wave aberration of projection objective of photoetching machine
10/14/2009CN101556428A Process for manufacturing developing film with color pattern and product thereof
10/14/2009CN101556412A Bidirectional visual array baseplate, color film baseplate, liquid crystal display device and manufacturing method
10/14/2009CN101556404A Bistable liquid crystal display and forming method thereof
10/14/2009CN101556397A Color-film substrate, manufacture method thereof and liquid crystal display
10/14/2009CN101556349A Color filter and manufacturing method thereof
10/14/2009CN101556348A Method for filming filter with node color pattern
10/14/2009CN101555362A Pigment dispersing composition and manufacturing method thereof, coloured polymerized composition, colour filter and manufacturing method thereof
10/14/2009CN101555318A Water-soluble negative light-sensitive polyamic acid salt as well as a preparation method and a developing method thereof
10/14/2009CN100551207C Method for removing resin mask layer and method for manufacturing solder bumped substrate
10/14/2009CN100550334C System and method for integrating in-situ metrology within a wafer process
10/14/2009CN100550300C Temperature setting method for heat treating plate, temperature setting device for heat treating plate
10/14/2009CN100550299C Exposure condition setting method, substrate processing unit and computer program
10/14/2009CN100550298C Maintenance system, substrate processing device, remote operation device, and communication method
10/14/2009CN100550295C Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device
10/14/2009CN100550291C Liquid processing apparatus and method
10/14/2009CN100550254C Antistatic film forming composition, and producing method for conductive film pattern
10/14/2009CN100549840C Remover composition
10/14/2009CN100549839C Substrate heating apparatus and method and coating and developing system
10/14/2009CN100549838C Liquid processing method and device thereof
10/14/2009CN100549837C Development device, development method, and developer circulating method
10/14/2009CN100549836C Method for producing a component comprising nanometric multilayers for optical uses and component produced according to said method
10/14/2009CN100549835C Exposure device, exposure method, and micro device manufacturing method
10/14/2009CN100549834C Position measurement system and lithographic apparatus
10/14/2009CN100549833C Level sensor, lithographic apparatus and device manufacturing method
10/14/2009CN100549832C Lithographic apparatus with multiple alignment arrangements and alignment measuring method
10/14/2009CN100549831C Substrate possessing multiple circuit patterns and its manufacture method
10/14/2009CN100549830C Positive resist compositions and forming method
10/14/2009CN100549829C Chemical amplification type positive resist composition
10/14/2009CN100549828C Positive photosensitive resin composition
10/14/2009CN100549827C Alkali-soluble polymer and polymerizable composition thereof
10/14/2009CN100549826C Multiphoton photosensitization system
10/14/2009CN100549825C Photosensitive resin composition comprising a halogen-free colorant
10/14/2009CN100549824C Etching composition and etching processing method
10/14/2009CN100549823C Multiphoton photosensitization method
10/14/2009CN100549822C Printing plate material, printing plate material plate, printing plate manufacturing process, and printing process,and printing plate material manufacturing process
10/14/2009CN100549821C Method for producing a unit having a three-dimensional surface patterning, and use of this method
10/14/2009CN100549819C Metal mask plate
10/14/2009CN100549816C Labelling product for applying the imaging compositions on substrate and its forming method
10/14/2009CN100549792C Silicon based LCD device with colorful array of pixels, and production method thereof
10/14/2009CN100549791C Method for making array base plate
10/14/2009CN100549790C Liquid crystal display device
10/14/2009CN100549754C Micro-oscillating element and method of making the same
10/14/2009CN100549241C Aluminium sheet embossing roll