Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2009
10/22/2009CA2721797A1 Magnetic microstructures for magnetic resonance imaging
10/21/2009EP2110709A1 Lithography exposure device
10/21/2009EP2110708A1 Positive-type photosensitive resin composition
10/21/2009EP2110707A1 Flare mapping in lithography
10/21/2009EP1395615B1 Oxime ester photoinitiators having a combined structure
10/21/2009CN201331670Y Secondary imprint template for nanometer imprint
10/21/2009CN201331353Y Optical coded disk
10/21/2009CN101563654A Method for regulating concentration of developing solution, apparatus for preparing the developing solution, and developing solution
10/21/2009CN101563653A Lithographic apparatus, substrate table, and method for releasing a wafer
10/21/2009CN101563652A Composition for resist lower layer film formation and method for pattern formation
10/21/2009CN101563651A Photosensitive element
10/21/2009CN101562130A Method of fabricating a photomask using self assembly molecule
10/21/2009CN101562129A Method of making inverted trapezoidal cross-section structure by S18 series of positive photoresist
10/21/2009CN101561642A Positioning system, lithographic apparatus and device manufacturing method
10/21/2009CN101561641A Plasma etching residual washing liquid
10/21/2009CN101561640A Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier
10/21/2009CN101561639A Lithographic apparatus
10/21/2009CN101561638A Stage system calibration method, stage system and lithographic apparatus comprising such stage system
10/21/2009CN101561637A Laser direct-write photoetching system based on photon sieve
10/21/2009CN101561636A Device and method for controlling photoetching exposure dose
10/21/2009CN101561635A System and method for controlling positioning of bilateral driving device
10/21/2009CN101561634A Method and device for acquiring optimal parameters of photoetching machine
10/21/2009CN101561633A Method for monitoring photoetching technology and monitoring mark
10/21/2009CN101561632A Photoresist resin, and method for forming pattern and method for manufacturing display panel using the same
10/21/2009CN101561631A Coloring light-sensitive resin composition
10/21/2009CN101561630A Manufacturing method of optical element
10/21/2009CN101561629A Method for manufacturing gradual slope of medium edge by photoresist with inverse trapezium section
10/21/2009CN101561628A Method of making air-bridge
10/21/2009CN101561627A Method for forming patterning photo-induced resist layer
10/21/2009CN101561524A Colored filter and manufacturing method thereof
10/21/2009CN101561523A Method for producing reflective film with microprism array structure
10/21/2009CN101560323A Composition for formation of underlayer film for lithography containing epoxy compound and carboxylic acid compound
10/21/2009CN101560279A A composition and a multipolymer used in organic antireflective coating
10/21/2009CN101559669A Manufacturing method and device of thin film pattern layer
10/21/2009CN100553404C Assembly for exposure of two-side printed circuit board and apparatus with the exposure assembly
10/21/2009CN100552881C Exposure apparatus, exposure method and device manufacturing method
10/21/2009CN100552880C Temperature regulation method and system for low flow rate liquid
10/21/2009CN100552879C Stage drive method and stage apparatus, exposure apparatus, and device producing method
10/21/2009CN100552859C Method for preparation of photoelectric sensitivity conductive slurry
10/21/2009CN100552551C Strip preparation method of graphics ferroelectric lead zirconate titanate film
10/21/2009CN100552550C Preparation method for light sensitive planographic plate material
10/21/2009CN100552549C Developing method, substrate treating method, and substrate treating apparatus
10/21/2009CN100552548C Pellicle for photolithography and pellicle frame
10/21/2009CN100552547C Anticorrdant dilution system
10/21/2009CN100552546C Substrate adhesion improver for photosensitive resin composition and photosensitive resin composition containing the same
10/21/2009CN100552545C Patterned mask holding device and method using two holding systems
10/21/2009CN100552544C Exposure device and positioning method
10/21/2009CN100552538C Projection screen with holographic cylindrical lens structure
10/21/2009CN100552518C Manufacturing method of display device
10/21/2009CN100552503C System and method for manufacturing a flat panel display
10/21/2009CN100552490C Sonic surface wave driven two-dimensional micro optical platform and method of manufacture
10/21/2009CN100551942C Adhesive film functionalizing color compensation and near infrared ray (nir) blocking and plasma display panel filter using the same
10/21/2009CN100551935C Mono-ingredient hydrogen abstraction light initiating agent, its production and use
10/21/2009CN100551716C Exposure visible image forming method of lithographic printing plate material, aluminum support and lithographic printing plate material
10/20/2009US7605941 Drawing apparatus and drawing-data-generation apparatus therefor as well as drawing method and drawing-data-generation method therefor to efficiently perform stable drawing operations
10/20/2009US7605906 Patterning systems using photomasks including shadowing elements therein
10/20/2009US7605905 Method for distortion correction in a microlithographic projection exposure apparatus
10/20/2009US7605390 Programmable photolithographic mask based on semiconductor nano-particle optical modulators
10/20/2009US7605350 System for two-step resist soft bake to prevent ILD outgassing during semiconductor processing
10/20/2009US7605113 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
10/20/2009US7605089 Method of manufacturing an electronic device
10/20/2009US7604928 Patterning method and methods for producing electro-optic device, color filter, illuminant, and thin-film transistor
10/20/2009US7604927 Methods of patterning using photomasks including shadowing elements therein and related systems
10/20/2009US7604926 Method of manufacturing a semiconductor device
10/20/2009US7604925 Exposure apparatus and method
10/20/2009US7604924 Negative-working imageable elements and methods of use
10/20/2009US7604923 Scanning, exposing image forming material having photosensitive layer comprising infrared absorbing agent, polymerization initiator and polymerizable compound on substrate to infrared beams; heat treatment; planographic printing plates
10/20/2009US7604921 Black matrix composition, black matrix prepared using the same, method of forming a black matrix pattern using the same and method of manufacturing a color filter substrate using the same
10/20/2009US7604920 Positive resist composition, method of forming resist pattern, polymeric compound, and compound
10/20/2009US7604919 Organobis(4-vinylbenzenesulfonyloxime) derivative monomers; resolution, photolithography; improved focus depth margin and the line edge roughness of photoresist patterns; fineness
10/20/2009US7604918 Photosensitive polymer and photoresist composition having the same
10/20/2009US7604917 addition-condensation copolymer comprising alkyl (meth)acrylate, 2-hydroxyethyl methacrylate monomers with polysilsesquioxane ladder polymer; coverings for photoresists; cost effective to manufacture; semiconductor wafer
10/20/2009US7604916 Laser induced thermal imaging (LITI) donor films having substrate, light-to-heat conversion layer, and pattern-directing layer; when imaged, LITI donor film transfers portion of templated transfer layer to permanent receptor while maintaining pattern substantially intact in transferred portion; displays
10/20/2009US7604912 manufacturing a semiconductor device; quantitatively correction by first calculating a effective numerical aperture to a pattern in the each region based on a light intensity distribution, then adjusting to form a desired pattern
10/20/2009US7604911 Coating an interpolymer hydrogen-bonded complex film of a proton donor polymer having a carboxylic or sulfonic acid group and a proton acceptor polymer having an amide group on the surface of a resist pattern to reduce the sizes of openings in the pattern
10/20/2009US7604910 Exposure mask, method of forming resist pattern and method of forming thin film pattern
10/20/2009US7604907 improve patterns at the boundaries of first and second exposure regions during a double exposure process; overlap the two exposure regions to offset the boundary between the binary pattern and the second halftone pattern
10/20/2009US7604424 Substrate processing apparatus
10/20/2009US7604359 High positioning reproducible low torque mirror-actuator interface
10/20/2009US7604343 Actinic ray curable composition, actinic ray curable ink, image formation method employing it, and ink-jet recording apparatus
10/20/2009CA2374207C A process for making a flexographic printing plate and a photosensitive element for use in the process
10/20/2009CA2356685C Coating agents which can be hardened by the addition of isocyanate groups as well as by the radiation-induced addition of activated c-c double covalent bonds
10/15/2009WO2009126916A2 Patterning devices using fluorinated compounds
10/15/2009WO2009126770A2 Plasma-based euv light source
10/15/2009WO2009125945A2 Photoresist stripper composition, and a photoresist peeling method employing the same
10/15/2009WO2009125940A2 Photoactive compound and photosensitive resin composition comprising the same
10/15/2009WO2009125867A1 Stage device, exposure apparatus, and method for manufacturing device
10/15/2009WO2009125806A1 Resin composition for energy ray-curable layer and sheet for forming through hole
10/15/2009WO2009125752A1 Photosensitive resin composition, and photosensitive resin laminate comprising the same
10/15/2009WO2009125745A1 Gas discharge chamber
10/15/2009WO2009125554A1 Exposure apparatus and electronic device manufacturing method
10/15/2009WO2009125530A1 Light source device, exposure device and manufacturing method
10/15/2009WO2009125511A1 Spatial light modulating unit, illumination optical system, aligner, and device manufacturing method
10/15/2009WO2009124942A1 Process for preparing a polymeric relief structure
10/15/2009WO2009124732A1 Shear-layer chuck for lithographic apparatus
10/15/2009WO2009124669A1 A method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus
10/15/2009WO2009124660A1 Lithographic apparatus comprising a closing device and device manufacturing method using the same
10/15/2009WO2009124595A1 Optical aperture device
10/15/2009WO2009124590A1 Optical aperture device
10/15/2009WO2009097436A3 On-track process for patterning hardmask by multiple dark field exposures
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