Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2009
10/28/2009CN101566797A Chemically amplified positive resist composition
10/28/2009CN101566796A Low temperature curing light-sensitive resin composition
10/28/2009CN101566795A Processing unit, processing method and technology for manufacturing chips
10/28/2009CN101566794A Lens manufacturing method
10/28/2009CN101566793A Double-beam holographic interference multiple exposure method for preparing two-dimensional photonic crystal
10/28/2009CN101566792A Colored filter reworking flow
10/28/2009CN101566789A Mask combination with scattering strip and photoetching method
10/28/2009CN101566768A Pixel structure for thin film transistor liquid crystal display and manufacturing method thereof
10/28/2009CN101566766A Picture element layout structure and manufacturing method thereof
10/28/2009CN101566721A Deep ultraviolet projection lithographic objective
10/28/2009CN101566702A Colored filter and method for manufacturing same
10/28/2009CN101566700A Aperture plate, manufacturing method thereof, lens module using same
10/28/2009CN101565486A Polymer and chemically amplified resist composition comprising the same
10/28/2009CN100555580C Composition for cleaning ion implanted photoresist in front end of line applications
10/28/2009CN100555569C Pattern forming method
10/28/2009CN100555567C Device processing system, information display method and application device
10/28/2009CN100555566C Light flux conversion element, lighting optical device, exposure system, and exposure method
10/28/2009CN100555086C Horizon sensor for photoetching device
10/28/2009CN100555085C Method of manufacturing an electronic device
10/28/2009CN100555084C Method for adjusting compositions of developing solution, and developing system
10/28/2009CN100555083C Removable pellicle for immersion lithography
10/28/2009CN100555082C Lithographic apparatus with contamination suppression and device manufacturing method
10/28/2009CN100555081C Lithographic apparatus
10/28/2009CN100555080C Method for determining optimal resist thickness
10/28/2009CN100555079C Process for refining crude resin for resist
10/28/2009CN100555078C Photosensitive resin composition, and electronic component and display using same
10/28/2009CN100555077C Hydrogenated ring-opening metathesis polymer and process for producing the same
10/28/2009CN100555076C Pressing die for nano stamping and preparation method
10/28/2009CN100555049C Liquid crystal display and method for fabricating the same
10/28/2009CN100555031C Processing method for rendering transparent electrode on transparent substrate invisible
10/28/2009CN100554234C Clear photopolymerizable systems for the preparation of high thickness coatings
10/28/2009CN100553971C Method and apparatus for printing a patterned layer on a flat substrate with a flat-type-bed
10/27/2009US7609455 Projection optical system and method for photolithography and exposure apparatus and method using same
10/27/2009US7609363 Helical optical pulse stretcher
10/27/2009US7609085 Configurable integrated circuit with a 4-to-1 multiplexer
10/27/2009US7608537 Method for fabricating semiconductor device
10/27/2009US7608528 Substrate cover, and charged particle beam writing apparatus and method
10/27/2009US7608390 Top antireflective coating composition containing hydrophobic and acidic groups
10/27/2009US7608389 Photoresists processable under biocompatible conditions for multi-biomolecule patterning
10/27/2009US7608388 Photoresists; photomasks
10/27/2009US7608386 Liquid immersion exposure; can transmit Argon fluoride excimer laser lights
10/27/2009US7608383 UV radiation blocking protective layers compatible with thick film pastes
10/27/2009US7608382 For example, homopolymer of alpha, alpha -bis(trifluoromethyl)bicyclo[2.2.1]hept-5-ene-2-ethanol or copolymers with ethylene or 5-norbornene-2-hydroxyethylether
10/27/2009US7608381 Polymer compound, positive resist composition and process for forming resist pattern
10/27/2009US7608380 a polyimide from a bis(aminophenyl)methane or sulfone and a diphenyl(methane or sulfone)-3,3'4,4'-tetracarboxylic acid; photolithographic dispersions; spin coatings for semiconductor wafers
10/27/2009US7608368 Pattern forming method, photomask manufacturing method, semiconductor device manufacturing method, and computer program product
10/27/2009US7608194 Photonic structures, devices, and methods
10/22/2009WO2009129537A2 Magnetic microstructures for magnetic resonance imaging
10/22/2009WO2009129443A2 Diaphragm flexure with large range and high load capacity
10/22/2009WO2009129441A2 Symmetric thermocentric flexure with minimal yaw error motion
10/22/2009WO2009129005A1 Modeling a sector-polarized-illumination source in an optical lithography system
10/22/2009WO2009128902A1 Method for producing ceramic stereolithography parts
10/22/2009WO2009128891A1 Making lithographic printing plates with simple processing
10/22/2009WO2009128717A1 Lithographic apparatus comprising an internal sensor and a mini-reactor, and method for treating a sensing surface of the internal sensor
10/22/2009WO2009128554A1 Exposure apparatus, cleaning method, and device fabricating method
10/22/2009WO2009128513A1 Resist underlayer film-forming composition for lithography containing aromatic fused ring-containing resin
10/22/2009WO2009128488A1 Illumination device, exposure device, and device manufacturing method
10/22/2009WO2009128439A1 Exposure method and device, and method for manufacturing device
10/22/2009WO2009128369A1 Photosensitive resin composition and layered object obtained therewith
10/22/2009WO2009128332A1 Illumination optical system, exposure apparatus, device manufacturing method, and exposure optical system
10/22/2009WO2009128302A1 Lithographic printing plate material, and method for production of lithographic printing plate
10/22/2009WO2009128291A1 Lithographic printing plate material
10/22/2009WO2009127824A1 Photopolymerizable compositions
10/22/2009WO2009127400A1 Apparatus for supporting an optical element, and method of making same
10/22/2009WO2009127391A1 Rapid exchange device for lithography reticles
10/22/2009WO2009127368A1 Method for analyzing masks for photolithography
10/22/2009WO2009127355A1 Inspection apparatus for lithography
10/22/2009WO2009127119A1 Detergent for removing plasma etching residues
10/22/2009WO2009108771A3 Methods of patterning a conductor on a substrate
10/22/2009WO2009105045A8 Patterning of nanostructures
10/22/2009US20090265680 Method and system for correcting a mask pattern design
10/22/2009US20090264592 Derivatized Polyhydroxystyrenes with a novolak type structure and processes for preparing the same
10/22/2009US20090263751 Methods for double patterning photoresist
10/22/2009US20090263750 Foreign particle inspection apparatus, exposure apparatus, and method of manufacturing device
10/22/2009US20090263749 Method of forming fine patterns of semiconductor device
10/22/2009US20090263748 Method of manufacturing wiring circuit board
10/22/2009US20090263747 Three axis linear actuator
10/22/2009US20090263746 Method of making lithographic printing plates with simple processing
10/22/2009US20090263745 Polyimide precursor, resin composition comprising the polyimide precursor, pattern forming method using the resin composition, and articles produced by using the resin composition
10/22/2009US20090263744 Ethylenically unsaturated compound, light sensitive composition, light sensitive planographic printing plate material and printing process employing the same
10/22/2009US20090263743 Resist polymer and resist composition
10/22/2009US20090263742 liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group
10/22/2009US20090263741 Positive resist composition and method of forming resist pattern
10/22/2009US20090263736 Exposure apparatus, exposure method, and device manufacturing method
10/22/2009US20090263735 Exposure apparatus
10/22/2009US20090263734 Lithographic Apparatus and Device Manufacturing Method
10/22/2009US20090263733 Photo mask, focus measuring method using the mask, and method of manufacturing semiconductor device
10/22/2009US20090263732 Mask patterns including gel layers for semiconductor device fabrication
10/22/2009US20090263729 Templates for imprint lithography and methods of fabricating and using such templates
10/22/2009US20090263577 Liquid processing apparatus and liquid processing method
10/22/2009US20090263075 Temperature Insensitive Arrayed Waveguide Grating Multiplexer for Optical Property Compensation and the Manufacturing Method Thereof
10/22/2009US20090262358 Airway adaptor with optical pressure transducer and method of maufacturing a sensor component
10/22/2009US20090262327 Mask transport system configured to transport a mask into and out of a lithographic apparatus
10/22/2009US20090262322 Optical arrangement of autofocus elements for use with immersion lithography
10/22/2009US20090261936 Thin film structures with negative inductance and methods for fabricating inductors comprising the same
10/22/2009US20090261501 Manufacturing method for a stamper and manufacturing method for an optical information recording medium using the stamper
10/22/2009US20090261491 Method for Producing Surface Convexes and Concaves
10/22/2009US20090261419 Semiconductor device having assist features and manufacturing method thereof
10/22/2009US20090261375 Package-base structure of luminescent diode and fabricating process thereof
10/22/2009DE102009013801A1 Musterschreibesystem und Parameterüberwachungsverfahren für eine Musterschreibevorrichtung Write pattern system and parameter monitoring method for pattern writing device
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