Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2009
11/03/2009US7612866 Lithography system
11/03/2009US7612865 Pattern writing apparatus and pattern writing method
11/03/2009US7612864 Exposure apparatus and method
11/03/2009US7612860 Color filter on thin film transistor type liquid crystal display device and method of fabricating the same with an alignment key formed with the orientation layer
11/03/2009US7612314 Manufacturing method that uses laser surface transformation to produce new and unique surface profiles for rotating bearings
11/03/2009US7612146 Polymeric compositions and uses therefor
11/03/2009US7611828 Photoactive adhesion promoter
11/03/2009US7611827 Photosensitive resin composition, ink jet head using photosensitive resin composition, and process for manufacturing ink jet head
11/03/2009US7611826 Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same
11/03/2009US7611825 Forming bottom anti-reflective coating(BARC) layer on substrate, treating BARC layer to make its surface hydrophilic, forming photoresist layer on treated BARC layer, exposing photoresist layer to predetermined pattern, and developing photoresist layer to form patterned photoresist; improved adhesion
11/03/2009US7611824 Cardboard support; a non-photosensitive layer containing an alkali soluble binder polymer, styrenesulfonic acid; undercoat layer carboxymethyl cellulose; for computer-to-plate, CTP plate-making system
11/03/2009US7611822 Positive resist composition used for semiconductor microfabrication employing a lithography process contains an acid generator comprising a compound generating an acid by irradiation and a monomer having a bulky and acid-labile group
11/03/2009US7611821 Positive resist compositions and patterning process
11/03/2009US7611820 For immersion exposure suitable for exposure with an immersion projection exposure apparatus using far ultraviolet rays of wavelengths of 300 nm or less as the light source; resist compositions are excellent in line edge roughness
11/03/2009US7611819 Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same
11/03/2009US7611818 Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board
11/03/2009US7611817 Aromatic sulfonium salt compound, photo-acid generator comprising the same and photopolymerizable composition containing the same, resin composition for optical three-dimensional shaping, and method of optically forming three-dimensional shape
11/03/2009US7611758 Plasma vapor deposition; tunable etch resistant film; electrode coupled to radio frequency power source; substrate holder coupled to second radio frequency
11/03/2009US7611597 Method for thermal development using apparatus having a removable support member
11/03/2009CA2282354C Chemical microreactors and method for their manufacture
10/2009
10/29/2009WO2009132321A1 Polymer pen lithography
10/29/2009WO2009132023A2 Photosensitive hardmask for microlithography
10/29/2009WO2009131189A1 Ketoxime ester compound and use thereof
10/29/2009WO2009130956A1 Reflective mask blank for euv lithography, and reflective mask for euv lithography
10/29/2009WO2009130846A1 Laser exposure method, photoresist layer working method, and pattern molding manufacturing method
10/29/2009WO2009130627A1 An integrated circuit and a misalignment determination system for characterizing the same
10/29/2009WO2009130603A2 Spatial light modulator with structured mirror surfaces
10/29/2009WO2009130011A1 Robot for in-vacuum use
10/29/2009WO2009130010A1 Method and apparatus for measuring line end shortening, substrate and patterning device
10/29/2009WO2009129974A1 Apparatus and method of measuring a property of a substrate
10/29/2009WO2009129960A1 Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device
10/29/2009WO2009129858A1 High aspect ratio microstructures
10/29/2009WO2009103706A3 Method of thermocleaving a polymer layer
10/29/2009WO2009096691A3 Method for selective adsorption of noble metal catalyst onto surface of polymer
10/29/2009US20090269708 Method of manufacturing magnetic head having a patterned pole layer and method of forming a patterned layer
10/29/2009US20090269707 Thick Film Layers and Methods Relating Thereto
10/29/2009US20090269706 Method for forming resist pattern
10/29/2009US20090269705 Lighography method
10/29/2009US20090269704 Manufacturing method of opto-electric hybrid board
10/29/2009US20090269703 Color electrophoretic display and method of manufacturing the same
10/29/2009US20090269702 Method for introducing inclusion image into gemstone
10/29/2009US20090269701 Positive resist composition and method of forming resist pattern
10/29/2009US20090269700 Positive resist composition and method of forming resist pattern
10/29/2009US20090269699 On-press developable elements and methods of use
10/29/2009US20090269698 Compound, positive resist composition and method for formation of resist pattern
10/29/2009US20090269697 Polyorganosiloxane, resin composition, and patterning process
10/29/2009US20090269696 Sulfonium salt-containing polymer, resist composition, and patterning process
10/29/2009US20090269695 liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group
10/29/2009US20090269694 Positive resist composition, method of forming resist pattern, and polymeric compound
10/29/2009US20090269693 Negative resist composition and method of forming resist pattern
10/29/2009US20090269685 Position aligning apparatus, position aligning method, and semiconductor device manufacturing method
10/29/2009US20090269683 Radiation-sensitive resin composition and color filters
10/29/2009US20090269682 Method of forming etching mask, etching method using the etching mask, and method of fabricating semiconductor device including the etching method
10/29/2009US20090269681 Method of detecting exposure boundary position, and method of fabricating semiconductor device
10/29/2009US20090269680 Image mask and image mask assembly
10/29/2009US20090269679 Phase Shift Mask for Double Patterning and Method for Exposing Wafer Using the Same
10/29/2009US20090269554 Bakeable lithographic printing plates with a high resistance to chemicals
10/29/2009US20090269524 Method and apparatus for altering device appearance
10/29/2009US20090269010 Optical interconnection structure and method for manufacturing the same
10/29/2009US20090268302 Light blocking plate, lens module having same and method for making same
10/29/2009US20090268294 Molded product and method for manufacturing same
10/29/2009US20090268190 Lithographic apparatus and device manufacturing method
10/29/2009US20090268189 Masks, lithography device and semiconductor component
10/29/2009US20090267706 Resonator and fabrication method thereof
10/29/2009US20090267249 Method for fabricating microlenses and process of single photomask pattern-based photolithography
10/29/2009US20090267239 Positive photosensitive resin composition
10/29/2009US20090266621 Reliability Metal Traces
10/29/2009US20090266585 Flame-Retardant Composition for Solder Resist and Cured Product Thereof
10/28/2009EP2112556A1 Method and apparatus for thermal development with a conformable support
10/28/2009EP2112555A2 Lithographic printing plate precursor
10/28/2009EP2112554A2 Sulfonium salt-containing polymer, resist composition, and patterning process
10/28/2009EP2112188A1 Polyorganosiloxane, resin composition, and patterning process
10/28/2009EP2112147A1 Sulfonium salts as photoinitiators
10/28/2009EP2112146A1 Sulfonium salt photoinitiators and their use
10/28/2009EP2111568A1 Apparatus with plasma radiation source, method of forming a beam of radiation and lithographic apparatus
10/28/2009EP2111567A2 Photoresist composition
10/28/2009EP2111566A2 Fine pattern transfer material
10/28/2009EP1709024B1 Piperazino sensitisers
10/28/2009EP1636651B1 Low-viscous, radiation curable formulation, particularly for the stereolithographical production of earpieces
10/28/2009EP1289967B1 Triazine-based compound comprising functionalized alkylthio groups, and photopolymerization initiator
10/28/2009EP1259663B1 Method and device for growing large-volume oriented monocrystals
10/28/2009CN101569243A Reducing fast ions in a plasma radiation source
10/28/2009CN101569036A Negative electrode base member
10/28/2009CN101568991A Composition for formation of antireflection film and pattern formation method using the same
10/28/2009CN101568885A Method of treating rinsing wastewater from developing apparatus for photosensitive lithographic printing plate, method of development, and developing apparatus
10/28/2009CN101568884A Optical system, in particular an illumination system or projection objective of a microlithographic projection exposure apparatus
10/28/2009CN101568883A Photosensitive resin composition, photosensitive element, method for resist pattern formation, and method for manufacturing printed wiring board
10/28/2009CN101568882A Photosensitive resin composition and layered product
10/28/2009CN101568572A Polyimide precursor and photosensitive resin composition containing polyimide precursor
10/28/2009CN101567332A Method for manufacturing semiconductor element by adopting dual-damascene techniques
10/28/2009CN101567331A Developing method used in process of fabricating metal interconnected connecting hole structure
10/28/2009CN101567302A Alignment mark, forming method thereof and alignment method of semiconductor
10/28/2009CN101566854A Method for controlling position of movable object, positioning system, and lithographic apparatus
10/28/2009CN101566804A Developing agent for flat-panel display
10/28/2009CN101566803A Exposure method and apparatus, and electronic device manufacturing method and lighting optical device
10/28/2009CN101566802A System and method for direct writing to wafer
10/28/2009CN101566801A Method and device for preventing eyeglass collision
10/28/2009CN101566800A Aligning system and aligning method for lithography equipment
10/28/2009CN101566799A Method for preparing hollowed-out polyimide evaporation shadow mask
10/28/2009CN101566798A Chemically amplified positive resist composition
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