| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 11/11/2009 | CN101576715A Calibration method for microscopic imaging systems |
| 11/11/2009 | CN101576714A Alignment datum plate of photoetching device and manufacturing method thereof |
| 11/11/2009 | CN101576713A Manufacture method for non-spherical insert |
| 11/11/2009 | CN101576712A Cavity manufacturing method |
| 11/11/2009 | CN101576711A Device and method for preparing optical waveguide in transparent solid material by femtosecond laser |
| 11/11/2009 | CN101576689A Electrode structure of smectic LCD baseplate and manufacturing method thereof |
| 11/11/2009 | CN101576686A Liquid crystal display device and production method thereof |
| 11/11/2009 | CN101576624A Light-condensing device and method of fabricating the same |
| 11/11/2009 | CN100559551C Multilayer reflecting mirror, multilayer reflecting mirror manufacturing method, optical system, exposure apparatus and device manufacturing method |
| 11/11/2009 | CN100559287C Photoresist stripping agent composition |
| 11/11/2009 | CN100559286C Technology for removing photoetching film |
| 11/11/2009 | CN100559285C Projection exposure apparatus and method for producing a printed circuit board |
| 11/11/2009 | CN100559284C Automatic measuring method for heterogeneous light of photo-etching machine |
| 11/11/2009 | CN100559283C Method for measuring Cube-Prism non-orthogonality angle and scale factor correct value |
| 11/11/2009 | CN100559282C Method for improving alignment signal processing precision based on self-adapting correction treatment |
| 11/11/2009 | CN100559281C Exposure device and exposure method |
| 11/11/2009 | CN100559280C Objective glass testing device and method thereof |
| 11/11/2009 | CN100559279C Method for manufacturing thin film transistor substrate using maskless exposing device |
| 11/11/2009 | CN100559278C Optical system of focusing and leveling sensor |
| 11/11/2009 | CN100559277C Photo-etching illumination system |
| 11/11/2009 | CN100559276C Lithographic apparatus and device manufacturing method |
| 11/11/2009 | CN100559275C Method for manufacturing semiconductor element |
| 11/11/2009 | CN100559274C Projection exposure device |
| 11/11/2009 | CN100559273C Photoetching device and measuring system |
| 11/11/2009 | CN100559272C Method for constituting sub-10 nano gap and array thereof |
| 11/11/2009 | CN100559271C Method and device for transferring a pattern from a stamp to a substrate |
| 11/11/2009 | CN100559269C Photomasks including shadowing elements therein and related methods and systems |
| 11/11/2009 | CN100559250C Array substrate for liquid crystal display device and method of fabricating the same |
| 11/11/2009 | CN100559249C Liquid crystal display device and method of fabricating the same |
| 11/11/2009 | CN100559238C Liquid crystal display device and method of fabricating the same |
| 11/11/2009 | CN100559217C Spectral purity filter for multi-layer mirror, lithographic apparatus and device manufacturing method |
| 11/11/2009 | CN100559120C Production method for novel gyroscope signal reading graph |
| 11/11/2009 | CN100558735C Perfluoropolyether amide-linked phosphonates, phosphates, and derivatives thereof |
| 11/11/2009 | CN100558686C Alicyclic unsaturated compound, polymer, chemically amplified resist composition and method for forming pattern using said composition |
| 11/10/2009 | USRE40964 Negative type resist composition |
| 11/10/2009 | US7616383 Lithographic apparatus and device manufacturing method |
| 11/10/2009 | US7615837 Lithography device for semiconductor circuit pattern generation |
| 11/10/2009 | US7615738 Scanning probe microscope assembly and method for making spectrophotometric, near-field, and scanning probe measurements |
| 11/10/2009 | US7615581 Black paste composite, upper plate of plasma display panel, and manufacturing method by using the same |
| 11/10/2009 | US7615488 Method for forming pattern, thin film transistor, display device and method for manufacturing the same, and television device |
| 11/10/2009 | US7615388 Electroluminescent element |
| 11/10/2009 | US7615338 Photoresist coating composition and method for forming fine pattern using the same |
| 11/10/2009 | US7615336 a shielding pattern partially formed on a transparent substrate; a first halftone transmission pattern partially formed on the transparent substrate; and a second halftone transmission pattern formed on the first halftone transmission layer |
| 11/10/2009 | US7615334 Ink composition for etching resist, method of forming etching resist pattern using the same, and method of forming microchannel using the ink composition |
| 11/10/2009 | US7615332 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process |
| 11/10/2009 | US7615331 Good mechanical properties, low-temperature curing; comprising a polymer having a specific structure and a compound containing a methacryloyl or acryloyl group within the molecule |
| 11/10/2009 | US7615330 containing an acid generating compound including a sulfonium cation, a low molecular weight polyhydric phenol compound which increases solubility in an alkali developing solution by an action of an acid; coating, exposing resist film and developing to form resist pattern |
| 11/10/2009 | US7615329 Branching self-assembling photoresist with decomposable backbone |
| 11/10/2009 | US7615324 Polyamide resin comprising (hydroxy)dicarboxylic acid and (hydroxy)diamine monomers; a photosensitive agent; a thermo-acid generator; and a compound having at least one of an alkoxymethyl group and an acyloxymethyl group; heat resistance, shrinkage inhibition; lithography, semiconductors |
| 11/10/2009 | US7615323 Lithographic printing plate precursors with oligomeric or polymeric sensitizers |
| 11/10/2009 | US7615322 a coloring agent including an anthraquinone-based dye and an organic pigment; a meta-cresol-formaldehyde novolak resin binder, hexakis/methoxymethyl/melamine crosslinker and propylene glycol methyl ether propionate as a solvent, benzophenone photopolymerization initiator; exposing to light, developing |
| 11/10/2009 | US7615320 Method for fabricating color filler substrate |
| 11/10/2009 | US7615179 Use of novel micro- and nano-imprinting techniques for making supported three-dimensional micro- and nano-structures for pixel segregation in OLED-based displays; enables assembly of polymers without a glass transition temperature and eliminates heating required to assemble thermoplastic polymers |
| 11/10/2009 | US7615119 Apparatus for spin coating semiconductor substrates |
| 11/10/2009 | US7615117 Coating and processing apparatus and method |
| 11/05/2009 | WO2009135102A2 Low ph mixtures for the removal of high density implanted resist |
| 11/05/2009 | WO2009133817A1 Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board |
| 11/05/2009 | WO2009133759A1 Method for cleaning euv exposure apparatus |
| 11/05/2009 | WO2009133704A1 Exposure apparatus, exposure method and device manufacturing method |
| 11/05/2009 | WO2009133621A1 Resist liquid diluting apparatus and method of diluting resist liquid |
| 11/05/2009 | WO2009133456A1 Spin-on graded k silicon antireflective coating |
| 11/05/2009 | WO2009132800A1 Support structure, inspection apparatus, lithographic apparatus and methods for loading and unloading substrates |
| 11/05/2009 | WO2009132756A1 Illumination optics for euv microlithography and illumination system and projection exposure apparatus comprising an illumination optics of this type |
| 11/05/2009 | WO2009114572A3 Phototools having a protective layer |
| 11/05/2009 | WO2009106903A3 A photomask and devices with nano-sized elements |
| 11/05/2009 | WO2009087027A3 Ionic, organic photoacid generators for duv, muv and optical lithography based on peraceptor-substituted aromatic anions |
| 11/05/2009 | US20090275694 Spin-on-Glass Anti-Reflective Coatings for Photolithography |
| 11/05/2009 | US20090274984 Carboxyl-containing lactone compound, polymer, resist composition, and patterning process |
| 11/05/2009 | US20090274983 Scanning exposure apparatus and method of manufacturing device |
| 11/05/2009 | US20090274982 Method of making a semiconductor device using negative photoresist |
| 11/05/2009 | US20090274981 Method of detecting repeating defects in lithography masks on the basis of test substrates exposed under varying conditions |
| 11/05/2009 | US20090274980 Method of forming fine patterns of semiconductor device by using double patterning process which uses acid diffusion |
| 11/05/2009 | US20090274979 Device and method for removing overcoat of on-press developable lithographic plate |
| 11/05/2009 | US20090274978 Novel photoacid generator, resist composition, and patterning process |
| 11/05/2009 | US20090274977 Compound and radiation-sensitive composition |
| 11/05/2009 | US20090274976 Negative resist composition for immersion exposure and method of forming resist pattern |
| 11/05/2009 | US20090274975 Positive photosensitive composition and method of forming pattern therewith |
| 11/05/2009 | US20090274974 Spin-on graded k silicon antireflective coating |
| 11/05/2009 | US20090274964 Measuring apparatus and exposure apparatus having the same |
| 11/05/2009 | US20090274963 Measurement apparatus, measurement method, exposure apparatus, and device manufacturing method |
| 11/05/2009 | US20090274961 Photosensitive composition for volume type hologram memory |
| 11/05/2009 | US20090274908 Preparation process of microbeads, and microbeads |
| 11/05/2009 | US20090274900 Composition For Positive Type Photoresist and Positive Type Photoresist Film Manufactured Thereby |
| 11/05/2009 | US20090273008 Image sensor and method for manufacturing the same |
| 11/05/2009 | DE102008041910A1 Catoptric or catadioptric obscured imaging system for e.g. microscope for surgical operation, has mirror support including bar-like structures for supporting mirror and arranged on reflecting mirror surface |
| 11/05/2009 | DE102008018763A1 Lithografiebelichtungseinrichtung Lithography exposure device |
| 11/05/2009 | DE102008001511A1 Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik Illumination optics for EUV lithography and micro lighting system and projection exposure apparatus having an illumination optics |
| 11/05/2009 | DE102008000990B3 Vorrichtung zur mikrolithographischen Projektionsbelichtung und Verfahren zum Prüfen einer derartigen Vorrichtung An apparatus for microlithographic projection exposure and a method for testing such a device |
| 11/04/2009 | EP2113813A1 Radiation source and lithographic apparatus |
| 11/04/2009 | EP2113812A1 Exposure apparatus and device manufacturing method |
| 11/04/2009 | EP2113811A1 Composition for antireflective coating |
| 11/04/2009 | EP2113810A1 Photosensitive resin composition, cured film, protective film, insulating film and semiconductor device using the same, and display device |
| 11/04/2009 | EP2113381A2 On-press developable elements and methods of use |
| 11/04/2009 | EP2113301A1 Preparation of microbeads, and microbeads |
| 11/04/2009 | EP1634122B1 Method for evaluating the effects of multiple exposure processes in lithography |
| 11/04/2009 | CN201341275Y PCB thin board developing horizontal line traction bridge |
| 11/04/2009 | CN101573662A Precursor for waterless lithographic printing plate |
| 11/04/2009 | CN101573661A Pigment-dispersed composition, curable composition, color filter and production method thereof |
| 11/03/2009 | US7614027 Methods for forming a MRAM with non-orthogonal wiring |
| 11/03/2009 | US7612867 Lithographic apparatus |