Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2009
11/18/2009CN100561348C Feature optimization using interference mapping lithography
11/18/2009CN100561347C Photoetching apparatus, device manufacturing method and device therefrom
11/18/2009CN100561346C Photoresist coating device and its method
11/18/2009CN100561345C Manufacturing method of aluminous plate for PS plate substrate for printing
11/18/2009CN100561344C Fluorinated photoresist materials with improved etch resistant properties
11/18/2009CN100561343C Photopolymerizable compositions and flexographic plates prepared from controlled distribution block copolymers
11/18/2009CN100561342C Photopolymerizable compositions and flexographic printing plates derived therefrom
11/18/2009CN100561341C Toning promoter for preparing diazo positive image sensitive paper
11/18/2009CN100561337C Low-activation energy silicon-containing resist system
11/18/2009CN100561306C Color membrane substrate and production method thereof as well as LCD device
11/18/2009CN100561288C Minitype optical device and method for producing the same
11/18/2009CN100560655C Use of a pigment preparation based on C.I. pigment yellow 74
11/17/2009US7619827 Projection optical system and method for photolithography and exposure apparatus and method using same
11/17/2009US7619748 Exposure apparatus mounted with measuring apparatus
11/17/2009US7619738 Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus
11/17/2009US7619718 Method and system for active purging of pellicle volumes
11/17/2009US7619715 Coupling apparatus, exposure apparatus, and device fabricating method
11/17/2009US7619714 Immersion exposure technique
11/17/2009US7618769 Textured chamber surface
11/17/2009US7618768 Method of forming micropattern, method of manufacturing optical recording medium master copy, optical recording medium master copy, optical recording medium stamper, and optical recording medium
11/17/2009US7618767 Illuminant distribution evaluation method, optical member manufacturing method, illumination optical device, exposure apparatus, and exposure method
11/17/2009US7618766 Halogen-free flame retardant coverlay materials for flexible printed circuit board packaging;flexible, aqueous-processible, photoimagable; photosensitive; phosphorus containing acrylates and phosphorus-containing photo-initiators mixed with a polymer binder;blocked (poly)isocyanate thermal crosslinker
11/17/2009US7618765 Mixture of a blocked acrylic ester resin which becomes soluble in alkaline developer under action of an acid and sulfonium salt acid generator
11/17/2009US7618764 Positive resist compositions and patterning process
11/17/2009US7618763 Hydroxystyrene/indene/alkoxyisobutoxystyrene copolymer as base resin for chemical amplified positive resist; photoacid generators; increased dissolution contrast; high resolution; satisfactory resist pattern profile after development; improved etch resistance; micropatterning for integrated circuits
11/17/2009US7618762 Polymer having polymerizable group, polymerizable composition, planographic printing plate precursor, and planographic printing method using the same
11/17/2009US7618751 RET for optical maskless lithography
11/17/2009US7618704 Spin-printing of electronic and display components
11/12/2009WO2009137735A1 Thick film recycling method
11/12/2009WO2009137049A1 Molecular resist compositions, methods of patterning substrates using the compositions and process products prepared therefrom
11/12/2009WO2009136920A1 Multifunctional nitrones in non-radical systems
11/12/2009WO2009136861A1 Apparatus and method for depositing and curing flowable material
11/12/2009WO2009136647A1 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device each comprising the cured film
11/12/2009WO2009136557A1 Polyimide precursor, photosensitive polyimide precursor composition, photosensitive dry film, and flexible printed circuit board using those materials
11/12/2009WO2009136441A1 Electron beam lithography system and method for electron beam lithography
11/12/2009WO2009136242A1 An antireflective coating composition
11/12/2009WO2009136093A1 Method for preparing a photo-crosslinkable composition
11/12/2009WO2009135586A1 Illumination system comprising a fourier optical system
11/12/2009WO2009135576A1 Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus
11/12/2009WO2009135556A1 Projection optic for microlithography comprising an intensity-correcting device
11/12/2009WO2009108543A3 Multi-photon exposure system
11/12/2009WO2009105347A3 Process sequence for formation of patterned hard mask film (rfp) without need for photoresist or dry etch
11/12/2009WO2009102359A3 Nonlinear optical chromophores with stabilizing substituent and electro-optic devices
11/12/2009WO2009100362A3 Method and apparatus for provisioning dual mode wireless client devices in a telecommunications system
11/12/2009WO2009095282A3 Photolatent amidine bases for redox curing of radically curable formulations
11/12/2009WO2008106245A8 Method of forming soft lithographic molds with fluorine modified elastomers
11/12/2009US20090281250 Methods and materials for fabricating microfluidic devices
11/12/2009US20090281017 Cleaning Composition
11/12/2009US20090281016 LOW pH MIXTURES FOR THE REMOVAL OF HIGH DENSITY IMPLANTED RESIST
11/12/2009US20090280441 Exposure method, exposure device, and micro device manufacturing method
11/12/2009US20090280440 Surface treating agent for resist-pattern, and pattern-forming method using same
11/12/2009US20090280439 Exposure apparatus, exposure method, and device manufacturing method
11/12/2009US20090280438 Method of forming pattern
11/12/2009US20090280437 Projection exposure methods and systems
11/12/2009US20090280436 Immersion system, exposure apparatus, exposing method, and device fabricating method
11/12/2009US20090280435 Antireflective coating composition
11/12/2009US20090280434 Resist composition and patterning process
11/12/2009US20090280433 Radiation-sensitive composition and process for producing low-molecular compound for use therein
11/12/2009US20090280432 Photosensitive sheets and method and apparatus for manufacturing the same
11/12/2009US20090280431 Material for protective film formation, and method for photoresist pattern formation using the same
11/12/2009US20090280418 Exposure apparatus, correction method, and device manufacturing method
11/12/2009US20090280417 photoresists, etching
11/12/2009US20090280416 Black photosensitive resin composition, and color filter and method of producing the same
11/12/2009US20090279088 Systems and methods for measurement of a specimen with vacuum ultraviolet light
11/12/2009US20090278569 Semiconductor Device and its Manufacturing Method, Semiconductor Manufacturing Mask, and Optical Proximity Processing Method
11/12/2009US20090278235 Manufacturing method of semiconductor device, and semiconductor device
11/12/2009DE102008023763A1 Illumination system for use in microlithographic-projection illumination system during production of semiconductor component, has Fourier optics system including ratio of overall length to bandwidth less than specific value
11/12/2009DE102008022881A1 Two-dimensional, individually controllable vertical cavity surface emitting laser-emitter arrangement for use in e.g. direct imaging printing machine, is rotated around one axis, where positions of emitters lie on hexagonal grid
11/12/2009DE102008022253A1 Hochauflösendes Fotoplottverfahren und Anordnung zur hochauflösenden Aufzeichnung eines computergespeicherten Rasterbildes auf einen ebenen lichtempfindlichen Aufzeichnungsträger High resolution Fotoplottverfahren and apparatus for high-resolution recording of a computer-stored raster image on a flat photosensitive carrier
11/12/2009DE102008001694A1 Projektionsoptik für die Mikrolithografie Projection optics for microlithography
11/12/2009DE102008001553A1 Komponente zur Einstellung einer scanintegrierten Beleuchtungsenergie in einer Objektebene einer Mikrolithographie-Projektionsbelichtungsanlage Component for setting a scan-integrated illumination energy in an object plane of a microlithography projection exposure apparatus
11/12/2009CA2723681A1 Molecular resist compositions, methods of patterning substrates using the compositions and process products prepared therefrom
11/12/2009CA2720663A1 Method for preparing a photo-crosslinkable composition
11/11/2009EP2117034A1 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method
11/11/2009EP2116902A1 Composition for forming cured film pattern, and method for producing cured film pattern by using the same
11/11/2009EP2116901A1 High resolution photo plot method and assembly for recording a high resolution halftone image stored on a computer on a level photosensitive recording medium
11/11/2009EP2116900A1 Processed substrates having water-repellent areas in patterns, process for production thereof, and process for production of members having patterms made of functional material films
11/11/2009EP2116899A2 Composition for forming inorganic pattern and method for forming inorganic pattern using the same
11/11/2009EP2116527A1 Oxime compound, photosensitive composition, color filter, method for production of the color filter, and liquid crystal display element
11/11/2009EP2115535A2 Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus
11/11/2009EP2115522A1 Illumination system of a microlithographic projection exposure apparatus
11/11/2009EP2115406A2 Laser produced plasma euv light source
11/11/2009EP2115073A2 Blue phthalocyanine pigment composition and its preparation
11/11/2009EP2114675A1 Photopolymerizable flexographic printing elements and hard flexographic printing formes which are produced therefrom
11/11/2009EP1735666B1 Optical element unit for exposure processes
11/11/2009EP1650786B1 Light source unit, illumination optical apparatus and exposure apparatus
11/11/2009EP1620475B1 Novel trifunctional photoinitiators
11/11/2009CN201345033Y High-speed multi-beam parallel laser direct-writing device
11/11/2009CN201345032Y Light shield box
11/11/2009CN101578556A Stripper for coating layer
11/11/2009CN101578555A Photocurable resin composition, cured product pattern, and printed wiring board
11/11/2009CN101578542A Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror
11/11/2009CN101578320A Novel polyimide precursor composition, use thereof and production method thereof
11/11/2009CN101578232A Methods using block copolymer self-assembly for sub-lithographic patterning
11/11/2009CN101576790A Manufacturing process for touch-control panel
11/11/2009CN101576720A Device and method for recovering silver in developing solution of plasma flat panel display
11/11/2009CN101576719A Lithographic apparatus and device manufacturing method
11/11/2009CN101576718A Immersion lithographic apparatus, drying device, immersion measuring apparatus and method of manufacturing the device
11/11/2009CN101576717A Coupling apparatus, exposure apparatus, and device fabricating method
11/11/2009CN101576716A Mobile body system, exposure apparatus, and method of producing device
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