Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2009
11/24/2009US7623557 Wavelength converting optical system, laser light source, exposure apparatus, mask examining apparatus, and macromolecular crystal lens machining device
11/24/2009US7623220 Source optimization for image fidelity and throughput
11/24/2009US7622246 Contrast enhancing layers
11/24/2009US7622243 Photosensitive element, resist pattern formation method and printed wiring board production method
11/24/2009US7622242 Resist composition and patterning process
11/24/2009US7622241 Initiator compositions, negative-working imageable elements, and methods of use
11/24/2009US7622240 Low blur molecular resist
11/24/2009US7622239 Micro-patterned SiO2/TiO2 films through photo and chemical reactions
11/24/2009CA2421527C Seamless master and method of making same
11/24/2009CA2388387C Method for synchronizing positioning and exposure processes
11/19/2009WO2009140442A2 Heated cantilever
11/19/2009WO2009140440A1 Dual-tip cantilever
11/19/2009WO2009140439A1 Nanomanufacturing devices and methods
11/19/2009WO2009140270A2 System and method for light source employing laser-produced plasma
11/19/2009WO2009140172A2 Selective inductive double patterning
11/19/2009WO2009139498A1 Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
11/19/2009WO2009139494A1 Exposure apparatus, exposure method, and device manufacturing method
11/19/2009WO2009139491A1 Exposure apparatus, exposure method, and device manufacturing method
11/19/2009WO2009139448A1 Pattern forming method
11/19/2009WO2009139421A1 Positive-type photosensitive composition
11/19/2009WO2009139335A1 Photosensitive resin composition
11/19/2009WO2009139208A1 Lithographic printing plate material
11/19/2009WO2009138835A1 Method for the real-time monitoring of integrated circuit manufacture through localized monitoring structures in opc model space
11/19/2009WO2009138162A1 Inspection apparatus for lithography
11/19/2009WO2009105667A3 Chain scission polyester polymers for photoresists
11/19/2009US20090286379 Method of manufacturing imprint substrate and imprinting method
11/19/2009US20090286188 Patterning process
11/19/2009US20090286187 Manufacturing method of optical waveguide device
11/19/2009US20090286186 Method of manufacturing a coordinate detector
11/19/2009US20090286185 Method of Manufacturing Semiconductor Device
11/19/2009US20090286184 Method for manufacturing conductive member pattern
11/19/2009US20090286183 Truly processless lithographic printing plate precursor
11/19/2009US20090286182 Resist protective coating composition and patterning process
11/19/2009US20090286181 Clear and colorless three-dimensional articles made via stereolithography and method of making said articles
11/19/2009US20090286180 Fused aromatic structures and methods for photolithographic applications
11/19/2009US20090286179 acrylate ester resin having a tertiary alkyl ester-type acid dissociable, dissolution inhibiting group, and acid generator; reducing line width roughness (LWR) and suppressing development of footing which is likely to occur with a substrate having an inorganic antireflection film (inorganic BARC)
11/19/2009US20090286178 Process for producing resist composition, filtering apparatus, resist composition applicator, and resist composition
11/19/2009US20090286174 Manufacturing method and manufacturing system of semiconductor device
11/19/2009US20090286173 Electronic component forming apparatus, electronic component formed with it and forming method thereof
11/19/2009US20090286172 Surface shape measurement apparatus and exposure apparatus
11/19/2009US20090286171 Lithographic mask and manufacturing method thereof
11/19/2009US20090286167 Cross technology reticles
11/19/2009US20090286165 Hologram laminate, hologram copy method, and hologram producing method
11/19/2009US20090286066 Patterned, dense and high-quality swnts arrays
11/19/2009US20090286053 Lithographic method
11/19/2009US20090284840 Process for making microlens arrays and masterforms
11/19/2009US20090284744 Apparatus and methods for detecting overlay errors using scatterometry
11/19/2009US20090284729 Illumination optical apparatus and projection exposure apparatus
11/19/2009US20090284721 providing a reticle system and assigning two or more of an image pattern onto the reticle system to form one or more layers of an integrated circuit system by grouping and pairing each of the image pattern onto the reticle system according to a multi-layer reticle grouping/pairing flow
11/19/2009US20090284720 Lithographic Apparatus and Device Manufacturing Method
11/19/2009US20090284567 Ink jet recording head, producing method therefor and composition for ink jet recording head
11/19/2009US20090283725 Photosensitive paste composition, pdp electrode manufactured using the composition, and pdp comprising the pdp electrode
11/19/2009US20090283000 Intaglio printing plate, production method for intaglio printing plate, production method for electronic substrate, and production method for display device
11/18/2009EP2120098A2 Apparatus and process for positioning a cylindrically-shaped printing element
11/18/2009EP2120097A1 Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method
11/18/2009EP2120096A1 Method for arranging on a carrier a flexible printing plate manufactured substantially from photopolymer, and device for applying such a method
11/18/2009EP2120095A1 Resist lower layer film forming composition for electron lithography
11/18/2009EP2120094A2 Black photosensitive resin composition, and color filter and method of producing the same
11/18/2009EP2118706A2 Imprint method and imprint apparatus
11/18/2009EP2118204A1 Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
11/18/2009EP2118026A1 Optical component made from synthetic quartz glass with enhanced radiation resistance, and method for producing the component
11/18/2009EP2117725A2 Methods and materials for fabricating laminate nanomolds and nanoparticles therefrom
11/18/2009EP1871584B1 Apparatus and method for producing two-sided patterned web in registration
11/18/2009EP1771491B1 Photosensitive compositions based on polycyclic polymers
11/18/2009EP1585169B1 Exposure system and exposure method
11/18/2009CN201348720Y Photoresistance removal temperature monitoring device
11/18/2009CN101584255A Radiation system and lithographic apparatus
11/18/2009CN101583909A Radiation system and lithographic apparatus comprising the same
11/18/2009CN101583908A Photosensitive resin composition, cured photosensitive resin product, photosensitive resin film, cured photosensitive resin film product, and optical waveguide produced by using those products
11/18/2009CN101583907A Antireflective coating compositions comprising solvent mixtures for photoresists
11/18/2009CN101583245A Manufacture method for conductive member pattern
11/18/2009CN101582377A Electronic component forming apparatus and electronic component formed with the same and forming method thereof
11/18/2009CN101582373A Gas charging equipment and gas inlet port device
11/18/2009CN101581911A Hologram laminate, hologram copy method, and hologram producing method
11/18/2009CN101581889A Alignment mark, alignment system and alignment method for photomask processor
11/18/2009CN101581888A Measurement apparatus and exposure apparatus
11/18/2009CN101581887A Fluid handling structure, lithographic apparatus and device manufacturing method
11/18/2009CN101581886A Photoetching machine control system
11/18/2009CN101581885A Coating apparatus and method
11/18/2009CN101581884A Intaglio printing plate, production method for intaglio printing plate, production method for electronic substrate, and production method for display device
11/18/2009CN101581883A Positive photoresist, insulation layer and organic light emitting diode
11/18/2009CN101581882A Chemically amplified positive resist composition
11/18/2009CN101581881A Coloring phototonus resin composition
11/18/2009CN101581880A Semiconductor package and method for making the same
11/18/2009CN101581879A Method for preparing soft template for nanoimprint
11/18/2009CN101581878A Fabricating method of soft template with nanometer structure
11/18/2009CN101581866A Line width compression device containing beam shaping and wavelength rotation tuning
11/18/2009CN101581852A Colored filter substrate, manufacture method thereof and liquid crystal display panel
11/18/2009CN101581347A Vibration reduction support device and photoetching machine using same
11/18/2009CN100561359C Asymmetric-type phase shift grating marker and its uses in photo-etching machine objective lens aberration detection
11/18/2009CN100561358C Pattern decomposition method for double exposure
11/18/2009CN100561357C Novel direct-write light scribing device having focusing mechanism
11/18/2009CN100561356C Integrative type direct-writing photo-etching method
11/18/2009CN100561355C Coating and developing method, coating and developing device
11/18/2009CN100561354C Peripheral exposure device irradiated by laser beam and uv-ray, and method thereof
11/18/2009CN100561353C Laser beam exposure device and method thereof
11/18/2009CN100561352C Peripheral exposure device irradiated by laser beam and uv-ray, and method thereof
11/18/2009CN100561351C Method for determining lens thermal deformation correctional parameter
11/18/2009CN100561350C Optical approximate correction method and its photomask pattern
11/18/2009CN100561349C Method for producing COB DRAM bit line for preventing it from collapse
1 ... 332 333 334 335 336 337 338 339 340 341 342 343 344 345 346 347 348 349 350 351 352 ... 1272