Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2009
11/26/2009WO2009142705A1 Method of imaging and developing positive-working imageable elements
11/26/2009WO2009142435A2 Photosensitive resin composition containing polyimide resin and novolak resin
11/26/2009WO2009142183A1 Novel compound, polymer and radiation-sensitive composition
11/26/2009WO2009142182A1 Radiation-sensitive resin composition, method for forming resist pattern and photoresist film
11/26/2009WO2009142181A1 Radiation-sensitive resin composition for liquid immersion exposure, polymer and method for forming resist pattern
11/26/2009WO2009142142A1 Alicyclic structure-containing compound, (meth)acrylate, (meth)acrylic polymer and positive resist composition containing the (meth)acrylic polymer
11/26/2009WO2009141932A1 Pattern forming method
11/26/2009WO2009141931A1 Barrier film forming material and pattern forming method using same
11/26/2009WO2009141930A1 Flexographic printing original plate
11/26/2009WO2009141774A1 Aqueous curable imprintable medium and patterned layer forming method
11/26/2009WO2009141720A1 Method and apparatus for overlay compensation between subsequently patterned layers on workpiece
11/26/2009WO2009141648A1 Method for patterning a surface using selective adhesion
11/26/2009WO2009141256A1 Photopolymerizable flexographic printing elements for printing with uv inks
11/26/2009WO2009141033A1 Optical system for microlithography
11/26/2009WO2009099924A3 Method to produce nanometer-sized features with directed assembly of block copolymers
11/26/2009WO2009095220A3 Grazing incidence collector for laser produced plasma sources
11/26/2009WO2009053832A3 Bottom antireflective coating compositions
11/26/2009WO2008122884A8 A composition for coating over a photoresist pattern comprising a lactem
11/26/2009US20090291565 Method for stripping photoresist
11/26/2009US20090291561 Method of forming pattern
11/26/2009US20090291552 Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and el television
11/26/2009US20090291513 Overlay marks, methods of overlay mark design and methods of overlay measurements
11/26/2009US20090291399 Coating/developing apparatus and method
11/26/2009US20090291398 Liquid discharge head producing method
11/26/2009US20090291397 Methods Of Forming Structures Supported By Semiconductor Substrates
11/26/2009US20090291396 Process for on-press developing high speed laser sensitive lithographic printing plate
11/26/2009US20090291395 Methods for imaging and processing positive-working imageable elements
11/26/2009US20090291394 Manufacturing method of printing plate using free-seal, free-quantity liquid photopolymer sachet and apparatus using the same
11/26/2009US20090291393 Positive photoresist composition and method of forming photoresist pattern using the same
11/26/2009US20090291392 Wet developable bottom antireflective coating composition and method for use thereof
11/26/2009US20090291391 Optical information-recording medium, method for manufacturing optical information-recording medium, method for visible information recording, use of mixture, and mixture
11/26/2009US20090291390 Acid generating agent for chemically amplified resist compositions
11/26/2009US20090291389 Photopatternable dielectric materials for beol applications and methods for use
11/26/2009US20090291388 Method for Forming a Self-Aligned Hard Mask for Contact to a Tunnel Junction
11/26/2009US20090291387 Method of imaging and developing positive-working imageable elements
11/26/2009US20090291374 Exposure aligning method and exposure apparatus
11/26/2009US20090291373 Green Photoresist and Color Filter Substrate using the same
11/26/2009US20090291265 Product With Concave-Convex Pattern On Its Surface and Method of Forming the Concave-Convex Pattern
11/26/2009US20090290135 Lithographic apparatus and device manufacturing method
11/26/2009US20090289257 Exposure mask using gray-tone pattern, manufacturing method of tft substrate using the same and liquid crystal display device having the tft substrate
11/26/2009US20090289246 Method for producing at least one multilayer body, and multilayer body
11/26/2009US20090289205 Mirror for extreme ultra violet, manufacturing method for mirror for extreme ultra violet, and far ultraviolet light source device
11/26/2009DE102009016608A1 Beleuchtungsoptik für eine Mikrolithographie-Projektionsbelichtungsanlage Illumination optics for microlithography projection exposure apparatus
11/26/2009DE102009016063A1 Mikrolithographisches Projektionsbelichtungsverfahren, sowie Projektionsbelichtungsanlage Microlithographic projection exposure method, and projection exposure apparatus
11/26/2009DE102009014146A1 Beleuchtungsoptik für eine Projektionsbelichtungsanlage Illumination optics for a projection exposure apparatus
11/26/2009DE102009001488A1 Entfernen von Kontaminationen von optischen Oberflächen durch aktivierten Wasserstoff Removing contamination from optical surfaces by activated hydrogen
11/26/2009DE102008024214A1 Fotopolymerisierbare Flexodruckelemente für den Druck mit UV-Farben Photopolymerizable flexographic printing for printing with UV inks
11/26/2009DE102008001892A1 Optisches System für die Mikrolithographie An optical system for microlithography
11/26/2009DE102008000709B3 Reinigungsmodul, EUV-Lithographievorrichtung und Verfahren zu seiner Reinigung Cleaning module, EUV lithography apparatus and method for cleaning
11/26/2009DE102007026753B4 Fassung für ein optisches Element bei Halbleiterobjektiven Socket for an optical element in semiconductor lenses
11/25/2009EP2124105A2 Process and apparatus having an adjustable heater
11/25/2009EP2124104A1 Curing of photo-curable printing plates using a light tunnel of mirrored walls and having a polygonal cross-section like a kaleidoscope
11/25/2009EP2124103A2 Manufacturing method of printing plate using free-seal, free-quantity liquid photopolymer sachet and apparatus using the same
11/25/2009EP2122417A2 Fabrication of microstructures and nanostructures using etching resist
11/25/2009EP2122408A1 Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
11/25/2009EP2122407A1 Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
11/25/2009EP2122393A2 Method for producing facet mirrors and projection exposure apparatus
11/25/2009EP2121514A2 Methods using block copolymer self-assembly for sub-lithographic patterning
11/25/2009EP2121324A1 Radiation-sensitive compositions and elements with basic development enhancers
11/25/2009EP2121323A1 Hydroxamic esters as photoinitiators
11/25/2009EP1632799B1 Optical element holding device, lens barrel, exposing device, and device producing method
11/25/2009EP1614001B1 Cleanup method for optics in immersion lithography
11/25/2009CN201352302Y Photomask box
11/25/2009CN101589453A Device and method for wet treating plate-like-articles
11/25/2009CN101589343A Irradiation strength distribution measuring apparatus and method of measuring
11/25/2009CN101589342A Method for improving imaging properties of an optical system, and optical system
11/25/2009CN101589341A Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
11/25/2009CN101588506A Solid-state imaging device, manufacturing method thereof, and electronic device
11/25/2009CN101587833A Method for removing residual photoresist
11/25/2009CN101587830A Large-area NW P-N junction array and manufacture method thereof
11/25/2009CN101587824A Registration mark and manufacturing method thereof
11/25/2009CN101587823A Inflation equipment
11/25/2009CN101587357A Temperature control method and temperature control system thereof
11/25/2009CN101587307A Exposure aligning method and exposure apparatus
11/25/2009CN101587306A Alignment signal processing method in photoetching technology
11/25/2009CN101587305A Developing method capable of effectively removing developing defects in wafer photo-etching technological process
11/25/2009CN101587304A Pattern transferring method
11/25/2009CN101587303A Lithographic apparatus and device manufacturing method
11/25/2009CN101587302A Photoetching illuminating system
11/25/2009CN101587301A Coating curing device for liquid medicine and coating curing method
11/25/2009CN101587300A Method for preparing heat-sensitive CTP plate
11/25/2009CN101587299A Photosensitive coloring composition for a filter and a filter
11/25/2009CN101587298A Photosensitive composition, photosensitive film, photosensitive layered body, permanent pattern forming method and printed circuit board
11/25/2009CN101587297A Preparation for titanium dioxide based organic-inorganic composite film and method for preparing micro-optic device by adopting film
11/25/2009CN101587296A Surface plasma nano photolithography
11/25/2009CN101587292A Method for manufacturing micro optical device by mobile digital mask
11/25/2009CN101587206A Manufacturing method of optical waveguide device
11/25/2009CN101587205A Two-dimensional double-layer fiber array and method for manufacturing same
11/25/2009CN101587199A Fluorinated quinacridone in LCD color filter
11/25/2009CN101587198A Large area photon sieve
11/25/2009CN101586001A Positive heat-sensitive CTP coating fluid and preparation method thereof
11/25/2009CN101585896A Polymer and chemically amplified resist composition comprising the same
11/25/2009CN101585794A Acid generating agent for chemically amplified resist compositions
11/25/2009CN100562948C Leadless silver paste composition for PDP addressing electrodes
11/25/2009CN100562826C Motor system for locating load
11/25/2009CN100562806C Water soluble resin composition, method of pattern formation and method of inspecting resist pattern
11/25/2009CN100562805C Lightscribing device and mfg. method of such device
11/25/2009CN100562804C CTP plate making method and apparatus by using ink jet imaging principle
11/25/2009CN100562801C Raster polarization photomask plate and its application in projection photoetching system
11/25/2009CN100562779C Liquid crystal display and fabrication method thereof