Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2009
12/02/2009EP2126635A1 Method for improving imaging properties of an optical system, and optical system
12/02/2009EP2126633A1 Antireflective coating compositions comprising solvent mixtures for photoresists
12/02/2009EP2126632A1 Imprint method, chip production process, and imprint apparatus
12/02/2009EP2126631A1 Method to form a pattern of functional material on a substrate using a stamp having a surface modifying material
12/02/2009EP2126630A2 Method to form a pattern of functional material on a substrate including the treatment of a surface of a stamp
12/02/2009EP2125713A1 Sulphonium salt photoinitiators
12/02/2009EP2125387A2 Method for manufacturing floor panels by performing a photographic art
12/02/2009EP2125061A2 Hydrophilic coating
12/02/2009EP1798758B1 Illumination optical apparatus, method of adjusting the illumination optical apparatus, exposure system and method
12/02/2009EP1789527B1 Cleaning compositions for microelectronics substrates
12/02/2009EP1692088B1 White solid photoinitiator in the form of powder and preparation thereof
12/02/2009EP1614008B1 Optical element for a lighting system
12/02/2009EP1497695B1 Nanoimprint resist
12/02/2009CN101595431A Device manufacturing method and lithographic apparatus
12/02/2009CN101595430A Shadowing electrodes for debris suppression in an EUV source
12/02/2009CN101595406A Colored composition, color filter, and method for production of the color filter
12/02/2009CN101595167A Resin for printing plate material, and planographic printing plate material using the same
12/02/2009CN101595071A Photosensitive glass paste and chip part with multilayer wiring
12/02/2009CN101594974A Hollow structure forming substrate, method of producing the same, and method of producing hollow structure using the same
12/02/2009CN101593744A Alignment mark and manufacture method thereof
12/02/2009CN101593717A Preparation method of shallow trench isolation structure
12/02/2009CN101593688A Semiconductor manufacturing method and semiconductor mask structure
12/02/2009CN101593673A A cardinal plate processing apparatus and method for producing a flat-panel display
12/02/2009CN101593668A Method for monitoring gluing developing equipment
12/02/2009CN101592876A Forming method of under pump metal layer and connecting cushion
12/02/2009CN101592875A Cleaning method and cleaning machine
12/02/2009CN101592874A Photoetching method for reducing antenna effect
12/02/2009CN101592873A Method for removing photoetching adhesive layer
12/02/2009CN101592872A Method of determining defects in substrate and apparatus for exposing substrate in lithographic process
12/02/2009CN101592871A Manufacturing method of semiconductor integrated circuit device
12/02/2009CN101592870A Monitoring method of lithography equipment focus
12/02/2009CN101592869A Exposure equipment focal distance monitoring method
12/02/2009CN101592868A Exposure system
12/02/2009CN101592867A Coating machine platform and method for cleaning nozzle of coating machine platform
12/02/2009CN101592866A Method for coating photoresist
12/02/2009CN101592865A Printing plate producing method of liquid photosensitive resin bag capable of free packaging and free batching, and apparatus thereof
12/02/2009CN101592864A Single-component water-emulsion type rotary screen stenciling sensitive material
12/02/2009CN101592863A Resin composition for liquid crystal panel, and color filter and liquid crystal panel using the same
12/02/2009CN101592862A Pigmentation solidifying composition
12/02/2009CN101592861A Resin composition for optical material, resin film for optical material and optical waveguide using same
12/02/2009CN101592860A Resin composition for optical material, resin film for optical material and optical waveguide using same
12/02/2009CN101592859A Stereolithography rapid prototyping photosensitive resin, preparation method and application thereof
12/02/2009CN101592858A Method for amending photoresist pattern error
12/02/2009CN101592827A Liquid crystal display and manufacturing method thereof
12/02/2009CN101592759A Resin composition for optical material, resin film for optical material, and optical waveguide using the same
12/02/2009CN101592752A Color filter, manufacture method thereof, and liquid crystal display unit
12/02/2009CN101591423A Alkaline water-soluble resin as well as photosensitive resin composition using same, cured resin and color filter
12/02/2009CN101591417A Curable compositions and rapid prototyping process using the same
12/02/2009CN101590730A Binary electro-deposition processing method for metal inkjet plate
12/02/2009CN100565846C Manufacturing method of LCD device and TFT completing substrate thereof
12/02/2009CN100565799C Exposure apparatus and method for manufacturing device
12/02/2009CN100565797C Bearing apparatus and its manufacture method, bearing table apparatus, and exposure apparatus
12/02/2009CN100565796C Method and system for manufacturing semiconductor device
12/02/2009CN100565789C Heating process apparatus and method
12/02/2009CN100565355C Manufacturing system in electronic devices
12/02/2009CN100565353C Miniature constant temperature self-control experimental bench used for simple photo-etching and soft photo-etching
12/02/2009CN100565352C Device for controlling photo-etching machine immerge
12/02/2009CN100565351C Lithographic apparatus and device manufacturing method
12/02/2009CN100565350C Substrate processing system and substrate processing method
12/02/2009CN100565349C Methods and systems for lithographic beam generation
12/02/2009CN100565348C Substrate placement in immersion lithography
12/02/2009CN100565347C Pattern forming method, semiconductor device manufacturing method and exposure mask set
12/02/2009CN100565346C Lithographic apparatus, device manufacturing method
12/02/2009CN100565345C Method for manufacturing lithographic pringting apparatus and equipment
12/02/2009CN100565344C Photoetching device, manufacturing method for the component, and component therefrom
12/02/2009CN100565343C Coating and developing system and coating and developing method
12/02/2009CN100565342C Antireflective compositions for photoresists
12/02/2009CN100565341C 抗蚀剂组合物 The resist composition
12/02/2009CN100565340C Chemical-reinforced photoresist composition
12/02/2009CN100565339C Image recording material and planographic printing plate
12/02/2009CN100565338C Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
12/02/2009CN100565337C Pt/Ti metal membrane patterning technique
12/02/2009CN100565307C Semiconductor device and manufacturing method thereof, liquid crystal television system, and EL television system
12/02/2009CN100565297C Manufacturing method of color filter substrate
12/02/2009CN100565292C Glass substrate carrier for preventing static congregation
12/02/2009CN100564058C Laser labeling method on valuable billing
12/02/2009CN100564033C Apparatus and method for forming pattern
12/02/2009CN100564032C Thermally sensitive multilayer imageable element and the method
12/01/2009US7626711 Method and system for measuring patterned structures
12/01/2009US7626710 Method and system for measuring patterned structures
12/01/2009US7626702 Overlay target and measurement method using reference and sub-grids
12/01/2009US7626680 Exposure apparatus and device fabrication method using the same
12/01/2009US7626238 Semiconductor devices having antireflective material
12/01/2009US7626182 Radiation pulse energy control system, lithographic apparatus and device manufacturing method
12/01/2009US7625765 Functionally organized, spatially patterned assembly polymer-microparticle composites including alternating current electric field-mediated assembly; systemic synthetic process to translate sequence of synthetic instructions into sequence of operations performed in homogenous fluid phase to form films
12/01/2009US7625695 Polymers for anti-reflective coatings, anti-reflective coating compositions and methods of forming a pattern using the same
12/01/2009US7625694 Selective provision of a diblock copolymer material
12/01/2009US7625692 Photolithography microelectronic fabrication; minimizing precipitation of developing reactant; involves rinsing polymer layer with an additional charge of developer fluid to minimize a sudden change in pH; and then rinsing said polymer layer with a rinse fluid of different chemistry than developer
12/01/2009US7625691 business method in providing photosensitive printing plate blanks having a precured floor layer to print shop customers; standardizing the floor layer thickness; saves customers time and money
12/01/2009US7625690 Positive resist composition and pattern forming method using the same
12/01/2009US7625688 a resin; a crosslinking agent; and surfactant selected from from alkoxylate surfactants, fatty acid ester surfactants, amide surfactants, alcohol surfactants, and ethylene diamine surfactants; semiconductor manufacture; fine space pattern
12/01/2009US7625687 as photoresist with improved lithographic properties such as etch-resistance, transparency, resolution, sensitivity, focus latitude, low line edge roughness, and adhesion; reacting a polysilsesquioxane with e.g. t-butyl 2-trifluoromethylacrylate or t-butyl ester of norbornene to modify it
12/01/2009US7625677 Half-tone stacked film, photomask-blank, photomask and fabrication method thereof
12/01/2009US7625675 Method for producing masks for photolithography and the use of such masks
12/01/2009US7624661 Supporting unit, and moving table device and linear-motion guiding device that use the supporting unit
12/01/2009CA2368372C Ultraviolet curable silver composition and related method
11/2009
11/26/2009WO2009143482A2 Negative tone molecular glass resists and methods of making and using same
11/26/2009WO2009143378A1 Generation of photomasks by dip-pen nanolithography
11/26/2009WO2009143357A2 Orthogonal processing of organic materials used in electronic and electrical devices
11/26/2009WO2009142869A2 Methods of forming structures supported by semiconductor substrates