Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2014
09/18/2014WO2014140298A2 Position sensor, sensor arrangement and lithography apparatus comprising position sensor
09/18/2014WO2014140193A2 Improved driver for acoustooptic modulator and modulation principle
09/18/2014WO2014140015A1 Optical device
09/18/2014WO2014139990A1 Projection exposure apparatus with a highly flexible manipulator
09/18/2014WO2014139896A2 Arrangement for the thermal actuation of a mirror, in particular in a microlithographic projection exposure apparatus
09/18/2014WO2014139881A1 Optical waveguide for guiding illumination light
09/18/2014WO2014139872A1 Illumination optical unit for projection lithography
09/18/2014WO2014139815A1 Optical assembly for increasing the etendue
09/18/2014WO2014139814A1 Illumination optical unit for projection lithography
09/18/2014WO2014139795A1 Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers
09/18/2014WO2014139763A2 Lithographic apparatus and to a reflector apparatus
09/18/2014WO2014139719A1 Projection lens with wavefront manipulator
09/18/2014WO2014139694A1 Optical element and optical system for euv lithography, and method for treating such an optical element
09/18/2014WO2014139651A1 Measuring an optical symmetry property on a projection exposure apparatus
09/18/2014WO2014139543A1 Microlithographic apparatus
09/18/2014WO2014139283A1 Array substrate and manufacturing method thereof, and display apparatus
09/18/2014WO2014139238A1 Display panel and preparation method therefor, mask plate and preparation method therefor, and display device
09/18/2014WO2014139216A1 Coating method
09/18/2014US20140283230 Microprobe and microprobe manufacturing method
09/18/2014US20140273521 Photoresist system and method
09/18/2014US20140273513 Resist composition and manufacturing method of semiconductor device
09/18/2014US20140273459 Systems and Methods for a Narrow Band High Transmittance Interference Filter
09/18/2014US20140272728 Techniques for processing photoresist features using ions
09/18/2014US20140272727 Method of producing polymeric compound, resist composition and method of forming resist pattern
09/18/2014US20140272726 Photo Resist Baking in Lithography Process
09/18/2014US20140272725 Method of water repellent treatment for pattern surface
09/18/2014US20140272724 Photoresist System and Method
09/18/2014US20140272723 Chemi-epitaxy in directed self-assembly applications using photo-decomposable agents
09/18/2014US20140272722 Composition for forming resist underlayer film, resist underlayer film and resist underlayer film-forming method, and pattern-forming method
09/18/2014US20140272721 Extreme Ultraviolet Lithography Process and Mask
09/18/2014US20140272720 Multiple Exposures in Extreme Ultraviolet Lithography
09/18/2014US20140272719 Surface modification, functionalization and integration of microfluidics and biosensor to form a biochip
09/18/2014US20140272718 Lithography Process
09/18/2014US20140272716 Photoresist System and Method
09/18/2014US20140272715 Lithography Process on High Topology Features
09/18/2014US20140272714 Double patterning strategy for contact hole and trench in photolithography
09/18/2014US20140272713 Method of making a lithographic printing plate
09/18/2014US20140272711 Pre-patterned hard mask for ultrafast lithographic imaging
09/18/2014US20140272710 Lithographic printing plate precursor and method of preparing the same
09/18/2014US20140272709 Middle layer composition for trilayer patterning stack
09/18/2014US20140272708 Photosensitive sacrificial polymer with low residue
09/18/2014US20140272707 Sulfonium salt, polymer, resist composition, and patterning process
09/18/2014US20140272706 Resist composition and method for forming pattern
09/18/2014US20140272705 Photoresist Application
09/18/2014US20140272704 Thickening phase for spin coating process
09/18/2014US20140272692 Actinic ray-sensitive or radiation-sensitive composition, actinic ray-sensitive or radiation-sensitive film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin
09/18/2014US20140272691 Photoactive additive with functionalized benzophenone
09/18/2014US20140272688 Grayscale lithography of photo definable glass
09/18/2014US20140272682 Extreme Ultraviolet Lithography Process and Mask
09/18/2014US20140272678 Structure and Method for Reflective-Type Mask
09/18/2014US20140272677 Methods for fabricating euv masks and methods for fabricating integrated circuits using such euv masks
09/18/2014US20140272673 Block copolymer-based mask structures for the growth of nanopatterned polymer brushes
09/18/2014US20140272275 Micro-truss materials having in-plane material property variations
09/18/2014US20140272030 Interior energy-activation of photo-reactive species inside a medium or body
09/18/2014US20140268381 Optical module for a microlithography objective holding and supporting devices
09/18/2014US20140268092 Extreme Ultraviolet Lithography Process and Mask
09/18/2014US20140268091 Extreme Ultraviolet Lithography Process and Mask
09/18/2014US20140268090 Cross technology reticle (ctr) or multi-layer reticle (mlr) cdu, registration, and overlay techniques
09/18/2014US20140268088 Mechanically produced alignment fiducial method and device
09/18/2014US20140268087 Lithography and Mask for Resolution Enhancement
09/18/2014US20140268086 Extreme Ultraviolet Lithography Process and Mask
09/18/2014US20140268085 Optical system for a microlithographic projection exposure apparatus
09/18/2014US20140268084 Projection lens with wavefront manipulator
09/18/2014US20140268083 Ultra-smooth layer ultraviolet lithography mirrors and blanks, and manufacturing and lithography systems therefor
09/18/2014US20140268082 Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor
09/18/2014US20140268080 Planarized extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor
09/18/2014US20140268079 Particle counter and immersion exposure system including the same
09/18/2014US20140268078 Electron beam lithography systems and methods including time division multiplex loading
09/18/2014US20140268077 A flow lithography technique to form microstructures using optical arrays
09/18/2014US20140268076 Self-aligned dynamic pattern generator device and method of fabrication
09/18/2014US20140268075 Source, target and mask optimization by incorporating countour based assessments and integration over process variations
09/18/2014US20140268074 Lithography System with an Embedded Cleaning Module
09/18/2014US20140264093 Laser produced plasma euv light source
09/18/2014US20140263172 Resist hardening and development processes for semiconductor device manufacturing
09/18/2014US20140260963 System and method for dispensing photoresist
09/18/2014DE102014208039A1 Diffraktive und refraktive optische Elemente für EUV - Optiksysteme Diffractive and refractive optical elements for EUV - Optics Systems
09/18/2014DE102014207109A1 Verfahren und vorrichtung zur bestimmung der kontamination von oberflächen A method and device for determining the contamination of surfaces
09/18/2014DE102014204388A1 Beleuchtungsoptik für die Projektionslithographie Illumination optics for projection lithography
09/18/2014DE102014103557A1 Aufbringen von Photolack Applying photoresist
09/18/2014DE102014102651A1 Lithographiesystem mit eingebettetem Reinigungsmodul Lithography system with embedded cleaning module
09/18/2014DE102013204572A1 Projektionsbelichtungsanlage mit hochflexiblem Manipulator Projection exposure system with a highly flexible manipulator
09/18/2014DE102013204546A1 Optisches Bauteil Optical component
09/18/2014DE102013204466A1 Messung einer optischen Symmetrieeigenschaft an einer Projektionsbelichtungsanlage Measuring an optical symmetry property of a projection exposure apparatus
09/18/2014DE102013204453A1 Optisches System für eine mikrolithographische Projektionsbelichtungsanlage Optical system for a microlithography projection exposure apparatus
09/18/2014DE102013204445A1 Vergrößernde abbildende Optik sowie EUV-Maskeninspektionssystem mit einer derartigen abbildenden Optik Magnifying imaging optics and EUV mask inspection system with such imaging optics
09/18/2014DE102013204444A1 Beleuchtungsoptik für ein Maskeninspektionssystem sowie Maskeninspektionssystem mit einer derartigen Beleuchtungsoptik Illumination optics for a mask inspection system and mask inspection system with such an illumination optics
09/18/2014DE102013204427A1 Anordnung zur thermischen Aktuierung eines Spiegels, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage Arrangement for thermal actuation of a mirror, in particular in microlithography projection exposure apparatus
09/18/2014DE102013204305A1 Anordnung zur Aktuierung wenigstens eines Elementes in einem optischen System Arrangement for actuation of at least one element in an optical system
09/18/2014DE102013108872A1 Fotomasken für extrem ultraviolettes Licht (EUV) sowie Herstellungsverfahren dieser Photo masks for extreme ultraviolet (EUV) and manufacturing method of this
09/17/2014EP2778786A2 A flow lithography technique to form microstructures using optical arrays
09/17/2014EP2778785A2 Method and apparatus for attaching flexographic and metal back plates on an imaging cylinder
09/17/2014EP2778784A2 Apparatus and method for multi-beam direct engraving of elastomeric printing plates and sleeves
09/17/2014EP2778783A1 Lithographic printing plate precursor and process for producing lithographic printing plate
09/17/2014EP2778782A1 Negative working radiation-sensitive elements
09/17/2014EP2777066A1 Thermally stable optical sensor mount
09/17/2014EP2776889A1 Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming pattern
09/16/2014US8836943 Workpiece alignment device
09/16/2014US8836929 Device and method for the optical measurement of an optical system by using an immersion fluid
09/16/2014US8836919 Management method and system for exposure apparatus having alarm based on inclination amount and deviation from aligned position
09/16/2014US8836917 Zone plate
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