Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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09/16/2014 | US8836916 Illumination system for use in a stereolithography apparatus |
09/16/2014 | US8836915 Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method |
09/16/2014 | US8836914 Environmental system including vacuum scavenge for an immersion lithography apparatus |
09/16/2014 | US8836913 Lithographic apparatus having an encoder type position sensor system |
09/16/2014 | US8836912 Fluid handling structure, a lithographic apparatus and a device manufacturing method |
09/16/2014 | US8836089 Positive photosensitive resin composition, method of creating resist pattern, and electronic component |
09/16/2014 | US8835881 Drift correction method and pattern writing data generation method |
09/16/2014 | US8835697 Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process |
09/16/2014 | US8835523 Silicone rubber composition curable by radial ray |
09/16/2014 | US8835521 Photosensitive composition and compound for use in the photosensitive composition |
09/16/2014 | US8835307 Method and structure for reworking antireflective coating over semiconductor substrate |
09/16/2014 | US8835103 Lithography process and structures |
09/16/2014 | US8835102 Patterning process and composition for forming silicon-containing film usable therefor |
09/16/2014 | US8835101 Method for fabricating a circuit |
09/16/2014 | US8835100 Double patterning by PTD and NTD process |
09/16/2014 | US8835099 Lithographic printing plate precursor |
09/16/2014 | US8835098 Method of forming pattern |
09/16/2014 | US8835097 Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process |
09/16/2014 | US8835096 Chemically amplified negative resist composition and patterning process |
09/16/2014 | US8835095 Resist composition and method for producing resist pattern |
09/16/2014 | US8835094 Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process |
09/16/2014 | US8835093 Resist underlayer film forming composition containing silicon having anion group |
09/16/2014 | US8835092 Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative |
09/16/2014 | US8835091 Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition |
09/16/2014 | US8835083 Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device |
09/16/2014 | US8835082 Method and system for E-beam lithography with multi-exposure |
09/16/2014 | US8835081 Polymerizable composition, color filter, method of producing color filter and solid-state image sensor |
09/16/2014 | US8834774 Imprinting method and apparatus therefor |
09/16/2014 | US8834769 Imprint apparatus for forming a pattern of a resin on a substrate using a mold |
09/16/2014 | US8834749 Photosensitive resin composition and light blocking layer using the same |
09/16/2014 | US8834672 Semiconductor development apparatus and method using same |
09/16/2014 | US8834144 Imprinting machine and device manufacturing method |
09/16/2014 | US8833430 Versatile high aspect ratio actuatable nanostructured materials through replication |
09/16/2014 | US8833256 Pad microprinting device and methods, and pad for this device |
09/12/2014 | WO2014138064A1 Compositions and methods for selectively etching titanium nitride |
09/12/2014 | WO2014137663A1 Methanofullerenes |
09/12/2014 | WO2014136991A1 Composition for forming fine resist pattern, and pattern formation method using same |
09/12/2014 | WO2014136922A1 Photosensitive resin composition, cured article, method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, and touch panel display device |
09/12/2014 | WO2014136897A1 Photosensitive resin composition, dry film using same, printed wiring board, and method for producing printed wiring board |
09/12/2014 | WO2014136815A1 Colored photosensitive composition, color filter and method for producing color filter |
09/12/2014 | WO2014136738A1 Black matrix substrate |
09/12/2014 | WO2014136154A1 Electron beam generating apparatus, electron beam irradiation apparatus, electron beam exposure apparatus, and manufacturing method |
09/12/2014 | WO2014136143A1 Mobile device, exposure device, and device production method |
09/12/2014 | WO2014135537A1 Collector mirror for an euv-lithography device |
09/12/2014 | WO2014135536A1 Apparatus and method for processing a lithographic printing plate |
09/12/2014 | WO2014135448A1 Method for illuminating an image field |
09/12/2014 | WO2014134889A1 Polymerisable oligomer and photoresist composition containing same |
09/12/2014 | WO2014134881A1 Photosensitive oligomer for photoresist, preparation method therefor and negative photoresist composition thereof |
09/11/2014 | US20140256155 Cleaning Solution for Preventing Pattern Collapse |
09/11/2014 | US20140255854 Pattern-forming method |
09/11/2014 | US20140255853 Resist composition, method of forming resist pattern, polymeric compound and compound |
09/11/2014 | US20140255852 Substrate treatment method, non-transitory computer storage medium and substrate treatment system |
09/11/2014 | US20140255851 Photoresist Defect Reduction System and Method |
09/11/2014 | US20140255850 Photo-Resist with Floating Acid |
09/11/2014 | US20140255849 Methanofullerenes |
09/11/2014 | US20140255848 Lithographic printing plate precursor and a method for making a printing plate |
09/11/2014 | US20140255847 Resist overlayer film forming composition for lithography |
09/11/2014 | US20140255846 Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition |
09/11/2014 | US20140255845 Photosensitive resin composition and uses thereof |
09/11/2014 | US20140255844 Substrate treatment method, non-transitory computer storage medium and substrate treatment system |
09/11/2014 | US20140255843 Patterning process and resist composition |
09/11/2014 | US20140255833 Chemically amplified positive resist composition and pattern forming process |
09/11/2014 | US20140254036 Optical module for an objective |
09/11/2014 | US20140253902 Multiple patterning process for forming trenches or holes using stitched assist features |
09/11/2014 | US20140253900 Chuck, a Chuck Control System, a Lithography Apparatus and a Method of Using a Chuck |
09/11/2014 | US20140253899 Substrate processing apparatus, lithography apparatus, and method of manufacturing article |
09/11/2014 | US20140253898 Pellicle mounting system and method |
09/11/2014 | US20140253897 Exposure apparatus and exposure method thereof |
09/11/2014 | US20140253896 Exposure apparatus and exposure method thereof |
09/11/2014 | US20140253895 Cylindrical reticle system, exposure apparatus and exposure method |
09/11/2014 | US20140253894 Radiation Source |
09/11/2014 | US20140253893 Cylindrical reticle system, exposure apparatus and exposure method |
09/11/2014 | US20140253892 Extreme Ultraviolet Lithography Projection Optics System and Associated Methods |
09/11/2014 | US20140253891 Tunable wavelength illumination system |
09/11/2014 | US20140253890 Lithographic apparatus and device manufacturing method |
09/11/2014 | US20140253889 Exposure apparatus, exposure method, and method for producing device |
09/11/2014 | US20140253888 Liquid jet and recovery system for immersion lithography |
09/11/2014 | US20140253887 Contamination prevention for photomask in extreme ultraviolet lithography application |
09/11/2014 | US20140253886 Exposure apparatus, exposing method, device manufacturing method, program, and recording medium |
09/11/2014 | US20140251393 Application liquid application apparatus and application liquid application method |
09/11/2014 | DE102013204015A1 Spektralzerlegung zur Mikrospiegelkippwinkelbestimmung Spectral decomposition for Mikrospiegelkippwinkelbestimmung |
09/11/2014 | DE102013203689A1 Verfahren zur Beleuchtung eines Bildfeldes Method for illuminating an image field |
09/11/2014 | DE102013203364A1 Reflektierende Beschichtung mit optimierter Dicke Reflective coating with optimized thickness |
09/11/2014 | DE102013202948A1 Beleuchtungssystem für eine EUV-Lithographievorrichtung und Facettenspiegel dafür Lighting system for an EUV lithography apparatus and facet mirror for |
09/10/2014 | EP2775351A1 Apparatus and method for processing a lithographic printing plate |
09/10/2014 | EP2775350A1 Components of three-dimensional imaging systems |
09/10/2014 | EP2774004A1 Method and apparatus for thermal treatment of printing surface in relief printing |
09/10/2014 | EP2774003A1 Method for thermal treatment of relief surface for a relief printing form |
09/10/2014 | EP2774002A1 A method and an apparatus having a compressible collar for thermally treating a photosensitive precursor |
09/10/2014 | EP2774001A2 Metering device for the manually-controlled metering of a light-curing material, kit, and method |
09/10/2014 | EP2774000A1 Method for avoiding charge effects for lithography and electron microscopy |
09/09/2014 | US8832607 Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device |
09/09/2014 | US8831170 Mirror with a mirror carrier and projection exposure apparatus |
09/09/2014 | US8830562 Multi-color electrophoretic display device, image sheet, and manufacturing method thereof |
09/09/2014 | US8830472 Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus |
09/09/2014 | US8830447 Inspection method for lithography |
09/09/2014 | US8830446 Exposure apparatus |
09/09/2014 | US8830445 Exposure apparatus, and device manufacturing method |
09/09/2014 | US8830444 Lithographic apparatus and method |
09/09/2014 | US8830443 Environmental system including a transport region for an immersion lithography apparatus |