Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2014
09/16/2014US8836916 Illumination system for use in a stereolithography apparatus
09/16/2014US8836915 Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
09/16/2014US8836914 Environmental system including vacuum scavenge for an immersion lithography apparatus
09/16/2014US8836913 Lithographic apparatus having an encoder type position sensor system
09/16/2014US8836912 Fluid handling structure, a lithographic apparatus and a device manufacturing method
09/16/2014US8836089 Positive photosensitive resin composition, method of creating resist pattern, and electronic component
09/16/2014US8835881 Drift correction method and pattern writing data generation method
09/16/2014US8835697 Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process
09/16/2014US8835523 Silicone rubber composition curable by radial ray
09/16/2014US8835521 Photosensitive composition and compound for use in the photosensitive composition
09/16/2014US8835307 Method and structure for reworking antireflective coating over semiconductor substrate
09/16/2014US8835103 Lithography process and structures
09/16/2014US8835102 Patterning process and composition for forming silicon-containing film usable therefor
09/16/2014US8835101 Method for fabricating a circuit
09/16/2014US8835100 Double patterning by PTD and NTD process
09/16/2014US8835099 Lithographic printing plate precursor
09/16/2014US8835098 Method of forming pattern
09/16/2014US8835097 Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process
09/16/2014US8835096 Chemically amplified negative resist composition and patterning process
09/16/2014US8835095 Resist composition and method for producing resist pattern
09/16/2014US8835094 Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process
09/16/2014US8835093 Resist underlayer film forming composition containing silicon having anion group
09/16/2014US8835092 Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative
09/16/2014US8835091 Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition
09/16/2014US8835083 Manufacturing method of photomask, method for optical proximity correction, and manufacturing method of semiconductor device
09/16/2014US8835082 Method and system for E-beam lithography with multi-exposure
09/16/2014US8835081 Polymerizable composition, color filter, method of producing color filter and solid-state image sensor
09/16/2014US8834774 Imprinting method and apparatus therefor
09/16/2014US8834769 Imprint apparatus for forming a pattern of a resin on a substrate using a mold
09/16/2014US8834749 Photosensitive resin composition and light blocking layer using the same
09/16/2014US8834672 Semiconductor development apparatus and method using same
09/16/2014US8834144 Imprinting machine and device manufacturing method
09/16/2014US8833430 Versatile high aspect ratio actuatable nanostructured materials through replication
09/16/2014US8833256 Pad microprinting device and methods, and pad for this device
09/12/2014WO2014138064A1 Compositions and methods for selectively etching titanium nitride
09/12/2014WO2014137663A1 Methanofullerenes
09/12/2014WO2014136991A1 Composition for forming fine resist pattern, and pattern formation method using same
09/12/2014WO2014136922A1 Photosensitive resin composition, cured article, method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, and touch panel display device
09/12/2014WO2014136897A1 Photosensitive resin composition, dry film using same, printed wiring board, and method for producing printed wiring board
09/12/2014WO2014136815A1 Colored photosensitive composition, color filter and method for producing color filter
09/12/2014WO2014136738A1 Black matrix substrate
09/12/2014WO2014136154A1 Electron beam generating apparatus, electron beam irradiation apparatus, electron beam exposure apparatus, and manufacturing method
09/12/2014WO2014136143A1 Mobile device, exposure device, and device production method
09/12/2014WO2014135537A1 Collector mirror for an euv-lithography device
09/12/2014WO2014135536A1 Apparatus and method for processing a lithographic printing plate
09/12/2014WO2014135448A1 Method for illuminating an image field
09/12/2014WO2014134889A1 Polymerisable oligomer and photoresist composition containing same
09/12/2014WO2014134881A1 Photosensitive oligomer for photoresist, preparation method therefor and negative photoresist composition thereof
09/11/2014US20140256155 Cleaning Solution for Preventing Pattern Collapse
09/11/2014US20140255854 Pattern-forming method
09/11/2014US20140255853 Resist composition, method of forming resist pattern, polymeric compound and compound
09/11/2014US20140255852 Substrate treatment method, non-transitory computer storage medium and substrate treatment system
09/11/2014US20140255851 Photoresist Defect Reduction System and Method
09/11/2014US20140255850 Photo-Resist with Floating Acid
09/11/2014US20140255849 Methanofullerenes
09/11/2014US20140255848 Lithographic printing plate precursor and a method for making a printing plate
09/11/2014US20140255847 Resist overlayer film forming composition for lithography
09/11/2014US20140255846 Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition
09/11/2014US20140255845 Photosensitive resin composition and uses thereof
09/11/2014US20140255844 Substrate treatment method, non-transitory computer storage medium and substrate treatment system
09/11/2014US20140255843 Patterning process and resist composition
09/11/2014US20140255833 Chemically amplified positive resist composition and pattern forming process
09/11/2014US20140254036 Optical module for an objective
09/11/2014US20140253902 Multiple patterning process for forming trenches or holes using stitched assist features
09/11/2014US20140253900 Chuck, a Chuck Control System, a Lithography Apparatus and a Method of Using a Chuck
09/11/2014US20140253899 Substrate processing apparatus, lithography apparatus, and method of manufacturing article
09/11/2014US20140253898 Pellicle mounting system and method
09/11/2014US20140253897 Exposure apparatus and exposure method thereof
09/11/2014US20140253896 Exposure apparatus and exposure method thereof
09/11/2014US20140253895 Cylindrical reticle system, exposure apparatus and exposure method
09/11/2014US20140253894 Radiation Source
09/11/2014US20140253893 Cylindrical reticle system, exposure apparatus and exposure method
09/11/2014US20140253892 Extreme Ultraviolet Lithography Projection Optics System and Associated Methods
09/11/2014US20140253891 Tunable wavelength illumination system
09/11/2014US20140253890 Lithographic apparatus and device manufacturing method
09/11/2014US20140253889 Exposure apparatus, exposure method, and method for producing device
09/11/2014US20140253888 Liquid jet and recovery system for immersion lithography
09/11/2014US20140253887 Contamination prevention for photomask in extreme ultraviolet lithography application
09/11/2014US20140253886 Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
09/11/2014US20140251393 Application liquid application apparatus and application liquid application method
09/11/2014DE102013204015A1 Spektralzerlegung zur Mikrospiegelkippwinkelbestimmung Spectral decomposition for Mikrospiegelkippwinkelbestimmung
09/11/2014DE102013203689A1 Verfahren zur Beleuchtung eines Bildfeldes Method for illuminating an image field
09/11/2014DE102013203364A1 Reflektierende Beschichtung mit optimierter Dicke Reflective coating with optimized thickness
09/11/2014DE102013202948A1 Beleuchtungssystem für eine EUV-Lithographievorrichtung und Facettenspiegel dafür Lighting system for an EUV lithography apparatus and facet mirror for
09/10/2014EP2775351A1 Apparatus and method for processing a lithographic printing plate
09/10/2014EP2775350A1 Components of three-dimensional imaging systems
09/10/2014EP2774004A1 Method and apparatus for thermal treatment of printing surface in relief printing
09/10/2014EP2774003A1 Method for thermal treatment of relief surface for a relief printing form
09/10/2014EP2774002A1 A method and an apparatus having a compressible collar for thermally treating a photosensitive precursor
09/10/2014EP2774001A2 Metering device for the manually-controlled metering of a light-curing material, kit, and method
09/10/2014EP2774000A1 Method for avoiding charge effects for lithography and electron microscopy
09/09/2014US8832607 Method for making correction map of dose amount, exposure method, and method for manufacturing semiconductor device
09/09/2014US8831170 Mirror with a mirror carrier and projection exposure apparatus
09/09/2014US8830562 Multi-color electrophoretic display device, image sheet, and manufacturing method thereof
09/09/2014US8830472 Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus
09/09/2014US8830447 Inspection method for lithography
09/09/2014US8830446 Exposure apparatus
09/09/2014US8830445 Exposure apparatus, and device manufacturing method
09/09/2014US8830444 Lithographic apparatus and method
09/09/2014US8830443 Environmental system including a transport region for an immersion lithography apparatus
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