| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 12/09/2009 | CN100568452C Coating and developing device, and method thereof |
| 12/09/2009 | CN100568103C Lithographic apparatus and device manufacturing method |
| 12/09/2009 | CN100568102C Position controlling of mass in lithographic apparatus |
| 12/09/2009 | CN100568101C Lithographic apparatus and device manufacturing method |
| 12/09/2009 | CN100568100C Checking method and element manufacture method |
| 12/09/2009 | CN100568099C Checking method and element manufacture method |
| 12/09/2009 | CN100568098C Radiation-sensitive resin composition, process for producing the same and process for producing semiconductor device therewith |
| 12/09/2009 | CN100568097C Photosensitive resin composition and laminate |
| 12/09/2009 | CN100568096C Colouring photosensitive resin composition |
| 12/09/2009 | CN100568095C Top anti-reflective coating polymer, its preparation method and top anti-reflective coating composition |
| 12/09/2009 | CN100568094C Producing technology for non-rusting agent pattern and thickening material thereof and semiconductor device producing technology |
| 12/09/2009 | CN100568093C Photolithographic projection assembly, handling apparatus for handling substrates and method of handling substrate |
| 12/09/2009 | CN100568091C Translucent stacked film, photomask blank, photomask and fabrication method thereof |
| 12/09/2009 | CN100568026C High reflectivity colorful filter and its manufacture method |
| 12/09/2009 | CN100566637C Photo frame with three-dimensional effect and its manufacturing method |
| 12/08/2009 | US7631287 Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing method |
| 12/08/2009 | US7630118 Spatial light modulator, method of spatially modulating a radiation beam, lithographic apparatus and device manufacturing method |
| 12/08/2009 | US7630060 Device manufacturing method, lithographic apparatus and device manufactured thereby |
| 12/08/2009 | US7630054 Methods and systems to compensate for a stitching disturbance of a printed pattern |
| 12/08/2009 | US7630052 Exposure processing system, exposure processing method and method for manufacturing a semiconductor device |
| 12/08/2009 | US7629595 Method for fabricating semiconductor device |
| 12/08/2009 | US7629110 polyethersiloxane copolymers used as photoresists for forming semiconductor circuit patterns, using photolithography |
| 12/08/2009 | US7629109 Exposure control for phase shifting photolithographic masks |
| 12/08/2009 | US7629108 Nitrogen-containing organic compound, resist composition and patterning process |
| 12/08/2009 | US7629107 Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition |
| 12/08/2009 | US7629106 Excellent resist pattern after development in liquid immersion lithography; high resolution, high sensitivity and high resolution to high energy beam; reduced line edge roughness because reduced swelling; copolymer comprising a vinyl naphthalene monomer and an unsaturated sulfonium monomer |
| 12/08/2009 | US7629105 Positive photoresist composition and method of forming resist pattern |
| 12/08/2009 | US7629091 Reaction product of acid dianhydride with a diamine; low coefficient of linear thermal expansion; curl-free flexible wiring boards |
| 12/08/2009 | US7629089 Low-expansion glass substrate for a reflective mask and reflective mask |
| 12/08/2009 | US7629086 Photosensitive composition for volume hologram recording and photosensitive medium for volume hologram recording |
| 12/08/2009 | US7629055 Protective coating system for reflective optical elements, reflective optical element and method for the production thereof |
| 12/08/2009 | US7628497 Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit |
| 12/08/2009 | CA2476371C Device and method for loading/unloading a drum exposure system |
| 12/08/2009 | CA2361519C Optical element such as multilayer film reflector, and the like, method of manufacturing the same, and apparatus using the same |
| 12/03/2009 | WO2009146400A1 Photosensitive paste and sintered layer |
| 12/03/2009 | WO2009146229A1 Methods of forming data cells and connections to data cells |
| 12/03/2009 | WO2009146014A1 Patterning resolution enhancement combining interference lithography and self-aligned double patterning techniques |
| 12/03/2009 | WO2009145520A2 Film type photodegradable transfer material |
| 12/03/2009 | WO2009145227A1 Photosensitive resin composition |
| 12/03/2009 | WO2009145158A1 Photosensitive resin composition, process for producing cured relief pattern, and semiconductor device |
| 12/03/2009 | WO2009145153A1 Photosensitive resin composition |
| 12/03/2009 | WO2009145120A1 Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board |
| 12/03/2009 | WO2009145065A1 Novel polyimide precursor composition, use of the same, and production method of the same |
| 12/03/2009 | WO2009145048A1 Inspection device and inspecting method for spatial light modulator, illuminating optical system, method for adjusting the illuminating optical system, exposure device, and device manufacturing method |
| 12/03/2009 | WO2009145032A1 Method for producing color filter, method for producing substrate with pattern, and small photomask |
| 12/03/2009 | WO2009144801A1 Dithiane derivative, polymer, resist composition, and process for producing semiconductor using the resist composition |
| 12/03/2009 | WO2009144609A1 Debris mitigation device |
| 12/03/2009 | WO2009144218A1 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
| 12/03/2009 | WO2009144117A1 Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for a radiation system and method of forming a spectral purity filter |
| 12/03/2009 | WO2009144039A1 Base material for preparing a stencil for screen printing |
| 12/03/2009 | WO2009143879A1 An element, in particular an optical element, for immersion lithography |
| 12/03/2009 | WO2009110764A3 Positive photosensitive polyimide composition |
| 12/03/2009 | WO2009041702A3 Exposure apparatus |
| 12/03/2009 | US20090298191 Lateral Flow and Flow-through Bioassay Devices Based On Patterned Porous Media, Methods of Making Same, and Methods of Using Same |
| 12/03/2009 | US20090298116 Cell culture apparatus having different micro-well topography |
| 12/03/2009 | US20090297991 Method for manufacturing lenticular sheet |
| 12/03/2009 | US20090297990 Liquid holding apparatus, liquid holding method, exposure apparatus, exposing method, and device fabricating method |
| 12/03/2009 | US20090297989 Method and device for patterning a disk |
| 12/03/2009 | US20090297988 Manufacturing method of semiconductor integrated circuit device |
| 12/03/2009 | US20090297987 Method of forming semiconductor device by using reduction projection aligner |
| 12/03/2009 | US20090297986 Method of manufacturing semiconductor device |
| 12/03/2009 | US20090297985 Method for preparing a composite printing form using a template |
| 12/03/2009 | US20090297984 Method for on-press developing high speed laser sensitive lithographic plate |
| 12/03/2009 | US20090297983 Printing members having permeability-transition layers and related methods |
| 12/03/2009 | US20090297982 Photosensitive element, method for formation of resist pattern, and method for production of print circuit board |
| 12/03/2009 | US20090297981 Photosensitive Resin Composition and Photosensitive Film Made with the Same |
| 12/03/2009 | US20090297980 Resist composition and method of forming resist pattern |
| 12/03/2009 | US20090297979 Polymerizable compound, polymer, positive resist composition, and patterning process using the same |
| 12/03/2009 | US20090297978 Method of Forming Exposure Visualization Image of Planographic Printing Plate Material, Aluminum Support, and Planographic Printing Plate Material |
| 12/03/2009 | US20090297959 large working accuracy tolerance margin of the correction portion of a clear defect in half tone mask; shading portion having a transmissivity of 0 to 2% or 2 to 6% in the removed opaque defect portion; semitransparent portion having a transmissivity larger than shading portion at the peripheral portion |
| 12/03/2009 | US20090297958 Exposure mask and exposure method using the same |
| 12/03/2009 | US20090297957 Exposure mask and method for manufacturing semiconductor device using the same |
| 12/03/2009 | US20090297956 light intensity inside dark area is reduced with non-printable clear cutout inside the feature; mask has same optical pathlength outside the feature adjacent to outer boundary as at the cutout; center portions of rectangular areas protected if corresponding opaque features are modified with clear cutouts |
| 12/03/2009 | US20090297955 Optical recording composition, holographic recording medium, and method of recording and reproducing information |
| 12/03/2009 | US20090297784 Photosensitive hardmask for microlithography |
| 12/03/2009 | US20090296069 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| 12/03/2009 | US20090296067 Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| 12/03/2009 | US20090296061 Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
| 12/03/2009 | US20090296053 Apparatus and method for providing fluid for immersion lithography |
| 12/03/2009 | US20090295041 Printing form precursor and process for preparing a stamp from the precursor |
| 12/03/2009 | US20090294888 Method for fabricating an image sensor |
| 12/03/2009 | US20090294059 Remote Center Compliant Flexure Device |
| 12/03/2009 | US20090293748 Platemaking method for lithographic printing plate precursor and planographic printing method |
| 12/03/2009 | DE202009010252U1 Belichtungsvorrichtung Exposure apparatus |
| 12/03/2009 | DE102009015295A1 Optische Baugruppe Optical assembly |
| 12/02/2009 | EP2128892A1 Optical integrator, illuminating optical device, exposure apparatus and device manufacturing method |
| 12/02/2009 | EP2128707A1 Cleaning composition and process for producing semiconductor device |
| 12/02/2009 | EP2128706A1 Resist pattern formation method, and resin composition capable of insolubilizing resist pattern |
| 12/02/2009 | EP2128705A2 Apparatus and method for treating a cylindrically-shaped element using a clamp assembly |
| 12/02/2009 | EP2128704A2 Processing Liquid for Lithographic Printing Plate Development and Method of Producing Lithographic Printing Plates |
| 12/02/2009 | EP2128703A1 Lithographic Apparatus and a Method of Operating the Apparatus |
| 12/02/2009 | EP2128702A1 Curing of photo-curable printing plates with flat tops or round tops |
| 12/02/2009 | EP2128701A1 Method of determining defects in a substrate and apparatus for exposing a substrate in a lithographic process |
| 12/02/2009 | EP2128700A1 Lithography system and method for regulating same |
| 12/02/2009 | EP2128699A1 Base material for preparing a stencil for screen printing |
| 12/02/2009 | EP2128698A2 method for preparing a composite printing form using a template |
| 12/02/2009 | EP2128183A1 Resin composition for optical components, optical component using the same and production method of optical lens |
| 12/02/2009 | EP2128132A1 Oxime ester compound and photopolymerization initiator comprising the compound |
| 12/02/2009 | EP2127896A1 Method for producing photosensitive resin plate or relief printing plate having recessed and projected pattern, and plate surface treating liquid used in the production method |
| 12/02/2009 | EP2126636A2 Illumination system of a microlithographic projection exposure apparatus |