Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2009
12/15/2009US7632630 A resin binder, photoacid generator and acrylic ester copolymer resin dye with a multicyclic chromophore on the side chain of one of the monomers; ultraviolet radiation absorption; reduced reflection, enhanced resolution; semiconductor wafers and flat panel displays
12/15/2009US7632627 Photomask apparatus, photomask manufacturing method, and mask pattern forming method
12/15/2009US7632626 Anti-reflective coating forming composition for lithography containing polymer having ethylenedicarbonyl structure
12/15/2009US7632625 Photosensitivity; flexography
12/15/2009US7632624 Photoresist undercoat-forming material and patterning process
12/15/2009US7632623 resin which increases solubility in alkali developing solution by action of acid and comprises repeating unit containing lactone structure and cyano group; photoresists; lithography
12/15/2009US7632622 Acid catalysts; vapor deposition; etching; photomasks; photoresists; lithography; semiconductors; integrated circuits
12/15/2009US7632621 Mask
12/15/2009US7632615 Colorant-containing curable composition, color filter using the composition, and method for manufacturing the same
12/15/2009US7632613 comprising light shielding portions and openings formed on a transparent substrate; bias correction which expands the light shielding portions pattern to both sides; used for manufacturing a semiconductor; improve a pattern resolution quality
12/15/2009US7632087 Composite stamper for imprint lithography
12/10/2009WO2009148976A1 Lens heating compensation methods
12/10/2009WO2009148974A1 Model-based scanner tuning methods
12/10/2009WO2009148972A1 Methods for model-based process simulation
12/10/2009WO2009148547A2 Illumination system for sizing focused spots of a patterning system for maskless lithography
12/10/2009WO2009148303A1 Method for manufacturing a stencil for screen printing
12/10/2009WO2009147962A1 Liquid treatment apparatus and liquid treatment method
12/10/2009WO2009147913A1 Photosensitive resin composition, photosensitive element, resist pattern manufacturing method, and printed circuit board manufacturing method
12/10/2009WO2009147876A1 Solution for treatment of lithographic printing plate material, and method for production of lithographic printing plate
12/10/2009WO2009147823A1 Polymer for lithographic purposes and method for producing same
12/10/2009WO2009147033A1 Photoinitiator mixtures
12/10/2009WO2009147031A2 Oxime ester photoinitiators
12/10/2009WO2009147014A1 Multilayer mirror and lithographic apparatus
12/10/2009WO2009146855A1 Method and apparatus for determining an optical characteristic of an optical system
12/10/2009WO2009146606A1 Cleaning solution for removing residues from plasma etching
12/10/2009WO2009114253A3 Immersion lithography using hafnium-based nanoparticles
12/10/2009WO2008068617A8 Photoactive compounds
12/10/2009US20090305481 Method for manufacturing semiconductor memory device
12/10/2009US20090305176 Exposure apparatus and method of manufacturing device
12/10/2009US20090305175 Surface position detecting apparatus, exposure apparatus, surface position detecting method, and device manufacturing method
12/10/2009US20090305174 Method of forming resist pattern
12/10/2009US20090305173 Formation of a device using block copolymer lithography
12/10/2009US20090305172 Lithography simulation method, computer program product, and pattern forming method
12/10/2009US20090305171 Apparatus for scanning sites on a wafer along a short dimension of the sites
12/10/2009US20090305170 Optical waveguide manufacturing method
12/10/2009US20090305169 Method for manufacturing semiconductor device
12/10/2009US20090305168 Techniques for Marking Product Housings
12/10/2009US20090305167 Method for manufacturing semiconductor device
12/10/2009US20090305166 Method of manufacturing a semiconductor device
12/10/2009US20090305165 Wafer exposing method, euv exposing apparatus, and eb exposing apparatus
12/10/2009US20090305164 Method for making a lithographic printing plate
12/10/2009US20090305163 Negative resist composition
12/10/2009US20090305162 imageable elements and methods useful for providing waterless printing plates
12/10/2009US20090305161 Liquid immersion lithography
12/10/2009US20090305153 Substrate processing method and mask manufacturing method
12/10/2009US20090305152 Semiconductor device manufacturing method
12/10/2009US20090305151 Lithographic apparatus and device manufacturing method
12/10/2009US20090305150 Exposure method, exposure apparatus, and device manufacturing method
12/10/2009US20090305149 Dummy light-exposed substrate, method of manufacturing the same, immersion exposure apparatus, and device manufacturing method
12/10/2009US20090305148 Pattern data creating method, photomask fabricating method, and method of manufacturing semiconductor device
12/10/2009US20090305146 Optical recording medium and method for manufacturing the same
12/10/2009US20090303626 Housing structure
12/10/2009US20090303615 Ir cut-off filter coated lens array and method for manufacturing same
12/10/2009US20090303452 Image Enhancement Technique
12/10/2009US20090303422 Display substrate, method of manufacturing the same and display panel having the same
12/10/2009DE112004001611B4 Farbzusammensetzungen, Verfahren zum Erzeugen von Farbbildern und System zum Etikettieren eines Substrats Color compositions, methods for forming color images and system for labeling of a substrate
12/10/2009DE102009018020A1 Maske sowie Verfahren zur Wellenfrontvermessung eines optischen Systems Mask and method for wavefront measurement of an optical system
12/10/2009DE102008026077A1 Lithographiesystem und Verfahren zur Regelung eines Lithographiesystems Lithography system and method for controlling a lithography system
12/10/2009DE102008023238A1 Vorrichtung und Verfahren zur Erhöhung der Lichtdurchlässigkeit an optischen Elementen für Licht mit Wellenlängen nahe der Absorptionskante An apparatus and method for increasing the light transmittance of optical elements for light with wavelengths near the absorption edge
12/10/2009DE102008002247A1 Verfahren und Vorrichtung zum Bestimmen einer optischen Eigenschaft eines optischen Systems Method and apparatus for determining an optical property of an optical system
12/09/2009EP2131423A1 Negative electrode base member
12/09/2009EP2131245A2 Lithographic apparatus and its focus determination method
12/09/2009EP2131244A2 Lithographic apparatus and method for measuring a pattern property
12/09/2009EP2131243A2 Lithographic apparatus and method for calibrating a stage position
12/09/2009EP2131242A1 Substrate table, lithographic apparatus and device manufacturing method
12/09/2009EP2131241A2 Fluid handling structure, lithographic apparatus and device manufacturing method
12/09/2009EP2131240A1 Positive-working radiation-sensitive composition and method for resist pattern formation using the composition
12/09/2009EP2131239A1 Processing liquid for lithographic printing plate development and method of producing lithographic printing plates
12/09/2009EP2131238A1 Positive photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device using the cured film
12/09/2009EP2130095A1 Positive photosensitive resin composition and cured film forming method using the same
12/09/2009EP2130094A1 Positive resist composition and pattern forming method
12/09/2009EP2130093A1 Nanolithography with use of viewports
12/09/2009EP2129733A2 Antireflective coating composition based on a silicon polymer
12/09/2009EP2129530A1 Method to form a pattern of functional material on a substrate using a mask material
12/09/2009EP1951829B1 Water castable - water strippable top coats for 193 nm immersion lithography
12/09/2009EP1702359B1 Fabrication method
12/09/2009CN201359681Y Edge photoresist removal device
12/09/2009CN101600995A Photosensitive element
12/09/2009CN101600994A Photosensitive resin composition, cured film, protective film, insulating film and semiconductor device using the same, and display device
12/09/2009CN101600993A Imprint method and imprint apparatus
12/09/2009CN101599434A Fabricating method of semiconductor device
12/09/2009CN101598908A Decompression drying devic
12/09/2009CN101598907A Substrate table, lithographic apparatus and device manufacturing method
12/09/2009CN101598906A Substrate table, lithographic apparatus and device manufacturing method
12/09/2009CN101598905A Lithographic apparatus and a method of operating the apparatus
12/09/2009CN101598904A Lithographic apparatus and device manufacturing method
12/09/2009CN101598903A Exposure apparatus and device fabricating method
12/09/2009CN101598902A Lithographic apparatus and device manufacturing method
12/09/2009CN101598901A Operation method of manual exposure machine
12/09/2009CN101598900A Method for exposing plasma display panels
12/09/2009CN101598899A Hundred-grade working table composite unit and method for producing flexible plate
12/09/2009CN101598898A Coloring composition for forming red pixel, color filter and color liquid crystal display element
12/09/2009CN101598897A Color solidification property composition
12/09/2009CN101598896A Printing using a structure coated with ultraviolet radiation responsive material
12/09/2009CN101598895A Method for preparing transmittance grating
12/09/2009CN101598843A Mold insert and manufacturing method thereof
12/09/2009CN100568581C Method for producing image element, equipment for producing image element and image element
12/09/2009CN100568457C Fabrication method of a semiconductor device
12/09/2009CN100568456C Using of second exposure to assit a PSM exposure in printing tight space adjacent to large feature
12/09/2009CN100568455C Reticle and optical characteristic measuring method
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