| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/17/2009 | WO2009037233A3 Preparation of epsilon copper phthalocyanine of small primary particle size and narrow particle size distribution |
| 12/17/2009 | WO2008139320A8 Antireflective coating compositions |
| 12/17/2009 | US20090312216 Photoresist Stripper Composition for Semiconductor Manufacturing |
| 12/17/2009 | US20090311637 Block copolymer and substrate processing method |
| 12/17/2009 | US20090311636 Exposure apparatus, device manufacturing method, and aperture stop manufacturing method |
| 12/17/2009 | US20090311635 Double exposure patterning with carbonaceous hardmask |
| 12/17/2009 | US20090311634 Method of double patterning using sacrificial structure |
| 12/17/2009 | US20090311633 Pattern forming method |
| 12/17/2009 | US20090311632 Developing method and developing apparatus |
| 12/17/2009 | US20090311631 Near-field exposure apparatus and near-field exposure method |
| 12/17/2009 | US20090311630 Process for producing optical component |
| 12/17/2009 | US20090311629 Method for manufacturing roller mold |
| 12/17/2009 | US20090311628 Method for etching an ultra thin film |
| 12/17/2009 | US20090311627 Resist composition for immersion exposure and method of forming resist pattern using the same |
| 12/17/2009 | US20090311626 Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s |
| 12/17/2009 | US20090311625 Method for forming photoresist pattern and photoresist laminate |
| 12/17/2009 | US20090311624 Resist underlayer film forming composition containing liquid additive |
| 12/17/2009 | US20090311623 Photolithography |
| 12/17/2009 | US20090311622 Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film |
| 12/17/2009 | US20090311621 Support for planographic printing plate material, manufacturing method thereof, and planographic printing plate material employing the same |
| 12/17/2009 | US20090311615 Method of photolithographic patterning |
| 12/17/2009 | US20090311613 Mask for multi-column electron beam exposure, and electron beam exposure apparatus and exposure method using the same |
| 12/17/2009 | US20090311494 Relief printing plate precursor for laser engraving, relief printing plate, and process for producing relief printing plate |
| 12/17/2009 | US20090311491 Multi-exposure lithography employing differentially sensitive photoresist layers |
| 12/17/2009 | US20090311490 Chemical trim of photoresist lines by means of a tuned overcoat material |
| 12/17/2009 | US20090311482 Substrate and imageable element with hydrophilic interlayer |
| 12/17/2009 | US20090311190 Self-assembled, micropatterned, and radio frequency (rf) shielded biocontainers and their uses for remote spatially controlled chemical delivery |
| 12/17/2009 | US20090310196 Volume phase hologram recording material and optical information recording medium |
| 12/17/2009 | US20090310105 Optical member, interferometer system, stage apparatus, exposure apparatus, and device manufacturing method |
| 12/17/2009 | DE10212937B4 Verfahren zur Einstellung der Bildlinienbreite in einem Belichter Method for adjusting the image line width in an exposer |
| 12/17/2009 | DE10208150B4 Verfahren und Vorrichtung zur Herstellung eines Formkörpers Method and apparatus for producing a shaped article |
| 12/17/2009 | DE102009023993A1 Halbleiterstrukturen mit Vias Semiconductor structures with vias |
| 12/17/2009 | DE102008035866A1 Verfahren zur Herstellung von einer Replik einer funktionalen Oberfläche Process for the preparation of a replica of a functional surface |
| 12/16/2009 | EP2133755A2 Computer generated hologram, exposure apparatus and device fabrication method |
| 12/16/2009 | EP2133747A1 Resin composition for micropattern formation and method of micropattern formation |
| 12/16/2009 | EP2133746A2 Method and system for evaluating an object that has a repetitive pattern |
| 12/16/2009 | EP2133745A1 Method of and program for determining an exposure parameter, exposure method, and device manufacturing method |
| 12/16/2009 | EP2133744A1 Photosensitive resin composition |
| 12/16/2009 | EP2133743A1 Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part |
| 12/16/2009 | EP2133742A1 Exposure method using pattern dependant dose control |
| 12/16/2009 | EP2133725A2 Apparatus for nanofabrication using multi-photon excitation |
| 12/16/2009 | EP2132602A1 Method and device for imaging a programmable mask on a substrate |
| 12/16/2009 | EP2132601A1 Illumination system for illuminating a patterning device and method for manufacturing an illumination system |
| 12/16/2009 | EP2132600A1 Split axes stage design for semiconductor applications |
| 12/16/2009 | EP2132599A2 Process, apparatus and device |
| 12/16/2009 | EP2132556A2 Device for sorting and concentrating electromagnetic energy and apparatus comprising at least one such device |
| 12/16/2009 | EP2132253A1 Process for making siloxane polymers |
| 12/16/2009 | CN201364461Y Spray foam-breaking device |
| 12/16/2009 | CN201364460Y Double wafer stage exchanging device of photo-etching machine |
| 12/16/2009 | CN201364459Y Double wafer stage exchanging device of photo-etching machine |
| 12/16/2009 | CN201364396Y Holographic concave-grating exposure diffraction efficiency real-time monitoring system |
| 12/16/2009 | CN101606442A Plasma radiation source with axial magnetic field |
| 12/16/2009 | CN101606104A Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus |
| 12/16/2009 | CN101606103A Photosensitive polyimide resin composition |
| 12/16/2009 | CN101606102A Photoactive compounds |
| 12/16/2009 | CN101606101A Fine pattern transfer material |
| 12/16/2009 | CN101604124A Mold, pattern forming method, and pattern forming apparatus |
| 12/16/2009 | CN101604123A Lithographic apparatus, composite material and manufacturing method |
| 12/16/2009 | CN101604122A Lithographic apparatus and device manufacturing method |
| 12/16/2009 | CN101604121A Colored photoresist with gold nanoparticles and colored filter formed by same |
| 12/16/2009 | CN101604120A Coloring photosensitive resin composition |
| 12/16/2009 | CN101604092A Display panel, manufacture method thereof as well as display device, color restoration method thereof and electronic device |
| 12/16/2009 | CN101603939A Electrochemical ultra-micro compound electrode and preparation method thereof |
| 12/16/2009 | CN101602682A Photoinitiator/halogen-free fire retardant, preparation method and application thereof |
| 12/16/2009 | CN100570822C Exposure device, exposing method, and device manufacturing method |
| 12/16/2009 | CN100570497C Production of automatic optical approximate correcting regulation |
| 12/16/2009 | CN100570496C Photo-etching machine silicon slice bench double-bench switching system adopting cross slide rail |
| 12/16/2009 | CN100570495C Method for testing whether etching solution is valid or not |
| 12/16/2009 | CN100570494C Lithography |
| 12/16/2009 | CN100570493C Pattern density control method using edge printing processes |
| 12/16/2009 | CN100570492C Around exposure device and method thereof |
| 12/16/2009 | CN100570491C Pattern image setting and multiplying power error compensation method of step-by-step exposure machine |
| 12/16/2009 | CN100570490C Lithographic apparatus, reticle exchange unit and device manufacturing method |
| 12/16/2009 | CN100570489C Lithographic apparatus and device manufacturing method |
| 12/16/2009 | CN100570488C Cooler of static chuck of extreme ultraviolet photolithographic mask platform |
| 12/16/2009 | CN100570487C Method of determining aberration of a projection system of a lithographic apparatus |
| 12/16/2009 | CN100570486C Picture drawing device |
| 12/16/2009 | CN100570485C Two-dimensional nanostructure deep etching method |
| 12/16/2009 | CN100570484C Coating and developing device, and coating and developing method |
| 12/16/2009 | CN100570483C Acrylic polymer-containing gap filler forming composition for lithography |
| 12/16/2009 | CN100570482C Photosensitive resin composition |
| 12/16/2009 | CN100570481C Thermosensitive polymerized lithographic printing plate |
| 12/16/2009 | CN100570453C Liquid crystal display and manufacturing method therefor |
| 12/16/2009 | CN100570445C Fluid dispensing and drop-on-demand dispensing for nano-scale manufacturing |
| 12/16/2009 | CN100570442C Assembling method of liquid-crystal panel |
| 12/16/2009 | CN100570430C Focal point variable micro-flat mirror driven by electrostatic and method of manufacturing the same |
| 12/16/2009 | CN100570415C Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
| 12/16/2009 | CN100569825C Photocurable/thermosetting resin composition and cured product thereof |
| 12/16/2009 | CN100569815C Resin compound containing addition product of benzoquinone-cyclopentadiene, and composition of photoresistive agent containing the resin compound |
| 12/16/2009 | CN100569510C Apparatus and method for thermally developing flexographic printing elements |
| 12/15/2009 | US7633712 Method to print photoresist lines with negative sidewalls |
| 12/15/2009 | US7633675 Catadioptric imaging system employing immersion liquid for use in broad band microscopy |
| 12/15/2009 | US7633619 Calibrating a lithographic apparatus |
| 12/15/2009 | US7633618 Method and apparatus for measuring the relative position of a first and a second alignment mark |
| 12/15/2009 | US7633598 Filter exposure apparatus, and device manufacturing method |
| 12/15/2009 | US7633227 Discharge lamp with lamp base structure |
| 12/15/2009 | US7633073 Lithographic apparatus and device manufacturing method |
| 12/15/2009 | US7632896 Derivatized novolak polyhydroxystyrene |
| 12/15/2009 | US7632895 Curable resin composition |
| 12/15/2009 | US7632631 Photoresists, antireflective coating; photolithography |