| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/23/2009 | EP1502334B1 High power deep ultraviolet laser with long life optics |
| 12/23/2009 | CN201369881Y Solder mask exposure device for printed circuit board |
| 12/23/2009 | CN101611470A Moving body apparatus, apparatus for forming pattern, method of forming pattern, method of producing device, method of producing moving body apparatus, and method of driving moving body |
| 12/23/2009 | CN101611353A Composition for forming cured film pattern, and method for producing cured film pattern by using the same |
| 12/23/2009 | CN101611352A Projection optical apparatus, exposure method and device manufacturing method |
| 12/23/2009 | CN101611351A Radiation system and lithographic apparatus |
| 12/23/2009 | CN101611350A Positive-type photosensitive resin composition |
| 12/23/2009 | CN101611068A Process for producing photosensitive resin, photosensitive resin obtained by the process, and photosensitive resin composition |
| 12/23/2009 | CN101609870A Organic solar cells and method of manufacturing the same |
| 12/23/2009 | CN101609789A Device and method for processing substrate |
| 12/23/2009 | CN101609787A Method for forming patterns of semiconductor device by using mixed assist feature system |
| 12/23/2009 | CN101609785A Valve block structure with pressure stabilization function |
| 12/23/2009 | CN101609784A Air valve structure for transplanting container |
| 12/23/2009 | CN101609692A Magnetic recording disks, a master mold for nanoimprinting patterned magnetic recording disks, and a method for making the master mold |
| 12/23/2009 | CN101609691A Method for making a master mold for nanoimprinting patterned magnetic recording disks |
| 12/23/2009 | CN101609269A Developing method and developing apparatus |
| 12/23/2009 | CN101609268A Lithographic apparatus and method |
| 12/23/2009 | CN101609267A 光刻设备 Lithography equipment |
| 12/23/2009 | CN101609266A Field measurement device of wave aberration of projection objective in photo-etching machine |
| 12/23/2009 | CN101609265A Silicon slice platform multi-platform exchange system adopting magnetic levitation planar motor |
| 12/23/2009 | CN101609264A Method for improving focusing and leveling measurement accuracy |
| 12/23/2009 | CN101609263A Mobile device of photoetching machine wafer stage and photoetching machine adopting mobile device |
| 12/23/2009 | CN101609262A Temperature control device of projection object lens of lithography machine |
| 12/23/2009 | CN101609261A Method for exposure |
| 12/23/2009 | CN101609260A Shielded air inlet and outlet structure of transplanting vessel |
| 12/23/2009 | CN101609259A Storage cabinet with pressure stabilization function |
| 12/23/2009 | CN101609258A Method for managing exposal intensity and evenness degree of photoetching machine |
| 12/23/2009 | CN101609257A Pressure-maintaining system applied to transplanting container |
| 12/23/2009 | CN101609256A Ray-sensing resin composition for forming protective film and method for forming protective film |
| 12/23/2009 | CN101609255A Settability composition for nanometer stamp, method for forming pattern |
| 12/23/2009 | CN101609254A A resist pattern-improving material and a method for preparing a resist pattern by using the same |
| 12/23/2009 | CN101609252A Pattern repairing method |
| 12/23/2009 | CN101609227A Color filter layer and fabrication method thereof |
| 12/23/2009 | CN101609193A Movable optical element adjusting and positioning device |
| 12/23/2009 | CN101608944A Optical fiber vibration sensing head and manufacturing method thereof |
| 12/23/2009 | CN100573785C Master mold for duplicating fine structure and production method thereof |
| 12/23/2009 | CN100573784C Method of making a display device having a light-blocking layer and display device having the same |
| 12/23/2009 | CN100573343C Method for cleaning wafer edge |
| 12/23/2009 | CN100573342C Method of making a photopolymer printing plate |
| 12/23/2009 | CN100573341C Precision vibration-damping assembly and vibration-damping platform constituted therefor |
| 12/23/2009 | CN100573340C Two-freedom degree electric machine actuating mechanism and corresponding six-freedom degree micromotion platform |
| 12/23/2009 | CN100573339C Real-time detecting and correcting device and method for position of object plane and image plane |
| 12/23/2009 | CN100573338C Immersion photolithography system and method using inverted wafer-projection optics interface |
| 12/23/2009 | CN100573337C Circle center locating method |
| 12/23/2009 | CN100573336C Off-axis projection optical system and extreme ultraviolet lithography apparatus using the same |
| 12/23/2009 | CN100573335C Stage apparatus, lithographic apparatus and device manufacturing method |
| 12/23/2009 | CN100573334C Optical system having a cleaning arrangement |
| 12/23/2009 | CN100573333C Lithographic apparatus, illumination system and filter system |
| 12/23/2009 | CN100573332C Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby |
| 12/23/2009 | CN100573331C Exposure system and pattern formation method |
| 12/23/2009 | CN100573330C An image forming method and apparatus |
| 12/23/2009 | CN100573329C Coating machine nozzle cleaning module and its device |
| 12/23/2009 | CN100573328C Coating and developing apparatus and coating and developing method |
| 12/23/2009 | CN100573327C Composition for forming underlying film containing dextrin ester compound |
| 12/23/2009 | CN100573326C Method for evaluating sensitivity of photoresist, method for preparation of photoresist |
| 12/23/2009 | CN100573325C Photocrosslinkable polyurethanes |
| 12/23/2009 | CN100573324C Negative light resistance agent composition |
| 12/23/2009 | CN100573323C Photosensitive paste and method for producing member for display panel |
| 12/23/2009 | CN100573322C Planar inorganic device |
| 12/23/2009 | CN100573321C Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method therefor |
| 12/23/2009 | CN100573320C Pattern forming method |
| 12/23/2009 | CN100573319C Anti-reflective coating and its design method |
| 12/23/2009 | CN100573318C Photosensitive planographic printing plate and method of producing the same |
| 12/23/2009 | CN100573317C Continuous-surface shape mask moving photoetching exposure device |
| 12/23/2009 | CN100573261C Color membrane substrates and manufacturing method thereof |
| 12/23/2009 | CN100573227C Micro optical chip based on light fluid and preparation method thereof |
| 12/23/2009 | CN100573222C Refractive projection objective for immersion lithography |
| 12/23/2009 | CN100572422C Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern |
| 12/23/2009 | CN100572088C Process for producing laser etching printing substrate |
| 12/23/2009 | CN100572032C Method to reduce adhesion between a conformable region and a pattern of a mold |
| 12/22/2009 | US7636149 Optical systems that correct optical irregularities, and projection-exposure systems and methods comprising same |
| 12/22/2009 | US7635554 Containing acid decomposable units; acid generators; irradiating with actinic radiation |
| 12/22/2009 | US7635553 photoresists; semiconductors; dimensional stability |
| 12/22/2009 | US7635552 Photoresist composition with antibacterial agent |
| 12/22/2009 | US7635551 Poly (imide-azomethine) copolymer, poly (amic acid-azomethine) copolymer, and positive photosensitive resin composition |
| 12/22/2009 | CA2530069C Low viscosity radiation curable formulations, especially for the stereo-lithographic production of earpieces |
| 12/22/2009 | CA2332992C Controlled phase delay between beams for writing bragg gratings |
| 12/22/2009 | CA2312508C Ultraviolet curable resin compositions having enhanced shadow cure properties |
| 12/17/2009 | WO2009152276A2 Photoacid generators and lithographic resists comprising the same |
| 12/17/2009 | WO2009151560A2 Adaptive nanotopography sculpting |
| 12/17/2009 | WO2009151499A2 Imageable elements useful for waterless printing |
| 12/17/2009 | WO2009151154A1 Apparatus and method for exposing adjacent sites on a substrate |
| 12/17/2009 | WO2009151126A1 Process and apparatus for producing cylindrical printing plate precursor for laser engraving |
| 12/17/2009 | WO2009151050A1 Photosensitive resin composition for hollow package, cured product thereof, multilayer body using the resin composition and microdevice |
| 12/17/2009 | WO2009151012A1 Polyamide resin, photosensitive resin composition, method for forming cured relief pattern, and semiconductor device |
| 12/17/2009 | WO2009150918A1 Structure having insulating coating film, method for producing the same, positive photosensitive resin composition and electronic device |
| 12/17/2009 | WO2009150913A1 Illumination apparatus, exposure apparatus, and device fabrication method |
| 12/17/2009 | WO2009150901A1 Exposure apparatus and exposure method |
| 12/17/2009 | WO2009150871A1 Exposure apparatus and device manufacturing method |
| 12/17/2009 | WO2009150870A1 Semiconductor device manufacturing method |
| 12/17/2009 | WO2009150703A1 Photosensitive flexographic printing original plate |
| 12/17/2009 | WO2009150178A1 Optical apparatus with adjustable action of force on an optical module |
| 12/17/2009 | WO2009150089A1 Apparatus and method for inspecting a substrate |
| 12/17/2009 | WO2009150074A1 Sulfonium derivatives and the use thereof as latent acids |
| 12/17/2009 | WO2009150031A1 Inspection method and apparatus |
| 12/17/2009 | WO2009150018A1 Method and system for thermally conditioning an optical element |
| 12/17/2009 | WO2009149802A1 Method for producing a multilayer coating, optical element and optical arrangement |
| 12/17/2009 | WO2009129441A3 Symmetric thermocentric flexure with minimal yaw error motion |
| 12/17/2009 | WO2009070622A3 Cantilever with pivoting actuation |
| 12/17/2009 | WO2009049758A3 Finely divided c.i. pigment yellow 155 |