| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/30/2009 | CN100576087C Photo-etching machine illumination homogeneity compensator preparation method |
| 12/30/2009 | CN100576086C Lithography device and its method |
| 12/30/2009 | CN100576085C Apparatus and method for performing a model based optical proximity correction factoring neighbor influence |
| 12/30/2009 | CN100576084C Method and apparatus for improving calibration of resist models used in critical dimension calculation |
| 12/30/2009 | CN100576083C A method for model based geometry decomposition for use in a multiple exposure process and corresponding product |
| 12/30/2009 | CN100576082C Soft mold and method for fabricating the same |
| 12/30/2009 | CN100576081C Lithographic apparatus and device manufacturing method with feed-forward focus control |
| 12/30/2009 | CN100576080C SLM direct writer |
| 12/30/2009 | CN100576079C Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method |
| 12/30/2009 | CN100576078C Apparatus and method for manufacturing photosensitive laminates |
| 12/30/2009 | CN100576077C Coating method and coating device |
| 12/30/2009 | CN100576076C Positive resist composition and method for forming resist pattern |
| 12/30/2009 | CN100576075C Radiation sensitive resin composition for forming spacer, spacer, method for forming same and liquid crystal display element |
| 12/30/2009 | CN100576074C Photosensitive resin composition, photosensitive elements using photosensitive resin composition, process for forming resist patterns with the same, and process for production of printed wiring boards |
| 12/30/2009 | CN100576073C Method for raising fine quality rate of semiconductor chip |
| 12/30/2009 | CN100576072C Planographic printing plate precursor |
| 12/30/2009 | CN100576071C Production technology of antiforged package |
| 12/30/2009 | CN100576070C A method of preparing photosensitive gel film to realize transfer of raster graphic |
| 12/30/2009 | CN100576069C Radiation curable resin composition and rapid prototyping process using the same |
| 12/30/2009 | CN100576045C Liquid crystal display and its manufacture method |
| 12/30/2009 | CN100576041C Film transistor array substrate and producing method thereof |
| 12/30/2009 | CN100576027C Flexible liquid crystal display and manufacturing method thereof |
| 12/30/2009 | CN100576026C Liquid crystal display panel and fabrication method thereof |
| 12/30/2009 | CN100576016C Flexible cantilever micro-mechanical-optical switch preparation method |
| 12/30/2009 | CN100576003C Optical element holding device, lens barrel, exposing device, and device producing method |
| 12/30/2009 | CN100575997C Optical filter element and wavelength division multiplexing optical coupler |
| 12/30/2009 | CN100575125C Method for making same-position heteromorphic stealth pattern on metallic material surface |
| 12/30/2009 | CN100575076C Improved flexo processor |
| 12/30/2009 | CN100574905C Optical performance restoring equipment, restoring method |
| 12/29/2009 | US7639419 Inspection system using small catadioptric objective |
| 12/29/2009 | US7639416 Apparatus for SLM-based optical lithography with gray level capability |
| 12/29/2009 | US7639343 Exposure apparatus and device manufacturing method |
| 12/29/2009 | US7638268 solvent remove the first photoresist film, forming a second photoresist film over the second antireflection silicone resin film which is over the first antireflection silicone resin film; lower cost and provide an excellent resist pattern |
| 12/29/2009 | US7638267 thermally contracting the coating film to narrow and reducing an opening dimension of a resist pattern, removing the coating film by dry etching processing; prevent increase the rinse processing of the coating forming agent |
| 12/29/2009 | US7638265 forming microstructures on substrates, then electrodeposting metal layers, coating with photoresists, exposing to photomasks and developing patterns, removing segments of the layer, depositing a second metal layer, electroforming metal plates on the second metal and separating the layers; waveguides |
| 12/29/2009 | US7638264 Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use |
| 12/29/2009 | US7638263 prevent the measuring error by forming trenches of a region; etching to form the trench of the peri region; simple manufacturing of semiconductor device |
| 12/29/2009 | US7638262 Polyesters, crosslinking agent and acid generator; post exposure baking |
| 12/29/2009 | US7638261 For use as chemically-amplified resist useful for microfabrication utilizing various types of radiation; lithography, integrated circuits |
| 12/29/2009 | US7638260 Resin comprising monomers of cyclopentyl- or cyclohexyl (meth)acrylate; hydroxyadamantyl (meth)acrylate; 3,8-epoxy-6-oxabicyclo[3.2.1]octyl (meth)acrylat;, and/or fluoroalkyl (meth)acrylate; ArF lithography; resolution; forms a pattern with a minimal line edge roughness |
| 12/29/2009 | US7638259 Polyimide resin soluble in aqueous alkaline solution, composition comprising the resin and cured coating prepared from the composition |
| 12/29/2009 | US7638258 Positive resist composition and method for resist pattern formation |
| 12/29/2009 | US7638257 Positive resist composition and method of forming resist pattern |
| 12/29/2009 | US7638256 Minimizing pattern collapse by swelling, exhibit improved resistance to etching using pattern transfer to organic film, photoresists; semiconductors, photolithography, lithography |
| 12/29/2009 | US7638255 Irradiating a photoresist layer masked by a desired pattern using ultraviolet light and subsequently washing said layer using a solvent solution containing alkali, wherein photo resist layer comprises condensation type polymer and photo acid generating agent |
| 12/29/2009 | US7638254 Makes pattern with good heat resistance, low water absorption and configuration ; good sensitivity, resolution and adhesion; memory polymers |
| 12/29/2009 | US7638253 Photoresist composition and method of manufacturing a thin-film transistor substrate using the same |
| 12/29/2009 | US7638245 Mask set for variable mask field exposure |
| 12/29/2009 | US7638096 Photoresist coating failure sensing methods and detection devices |
| 12/24/2009 | US20090318323 Solvent compositions containing chlorofloroolefins or fluoroolefins |
| 12/24/2009 | US20090317753 Bicyclo compound, method for producing pentacene and a film thereof using the same, and method for producing bicyclo compound |
| 12/24/2009 | US20090317752 Rinse liquid for lithography and method for forming resist pattern using same |
| 12/24/2009 | US20090317751 Optical arrangement of autofocus elements for use with immersion lithography |
| 12/24/2009 | US20090317750 Method for manufacturing piezoelectric/electrostrictive film type element |
| 12/24/2009 | US20090317749 Method for forming patterns of semiconductor device by using mixed assist feature system |
| 12/24/2009 | US20090317748 Method for Forming Fine Patterns of Semiconductor Device |
| 12/24/2009 | US20090317747 Anti-reflective coatings using vinyl ether crosslinkers |
| 12/24/2009 | US20090317746 Photosensitive resin composition, photosensitive element comprising the same, method of forming resist pattern, and process for producing printed wiring board |
| 12/24/2009 | US20090317745 Positive resist composition and method of forming resist pattern |
| 12/24/2009 | US20090317744 Polymer and chemically amplified resist composition comprising the same |
| 12/24/2009 | US20090317743 Resist composition for immersion exposure, method of forming resist pattern, and flourine-containing polymeric compound |
| 12/24/2009 | US20090317742 Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device |
| 12/24/2009 | US20090317741 Compound, acid generator, resist composition and method of forming resist pattern |
| 12/24/2009 | US20090317740 Composition containing hydroxylated condensation resin for forming resist underlayer film |
| 12/24/2009 | US20090317739 An aqueous coating composition for coating a photoresist pattern comprising an polymer having an acrylic monomer with an alkylamino group; shrinkage; sensitivity to the deep ultraviolet radiation; improved pattern definition, higher resolution, low defects, smaller feature sizes, heat resistance |
| 12/24/2009 | US20090317727 Means for transferring a pattern to an object |
| 12/24/2009 | US20090317604 Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel |
| 12/24/2009 | US20090317601 Apparatus and method for treating imaging materials |
| 12/24/2009 | US20090317595 Method for producing a multi-layer body, and multi-layer body |
| 12/24/2009 | US20090316132 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method |
| 12/24/2009 | US20090316129 Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame |
| 12/24/2009 | US20090316128 Illumination system particularly for microlithography |
| 12/24/2009 | US20090315413 Motor apparatus, manufacturing method, exposure apparatus, and device fabrication method |
| 12/24/2009 | DE102009017941A1 Illuminating system for use in wafer-scanner for illuminating lighting field, has two types of raster elements differing in its distance to another set of raster elements along beam direction of illuminating light around specific distance |
| 12/24/2009 | DE102009016456A1 Illumination lens for use in microlithography-projection illumination system during manufacturing dynamic RAM, has filters e.g. neutral gray filter, and polarization filters arranged in or adjacent to pupil plane arranged after glass bar |
| 12/24/2009 | DE102008028868A1 Optische Baugruppe Optical assembly |
| 12/24/2009 | DE102008028416A1 Beleuchtungssystem für eine Projektionsbelichtungsanlage in der Halbleiterlitographie und Projektionsbelichtungsanlage Illumination system for a projection exposure apparatus in the Halbleiterlitographie and projection exposure apparatus |
| 12/24/2009 | DE102008026979B3 Device for correcting image defect in optical system, has multiple optical components, which are arranged along common axis, where unit is provided for adjusting position of optical element |
| 12/24/2009 | DE102005024518B4 Verfahren und Anordnung zum Beschichten eines Substrates Method and arrangement for coating a substrate |
| 12/23/2009 | WO2009155067A2 Method for forming fine pitch structures |
| 12/23/2009 | WO2009154740A1 Substrate and imageable element with hydrophilic interlayer |
| 12/23/2009 | WO2009154571A1 A method of making an imprint on a polymer structure |
| 12/23/2009 | WO2009154194A1 Photosensitive resin composition, photosensitive element wherein same is used, method for forming a resist-pattern, and method for producing a printed wiring board |
| 12/23/2009 | WO2009154114A1 Method of resist treatment |
| 12/23/2009 | WO2009154085A1 Seed light generating device, light source device and method for adjusting the same, optical irradiation device, exposure device, and device manufacturing method |
| 12/23/2009 | WO2009154023A1 Lithographic printing material |
| 12/23/2009 | WO2009153648A1 Aqueous composition for coating over a photoresist pattern |
| 12/23/2009 | WO2009152959A1 Projection exposure apparatus for semiconductor lithography comprising a device for the thermal manipulation of an optical element |
| 12/23/2009 | WO2009152885A1 Particle cleaning of optical elements for microlithography |
| 12/23/2009 | WO2009152867A1 Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method |
| 12/23/2009 | WO2009103485A8 Gas gauge compatible with vacuum environments |
| 12/23/2009 | EP2136250A1 Lithographic apparatus and method |
| 12/23/2009 | EP2136249A2 Pattern forming method, substrate processing method and mold structure replication method |
| 12/23/2009 | EP2136231A1 High aperture catadioptric system |
| 12/23/2009 | EP2136229A1 Laterally adjustable optical mount with bent lever manipulator units |
| 12/23/2009 | EP2135901A1 Compound for photoresist, photoresist solution, and etching method using the photoresist solution |
| 12/23/2009 | EP2135137A1 Exposure method and electronic device manufacturing method |
| 12/23/2009 | EP2135124A1 Optical mounting and optical component comprising said type of optical mounting |
| 12/23/2009 | EP2076818B1 Apparatus comprising a rotating contaminant trap |
| 12/23/2009 | EP1635382B1 Exposure device and device producing method |