| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/05/2010 | US7643049 Method for manufacturing recording media, method for manufacturing production plate used when manufacturing recording media, apparatus for manufacturing recording media, and apparatus for manufacturing production plate used when manufacturing recording media |
| 01/05/2010 | US7642533 Extreme ultraviolet light source |
| 01/05/2010 | US7642145 Method for producing electronic device |
| 01/05/2010 | US7642110 Method for fabricating a structure for a microelectromechanical systems (MEMS) device |
| 01/05/2010 | US7642043 Rework process for photoresist film |
| 01/05/2010 | US7642042 Polymer, top coating layer, top coating composition and immersion lithography process using the same |
| 01/05/2010 | US7642041 Using mask having an aperture that creates a servo pattern in a master for magnetic-contact printing; arc-shaped slit; using a wavelength of laser beam to determine a trackpitch; reducing the time required for recording a master; high-density magnetic recording applications |
| 01/05/2010 | US7642040 Method of fabricating periodic domain inversion structure |
| 01/05/2010 | US7642039 Method of making an address plate |
| 01/05/2010 | US7642038 irradiating TiO2 photocatalyst and a silicone coupler having fluorocarbon chain with light through the light-transmitting substrate to modify a part of a surface of the material containing the fluorocarbon chain which is to be a 2nd region; patterning a conductive material to form pattern to 2nd region |
| 01/05/2010 | US7642037 generating an imaging pattern using a mask having a mathematical (e.g., Fourier-space) representation of an imaging pattern in an imaging plane between a substantially coherent light source and the integrated circuit substrate |
| 01/05/2010 | US7642034 Photoresists; (meth)acrylate fluoropolymer which is insoluble in water, dissolvable in aqueous alkaline solution, and immiscible with resist films so that it enables pattern formation by the immersion lithography |
| 01/05/2010 | US7642019 constructing photomasks with test patterns adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction of defocus from a best focus position of an exposure tool during a lithographic process |
| 01/05/2010 | US7642018 Photosensitive resin composition, pattern forming method and electronic parts using the photosensitive resin composition |
| 01/05/2010 | US7641763 Apparatus and method for removing coating film |
| 01/05/2010 | CA2428255C Onium salts and the use therof as latent acids |
| 12/31/2009 | US20090326269 Templated Monolayer Polymerization and Replication |
| 12/31/2009 | US20090325107 Thermal embossing of resist reflowed lenses to make aspheric lens master wafer |
| 12/31/2009 | US20090325105 Printed circuit board with embedded capacitors therein, and process for manufacturing the same |
| 12/31/2009 | US20090325104 Process for manufacturing semiconductor device |
| 12/31/2009 | US20090325103 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same |
| 12/31/2009 | US20090325102 Photosensitive composition and pattern forming method using same |
| 12/31/2009 | US20090325088 Method and apparatus for overlay compensation between subsequently patterned layers on workpiece |
| 12/31/2009 | US20090325087 Parallel Process Focus Compensation |
| 12/31/2009 | US20090325082 Method for fabricating patterns using a photomask |
| 12/31/2009 | US20090325081 Exposure mask and manufacturing method of a semiconductor using the same |
| 12/31/2009 | US20090325080 Method and Structure for Fabricating Dark-Periphery Mask for the Manufacture of Semicondutor Wafers |
| 12/31/2009 | US20090325079 Data storage medium comprising colloidal metal and preparation process thereof |
| 12/31/2009 | US20090325078 Holographic recording medium |
| 12/31/2009 | US20090324904 Massively Parallel Assembly of Composite Structures Using Depletion Attraction |
| 12/31/2009 | US20090324450 Nanometer Scale Instrument for Biochemically, Chemically, or Catalytically Interacting with a Sample Material |
| 12/31/2009 | US20090324174 Device consisting of at least one optical element |
| 12/31/2009 | US20090323156 Method of forming electrochromic layer pattern, method of manufacturing electrochromic device using the same, and electrochromic device including electrochromic layer pattern |
| 12/31/2009 | US20090323042 Optical system of a microlithographic projection exposure apparatus |
| 12/31/2009 | US20090323041 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses |
| 12/31/2009 | US20090321894 Multi-functional linear siloxane compound, a siloxane polymer prepared from the compound, and a process for forming a dielectric film by using the polymer |
| 12/31/2009 | US20090321652 Radiation detector using gas amplication and method for manufacturing the same |
| 12/31/2009 | DE102009024870A1 Optische Einrichtung mit einstellbarer Kraftwirkung auf ein optisches Modul Optical device with adjustable force on an optical module |
| 12/31/2009 | DE102009021330A1 Verfahren zum Verringern der Oberflächenrauhigkeit einer porösen Oberfläche A method for reducing the surface roughness of a porous surface |
| 12/31/2009 | DE102008029970A1 Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zum Überwachen einer lateralen Abbildungsstabilität Projection exposure system for microlithography and method for monitoring a lateral imaging stability |
| 12/31/2009 | DE102008002749A1 Beleuchtungsoptik für die Mikrolithografie Illumination optics for microlithography |
| 12/30/2009 | WO2009157974A1 Print plate handling system |
| 12/30/2009 | WO2009157354A1 Photosensitive conductive paste |
| 12/30/2009 | WO2009156225A1 Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus |
| 12/30/2009 | WO2009156111A1 Projection exposure system for microlithography and method of monitoring a lateral imaging stability |
| 12/30/2009 | WO2009156038A1 Illumination optical unit for microlithography |
| 12/30/2009 | WO2009155782A1 Detergent for removing photoresist |
| 12/30/2009 | WO2009125945A3 Photoresist stripper composition, and a photoresist peeling method employing the same |
| 12/30/2009 | WO2009125940A3 Photoactive compound and photosensitive resin composition comprising the same |
| 12/30/2009 | WO2009114193A3 Bare reticle storage chamber and stocker |
| 12/30/2009 | EP2138898A1 Method for pattern formation, and resist composition, developing solution and rinsing liquid for use in the method for pattern formation |
| 12/30/2009 | EP2138897A1 Material for formation of conductive anti-reflection film, method for formation of conductive anti-reflection film, method for formation of resist pattern, semiconductor device, and magnetic head |
| 12/30/2009 | EP2138896A1 Nano imprinting method and apparatus |
| 12/30/2009 | EP2138895A1 Nano imprinting method and apparatus |
| 12/30/2009 | EP2138531A1 Method for production of crosslinked polyvinyl acetal resin, and crosslinked polyvinyl acetal resin |
| 12/30/2009 | EP2137576A1 Dual photoinitiator, photocurable composition, use thereof and process for producing a three dimensional article |
| 12/30/2009 | EP2137264A2 Pigment-dispersed composition, curable composition, and color filter and production method thereof |
| 12/30/2009 | EP2137220A1 Aromatic urethane acrylates having a high refractive index |
| 12/30/2009 | EP2137140A2 Novel diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof |
| 12/30/2009 | EP2136933A1 Method for imprint lithography utilizing an adhesion primer layer |
| 12/30/2009 | EP1771771B1 Catadioptric projection objective |
| 12/30/2009 | EP1565789B1 Photosensitive resin composition comprising a halogen-free colorant |
| 12/30/2009 | EP1435020B1 Aqueous developable photoimageable thick film compositions |
| 12/30/2009 | EP1266923B1 Polyester film as support for dry film resist |
| 12/30/2009 | EP1192421B1 A non-invasive system and method for diagnosing potential malfunctions of semiconductor equipment components |
| 12/30/2009 | CN101617274A Exposure method, exposure apparatus, light converging pattern formation member, mask, and device manufacturing method |
| 12/30/2009 | CN101617273A Composition for antireflective coating |
| 12/30/2009 | CN101617272A Photo-sensitive resin composition for black matrix, black matrix produced by the composition and liquid crystal display including the black matrix |
| 12/30/2009 | CN101614971A Photoresist cleaning agent |
| 12/30/2009 | CN101614970A Photoresist cleaning agent composition |
| 12/30/2009 | CN101614969A Developing method for immersion lithography, solvent used for the developing method and electronic device using the developing method |
| 12/30/2009 | CN101614968A Lithographic apparatus and device manufacturing method |
| 12/30/2009 | CN101614967A Replacement apparatus for an optical element |
| 12/30/2009 | CN101614966A Exposure method, aligner and device manufacturing method |
| 12/30/2009 | CN101614965A Lithographic apparatus and device manufacturing method |
| 12/30/2009 | CN101614964A Silicon slice table double-table exchange exposure system and double-table exchange method |
| 12/30/2009 | CN101614963A Processing method of lithography machine silicon slice alignment signals |
| 12/30/2009 | CN101614962A Method, device and system for acquiring bias parameters and increasing resolution of photoetching equipment |
| 12/30/2009 | CN101614961A Partial zonal photon sieve and manufacturing method thereof |
| 12/30/2009 | CN101614960A Slit coating device with nozzle lip cleaning device |
| 12/30/2009 | CN101614959A Star-structure glue-spreading development equipment |
| 12/30/2009 | CN101614958A Chemically amplified positive resist composition |
| 12/30/2009 | CN101614957A Radiation-sensitive composition for forming color filter for solid-state image sensing device, color filter, and solid-state image sensing device |
| 12/30/2009 | CN101614956A Red colored composition and color filter using the same, and manufacturing method thereof |
| 12/30/2009 | CN101614955A Etching method for forming multi-stage surface on substrate |
| 12/30/2009 | CN101614954A Method for preparing material with holographic patterns |
| 12/30/2009 | CN101614920A Method for manufacturing liquid crystal display device |
| 12/30/2009 | CN100576463C Method for forming a pattern in semiconductor device with double exposure technology |
| 12/30/2009 | CN100576453C Grid and NMOS transistor manufacture method |
| 12/30/2009 | CN100576446C Reflux processing method and method for manufacturing TFT |
| 12/30/2009 | CN100576445C Method for forming a pattern of a semiconductor device |
| 12/30/2009 | CN100576444C Substrate holding apparatus, exposure apparatus and device manufacturing method |
| 12/30/2009 | CN100576443C Substrate cleaning method |
| 12/30/2009 | CN100576414C Electron beam irradiation device and drawing device |
| 12/30/2009 | CN100576236C Method for diffuse reflection processing on metal cladding high polymer film |
| 12/30/2009 | CN100576092C Plasma degumming table adjustable piece-carrying body |
| 12/30/2009 | CN100576091C Process for reclaiming light shield |
| 12/30/2009 | CN100576090C Substrate processing method |
| 12/30/2009 | CN100576089C Non-mask write through photo-etching machine with ultrahigh strength LED light source |
| 12/30/2009 | CN100576088C Exposure device and method for photomask haze reduction via ventilation |