| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/14/2010 | WO2010004849A1 Positive photosensitive resin composition, cured film, protective film, insulation film, and semiconductor device and display device using same |
| 01/14/2010 | WO2010004827A1 Resist processing apparatus, resist applying/developing apparatus and resist processing method |
| 01/14/2010 | WO2010004780A1 Photosensitive lithographic plate material |
| 01/14/2010 | WO2010004778A1 Developing solution for lithographic printing plate material, and lithographic printing plate material |
| 01/14/2010 | WO2010004378A1 Antirelective coating compositions |
| 01/14/2010 | WO2010004006A2 Device and method for impressing structures in a substrate, in particular in optical data storage media, semiconductor structures and microstructures |
| 01/14/2010 | WO2010003921A1 Method and device for coating a peripheral surface of a sleeve core |
| 01/14/2010 | WO2010003671A2 Radiation source, lithographic apparatus, and device manufacturing method |
| 01/14/2010 | WO2010003600A1 Process and system for fabrication of patterns on a surface |
| 01/14/2010 | WO2010003527A1 Illumination system for a projection exposure apparatus in semiconductor lithography and projection exposure apparatus |
| 01/14/2010 | WO2009140442A3 Heated cantilever |
| 01/14/2010 | WO2009126770A3 Plasma-based euv light source |
| 01/14/2010 | WO2009095282A4 Photolatent amidine bases for redox curing of radically curable formulations |
| 01/14/2010 | WO2008145296A9 Projection objective for microlithography, microlithography projection exposure apparatus with said projection objective, microlithographic manufacturing method for components, as well as a component manufactured with said method |
| 01/14/2010 | WO2008145295A9 Projection objective for microlithography, microlithography projection exposure apparatus with said projection objective, microlithographic manufacturing method for components, as well as a component manufactured with said method |
| 01/14/2010 | US20100009885 Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition |
| 01/14/2010 | US20100009536 Multilayer low reflectivity hard mask and process therefor |
| 01/14/2010 | US20100009482 Photoresist composition, method of forming a metal pattern, and method of manufacturing a display substrate using the same |
| 01/14/2010 | US20100009299 Resist composition and patterning process |
| 01/14/2010 | US20100009298 Forming sub-lithographic patterns using double exposure |
| 01/14/2010 | US20100009297 Antireflective Coating Compositions |
| 01/14/2010 | US20100009296 Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head |
| 01/14/2010 | US20100009295 Method of fine patterning a thin film and method of manufacturing a display substrate using the method |
| 01/14/2010 | US20100009294 Exposure method |
| 01/14/2010 | US20100009293 Antireflective Coating Compositions |
| 01/14/2010 | US20100009292 Resin composition for micropattern formation and method of micropattern formation |
| 01/14/2010 | US20100009291 Resist composition for immersion exposure and method of forming resist pattern |
| 01/14/2010 | US20100009290 Photosensitive Polybenzoxazines and Methods of Making the Same |
| 01/14/2010 | US20100009289 Resist sensitizer |
| 01/14/2010 | US20100009288 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same |
| 01/14/2010 | US20100009287 Curable composition for imprints, patterning method and pattern |
| 01/14/2010 | US20100009286 Chemically-amplified positive resist composition and patterning process thereof |
| 01/14/2010 | US20100009285 Flexographic printing forme precursor for laser engraving |
| 01/14/2010 | US20100009284 polyhydric phenols as acid generators; photolithgraphy |
| 01/14/2010 | US20100009275 Exposure method and memory medium storing computer program |
| 01/14/2010 | US20100009274 Substrate processing method and substrate processing system |
| 01/14/2010 | US20100009272 Mask fabrication method, exposure method, device fabrication method, and recording medium |
| 01/14/2010 | US20100009271 Resist patterning process and manufacturing photo mask |
| 01/14/2010 | US20100009269 Holographic recording media |
| 01/14/2010 | US20100009142 Method for the production of structured layers of titanium and nickel |
| 01/14/2010 | US20100009140 Lithographic method for wiring a side surface of a substrate |
| 01/14/2010 | US20100009134 Beam ablation lithography |
| 01/14/2010 | US20100009132 Self-segregating multilayer imaging stack with built-in antireflective properties |
| 01/14/2010 | US20100009131 Multi-exposure lithography employing a single anti-reflective coating layer |
| 01/14/2010 | US20100009130 On-press developable imageable elements |
| 01/14/2010 | US20100007932 Optical recording medium and method for manufacturing the same |
| 01/14/2010 | US20100007865 Coupling apparatus, exposure apparatus, and device fabricating method |
| 01/14/2010 | US20100007708 Actinic ray curable composition, actinic ray curable ink, image formation method employing it, and ink-jet recording apparatus |
| 01/14/2010 | US20100007028 Device including an imide layer with non-contact openings and method |
| 01/14/2010 | US20100006843 Polysilsesquioxane copolymer, polysilsesquioxane copolymer thin film including the same, organic light emitting diode display device including the same, and associated methods |
| 01/14/2010 | US20100006443 Electrochemical Fabrication Method for Producing Compliant Beam-Like Structures |
| 01/14/2010 | DE10308174B4 Anordnung zur Debrisreduktion bei einer Strahlungsquelle auf Basis eines Plasmas Arrangement for Debrisreduktion at a radiation source based on a plasma |
| 01/14/2010 | DE102008040265A1 Reflektives optisches Element und Verfahren zu seiner Herstellung The reflective optical element and method for its preparation |
| 01/13/2010 | EP2144119A1 Reticle transport apparatus and reticle transporting method |
| 01/13/2010 | EP2144118A1 Exposure apparatus and method of manufacturing device |
| 01/13/2010 | EP2144117A1 Process and system for fabrication of patterns on a surface |
| 01/13/2010 | EP2144116A1 Chemically-amplified positive resist composition and patterning process thereof |
| 01/13/2010 | EP2143711A1 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same |
| 01/13/2010 | EP2142960A1 Alkaline-resistant negative photoresist for silicon wet-etch without silicon nitride |
| 01/13/2010 | EP2142959A1 Triangulating design data and encoding design intent for microlithographic printing |
| 01/13/2010 | EP1733229B1 Patterning method for biosensor applications and devices comprising such patterns |
| 01/13/2010 | EP1548908B1 Method and device for inspecting linear infrastructures |
| 01/13/2010 | CN201383071Y Direct printing plate for printing |
| 01/13/2010 | CN101627341A Position measuring module, position measuring apparatus, stage apparatus, exposure apparatus and device manufacturing method |
| 01/13/2010 | CN101627340A Anti-reflective coatings using vinyl ether crosslinkers |
| 01/13/2010 | CN101627339A Photosensitive resin composition, flexographic printing plate, and method for producing flexographic printing plate |
| 01/13/2010 | CN101627338A Photosensitive composition, photosensitive film, method for formation of permanent pattern, and print substrate |
| 01/13/2010 | CN101627337A Method to form a pattern of functional material on a substrate by treating a surface of a stamp |
| 01/13/2010 | CN101627336A Method to form a pattern of functional material on a substrate using a stamp having a surface modifying material |
| 01/13/2010 | CN101625529A Circuit board exposure alignment device and circuit board exposure alignment method |
| 01/13/2010 | CN101625528A Mask clamp |
| 01/13/2010 | CN101625527A High durability diazoresin photosensitizer synthesis method |
| 01/13/2010 | CN101625526A Coloring light-sensitive resin composition for ultraviolet ray laser, method for forming patterns, optical filter and production method thereof and display device |
| 01/13/2010 | CN101625525A Light-sensitive resin composition |
| 01/13/2010 | CN101625524A Resist composition and patterning process |
| 01/13/2010 | CN101625523A Resist patterning process and manufacturing photo mask |
| 01/13/2010 | CN101625522A Method for preparing dense pattern on thick negative high resolution electron beam resist HSQ |
| 01/13/2010 | CN100580878C Exposure apparatus, method for processing substrate, and method for manufacturing device |
| 01/13/2010 | CN100580563C Lithographic apparatus and method for calibrating the same |
| 01/13/2010 | CN100580562C Method of improving photoresist etching selection ratio of dielectric antireflection coating layer |
| 01/13/2010 | CN100580561C Anticorrosive developing composition |
| 01/13/2010 | CN100580560C Lithographic apparatus with planar motor driven support |
| 01/13/2010 | CN100580559C Method for maximizing output capacity in scanning system |
| 01/13/2010 | CN100580558C Exposure process |
| 01/13/2010 | CN100580557C Wavelength or long wavelength optical contact approach nanometer photoetching optical apparatus |
| 01/13/2010 | CN100580556C Photosensitive resin composition, ink-jet recording head using the composition, and production method for the same |
| 01/13/2010 | CN100580555C Alkaline developable resin composition |
| 01/13/2010 | CN100580554C Black photosensitive resin composition |
| 01/13/2010 | CN100580553C Photosensitive composition |
| 01/13/2010 | CN100580552C Multi-photon reactive compositions with inorganic particles and method for fabricating structures |
| 01/13/2010 | CN100580551C Location method for nano materials synthesis used catalyst |
| 01/13/2010 | CN100580550C Screen plate making method |
| 01/13/2010 | CN100580549C Photomask blank and photomask |
| 01/13/2010 | CN100580548C Method for using three-dimensional function for mask specification institution |
| 01/13/2010 | CN100580545C High resolution, dynamic positioning mechanism for specimen inspection and processing |
| 01/13/2010 | CN100580544C Diffraction projecting screen and its production |
| 01/13/2010 | CN100580531C Liquid crystal display device and method for fabricating the same |
| 01/13/2010 | CN100580509C LCD and defect mending method used for same |
| 01/12/2010 | US7646919 Graphics engine for high precision lithography |
| 01/12/2010 | US7646906 Computer-implemented methods for detecting defects in reticle design data |