| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 01/21/2010 | WO2006129973A9 Coating composition for film with low refractive index and film prepared therefrom |
| 01/21/2010 | US20100015557 Sealed cell structure |
| 01/21/2010 | US20100015556 Negative-working imaging elements and methods of use |
| 01/21/2010 | US20100015555 Resist composition, method of forming resist pattern, and novel compound and acid generator |
| 01/21/2010 | US20100015554 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 01/21/2010 | US20100015553 Positive resist composition and method of forming resist pattern |
| 01/21/2010 | US20100015552 Resist composition, method of forming resist pattern, compound and acid generator |
| 01/21/2010 | US20100015551 Novel epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition |
| 01/21/2010 | US20100015550 Dual damascene via filling composition |
| 01/21/2010 | US20100015549 On-press developable negative-working imageable elements |
| 01/21/2010 | US20100015548 essential lithography properties, but also is capable of reducing defects in a resist pattern; acrylate ester copolymer including units of 5-methacryloyloxytetracyclododecane-1-carboxylic acid, an acrylic with lactone group, and an acrylate ester of a hydroxy or cyano-substituted polycyclic ring |
| 01/21/2010 | US20100015537 Beam dose computing method and writing method and record carrier body and writing apparatus |
| 01/21/2010 | US20100015535 Fabrication method of lithography mask and formation method of fine pattern using the same |
| 01/21/2010 | US20100015534 Method for monitoring photolithography process and monitor mark |
| 01/21/2010 | US20100015471 Bit-patterned magnetic media formed in filler layer recesses |
| 01/21/2010 | US20100015416 Resin composition for laser engraving, image forming material, relief printing plate precursor for laser engraving, relief printing plate, and method of producing relief printing plate |
| 01/21/2010 | US20100015409 Photoimaging method and apparatus |
| 01/21/2010 | US20100014165 Lens, lens array and method for making lens array |
| 01/21/2010 | US20100014061 Lithographic apparatus and device manufacturing method |
| 01/21/2010 | US20100014059 Lithographic Apparatus and Device Manufacturing Method |
| 01/21/2010 | US20100012945 Method of forming photoresist burr edge and method of manufacturing array substrate |
| 01/21/2010 | US20100012620 Wet-processing apparatus and method of fabricating display panel |
| 01/21/2010 | US20100012352 Photoimaging method and apparatus |
| 01/21/2010 | DE102009023166A1 Verzögerungsplatteneinheit, Anwendung der Verzögerungsplatteneinheit und Verfahren zu deren Herstellung Retardation plate unit, application of the retardation plate unit and methods for their preparation |
| 01/21/2010 | DE102009014145A1 Lichtintensitätsmessung in einer mikrolithographischen Projektionsbelichtungsanlage Light intensity measurement in a microlithography projection exposure apparatus |
| 01/21/2010 | DE102008033342A1 Projection optics for microlithography process used in projection exposure apparatus, sets ratio between overall length and object image shift smaller than preset amount |
| 01/21/2010 | DE102008032853A1 Optische Einrichtung mit einem deformierbaren optischen Element An optical device with a deformable optical element |
| 01/21/2010 | DE102008030664A1 Optische Abbildungseinrichtung mit Bestimmung von Abbildungsfehlern Optical imaging device with determination of imaging errors |
| 01/20/2010 | EP2146405A1 Optical arrangement and method |
| 01/20/2010 | EP2146250A1 Water-soluble resin composition for the formation of micropatterns and process for the formation of micropatterns with the same |
| 01/20/2010 | EP2146249A1 Program and exposure method |
| 01/20/2010 | EP2146248A1 Illumination system of a microlithographic projection exposure apparatus |
| 01/20/2010 | EP2146247A1 Resist patterning process and manufacturing photo mask |
| 01/20/2010 | EP2146246A1 Negative resist composition and patterning process |
| 01/20/2010 | EP2146245A2 Resist composition and patterning process |
| 01/20/2010 | EP2145926A2 PR 254 pigment preparation for use in colour filters |
| 01/20/2010 | EP2145230A2 Method and apparatus for loading and unloading flexographic plates for computer-to-plate imagin including separate loading and unloading areas |
| 01/20/2010 | EP2145229A2 Exposing printing plates using light emitting diodes |
| 01/20/2010 | EP2145214A1 Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror |
| 01/20/2010 | EP2144967A2 Surface-modified nanoparticles comprising a cationic colorant for use in color filters |
| 01/20/2010 | EP2144894A1 Oxime ester photoinitiators |
| 01/20/2010 | EP2144876A1 Oxime ester photoinitiators |
| 01/20/2010 | EP1934654B1 Method of forming a patterned material feature on a substrate utilising a top antireflective coating composition with low refractive index at 193nm radiation wavelength |
| 01/20/2010 | CN201387536Y Recycling device of silver in developing solution of plasma flat panel display |
| 01/20/2010 | CN101632042A Cleaning composition and process for producing semiconductor device |
| 01/20/2010 | CN101632041A Method of imaging and developing negative-working elements |
| 01/20/2010 | CN101632040A Imprint method, chip production process, and imprint apparatus |
| 01/20/2010 | CN101630639A Semiconductor device manufacturing method |
| 01/20/2010 | CN101630127A Photoresist release agent composition for use in manufacturing technology of colour filter array suitable of liquid crystal display |
| 01/20/2010 | CN101630126A Method and system for correcting exposure system for manufacturing integrated circuit |
| 01/20/2010 | CN101630125A Film transfer material |
| 01/20/2010 | CN101630124A Radiation-sensitive linear composition for forming coloured layer, colour filter and colour liquid crystal display device |
| 01/20/2010 | CN101630123A Lens, lens array and manufacturing method thereof |
| 01/20/2010 | CN101630122A Light guide plate and manufacturing method thereof |
| 01/20/2010 | CN101628477A Process for the production of a three-dimensional object with resolution improvement by ''pixel-shift'' |
| 01/20/2010 | CN100583394C Exposure apparatus |
| 01/20/2010 | CN100582951C Mounting method for photoresist stripping reaction chamber quartz tube |
| 01/20/2010 | CN100582950C Process, treatment fluid and apparatus for removing sticky material from basal body surface |
| 01/20/2010 | CN100582949C Plasma chamber system and method for cineration of photolithographic patterns thereby |
| 01/20/2010 | CN100582948C Lithographic method |
| 01/20/2010 | CN100582947C Method and device of generating pattern, method of determining the position, measurement device, and lithographic apparatus |
| 01/20/2010 | CN100582946C Lithographic apparatus and method for determining z position errors/variations and substrate table flatness |
| 01/20/2010 | CN100582945C Lithographic apparatus, device manufacturing method |
| 01/20/2010 | CN100582944C Lithographic apparatus and device manufacturing method |
| 01/20/2010 | CN100582943C Lithographic apparatus and device manufacturing method |
| 01/20/2010 | CN100582942C Illuminator controlled tone reversal printing |
| 01/20/2010 | CN100582941C Film forming method |
| 01/20/2010 | CN100582940C Composition for forming antireflection coating |
| 01/20/2010 | CN100582939C Positive photoresistive agent composition and its use |
| 01/20/2010 | CN100582938C Positive type resist composition and method of forming resist pattern from the same |
| 01/20/2010 | CN100582937C Photosensitive resin composition for display panel, its condensate and display panel used interval element |
| 01/20/2010 | CN100582936C Resist material and nanofabrication method |
| 01/20/2010 | CN100582935C Immersion lithography fluids |
| 01/20/2010 | CN100582934C Exposure method and exposure processing unit |
| 01/20/2010 | CN100582933C Warm-up flash two-purpose nano impression device |
| 01/20/2010 | CN100582899C Liquid crystal display device with color film on thin-film transistor and its manufacture method |
| 01/20/2010 | CN100581792C Photocurable compositions |
| 01/19/2010 | USRE41083 Solvent resistant polymers with improved bakeablity features |
| 01/19/2010 | US7649615 Advanced exposure techniques for programmable lithography |
| 01/19/2010 | US7649184 Processing method and system |
| 01/19/2010 | US7649118 Copolymer of 2-fluoro-2-fluorocarbonyl-5-norbornene and tetrafluoroethyene; chemical amplification of type photoresist by a F2 laser; excellent radiation transparency, particularly ultraviolet; improved dry etching resistance |
| 01/19/2010 | US7648820 Polycarbosilanes with chromogen and transparent moieties crosslinked by glycouril, alcohols, hydroxybenzyl, phenol, hydroxymethylbenzyl, cyclohexanoyl, propanol, fluorocarbon alcohols, vinyl ethers, and epoxides; semiconductors; lithography |
| 01/19/2010 | US7648819 incorporation of a cleaning mechanism within the immersion head of an immersion lithographic system or including a cleaning mechanism in a cleaning station of an immersion lithographic system |
| 01/19/2010 | US7648817 Resin decomposition by acid; increase solubility of alkaline developer |
| 01/19/2010 | US7648816 Positive resist composition, method for forming resist pattern and compound |
| 01/19/2010 | US7648815 Solvent solubility; adhesive; heat resistance; dielectric film pattern |
| 01/19/2010 | US7648814 Oxime-based photopolymerization initiator comprising derivative of 2-(acetyloxyiminomethyl)thioxanthen-9-one; carboxyl group-containing resin, glass frit, black pigment, free radically polymerizable unsaturated compound; high-definition black matrix pattern, storage stability |
| 01/19/2010 | US7648738 for photopolymerization; photography, relief imaging; color filters |
| 01/19/2010 | US7648671 Method of making master for manufacturing optical disc and method of manufacturing optical disc |
| 01/19/2010 | CA2380114C Imprint method and device |
| 01/19/2010 | CA2271815C In-line holographic mask for micromachining |
| 01/14/2010 | WO2010006058A1 Method and apparatus for determining the effect of process variations |
| 01/14/2010 | WO2010005957A1 Illumination optimization |
| 01/14/2010 | WO2010005892A1 Resist composition and lithographic process using said composition |
| 01/14/2010 | WO2010005491A1 Telecentricity corrector for microlithographic projection system |
| 01/14/2010 | WO2010005488A1 On-press developable imageable elements |
| 01/14/2010 | WO2010005428A1 Resist sensitizer |
| 01/14/2010 | WO2010005081A1 Deformation measuring apparatus, exposure apparatus, jig for deformation measuring apparatus, position measuring method and device manufacturing method |
| 01/14/2010 | WO2010005028A1 Positive photosensitive resin composition and polyhydroxyamide resin |
| 01/14/2010 | WO2010004979A1 Method of resist treatment |