| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/28/2010 | US20100021846 Negative working, heat-sensitive lithographic printing plate precursor |
| 01/28/2010 | US20100021845 Negative working, heat-sensitive lithographic printing plate precursor |
| 01/28/2010 | US20100021844 Negative-working imageable elements and method of use |
| 01/28/2010 | US20100021843 Inorganic Resist Sensitizer |
| 01/28/2010 | US20100021842 Laser engravable flexographic printing articles based on millable polyurethanes, and method |
| 01/28/2010 | US20100021832 a coloring agent including an anthraquinone-based dye and an organic pigment; a meta-cresol-formaldehyde novolak resin binder, hexakis/methoxymethyl/melamine crosslinker and propylene glycol methyl ether propionate as a solvent, benzophenone photopolymerization initiator; color filter |
| 01/28/2010 | US20100021831 Transparent colourants and colourant compositions, and their use |
| 01/28/2010 | US20100021830 Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods |
| 01/28/2010 | US20100021827 Method of Designing Sets of Mask Patterns, Sets of Mask Patterns, and Device Manufacturing Method |
| 01/28/2010 | US20100021826 Reflective mask, manufacturing method for reflective mask, and manufacturing method for semiconductor device |
| 01/28/2010 | US20100021703 Developing method for immersion lithography, solvent used for the developing method and electronic device using the developing method |
| 01/28/2010 | US20100021700 Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method |
| 01/28/2010 | US20100021695 Engraved plate and substrate with conductor layer pattern using the same |
| 01/28/2010 | US20100021119 Optical waveguide film, method of producing the same, and optical transmitter and receiver module |
| 01/28/2010 | US20100020400 Diffractive optical element, method for manufacturing diffractive optical element, and laser beam machining method |
| 01/28/2010 | US20100020373 Holographic storage medium and method for gated diffusion of photoactive monomer |
| 01/28/2010 | US20100020372 Holographic recording medium and optical information recording/reproducing apparatus |
| 01/28/2010 | US20100020316 Inspection apparatus, exposure apparatus, and method of manufacturing device |
| 01/28/2010 | US20100020297 Method for improving surface roughness of processed film of substrate and apparatus for processing substrate |
| 01/28/2010 | US20100020274 Colorant, color filter, lcd device, composition and method for preparing the same |
| 01/28/2010 | US20100019399 Polyorganosiloxane composition |
| 01/28/2010 | US20100018639 Method of forming micropattern, method of manufacturing optical recording medium master copy, optical recording medium master copy, optical recording medium stamper, and optical recording medium |
| 01/28/2010 | DE102009027704A1 Optical element manufacturing method for projection illumination system for manufacturing of e.g. semiconductor components, involves tempering blanks, and tempering blanks in reduced atmosphere at temperature of seven hundred degree Celsius |
| 01/28/2010 | DE102008040611A1 Verfahren zum Modifizieren einer Polarisationsverteilung in einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographische Projektionsbelichtungsanlage A method for modifying a polarization distribution in a microlithography projection exposure apparatus, and microlithography projection exposure apparatus |
| 01/28/2010 | DE102008035320A1 Illumination system for microlithography projection exposure apparatus, has Fourier optical unit provided in pupil shaping unit so that ratio between structural length and focal length of Fourier optical unit is set to preset value |
| 01/28/2010 | DE102008035304A1 Optical system for illuminating substrate with light, particularly for use in microelectronics or in display technology, comprises light source for producing light, which is directed on substrate under angle of incidence |
| 01/27/2010 | EP2148244A1 Improved Edge Smoothness with low resolution projected images for use in Solid Imaging |
| 01/27/2010 | EP2148201A1 Latent reactive polymers with biologically active moieties |
| 01/27/2010 | EP2147948A1 Polyimide precursor, polyimide, and coating solution for under layer film for image formation |
| 01/27/2010 | EP2146925A1 Extensions of self-assembled structures to increased dimensions via a "bootstrap" self-templating method |
| 01/27/2010 | EP1687406B1 Nucleic acid detection method having increased sensitivity |
| 01/27/2010 | CN201392451Y Coating glue-supply and air-exhaust device in production process of PS printing plate |
| 01/27/2010 | CN201392450Y Mask plate |
| 01/27/2010 | CN101636696A Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus |
| 01/27/2010 | CN101636695A Illumination system of a microlithographic projection exposure apparatus |
| 01/27/2010 | CN101636694A Photosensitive lithographic printing plate material developable with water |
| 01/27/2010 | CN101634816A Developer control system |
| 01/27/2010 | CN101634815A Alignment method based on a plurality of different wavelengths |
| 01/27/2010 | CN101634814A Primary aligning device and primary aligning system |
| 01/27/2010 | CN101634813A Apparatus for exposing a substrate, photomask and modified illuminating system of the apparatus, and method of forming a pattern on a substrate using the apparatus |
| 01/27/2010 | CN101634812A Lithographic apparatus and device manufacturing method |
| 01/27/2010 | CN101634811A Flexible seal and self-adaption recycling device for immersed photoetching machine |
| 01/27/2010 | CN101634810A Stepping arrangement type interference microlithography and system thereof |
| 01/27/2010 | CN101634809A Method for exposing single-sided flexible circuit board |
| 01/27/2010 | CN101634808A Device and method for detecting lens aberration of lithography machines |
| 01/27/2010 | CN101634807A Photosensitive resin composition for black matrix and liquid crystal display element |
| 01/27/2010 | CN101634806A Method for forming filament wide silicide barrier layer pattern |
| 01/27/2010 | CN100585803C Heat exchanging apparatus |
| 01/27/2010 | CN100585799C Liquid processing apparatus |
| 01/27/2010 | CN100585497C Developing method of photoresist and developing device |
| 01/27/2010 | CN100585496C Sulfur-atom-containing composition for forming lithographic antireflection film |
| 01/27/2010 | CN100585495C 平版印版前体 The lithographic printing plate precursor |
| 01/27/2010 | CN100585494C Lithographic plate for laser digital scanning and its preparation method |
| 01/27/2010 | CN100585493C Radiation-sensitive resin composition |
| 01/27/2010 | CN100585492C Photoresist composition for the formation of thick films |
| 01/27/2010 | CN100585491C Large area periodic array three-dimensional microstructure preparation method |
| 01/27/2010 | CN100585490C Method and apparatus for creating a topographically patterned substrate |
| 01/27/2010 | CN100585489C Automobile instrument scale disc backlight homogeneity adjustment technological process |
| 01/27/2010 | CN100585488C Method for forming pattern |
| 01/27/2010 | CN100585463C LCD photoelectric film containing high surface area grain and preparation method thereof |
| 01/26/2010 | US7653279 Optically oriented three-dimensional polymer microstructures |
| 01/26/2010 | US7653096 Laser light source device, exposure device, and mask inspection device using this laser light source device |
| 01/26/2010 | US7652751 Lithographic apparatus and device manufacturing method |
| 01/26/2010 | US7652750 Lithography exposure device having a plurality of radiation sources |
| 01/26/2010 | US7652272 Plasma-based debris mitigation for extreme ultraviolet (EUV) light source |
| 01/26/2010 | US7652270 Techniques for ion beam current measurement using a scanning beam current transformer |
| 01/26/2010 | US7651861 Method of producing fluorite crystal, fluorite and optical system incorporating the same |
| 01/26/2010 | US7651834 Photosensitive compound, photosensitive composition, method for resist pattern formation, and process for device production |
| 01/26/2010 | US7651833 Method for preparing photochromic film or plate |
| 01/26/2010 | US7651831 Acrylic terpolymer with fluorosulfonamide-containing unit e.g. 2-trifluoromethanesulfonylaminoethyl methacrylate, a second unit having pendant acid labile group, and a third unit having a lactone moiety, and an acid generator; good etch resistance and dissolution properties; use making semiconductors |
| 01/26/2010 | US7651830 Patterned photoacid etching and articles therefrom |
| 01/26/2010 | US7651829 Positive resist material and pattern formation method using the same |
| 01/26/2010 | US7651822 Method of manufacturing gray scale mask and microlens, microlens, spatial light modulating apparatus and projector |
| 01/26/2010 | US7651821 Exposure of substrate using mask with gray tone features; forming , trimming pattern; variation of transmission generate various light intensity |
| 01/26/2010 | US7651284 Development apparatus and development method |
| 01/26/2010 | CA2309738C Method of molecular-scale pattern imprinting at surfaces |
| 01/21/2010 | WO2010009323A2 Phase mask and method of fabrication |
| 01/21/2010 | WO2010008993A1 Adaptive fly-eye and other mirrors for extreme ultraviolet and other optical systems |
| 01/21/2010 | WO2010008514A1 Negative-working imaging elements and methods of use |
| 01/21/2010 | WO2010007993A1 Positive-type radiation-sensitive composition, and resist pattern formation method |
| 01/21/2010 | WO2010007976A1 Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same |
| 01/21/2010 | WO2010007971A1 Radiation-sensitive resin composition |
| 01/21/2010 | WO2010007955A1 Reflective mask blank for euv lithography and reflective mask for euv lithography |
| 01/21/2010 | WO2010007945A1 Illuminating optical system, exposure apparatus and exposure method |
| 01/21/2010 | WO2010007915A1 Positive-type resist composition, and method for production of microlens |
| 01/21/2010 | WO2010007910A1 Novel sulfonic acid salt and derivative thereof, photo-acid generator, and process for production of sulfonic acid salt |
| 01/21/2010 | WO2010007874A1 Method for modifying first film and composition for forming acid transfer resin film used therefor |
| 01/21/2010 | WO2010007707A1 Photosensitive letterpress printing original plate |
| 01/21/2010 | WO2010007569A1 Extreme uv radiation generating device comprising a contamination captor |
| 01/21/2010 | WO2010007405A1 Method for photoimaging a substrate |
| 01/21/2010 | WO2010007036A2 Optical device having a deformable optical element |
| 01/21/2010 | WO2010007015A1 Source module of an euv lithographic apparatus, lithographic apparatus, and method for manufacturing a device |
| 01/21/2010 | WO2010007010A1 Scatterometry method and measurement system for lithography |
| 01/21/2010 | WO2010006948A1 A method and apparatus for preparing lithographic printing plate precursors |
| 01/21/2010 | WO2010006847A1 Method for removing a deposition on an uncapped multilayer mirror of a lithographic apparatus, lithographic apparatus and device manufacturing method |
| 01/21/2010 | WO2010006687A1 Illumination system of a microlithographic projection exposure apparatus |
| 01/21/2010 | WO2010006678A1 Imaging optics |
| 01/21/2010 | WO2009143482A3 Negative tone molecular glass resists and methods of making and using same |
| 01/21/2010 | WO2009130603A3 Spatial light modulator with structured mirror surfaces |
| 01/21/2010 | WO2009129537A3 Magnetic microstructures for magnetic resonance imaging |