Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/2014
09/30/2014US8845317 Alignment method, imprint method, alignment apparatus, and position measurement method
09/30/2014US8844607 Method and apparatus for production of a cast component
09/30/2014US8844133 Stereolithographic rocket motor manufacturing method
09/25/2014WO2014152156A1 Track processing to remove organic films in directed self-assembly chemo-epitaxy applications
09/25/2014WO2014152116A1 Topography minimization of neutral layer overcoats in directed self-assembly applications
09/25/2014WO2014152023A1 Vapor deposition deposited photoresist, and manufacturing and lithography systems therefor
09/25/2014WO2014150670A1 Multi-step bake apparatus and method for directed self-assembly lithography control
09/25/2014WO2014150577A1 Photoactive transparent conductive films, method of making them and touch sensitive device comprising said films
09/25/2014WO2014150121A1 Thiosulfate polymer compositions and articles
09/25/2014WO2014149805A1 Method of sequestering metals using thiosulfate polymers
09/25/2014WO2014149294A1 Solvent anneal processing for directed-self-assembly applications
09/25/2014WO2014148548A1 Resin composition for laser engraving, method for producing flexographic printing original plate for laser engraving, flexographic printing original plate, method for making flexographic printing plate, and flexographic printing plate
09/25/2014WO2014148474A1 Defoaming agent, surfactant composition, coating composition, and resist composition
09/25/2014WO2014148351A1 Substrate processing apparatus, substrate processing method, and computer storage medium
09/25/2014WO2014148273A1 Photosensitive resin composition, photosensitive element, method for producing substrate with resist pattern, and method for manufacturing printed wiring board
09/25/2014WO2014148241A1 Radiation-sensitive resin composition, resist pattern forming method, polymer and method for producing compound
09/25/2014WO2014148096A1 Program for correcting charged particle radiation location, device for calculating degree of correction of charged particle radiation location, charged particle radiation system, and method for correcting charged particle radiation location
09/25/2014WO2014148066A1 3d decorative solid object and method for producing same
09/25/2014WO2014147562A2 Methods and systems for printing periodic patterns
09/25/2014WO2014147375A1 Apparatus for and method of forming plural groups of laser beams using two rotating diffractive optical elements
09/25/2014WO2014146974A1 Method and arrangement for forming a structuring on surfaces of components by means of a laser beam
09/25/2014WO2014146365A1 Glass substrate support mechanism for exposure machine
09/25/2014WO2014146359A1 Exposure method and exposure device
09/25/2014WO2014146220A1 Pupil shaping optical system for lithography machine and method for generating off-axis illumination modes
09/25/2014US20140287366 Method of sequestering metals using thiosulfate polymers
09/25/2014US20140287365 Forming patterns using thiosulfate polymer compositions
09/25/2014US20140287364 Patterning method using thiosulfate polymer and metal nanoparticles
09/25/2014US20140287363 Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the composition
09/25/2014US20140287362 Resist composition and resist pattern forming method
09/25/2014US20140287361 Resist composition and resist pattern forming method
09/25/2014US20140287360 Resist composition and resist pattern forming method
09/25/2014US20140287359 Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method
09/25/2014US20140287350 Exposure tolerance estimation method and method for manufacturing semiconductor device
09/25/2014US20140287349 Thiosulfate polymer compositions and articles
09/25/2014US20140287083 Imprint template with optically-detectable alignment marks and method for making using block copolymers
09/25/2014US20140285791 Exposure apparatus, stage apparatus, and device fabrication method
09/25/2014US20140285789 Lithography Method and Structure for Resolution Enhancement with a Two-State Mask
09/25/2014US20140285788 Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
09/25/2014US20140285787 Exposure system and exposure method
09/25/2014US20140285786 Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program
09/25/2014US20140285785 Lithographic apparatus, device manufacturing method and computer program
09/25/2014US20140285784 Apparatus for and method of drawing
09/25/2014US20140285783 Euv-mirror arrangement, optical system with euv-mirror arrangement and associated operating method
09/25/2014US20140285782 Lithographic apparatus and device manufacturing method
09/25/2014US20140285781 Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
09/25/2014US20140284510 Compositions containing chlorfluoroolefins or fluoroolefins
09/25/2014US20140284502 Target generation device and extreme ultraviolet light generation apparatus
09/25/2014US20140284352 Metering device for the manually-controlled metering of a light-curing material, kit, and method
09/25/2014DE102014215159A1 Transportsicherung für ein optisches system mit formgedächtnisaktuatoren Transport lock for an optical system with shape memory actuators
09/25/2014DE102013217260A1 Messung des Kippwinkels von kippbaren Spiegeln mit einer Messlichtanordnung Measurement of the tilt angle of tiltable mirrors with a measuring light assembly
09/24/2014EP2781960A1 Method of estimating an exposure tolerance and method of manufacturing a semiconductor device
09/24/2014EP2781959A2 Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound
09/24/2014EP2781955A1 Method for producing motherboard alignment film, transfer plate, and alignment liquid
09/24/2014EP2781550A1 Self-organization composition for pattern formation and pattern formation method
09/24/2014EP2781530A1 Carboxyl-containing resin, resin composition for use in solder resist, and manufacturing process for carboxyl-containing resin
09/24/2014EP2781504A1 Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern
09/24/2014EP2781501A1 Cyclic compound, method for producing same, radiation-sensitive composition, and method for forming resist pattern
09/23/2014US8843860 Frame cell for shot layout flexibility
09/23/2014US8842364 Optical device, manufacturing method thereof, and method of manufacturing master
09/23/2014US8842296 Methods and devices for reducing errors in Goos-Hänchen corrections of displacement data
09/23/2014US8842295 System having a plurality of scanning units of a position measuring device
09/23/2014US8842294 Position detection apparatus, imprint apparatus, and position detection method
09/23/2014US8842284 Magnifying imaging optical unit and metrology system including same
09/23/2014US8842278 Exposure method, exposure apparatus, and device manufacturing method
09/23/2014US8842258 Exposure apparatus, exposure method, and blind for exposure apparatus
09/23/2014US8841637 Method for nanolithography
09/23/2014US8841625 Method for the detection of the irradiance distribution in an extreme ultraviolet light source device and an extreme ultraviolet light source device
09/23/2014US8841239 Patterned nanosubstrates made by directed self assembly of amphiphilic molecules
09/23/2014US8841066 Photoresist stripping technique
09/23/2014US8841065 Manufacturing method of exposure apparatus and device manufacturing method
09/23/2014US8841064 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film
09/23/2014US8841062 Positive working photosensitive material
09/23/2014US8841061 Positive resist composition and patterning process
09/23/2014US8841060 Actinic-ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, method for preparing electronic device, and electronic device
09/23/2014US8841059 Crosslinking agent, negative resist composition, and pattern forming method using the negative resist composition
09/23/2014US8841058 Photolithography material for immersion lithography processes
09/23/2014US8841050 Photosensitive resin composition and applications thereof
09/23/2014US8841049 Electron beam data storage system and method for high volume manufacturing
09/23/2014US8841046 System and a method for generating periodic and/or quasi-periodic pattern on a sample
09/23/2014US8840985 Composition for forming inorganic pattern and method for forming inorganic pattern using the same
09/23/2014US8840795 Method for manufacturing a master mold which is used to form a micropatterned film applied to an exterior of a household appliance and manufacturing apparatus and method of the film using the master mold
09/23/2014US8840728 Imprint system for performing a treatment on a template
09/18/2014WO2014145634A2 Nano imprinting with reusable polymer template with metallic or oxide coating
09/18/2014WO2014144478A2 System and method for integrating a medical sequencing apparatus and laboratory system into a medical facility
09/18/2014WO2014143928A1 Method and apparatus for preparing a screen printing screen
09/18/2014WO2014143826A2 Interior energy-activation of photo-reactive species inside a medium or body
09/18/2014WO2014142494A1 Composition for forming resist protection film for lithography and method for forming pattern of semiconductor device using same
09/18/2014WO2014142360A1 Method of forming pattern, actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, process for manufacturing electronic device and electronic device
09/18/2014WO2014142296A1 Composition for forming upper layer film and resist pattern forming method using same
09/18/2014WO2014142163A1 Photosensitive resin composition, method for producing cured film, cured film, organic el display device, and liquid crystal display device
09/18/2014WO2014142144A1 Colored radiation-sensitive composition, colored cured film, color filter, color pattern formation method, method for producing color filter, solid-state imaging element, and liquid crystal display device
09/18/2014WO2014141979A1 Radiation-sensitive resin composition, resist pattern forming method, radiation-sensitive acid generator and compound
09/18/2014WO2014141969A1 Resin composition for plating resist and method for producing substrate using same
09/18/2014WO2014141876A1 Pattern forming method, active light-sensitive or radiation-sensitive resin composition for organic solvent development used in same, method for producing active light-sensitive or radiation-sensitive resin composition for organic solvent development, method for manufacturing electronic device, and electronic device
09/18/2014WO2014141858A1 Active light-sensitive or radiation-sensitive resin composition, resist film using active light-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic device
09/18/2014WO2014141827A1 Pattern forming method, active light-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic device
09/18/2014WO2014141807A1 Pattern forming method, composition kit, resist film, method for manufacturing electronic device using pattern forming method, and electronic device
09/18/2014WO2014141781A1 Concentrating method for platemaking waste fluid and recycling method
09/18/2014WO2014141740A1 Modified phenolic novolac resin, resist material, coating film, and permanent resist film
09/18/2014WO2014141731A1 Blocked isocyanato group-containing polymer, composition containing polymer, and applications thereof
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