| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/04/2010 | US20100024962 Composite stamper for imprint lithography |
| 02/04/2010 | US20100024672 Method and Apparatus for Thermal Processing of Photosensitive Printing Elements |
| 02/04/2010 | US20100024671 Solvent-assisted embossing of flexographic printing plates |
| 02/04/2010 | DE102009025362A1 Variabel einstellbare Streuscheibe für Projektionsbelichtungsanlage Variably adjustable diffuser for the projection exposure apparatus |
| 02/04/2010 | DE102008034285A1 Aktuator zur hochpräzisen Positionierung bzw. Manipulation von Komponenten und Projektionsbelichtungsanlage für die Mikrolithographie Actuator for high precision positioning and manipulation of components and projection exposure system for microlithography |
| 02/03/2010 | EP2149972A1 Alignment apparatus and exposure apparatus using the same |
| 02/03/2010 | EP2149817A2 Method of producing mold |
| 02/03/2010 | EP2149803A1 Method for producing substrate with partition wall and pixel formed thereon |
| 02/03/2010 | EP2149072A1 A gum solution for developing and gumming a photopolymer printing plate. |
| 02/03/2010 | EP2149071A1 A method for making a lithographic printing plate precursor |
| 02/03/2010 | EP1099139B1 Lithography method |
| 02/03/2010 | CN101641647A Developing solution and method for production of finely patterned material |
| 02/03/2010 | CN101641646A Contamination prevention system, lithographic apparatus, radiation source and device manufacturing method |
| 02/03/2010 | CN101641645A Device manufacturing method, lithographic apparatus and a computer program |
| 02/03/2010 | CN101641644A Composition for forming under-resist film |
| 02/03/2010 | CN101641643A Photoactivable nitrogen bases |
| 02/03/2010 | CN101641642A Photosensitive resin, method for preparing the resin, photosensitive resin composition and cured product of the resin composition |
| 02/03/2010 | CN101639634A Alkaline developer for coloring light sensitive composition, image forming method, color filter and liquid crystal display device |
| 02/03/2010 | CN101639633A Supply pipeline of developing solution |
| 02/03/2010 | CN101639632A Lithographic apparatus and device manufacturing method |
| 02/03/2010 | CN101639631A Exposure apparatus, exposure method, and method for producing elements |
| 02/03/2010 | CN101639630A Coaxial alignment system in projection lithography |
| 02/03/2010 | CN101639629A Internal-drum imaging device |
| 02/03/2010 | CN101639628A Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element |
| 02/03/2010 | CN101639627A Photosensitive composition, photosensitive thin-film, photosensitive laminate material, method for forming permanent pattern and printed circuit board |
| 02/03/2010 | CN101639626A Colored cured composition, color filter, manufacturing method and liquid crystal display elements thereof |
| 02/03/2010 | CN100587607C Substrate processing method and substrate processing apparatus |
| 02/03/2010 | CN100587606C Reverse illumination adjacent and contact nanometer lithographic equipment |
| 02/03/2010 | CN100587605C Aligning mark structure for aligning system of photolithography equipment |
| 02/03/2010 | CN100587604C Subsection interleaving aligning mark combined and aligning method thereof |
| 02/03/2010 | CN100587603C Mask alignment marker and aligning method used for photo etching device |
| 02/03/2010 | CN100587602C Method of manufacturing printing plate and method for manufacturing liquid crystal display device using the same |
| 02/03/2010 | CN100587601C Large viewing field projection optical system with aberration correctability for flat panel displays |
| 02/03/2010 | CN100587600C Anti-reflective coating composition and production method for pattern using the same |
| 02/03/2010 | CN100587599C Use of cyclic piperonyl compound and its derivative as ultraviolet ray initiator |
| 02/03/2010 | CN100587598C Photosensitive inorganic paste composition, unbaked sheet-shaped body, and method of producing plasma display front plate |
| 02/03/2010 | CN100587597C Positive PS printing plate light sensitive composition |
| 02/03/2010 | CN100587596C Transparent coloured composition and colour filter |
| 02/03/2010 | CN100587595C Method of forming planar color filters in image sensor |
| 02/03/2010 | CN100587549C Compact device for printing-plate imaging |
| 02/03/2010 | CN100587011C Violet colorant for colour filters, inks for ink-jet, electrophotographic toners and developers and electronic inks |
| 02/02/2010 | US7657864 System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques |
| 02/02/2010 | US7656595 Adjustment arrangement of an optical element |
| 02/02/2010 | US7656582 Methods for reducing polarization aberration in optical systems |
| 02/02/2010 | US7656528 Periodic patterns and technique to control misalignment between two layers |
| 02/02/2010 | US7656512 Method for determining lithographic focus and exposure |
| 02/02/2010 | US7656507 Processing unit, exposure apparatus having the processing unit, and protection unit |
| 02/02/2010 | US7656505 Apparatus to easily measure reticle blind positioning with an exposure apparatus |
| 02/02/2010 | US7656504 Projection exposure apparatus with luminous flux distribution |
| 02/02/2010 | US7655743 dropping polymerization of monomers such as 1-hydroxy-3-methacryloyloxyadamantane (HMA), 5-methacryloyloxy-2,6-norbornane carbolactone (MNBL), 2-methacryloyloxy-2-methyladamantane (2-MMA) in presence of dimethyl-2,2'-azobis(2-methylpropionate) initiator, solvent extraction, redissolving, desolventing |
| 02/02/2010 | US7655389 Includes 0.5-5 percent by weight acid-labile thermal cross-linking agent that is decomposed by an epoxy group and photo-acid generator,10-22 percent by weight copolymer resin that includes acrylate or methacrylate monomer containing anthracene, 0.1-1 percent photo-acid generator |
| 02/02/2010 | US7655387 Alignment tolerances between narrow mask lines, for forming interconnects in the array region of an integrated circuit, and wider mask lines, interconnects in the periphery of the integrated circuit; forming contacts between pitch multiplied and non-pitch multiplied features |
| 02/02/2010 | US7655386 Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device |
| 02/02/2010 | US7655385 Pattern formation method |
| 02/02/2010 | US7655384 Methods for reducing spherical aberration effects in photolithography |
| 02/02/2010 | US7655383 Creation of periodic and aperiodic patterns of highly ordered inorganic nanostructures on a substrate, based on the selective photochemical modification of a self-assembled monolayer of metal compound loaded polymer core-shell systems on widely variable substrates |
| 02/02/2010 | US7655382 Photosensitive polymeric binder, free radical polymerizable (meth)acrylate monomer or oligomer, free radical initiator, sensitizing dye and water soluble overcoat are exposed and hardened; rinsing; removing overcoat; developing exposed and deactivated plate with both ink and fountain solution; durability |
| 02/02/2010 | US7655381 Method for producing a substrate having a resist layer in the form of a relief structure, which represents a diffraction structure, the substrate having a conductive layer which scatters the primary electrons and/or produces secondary electrons when the resist layer is exposed by an electron beam |
| 02/02/2010 | US7655380 Polymeric material containing a latent acid, i.e. a compound which is not an acid but which can be converted to an acid by the influence of laser irradiation |
| 02/02/2010 | US7655379 Ionic, organic photoacid generators for DUV, MUV and optical lithography based on peraceptor-substituted aromatic anions |
| 02/02/2010 | US7655378 Negative resist composition and patterning process using the same |
| 02/02/2010 | US7655377 Antireflection film and exposure method |
| 02/02/2010 | US7655376 Multibeam interference; pyrolysis; chemical vapor deposition |
| 02/02/2010 | US7655369 Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device |
| 02/02/2010 | US7655368 Method for exposing a substrate and lithographic projection apparatus |
| 02/02/2010 | US7655366 Inkless reimageable printing paper and method |
| 02/02/2010 | US7655365 Wettability variable substrate and wettability variable layer forming composition |
| 02/02/2010 | US7655307 Resin composition for mold used in forming micropattern, and method for fabricating organic mold therefrom |
| 02/02/2010 | US7655174 Combination of high viscosity and slower acting low viscosity resins, curable toughener, initiator and stabilizer; rapid homogeneous droplet merging and curing; tensile strength, ductility; computer controlled piezoelectric printing of three dimensional multilayer articles |
| 02/02/2010 | US7654200 Photosensitive planographic printing plate and method of producing the same |
| 02/02/2010 | CA2438728C Mounting and preparing a gemstone or industrial diamond for the formation of a mark on the surface thereof |
| 01/28/2010 | WO2010011899A1 Holographic storage medium and method for gated diffusion of photoactive monomer |
| 01/28/2010 | WO2010011262A1 Negative-working imageable elements and method of use |
| 01/28/2010 | WO2010010928A1 Coating composition and pattern-forming method |
| 01/28/2010 | WO2010010899A1 Positive-type photosensitive resin composition and cured film production method using the same |
| 01/28/2010 | WO2010010842A1 Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device and display device each comprising the cured film |
| 01/28/2010 | WO2010010831A1 Novel polyimide precursor composition and use thereof |
| 01/28/2010 | WO2010010706A1 Resist trimming method and trimming apparatus |
| 01/28/2010 | WO2010010034A1 Optical element mount for lithographic apparatus |
| 01/28/2010 | WO2010009948A1 Laser interferometer systems and methods with suppressed error and pattern generators having the same |
| 01/28/2010 | WO2010009930A1 Sub-wavelength segmentation in measurement targets on substrates |
| 01/28/2010 | WO2010009807A1 Actuator and projection exposure system |
| 01/28/2010 | WO2010009788A1 Method for modifying a polarization distribution in a microlithographic projection exposure apparatus, and microlithographic projection exposure apparatus |
| 01/28/2010 | WO2010009592A1 A sensitive liquid crystalline polymeric material suitable for reflective hologram recording and the preparing method thereof |
| 01/28/2010 | WO2009151560A3 Adaptive nanotopography sculpting |
| 01/28/2010 | WO2009143378A9 Generation of photomasks by dip-pen nanolithography |
| 01/28/2010 | WO2009142435A3 Photosensitive resin composition containing polyimide resin and novolak resin |
| 01/28/2010 | WO2009132023A3 Photosensitive hardmask for microlithography |
| 01/28/2010 | WO2009112704A8 Device for the inspection of semiconductor wafers |
| 01/28/2010 | WO2009091704A3 Aromatic fluorine-free photoacid generators and photoresist compositions containing the same |
| 01/28/2010 | US20100022745 One component resin composition curable with combination of light and heat and use of the same |
| 01/28/2010 | US20100022426 Photoresist stripping solution |
| 01/28/2010 | US20100022156 Color filter on thin film transistor type liquid crystal display device and method of fabricating the same |
| 01/28/2010 | US20100022089 Method for manufacturing semiconductor device using quadruple-layer laminate |
| 01/28/2010 | US20100021852 Composition for formation of upper layer film, and method for formation of photoresist pattern |
| 01/28/2010 | US20100021851 Methods for producing organic nanocrystals |
| 01/28/2010 | US20100021850 Pattern forming method |
| 01/28/2010 | US20100021849 Method of Forming Patterns of Semiconductor Device |
| 01/28/2010 | US20100021848 Method for forming pattern and method for manufacturing semiconductor device |
| 01/28/2010 | US20100021847 Oxime Compound and Resist Composition Containing the Same |