| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/11/2010 | US20100035061 Cutomized lithographic particles |
| 02/11/2010 | US20100035028 Mask blank substrate, mask blank, photomask, and methods of manufacturing the same |
| 02/11/2010 | US20100034969 Coating and processing apparatus and method |
| 02/11/2010 | US20100034072 Fresnel member having variable sag for multiple wavelength optical system |
| 02/11/2010 | US20100032586 Uniform Large-Grained And Grain Boundary Location Manipulated Polycrystalline Thin Film Semiconductors Formed Using Sequential Lateral Solidification And Devices Formed Thereon |
| 02/11/2010 | DE102009024118A1 Vorrichtung zur thermischen Manipulation eines optischen Elementes Device for thermal manipulation of an optical element |
| 02/11/2010 | DE102008031650A1 Debris filter arrangement for plasma-based radiation source utilized for semiconductor lithography application, has plasma and buffer gas sections, where pressure gradient between sections is adjusted to order of magnitude |
| 02/11/2010 | DE102007051291B4 Adaptierbares optisches System Adaptable optical system |
| 02/11/2010 | DE102004063832B4 Anordnung zur Erzeugung eines gepulsten Laserstrahls hoher Durchschnittsleistung Arrangement for generating a pulsed laser beam of high average power |
| 02/11/2010 | DE102004041921B4 Phasenschiebermaske und Verfahren zu ihrer Herstellung Phase shift mask and process for their preparation |
| 02/10/2010 | EP2151717A1 Full wafer width scanning using step and scan system |
| 02/10/2010 | EP2151716A1 Element, in particular photopolymer unit |
| 02/10/2010 | EP2151715A1 Photosensitive adhesive composition, film-like adhesive, adhesive sheet, method for forming adhesive pattern, semiconductor wafer with adhesive layer, semiconductor device and method for manufacturing semiconductor device |
| 02/10/2010 | EP2151714A2 Original data generation program and original data generation method |
| 02/10/2010 | EP2150857A1 Illumination non-uniformity quantification method and apparatus |
| 02/10/2010 | EP2150856A1 Illumination configurator in mask aligners |
| 02/10/2010 | EP2150855A1 Method and apparatus for determining the relative overlay shift of stacked layers |
| 02/10/2010 | EP2150854A1 Die for micro-contact printing and method for the production thereof |
| 02/10/2010 | EP2150542A2 Sensitizer for cationic photoinitiators |
| 02/10/2010 | EP1768172B1 Projection exposure apparatus |
| 02/10/2010 | CN201402366Y 曝光机 Exposure Machine |
| 02/10/2010 | CN201402365Y 掩模板夹持机构 Mask holding mechanism |
| 02/10/2010 | CN201402364Y Mask plate bearer and exposure equipment |
| 02/10/2010 | CN101646978A Photosensitive resin composition |
| 02/10/2010 | CN101646977A Colored dispersion, photoresist composition and black matrix |
| 02/10/2010 | CN101644903A Developing solution spray head |
| 02/10/2010 | CN101644902A Base plate processing method and device and liquid supply device thereof |
| 02/10/2010 | CN101644901A Full wafer width scanning using step and scan system |
| 02/10/2010 | CN101644900A Exposure apparatus, method for manufacturing device |
| 02/10/2010 | CN101644899A Exposure apparatus, method for manufacturing device, and method for controlling exposure apparatus |
| 02/10/2010 | CN101644898A Method for measuring alignment precision among lithography machines with different magnifications |
| 02/10/2010 | CN101644897A Method for manufacturing nonwoven metal porous plate used for printing |
| 02/10/2010 | CN101644896A Process for producing photoresist composition, filter, coater |
| 02/10/2010 | CN101644895A 化学增幅正性抗蚀剂组合物 A chemically amplified positive resist composition |
| 02/10/2010 | CN101644894A 化学增幅正性抗蚀剂组合物 A chemically amplified positive resist composition |
| 02/10/2010 | CN101644893A Photosensitive composition, photosensitive film, photosensitive laminated body, permanent patterning method and printed circuit board |
| 02/10/2010 | CN101644892A Colored photosensitive resin composition and method for preparing colored filter |
| 02/10/2010 | CN101644891A Positively photosensitive insulating resin composition and cured object obtained therefrom |
| 02/10/2010 | CN100589032C Photosensitive resin film and cured film made therefrom |
| 02/10/2010 | CN100589031C Photo-curing ink-jet resist for printing circuit board and preparation method thereof |
| 02/09/2010 | US7660646 System and method providing control of reticle stocking and sorting |
| 02/09/2010 | US7660098 Substrate holding system and exposure apparatus using the same |
| 02/09/2010 | US7659051 Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer |
| 02/09/2010 | US7659048 photoresists; tackiness without complete dryness; printing plates |
| 02/09/2010 | US7659047 Materials for photoresist, negative-tone photoresist composition, method of forming resist pattern, and semiconductor device |
| 02/09/2010 | US7659046 Water-developable infrared-sensitive printing plate |
| 02/09/2010 | US7659042 photomasks; photoresists; for hard-to-etch metal layers such as copper; integrated circuits; improved resolution |
| 02/09/2010 | US7659041 Lithographic method of manufacturing a device |
| 02/09/2010 | US7659038 Lithographic method for wiring a side surface of a substrate |
| 02/09/2010 | US7658803 Depositing first thin film including aluminum on substrate, patterning by photolithography and etching, cleansing, and depositing second thin film on substrate; cleansing is performed using materials including ultrapure water, cyclic amine, pyrogallol, benzotriazole, and methyl glycol |
| 02/09/2010 | US7658798 Method for fixing metal particles and method for manufacturing substrate containing metal particles, method for manufacturing substrate containing carbon nanotube, and method for manufacturing substrate containing semiconductor-crystalline rod, employing thereof |
| 02/09/2010 | US7658601 Pattern forming apparatus |
| 02/04/2010 | WO2010014293A1 Method and apparatus for thermal processing of photosensitive printing elements |
| 02/04/2010 | WO2010014165A1 Optimization of focused spots for maskless lithography |
| 02/04/2010 | WO2010014164A1 Active spot array lithographic projector system with regulated spots |
| 02/04/2010 | WO2010014156A1 Employing secondary back exposure of flexographic plate |
| 02/04/2010 | WO2010014139A1 Method of preparing lithographic printing plates |
| 02/04/2010 | WO2010013816A1 Negative working photosensitive composition, partition wall for optical element using the nagative working photosensitive composition, and optical element comprising the partition wall |
| 02/04/2010 | WO2010013654A1 Method for manufacturing substrate with partition walls and pixels formed therein |
| 02/04/2010 | WO2010013642A1 Method for forming conductive polymer pattern |
| 02/04/2010 | WO2010013623A1 Photosensitive element, method for forming resist pattern using the same, and method for manufacturing printed wiring board |
| 02/04/2010 | WO2010013349A1 Electron beam recorder, and apparatus and method for controlling the same |
| 02/04/2010 | WO2010013348A1 Electron beam recorder, its controller, and control method |
| 02/04/2010 | WO2010013331A1 Electron beam device |
| 02/04/2010 | WO2010013232A1 Mapping variations of a surface |
| 02/04/2010 | WO2010013052A2 Exposure apparatus and methods |
| 02/04/2010 | WO2010012589A1 Alignment of collector device in lithographic apparatus |
| 02/04/2010 | WO2010012588A1 Radiation source, lithographic apparatus and device manufacturing method |
| 02/04/2010 | WO2009152276A3 Photoacid generators and lithographic resists comprising the same |
| 02/04/2010 | WO2009126916A3 Patterning devices using fluorinated compounds |
| 02/04/2010 | US20100029841 Silicone-containing polymer and a heat-resistant resin composition comprising the silicon-containing polymer |
| 02/04/2010 | US20100029085 Cleaning composition and process for producing semiconductor device |
| 02/04/2010 | US20100028817 Solution for treatment of resist substrate after development processing and method for treatment of resist substrate using the same |
| 02/04/2010 | US20100028816 Process for preparing a polymeric relief structure |
| 02/04/2010 | US20100028815 System and method employing secondary back exposure of flexographic plate |
| 02/04/2010 | US20100028814 Manufacturing cross-structures of nanostructures |
| 02/04/2010 | US20100028813 Backside cleaning of substrate |
| 02/04/2010 | US20100028812 Method of manufacturing inkjet printhead |
| 02/04/2010 | US20100028811 Methods of making composite electrodes |
| 02/04/2010 | US20100028810 Etching method for use in deep-ultraviolet lithography |
| 02/04/2010 | US20100028809 Double patterning for lithography to increase feature spatial density |
| 02/04/2010 | US20100028808 Photosensitive element |
| 02/04/2010 | US20100028807 Imide Compound and Chemically Amplified Resist Composition Containing The Same |
| 02/04/2010 | US20100028806 Method of preparing lithographic printing plates |
| 02/04/2010 | US20100028805 Positive photosensitive resin composition |
| 02/04/2010 | US20100028804 Resist composition and method of forming pattern therewith |
| 02/04/2010 | US20100028803 Surface treating agent for resist pattern formation, resist composition, method of treating surface of resist pattern therewith and method of forming resist pattern |
| 02/04/2010 | US20100028802 Method for resist under layer film formation, composition for resist under layer film for use in the method, and method for pattern formation |
| 02/04/2010 | US20100028801 Lithography for pitch reduction |
| 02/04/2010 | US20100028800 Radiation-sensitive resin composition |
| 02/04/2010 | US20100028799 Resist composition for immersion exposure and method for resist pattern formation |
| 02/04/2010 | US20100028790 Method and system for reducing overlay errors in semiconductor volume production using a mixed tool scenario |
| 02/04/2010 | US20100028788 Manufacturing method of photomask for multiple exposure and semiconductor device manufacturing method using above photomask |
| 02/04/2010 | US20100028787 Substrate for euv mask blanks |
| 02/04/2010 | US20100028633 Flexible Transparent Electrodes Via Nanowires and Sacrificial Conductive Layer |
| 02/04/2010 | US20100027956 Multiphoton curing to provide encapsulated optical elements |
| 02/04/2010 | US20100027950 Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same |
| 02/04/2010 | US20100027946 Stackable optoelectronics chip-to-chip interconnects and method of manufacturing |
| 02/04/2010 | US20100026979 Active spot array lithographic projector system with regulated spots |
| 02/04/2010 | US20100025084 Photosensitive thermosetting resin composition and flexible printed circuit board |