| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/17/2010 | EP2154574A2 Radiation sources and methods of generating radiation |
| 02/17/2010 | EP2154573A1 System for lithography by laser interference |
| 02/17/2010 | EP2154572A2 Process for making a cylindrically-shaped photosensitive element for use as a printing form |
| 02/17/2010 | EP2154571A1 Positive photosensitive resin composition and method of forming cured film therefrom |
| 02/17/2010 | EP2154570A1 Photosensitive adhesive resin composition, adhesive film and light-receiving device |
| 02/17/2010 | EP2154569A1 Photosensitive resin and process for producing microlens |
| 02/17/2010 | EP2154568A1 Color filter and production method thereof, and solid-state image sensor using the same |
| 02/17/2010 | EP2154205A1 Resin composition, resin spacer film, and semiconductor device |
| 02/17/2010 | EP2154162A1 Reactive urethane compound having ether bond, curable composition and cured product |
| 02/17/2010 | EP2153282A1 Catoptric illumination system for microlithography tool |
| 02/17/2010 | EP2153280A1 A lithographic printing plate precursor |
| 02/17/2010 | EP2153278A1 Mask film to form relief images and method of use |
| 02/17/2010 | EP2153254A1 Multilayer-film reflective mirror and euv optical exposure apparatus comprising same |
| 02/17/2010 | EP2153253A1 Multilayer-film reflective mirror and euv optical exposure apparatus comprising same |
| 02/17/2010 | EP2152822A2 Antireflective coating compositions |
| 02/17/2010 | EP2152516A1 Imageable elements and methods of use in negative working lithographic printing plates |
| 02/17/2010 | EP1963374B1 Oxime ester photoinitiators |
| 02/17/2010 | EP1928929B1 Curable compositions containing dithiane monomers |
| 02/17/2010 | EP1757175B1 Method and apparatus for accurately applying structures to a substrate |
| 02/17/2010 | EP1320785B1 Oxime derivatives and the use thereof as latent acids |
| 02/17/2010 | CN201408326Y Double-side synchronous exposure machine of circuit board |
| 02/17/2010 | CN201408325Y LCD exposure device |
| 02/17/2010 | CN101652716A Photosensitive resin composition, photosensitive film, method for forming pattern by using the photosensitive film, and printed board |
| 02/17/2010 | CN101652715A Photosensitive resin composition and layered product |
| 02/17/2010 | CN101652714A 感光性树脂组合物 The photosensitive resin composition |
| 02/17/2010 | CN101652713A Photosensitive resin composition comprising a polymer prepared by using macromonomer as alkali soluble resin |
| 02/17/2010 | CN101652712A Colored composition and color filter therefrom |
| 02/17/2010 | CN101652433A Pigment-dispersed composition, curable composition, and color filter and production method thereof |
| 02/17/2010 | CN101650535A Direct-write photoetching device |
| 02/17/2010 | CN101650534A Method for measuring focal plane uniformity of exposure machine |
| 02/17/2010 | CN101650533A Method and system for monitoring photolithographic process |
| 02/17/2010 | CN101650532A Liquid processing apparatus, liquid processing method and storage medium |
| 02/17/2010 | CN101650531A Calixresorcinarene compounds, photoresist base materials, and compositions thereof |
| 02/17/2010 | CN101650530A Coating and developing device and method |
| 02/17/2010 | CN100590533C Method for detecting light intensity distribution of gradient filter and method for improving line breadth consistency |
| 02/17/2010 | CN100590532C Photolith exposure method and exposure system |
| 02/17/2010 | CN100590531C Two time graph exposure method utilizing developing filler material |
| 02/17/2010 | CN100590530C Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| 02/17/2010 | CN100590529C Silicon containing 193nm negative photo resist and membrane forming resin |
| 02/17/2010 | CN100590528C Transparent, highly heat-resistant polyimide precursor and photosensitive polyimide composition thereof |
| 02/17/2010 | CN100590527C Photosensitive thermosetting resin composition, and photosensitive cover lay and flexible printed wiring board using the composition |
| 02/17/2010 | CN100590526C Polymer for immersion lithography, photoresist composition containing the same, method of manufacturing a semiconductor device, and semiconductor device |
| 02/17/2010 | CN100590525C Polymerizable composition and plated printed plate fore-body |
| 02/17/2010 | CN100590523C Photomask and its production method, and pattern forming method |
| 02/17/2010 | CN100590522C Method of manufacturing grey mask and grey mask |
| 02/16/2010 | USRE41128 Comprise polymer (e.g., epoxy cresol novolac resins) bonded with chromophore (4-hydroxybenzoic acid, trimellitic anhydride); compositions can be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which prevent reflection during photoresist exposure |
| 02/16/2010 | US7663768 Method and system for measuring patterned structures |
| 02/16/2010 | US7663753 Apparatus and methods for detecting overlay errors using scatterometry |
| 02/16/2010 | US7663735 Microlithographic projection exposure apparatus with immersion projection lens |
| 02/16/2010 | US7663734 Pattern writing system and pattern writing method |
| 02/16/2010 | US7662897 dropping polymerization of monomers such as 1-hydroxy-3-methacryloyloxyadamantane (HMA), 5-methacryloyloxy-2,6-norbornane carbolactone (MNBL), 2-methacryloyloxy-2-methyladamantane (2-MMA), solvent extraction, redissolving, desolventing; purification; metal-free |
| 02/16/2010 | US7662763 Composition and method for removing copper-compatible resist |
| 02/16/2010 | US7662762 Aqueous solution containing fluorine compound, amine and chelate compound |
| 02/16/2010 | US7662546 Apparatus for processing substrate and method of processing the same |
| 02/16/2010 | US7662545 Making microstructure by selectively activating portion of surface of silicon-containing elastomer, contacting activated portion with substance, and bonding activated portion and substance, such that activated portion of surface and substance in contact with activated portion are irreversibly attached |
| 02/16/2010 | US7662543 Pattern forming method and method of manufacturing semiconductor device |
| 02/16/2010 | US7662542 Forming a resist pattern on a to-be-processed film, forming a mask pattern including the resist pattern and a resin film formed on a surface of the resist pattern, and slimming the mask pattern; pattern shape of anitreflection film is the same between even different types of patterns |
| 02/16/2010 | US7662541 Comprises an alkali-soluble resin, a photopolymerizable compound and a photopolymerization initiator, the polymerization initiator comprising a hexaarylbisimidazole based compound, and a multifunctional thiol compound; excellent in stability with maintaining sensitivity |
| 02/16/2010 | US7662540 Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 |
| 02/16/2010 | US7662539 Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device |
| 02/16/2010 | US7662538 Have application in electronic chemicals market such as in a photoresist composition, and in other areas such as in varnishes, printing inks, epoxy resins, copying paper, tackifiers for rubber, crude oil separators, toner resins for photocopying, antireflective coatings, and the like |
| 02/16/2010 | US7662537 Sensitive to the light in near-infrared region and provides images directly on the plate by laser beam irradiation |
| 02/16/2010 | US7662523 Photo mask, exposure method using the same, and method of generating data |
| 02/16/2010 | US7662263 Polishing or otherwise figuring multilayer coating that has been deposited on optical substrate in order to correct for errors in figure of substrate and coating; method such as ion-beam milling can be used to remove material from multilayer coating by amount that varies in specified way across substrate |
| 02/16/2010 | US7661385 Device for spin-coating substrates |
| 02/16/2010 | CA2458886C Method for fabricating chirped fiber bragg gratings |
| 02/16/2010 | CA2452053C Stripping and cleaning compositions for microelectronics |
| 02/11/2010 | WO2010017184A2 Dendrimer hydrogels |
| 02/11/2010 | WO2010017160A2 Environmentally friendly polymer stripping compositions |
| 02/11/2010 | WO2010016550A1 A substrate treating method, a substrate treating apparatus, an exposure method, and a device manufacturing method |
| 02/11/2010 | WO2010016258A1 Flame-retardant photocurable resin composition, dry film and cured product of the same, and printed wiring board using the composition, dry film or cured product |
| 02/11/2010 | WO2010016256A1 Flame-retardant photocurable resin composition, dry film and cured product of the same, and printed wiring board using the composition, dry film or cured product |
| 02/11/2010 | WO2010015511A1 Lithographic apparatus and device manufacturing method |
| 02/11/2010 | WO2010015508A2 Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element |
| 02/11/2010 | WO2010015333A2 Template and method of making high aspect ratio template for lithography and use of the template for perforating a substrate at nanoscale |
| 02/11/2010 | WO2010015296A2 Transmitting optical element consisting of magnesium-aluminium spinel |
| 02/11/2010 | US20100035786 Peroxide Activated Oxometalate Based Formulations for Removal of Etch Residue |
| 02/11/2010 | US20100035785 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
| 02/11/2010 | US20100035192 Method of forming resist pattern |
| 02/11/2010 | US20100035191 Method for patterning material layer |
| 02/11/2010 | US20100035190 Method of forming an alignment layer, and apparatus for forming the alignment layer |
| 02/11/2010 | US20100035189 Forming method of resist pattern and manufacturing method of thin-film magnetic head |
| 02/11/2010 | US20100035188 Method of manufacturing organic electro-luminescence device |
| 02/11/2010 | US20100035187 Method for smoothing printed circuit boards |
| 02/11/2010 | US20100035186 Manufacturing a graphene device and a graphene nanostructure solution |
| 02/11/2010 | US20100035185 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method |
| 02/11/2010 | US20100035184 Multilayer positive-working imageable elements and their use |
| 02/11/2010 | US20100035183 Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
| 02/11/2010 | US20100035182 Photosensitive resin composition |
| 02/11/2010 | US20100035181 Resist underlayer film forming composition |
| 02/11/2010 | US20100035180 Chemically amplified positive resist composition |
| 02/11/2010 | US20100035179 Method of synthesizing ito electron-beam resist and method of forming ito pattern using the same |
| 02/11/2010 | US20100035178 Negative resist composition, method of forming resist pattern and polymeric compound |
| 02/11/2010 | US20100035177 Method for forming pattern, and material for forming coating film |
| 02/11/2010 | US20100035176 Imaging element and method using differential light scattering |
| 02/11/2010 | US20100035168 Pattern predicting method, recording media and method of fabricating semiconductor device |
| 02/11/2010 | US20100035167 Exposure method, mask data producing method, and semiconductor device manufacturing method |
| 02/11/2010 | US20100035166 Photosensitive composition, partition walls, black matrix and process for producing color filter |
| 02/11/2010 | US20100035164 excellent in flatness after having been chucked by a mask stage of an exposure system; at least three of four corner portions of the flatness measurement area have a shape that rises toward the outer peripheral side; position accuracy |
| 02/11/2010 | US20100035163 Fabrication of nanostructured devices |